JP2013165131A5 - - Google Patents

Download PDF

Info

Publication number
JP2013165131A5
JP2013165131A5 JP2012026715A JP2012026715A JP2013165131A5 JP 2013165131 A5 JP2013165131 A5 JP 2013165131A5 JP 2012026715 A JP2012026715 A JP 2012026715A JP 2012026715 A JP2012026715 A JP 2012026715A JP 2013165131 A5 JP2013165131 A5 JP 2013165131A5
Authority
JP
Japan
Prior art keywords
transport container
present
ion implantation
mask
gate valve
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2012026715A
Other languages
English (en)
Japanese (ja)
Other versions
JP5892802B2 (ja
JP2013165131A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP2012026715A external-priority patent/JP5892802B2/ja
Priority to JP2012026715A priority Critical patent/JP5892802B2/ja
Priority to TW101144215A priority patent/TWI514446B/zh
Priority to KR1020120153244A priority patent/KR101412687B1/ko
Priority to US13/764,016 priority patent/US9117960B2/en
Priority to CN201310051265XA priority patent/CN103247522A/zh
Publication of JP2013165131A publication Critical patent/JP2013165131A/ja
Publication of JP2013165131A5 publication Critical patent/JP2013165131A5/ja
Publication of JP5892802B2 publication Critical patent/JP5892802B2/ja
Application granted granted Critical
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2012026715A 2012-02-09 2012-02-09 イオン注入方法、搬送容器及びイオン注入装置 Expired - Fee Related JP5892802B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2012026715A JP5892802B2 (ja) 2012-02-09 2012-02-09 イオン注入方法、搬送容器及びイオン注入装置
TW101144215A TWI514446B (zh) 2012-02-09 2012-11-26 Ion implantation method, transfer container and ion implantation device
KR1020120153244A KR101412687B1 (ko) 2012-02-09 2012-12-26 이온주입방법, 반송용기 및 이온주입장치
US13/764,016 US9117960B2 (en) 2012-02-09 2013-02-11 Ion implantation method, carrier, and ion implantation device
CN201310051265XA CN103247522A (zh) 2012-02-09 2013-02-16 离子注入方法、输送容器及离子注入装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012026715A JP5892802B2 (ja) 2012-02-09 2012-02-09 イオン注入方法、搬送容器及びイオン注入装置

Publications (3)

Publication Number Publication Date
JP2013165131A JP2013165131A (ja) 2013-08-22
JP2013165131A5 true JP2013165131A5 (enExample) 2014-05-22
JP5892802B2 JP5892802B2 (ja) 2016-03-23

Family

ID=48926952

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012026715A Expired - Fee Related JP5892802B2 (ja) 2012-02-09 2012-02-09 イオン注入方法、搬送容器及びイオン注入装置

Country Status (5)

Country Link
US (1) US9117960B2 (enExample)
JP (1) JP5892802B2 (enExample)
KR (1) KR101412687B1 (enExample)
CN (1) CN103247522A (enExample)
TW (1) TWI514446B (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6338416B2 (ja) * 2014-03-27 2018-06-06 住重アテックス株式会社 イオン照射方法およびイオン照射に用いる固定装置
JP6403485B2 (ja) * 2014-08-08 2018-10-10 住友重機械イオンテクノロジー株式会社 イオン注入装置及びイオン注入方法
CN107210252B (zh) * 2014-11-26 2021-05-25 冯·阿登纳资产股份有限公司 基板保持装置、基板运送装置、处理布置和用于处理基板的方法
JP6410689B2 (ja) * 2015-08-06 2018-10-24 住友重機械イオンテクノロジー株式会社 イオン注入装置及びそれを用いた複数枚のウェハの処理方法
LU101808B1 (en) * 2020-05-15 2021-11-15 Mi2 Factory Gmbh An ion implantation device comprising energy filter and additional heating element

