JP2013004680A - 荷電粒子線レンズ - Google Patents

荷電粒子線レンズ Download PDF

Info

Publication number
JP2013004680A
JP2013004680A JP2011133486A JP2011133486A JP2013004680A JP 2013004680 A JP2013004680 A JP 2013004680A JP 2011133486 A JP2011133486 A JP 2011133486A JP 2011133486 A JP2011133486 A JP 2011133486A JP 2013004680 A JP2013004680 A JP 2013004680A
Authority
JP
Japan
Prior art keywords
electrode
charged particle
particle beam
support
lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2011133486A
Other languages
English (en)
Japanese (ja)
Other versions
JP2013004680A5 (enExample
Inventor
Koichi Tsunoda
浩一 角田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2011133486A priority Critical patent/JP2013004680A/ja
Priority to US13/493,833 priority patent/US20120319001A1/en
Publication of JP2013004680A publication Critical patent/JP2013004680A/ja
Publication of JP2013004680A5 publication Critical patent/JP2013004680A5/ja
Pending legal-status Critical Current

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/12—Lenses electrostatic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10—Lenses
    • H01J2237/12—Lenses electrostatic
    • H01J2237/1205—Microlenses

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP2011133486A 2011-06-15 2011-06-15 荷電粒子線レンズ Pending JP2013004680A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2011133486A JP2013004680A (ja) 2011-06-15 2011-06-15 荷電粒子線レンズ
US13/493,833 US20120319001A1 (en) 2011-06-15 2012-06-11 Charged particle beam lens

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011133486A JP2013004680A (ja) 2011-06-15 2011-06-15 荷電粒子線レンズ

Publications (2)

Publication Number Publication Date
JP2013004680A true JP2013004680A (ja) 2013-01-07
JP2013004680A5 JP2013004680A5 (enExample) 2014-07-31

Family

ID=47352947

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011133486A Pending JP2013004680A (ja) 2011-06-15 2011-06-15 荷電粒子線レンズ

Country Status (2)

Country Link
US (1) US20120319001A1 (enExample)
JP (1) JP2013004680A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016522564A (ja) * 2013-01-20 2016-07-28 ケーエルエー−テンカー コーポレイション 電子光学系ｍｅｍｓ用電荷排出塗膜

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013004216A (ja) * 2011-06-14 2013-01-07 Canon Inc 荷電粒子線レンズ
DE112014003890B4 (de) * 2013-09-30 2018-08-02 Hitachi High-Technologies Corporation Mit einem Strahl geladener Teilchen arbeitende Vorrichtung
US9349564B2 (en) * 2014-07-17 2016-05-24 Fei Company Charged-particle lens that transmits emissions from sample
US11137581B2 (en) * 2018-09-27 2021-10-05 Himax Technologies Limited Wafer-level homogeneous bonding optical structure and method to form the same
EP3783917B1 (en) * 2019-03-28 2024-07-17 Sumitomo Riko Company Limited Electrostatic transducer and electrostatic transducer unit
WO2022135926A1 (en) * 2020-12-23 2022-06-30 Asml Netherlands B.V. Electron lens
EP4020517A1 (en) * 2020-12-23 2022-06-29 ASML Netherlands B.V. Electron-optical device
WO2023018496A1 (en) * 2021-08-08 2023-02-16 ViaMEMS Technologies, Inc. Electrostatic devices to influence beams of charged particles
EP4307335A1 (en) * 2022-07-12 2024-01-17 ASML Netherlands B.V. Isolating spacer for electron-optical assembly

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5684853A (en) * 1979-12-14 1981-07-10 Jeol Ltd Face structure of member located close to electron beam path
JPH05190129A (ja) * 1992-01-13 1993-07-30 Toshiba Corp 静電型レンズ
JPH09283015A (ja) * 1996-04-12 1997-10-31 Canon Inc 遮蔽部材の作製方法、及び画像形成装置
JP2000208038A (ja) * 1999-01-08 2000-07-28 Canon Inc 電子源及び画像形成装置の製造方法
JP2006049702A (ja) * 2004-08-06 2006-02-16 Canon Inc 荷電粒子線レンズアレイ、及び該荷電粒子線レンズアレイを用いた荷電粒子線露光装置
WO2006106781A1 (ja) * 2005-03-31 2006-10-12 Nippon Sheet Glass Company, Limited イットリウムを含むガラス組成物および電子線励起型ディスプレイ用ガラススペーサ
JP2006350125A (ja) * 2005-06-17 2006-12-28 Seiko Epson Corp 光学デバイス
JP2008235101A (ja) * 2007-03-22 2008-10-02 Horiba Ltd 荷電粒子線装置における帯電防止構造

