JP2013165234A5 - - Google Patents

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Publication number
JP2013165234A5
JP2013165234A5 JP2012028602A JP2012028602A JP2013165234A5 JP 2013165234 A5 JP2013165234 A5 JP 2013165234A5 JP 2012028602 A JP2012028602 A JP 2012028602A JP 2012028602 A JP2012028602 A JP 2012028602A JP 2013165234 A5 JP2013165234 A5 JP 2013165234A5
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JP
Japan
Prior art keywords
charged particle
optical system
particle beam
beam apparatus
lens array
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Pending
Application number
JP2012028602A
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English (en)
Japanese (ja)
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JP2013165234A (ja
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Priority to JP2012028602A priority Critical patent/JP2013165234A/ja
Priority claimed from JP2012028602A external-priority patent/JP2013165234A/ja
Publication of JP2013165234A publication Critical patent/JP2013165234A/ja
Publication of JP2013165234A5 publication Critical patent/JP2013165234A5/ja
Pending legal-status Critical Current

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JP2012028602A 2012-02-13 2012-02-13 荷電粒子光学系、荷電粒子線装置、および物品の製造方法 Pending JP2013165234A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2012028602A JP2013165234A (ja) 2012-02-13 2012-02-13 荷電粒子光学系、荷電粒子線装置、および物品の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012028602A JP2013165234A (ja) 2012-02-13 2012-02-13 荷電粒子光学系、荷電粒子線装置、および物品の製造方法

Publications (2)

Publication Number Publication Date
JP2013165234A JP2013165234A (ja) 2013-08-22
JP2013165234A5 true JP2013165234A5 (enExample) 2015-03-19

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ID=49176402

Family Applications (1)

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JP2012028602A Pending JP2013165234A (ja) 2012-02-13 2012-02-13 荷電粒子光学系、荷電粒子線装置、および物品の製造方法

Country Status (1)

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JP (1) JP2013165234A (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102817129B1 (ko) 2020-02-21 2025-06-05 에이에스엠엘 네델란즈 비.브이. 하전 입자 검사 툴, 검사 방법
IL295627B1 (en) * 2020-02-21 2026-05-01 Asml Netherlands Bv Inspection apparatus
EP4734147A1 (en) * 2024-10-24 2026-04-29 ASML Netherlands B.V. Charged particle-optical arrangement for a charged particle beam apparatus

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4996441A (en) * 1988-09-16 1991-02-26 Siemens Aktiengesellschaft Lithographic apparatus for structuring a subject
JP3913250B2 (ja) * 2005-01-07 2007-05-09 キヤノン株式会社 電子ビーム露光装置とその露光方法
JP4652830B2 (ja) * 2005-01-26 2011-03-16 キヤノン株式会社 収差調整方法、デバイス製造方法及び荷電粒子線露光装置
US8039813B2 (en) * 2005-09-06 2011-10-18 Carl Zeiss Smt Gmbh Charged particle-optical systems, methods and components

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