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6335534B1 (en) * 1998-04-17 2002-01-01 Kabushiki Kaisha Toshiba Ion implantation apparatus, ion generating apparatus and semiconductor manufacturing method with ion implantation processes
JP3353064B2 (ja) * 2000-02-17 2002-12-03 独立行政法人物質・材料研究機構 イオン注入装置および方法
JP4252237B2 (ja) * 2000-12-06 2009-04-08 株式会社アルバック イオン注入装置およびイオン注入方法
US8153513B2 (en) * 2006-07-25 2012-04-10 Silicon Genesis Corporation Method and system for continuous large-area scanning implantation process
US7820460B2 (en) * 2007-09-07 2010-10-26 Varian Semiconductor Equipment Associates, Inc. Patterned assembly for manufacturing a solar cell and a method thereof
JP4530032B2 (ja) * 2007-11-29 2010-08-25 日新イオン機器株式会社 イオンビーム照射方法およびイオンビーム照射装置
US7727866B2 (en) 2008-03-05 2010-06-01 Varian Semiconductor Equipment Associates, Inc. Use of chained implants in solar cells
US7816239B2 (en) * 2008-11-20 2010-10-19 Varian Semiconductor Equipment Associates, Inc. Technique for manufacturing a solar cell
US8330128B2 (en) * 2009-04-17 2012-12-11 Varian Semiconductor Equipment Associates, Inc. Implant mask with moveable hinged mask segments
US9000446B2 (en) * 2009-05-22 2015-04-07 Varian Semiconductor Equipment Associates, Inc. Techniques for processing a substrate
US20110027463A1 (en) * 2009-06-16 2011-02-03 Varian Semiconductor Equipment Associates, Inc. Workpiece handling system
EP3188215A3 (en) * 2010-02-09 2017-09-13 Intevac, Inc. An adjustable shadow mask assembly for use in solar cell fabrications
WO2011155199A1 (ja) * 2010-06-10 2011-12-15 株式会社アルバック 太陽電池製造装置及び太陽電池製造方法
US8216923B2 (en) * 2010-10-01 2012-07-10 Varian Semiconductor Equipment Associates, Inc. Integrated shadow mask/carrier for patterned ion implantation
JP5704402B2 (ja) * 2011-08-30 2015-04-22 日新イオン機器株式会社 基板保持部材および当該半導体保持部材への半導体基板の取り付け位置調整方法
JP2013131367A (ja) * 2011-12-21 2013-07-04 Nissin Ion Equipment Co Ltd イオン注入装置

Similar Documents

Publication Publication Date Title
NZ761006A (en) Plasma kallikrein binding proteins and uses thereof in treating hereditary angioedema
SG162642A1 (en) Techniques for maintaining a substrate processing system
WO2016072806A3 (ko) 코어-쉘 구조의 페로브스카이트 나노결정입자 발광체, 이의 제조방법 및 이를 이용한 발광소자
CN106796835A8 (zh) 具有不同磁性质的区域的磁体以及用于形成这种磁体的方法
CU24262B1 (es) Un método para procesar un material de biomasa
TWD153878S1 (zh) 基板運送用固持構件
EP3424941A4 (en) PROCESS FOR THE PRODUCTION OF NON-CYCLIC PEPTIDE-NUCLEIC ACID COMPLEX HAVING AT AN N-TERMINAL END AN AMINO ACID HAVING A THIOL GROUP NEAR THE AMINO GROUP, A CORRESPONDING LIBRARY, AND A LIBRARY OF THE PEPTIDE-CYCLIC NUCLEIC ACID COMPOUND THUS DERIVED
GB2567777A (en) Fabrication of correlated electron material films with varying atomic or molecular concentrations of dopant species
BR112015000582A2 (pt) método, e composição
MX2019000049A (es) Producción de óxido de carbono y óxido de carbono reducido a gran escala.
WO2017002115A3 (en) Hybrid nanoparticles as photoinitiators
MX2018001833A (es) Dispositivo de transporte y metodo de transporte que comprende tal dispositivo de transporte.
JP2015035607A5 (enExample)
JP2015115404A5 (enExample)
FR3051831B1 (fr) Carter d'echappement de turbomachine et son procede de fabrication
BR112013030890A2 (pt) processo e sistema de adsorção cíclica, método para melhorar a eficiência de potência de um processo de adsorção cíclica, processo de adsorção com oscilação de pressão, e, método para usar pelo menos um compressor centrífugo.
Ashrafi et al. Ordering chemical trees by Wiener polarity index
Salce et al. Products of elementary and idempotent matrices over integral domains
FR2971224B1 (fr) Dispositif de transport
TW201613953A (en) Process for the preparation of cyclic depsipeptides
BR112014002723A2 (pt) processo de monitoramento dos meios de bloqueio de um sistema elétrico de inversão de impulso para turbo-máquina
EA201891747A1 (ru) Полинуклеотиды и полипептиды slam и их использование
JP2017042232A5 (enExample)
EP3509973B8 (de) Robotische transportvorrichtung zum transportieren von kleinteilen und mit der robotischen vorrichtung durchführbares verfahren
Li et al. Ding–Iohara algebras and quantum vertex algebras