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3763446B2 (ja) * 1999-10-18 2006-04-05 キヤノン株式会社 静電レンズ、電子ビーム描画装置、荷電ビーム応用装置、および、デバイス製造方法
JP2001283756A (ja) * 2000-03-31 2001-10-12 Canon Inc 電子光学系アレイ、これを用いた荷電粒子線露光装置ならびにデバイス製造方法
JP2002080828A (ja) * 2000-09-11 2002-03-22 Toshiba Corp 帯電防止用分散液と帯電防止膜および画像表示装置
US7081630B2 (en) * 2004-03-12 2006-07-25 Zyvex Corporation Compact microcolumn for automated assembly
US8707734B2 (en) * 2009-10-19 2014-04-29 The Regents Of The University Of Michigan Method of embedding material in a glass substrate
JP2011198738A (ja) * 2010-02-23 2011-10-06 Nissin Ion Equipment Co Ltd 複数の磁場集中部材をカバーする保護部材を備えたイオンビーム照射装置用磁石

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5684853A (en) * 1979-12-14 1981-07-10 Jeol Ltd Face structure of member located close to electron beam path
JPH05190129A (ja) * 1992-01-13 1993-07-30 Toshiba Corp 静電型レンズ
US5293045A (en) * 1992-01-13 1994-03-08 Kabushiki Kaisha Toshiba Electrostatic lens
JPH09283015A (ja) * 1996-04-12 1997-10-31 Canon Inc 遮蔽部材の作製方法、及び画像形成装置
JP2000208038A (ja) * 1999-01-08 2000-07-28 Canon Inc 電子源及び画像形成装置の製造方法
JP2006049702A (ja) * 2004-08-06 2006-02-16 Canon Inc 荷電粒子線レンズアレイ、及び該荷電粒子線レンズアレイを用いた荷電粒子線露光装置
WO2006106781A1 (ja) * 2005-03-31 2006-10-12 Nippon Sheet Glass Company, Limited イットリウムを含むガラス組成物および電子線励起型ディスプレイ用ガラススペーサ
JP2006350125A (ja) * 2005-06-17 2006-12-28 Seiko Epson Corp 光学デバイス
JP2008235101A (ja) * 2007-03-22 2008-10-02 Horiba Ltd 荷電粒子線装置における帯電防止構造

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016522564A (ja) * 2013-01-20 2016-07-28 ケーエルエー−テンカー コーポレイション 電子光学系ｍｅｍｓ用電荷排出塗膜

Also Published As

Publication number Publication date
US20120319001A1 (en) 2012-12-20

Similar Documents

Publication Publication Date Title
JP2013004680A (ja) 荷電粒子線レンズ
JP7689139B2 (ja) マルチビーム発生ユニットおよびマルチビーム偏向ユニットの特定の改善
KR20130129109A (ko) 정전렌즈의 전극 및 그 제조 방법
TWI479530B (zh) 靜電透鏡結構、靜電透鏡陣列、帶電粒子的子束微影系統以及製造絕緣結構的方法
US20140197325A1 (en) Charged particle beam lens and exposure apparatus using the same
US8829465B2 (en) Charged particle beam lens having a particular support electrically insulating first and second electrodes from each other
TW202312206A (zh) 聚焦能力增進的多射束產生單元
JP2013168396A (ja) 静電型の荷電粒子線レンズ及び荷電粒子線装置
US20140166894A1 (en) Charged particle beam lens and exposure apparatus using the same
JP2013008534A (ja) 荷電粒子線レンズ用電極
JP2007266525A (ja) 荷電粒子線レンズアレイ、該荷電粒子線レンズアレイを用いた荷電粒子線露光装置
JP4541798B2 (ja) 荷電粒子線レンズアレイ、及び該荷電粒子線レンズアレイを用いた荷電粒子線露光装置
JP2013165200A (ja) 荷電粒子線レンズ
JP2013030567A (ja) 荷電粒子線レンズアレイ
JP2007123599A (ja) 荷電粒子線レンズアレイ及び該レンズアレイを用いた荷電粒子線露光装置
JP2014033033A (ja) 静電レンズ用電極ユニット
US20250349495A1 (en) Isolating spacer for electron-optical assembly
EP4354483A1 (en) Alignment of electron-optical elements
JP2014033077A (ja) 貫通孔の形成方法
US20140151571A1 (en) Charged particle beam lens and exposure apparatus using the same

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20140613

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20140613

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20150311

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20150324

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20150804