JP2013162111A5 - - Google Patents
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- JP2013162111A5 JP2013162111A5 JP2012025743A JP2012025743A JP2013162111A5 JP 2013162111 A5 JP2013162111 A5 JP 2013162111A5 JP 2012025743 A JP2012025743 A JP 2012025743A JP 2012025743 A JP2012025743 A JP 2012025743A JP 2013162111 A5 JP2013162111 A5 JP 2013162111A5
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- 239000000758 substrate Substances 0.000 description 29
- 238000000034 method Methods 0.000 description 6
- 230000007723 transport mechanism Effects 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012025743A JP5588469B2 (ja) | 2012-02-09 | 2012-02-09 | 基板処理装置 |
KR1020130013259A KR101532826B1 (ko) | 2012-02-09 | 2013-02-06 | 기판 처리 장치 |
KR1020140118783A KR101602570B1 (ko) | 2012-02-09 | 2014-09-05 | 기판 처리 장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012025743A JP5588469B2 (ja) | 2012-02-09 | 2012-02-09 | 基板処理装置 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014151419A Division JP5830140B2 (ja) | 2014-07-25 | 2014-07-25 | 基板処理装置 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2013162111A JP2013162111A (ja) | 2013-08-19 |
JP2013162111A5 true JP2013162111A5 (enrdf_load_stackoverflow) | 2014-02-27 |
JP5588469B2 JP5588469B2 (ja) | 2014-09-10 |
Family
ID=49174080
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012025743A Active JP5588469B2 (ja) | 2012-02-09 | 2012-02-09 | 基板処理装置 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP5588469B2 (enrdf_load_stackoverflow) |
KR (2) | KR101532826B1 (enrdf_load_stackoverflow) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6182065B2 (ja) * | 2013-12-27 | 2017-08-16 | 東京エレクトロン株式会社 | 基板処理装置 |
JP6867827B2 (ja) | 2017-02-28 | 2021-05-12 | キヤノン株式会社 | リソグラフィ装置および物品製造方法 |
JP6955922B2 (ja) * | 2017-07-14 | 2021-10-27 | 株式会社ディスコ | インラインシステム |
WO2019159736A1 (ja) * | 2018-02-16 | 2019-08-22 | 東京エレクトロン株式会社 | 基板処理装置 |
JP7363591B2 (ja) * | 2020-03-05 | 2023-10-18 | 東京エレクトロン株式会社 | 基板処理装置及び基板処理方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3943828B2 (ja) * | 2000-12-08 | 2007-07-11 | 東京エレクトロン株式会社 | 塗布、現像装置及びパターン形成方法 |
KR100892756B1 (ko) * | 2007-12-27 | 2009-04-15 | 세메스 주식회사 | 기판 처리 장치 및 이를 이용한 기판 이송 방법 |
JP5338757B2 (ja) * | 2010-07-09 | 2013-11-13 | 東京エレクトロン株式会社 | 塗布、現像装置、塗布、現像方法及び記憶媒体 |
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2012
- 2012-02-09 JP JP2012025743A patent/JP5588469B2/ja active Active
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2013
- 2013-02-06 KR KR1020130013259A patent/KR101532826B1/ko active Active
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2014
- 2014-09-05 KR KR1020140118783A patent/KR101602570B1/ko active Active