JP2013004680A5 - - Google Patents
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- Publication number
- JP2013004680A5 JP2013004680A5 JP2011133486A JP2011133486A JP2013004680A5 JP 2013004680 A5 JP2013004680 A5 JP 2013004680A5 JP 2011133486 A JP2011133486 A JP 2011133486A JP 2011133486 A JP2011133486 A JP 2011133486A JP 2013004680 A5 JP2013004680 A5 JP 2013004680A5
- Authority
- JP
- Japan
- Prior art keywords
- charged particle
- electrode
- particle beam
- opening
- support
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002245 particle Substances 0.000 claims description 13
- 239000011521 glass Substances 0.000 claims description 4
- 239000003513 alkali Substances 0.000 claims description 3
- 230000004927 fusion Effects 0.000 claims 1
- 230000003287 optical effect Effects 0.000 claims 1
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011133486A JP2013004680A (ja) | 2011-06-15 | 2011-06-15 | 荷電粒子線レンズ |
| US13/493,833 US20120319001A1 (en) | 2011-06-15 | 2012-06-11 | Charged particle beam lens |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011133486A JP2013004680A (ja) | 2011-06-15 | 2011-06-15 | 荷電粒子線レンズ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2013004680A JP2013004680A (ja) | 2013-01-07 |
| JP2013004680A5 true JP2013004680A5 (enExample) | 2014-07-31 |
Family
ID=47352947
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011133486A Pending JP2013004680A (ja) | 2011-06-15 | 2011-06-15 | 荷電粒子線レンズ |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US20120319001A1 (enExample) |
| JP (1) | JP2013004680A (enExample) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013004216A (ja) * | 2011-06-14 | 2013-01-07 | Canon Inc | 荷電粒子線レンズ |
| US9824851B2 (en) * | 2013-01-20 | 2017-11-21 | William M. Tong | Charge drain coating for electron-optical MEMS |
| DE112014003890B4 (de) * | 2013-09-30 | 2018-08-02 | Hitachi High-Technologies Corporation | Mit einem Strahl geladener Teilchen arbeitende Vorrichtung |
| US9349564B2 (en) * | 2014-07-17 | 2016-05-24 | Fei Company | Charged-particle lens that transmits emissions from sample |
| US11137581B2 (en) * | 2018-09-27 | 2021-10-05 | Himax Technologies Limited | Wafer-level homogeneous bonding optical structure and method to form the same |
| EP3783917B1 (en) * | 2019-03-28 | 2024-07-17 | Sumitomo Riko Company Limited | Electrostatic transducer and electrostatic transducer unit |
| WO2022135926A1 (en) * | 2020-12-23 | 2022-06-30 | Asml Netherlands B.V. | Electron lens |
| EP4020517A1 (en) * | 2020-12-23 | 2022-06-29 | ASML Netherlands B.V. | Electron-optical device |
| WO2023018496A1 (en) * | 2021-08-08 | 2023-02-16 | ViaMEMS Technologies, Inc. | Electrostatic devices to influence beams of charged particles |
| EP4307335A1 (en) * | 2022-07-12 | 2024-01-17 | ASML Netherlands B.V. | Isolating spacer for electron-optical assembly |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5684853A (en) * | 1979-12-14 | 1981-07-10 | Jeol Ltd | Face structure of member located close to electron beam path |
| JPH05190129A (ja) * | 1992-01-13 | 1993-07-30 | Toshiba Corp | 静電型レンズ |
| JPH09283015A (ja) * | 1996-04-12 | 1997-10-31 | Canon Inc | 遮蔽部材の作製方法、及び画像形成装置 |
| JP2000208038A (ja) * | 1999-01-08 | 2000-07-28 | Canon Inc | 電子源及び画像形成装置の製造方法 |
| JP3763446B2 (ja) * | 1999-10-18 | 2006-04-05 | キヤノン株式会社 | 静電レンズ、電子ビーム描画装置、荷電ビーム応用装置、および、デバイス製造方法 |
| JP2001283756A (ja) * | 2000-03-31 | 2001-10-12 | Canon Inc | 電子光学系アレイ、これを用いた荷電粒子線露光装置ならびにデバイス製造方法 |
| JP2002080828A (ja) * | 2000-09-11 | 2002-03-22 | Toshiba Corp | 帯電防止用分散液と帯電防止膜および画像表示装置 |
| US7081630B2 (en) * | 2004-03-12 | 2006-07-25 | Zyvex Corporation | Compact microcolumn for automated assembly |
| JP4541798B2 (ja) * | 2004-08-06 | 2010-09-08 | キヤノン株式会社 | 荷電粒子線レンズアレイ、及び該荷電粒子線レンズアレイを用いた荷電粒子線露光装置 |
| JPWO2006106781A1 (ja) * | 2005-03-31 | 2008-09-11 | 日本板硝子株式会社 | イットリウムを含むガラス組成物を含む電子線励起型ディスプレイ用ガラススペーサおよび電子線励起型ディスプレイ |
| JP2006350125A (ja) * | 2005-06-17 | 2006-12-28 | Seiko Epson Corp | 光学デバイス |
| JP2008235101A (ja) * | 2007-03-22 | 2008-10-02 | Horiba Ltd | 荷電粒子線装置における帯電防止構造 |
| US8707734B2 (en) * | 2009-10-19 | 2014-04-29 | The Regents Of The University Of Michigan | Method of embedding material in a glass substrate |
| JP2011198738A (ja) * | 2010-02-23 | 2011-10-06 | Nissin Ion Equipment Co Ltd | 複数の磁場集中部材をカバーする保護部材を備えたイオンビーム照射装置用磁石 |
-
2011
- 2011-06-15 JP JP2011133486A patent/JP2013004680A/ja active Pending
-
2012
- 2012-06-11 US US13/493,833 patent/US20120319001A1/en not_active Abandoned