JP2013136024A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2013136024A5 JP2013136024A5 JP2011288361A JP2011288361A JP2013136024A5 JP 2013136024 A5 JP2013136024 A5 JP 2013136024A5 JP 2011288361 A JP2011288361 A JP 2011288361A JP 2011288361 A JP2011288361 A JP 2011288361A JP 2013136024 A5 JP2013136024 A5 JP 2013136024A5
- Authority
- JP
- Japan
- Prior art keywords
- gas
- liquid
- carbon dioxide
- amount
- dioxide gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 140
- 239000007788 liquid Substances 0.000 claims description 101
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 70
- 239000001569 carbon dioxide Substances 0.000 claims description 70
- 238000004090 dissolution Methods 0.000 claims description 29
- 229920006395 saturated elastomer Polymers 0.000 claims description 21
- 239000000758 substrate Substances 0.000 claims description 17
- 238000000034 method Methods 0.000 claims description 7
- 238000003672 processing method Methods 0.000 claims description 4
- 238000002844 melting Methods 0.000 claims 4
- 230000008018 melting Effects 0.000 claims 4
- 238000004519 manufacturing process Methods 0.000 claims 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011288361A JP5989338B2 (ja) | 2011-12-28 | 2011-12-28 | 処理液生成装置、処理液生成方法、基板処理装置及び基板処理方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011288361A JP5989338B2 (ja) | 2011-12-28 | 2011-12-28 | 処理液生成装置、処理液生成方法、基板処理装置及び基板処理方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013136024A JP2013136024A (ja) | 2013-07-11 |
| JP2013136024A5 true JP2013136024A5 (enExample) | 2015-02-19 |
| JP5989338B2 JP5989338B2 (ja) | 2016-09-07 |
Family
ID=48912242
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011288361A Active JP5989338B2 (ja) | 2011-12-28 | 2011-12-28 | 処理液生成装置、処理液生成方法、基板処理装置及び基板処理方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5989338B2 (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2015030035A1 (ja) * | 2013-08-28 | 2015-03-05 | 国立大学法人筑波大学 | 洗浄装置および洗浄方法 |
| CN106471602A (zh) * | 2014-03-31 | 2017-03-01 | 独立行政法人产业技术综合研究所 | 半导体的制造方法及晶片衬底的清洗方法 |
| JP6608515B2 (ja) * | 2014-08-26 | 2019-11-20 | 東京エレクトロン株式会社 | 基板液処理方法及び基板液処理装置 |
| JP2017050460A (ja) * | 2015-09-03 | 2017-03-09 | 株式会社ディスコ | 溶液製造装置 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0763687B2 (ja) * | 1986-06-11 | 1995-07-12 | 株式会社オ−・エイチ・エル | 物品洗浄方法及び装置 |
| JP2002172318A (ja) * | 2000-09-27 | 2002-06-18 | Dainippon Ink & Chem Inc | 超純水の比抵抗調整装置及び調整方法 |
| JP2005093873A (ja) * | 2003-09-19 | 2005-04-07 | Ebara Corp | 基板処理装置 |
| JP2004344821A (ja) * | 2003-05-23 | 2004-12-09 | Nomura Micro Sci Co Ltd | 超純水又は純水の帯電防止方法及び帯電防止装置 |
| WO2008050832A1 (fr) * | 2006-10-27 | 2008-05-02 | Tokyo Electron Limited | Appareil et procédé de nettoyage de substrat, programme et support d'enregistrement |
-
2011
- 2011-12-28 JP JP2011288361A patent/JP5989338B2/ja active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2016101585A5 (enExample) | ||
| TW200802560A (en) | Apparatus for and method of processing substrate | |
| CN102946982B (zh) | 高浓度臭氧水的制造方法及高浓度臭氧水的制造装置 | |
| MX2016003652A (es) | Soluciones liquidas que contienen nanoburbujas. | |
| MX2017005936A (es) | Aparato para disolver gas en un líquido. | |
| HK1252285A1 (zh) | 用臭氧气泡处理基材的装置和方法 | |
| JP2013136024A5 (enExample) | ||
| AR077953A1 (es) | Metodo y programa de computadora para tratar liquido que contiene impurezas | |
| BRPI1000046B8 (pt) | método terapêutico com microbolhas e aparelho de geração de microbolhas | |
| MX350052B (es) | Aparato y metodo para el tratamiento biologico de aguas residuales. | |
| MX2016004900A (es) | Aparato y proceso para tratamiento de fluidos. | |
| MX2022003603A (es) | Metodo para inertizar carbon activado en equipo de purificacion de biogas. | |
| MX2015011372A (es) | Concentracion localizada de energia. | |
| JP2015080756A (ja) | 微小気泡発生装置および気泡径制御方法 | |
| NZ717343A (en) | Method and apparatus for treating a feed stream for a flotation device | |
| UA119450C2 (uk) | Пристрій для формування мікробульбашок і система очищення забрудненої води, яка містить пристрій для формування мікробульбашок | |
| JP2015052512A5 (enExample) | ||
| CL2018001542A1 (es) | Aparato y proceso para separar a través de espuma | |
| NZ769836A (en) | Cooling acetylated wood elements | |
| SG10201900882TA (en) | Gas-dissolved liquid producing apparatus | |
| MY181156A (en) | Method and apparatus for treating offgases in a acetic acid production unit | |
| JP2012240099A5 (enExample) | ||
| JP5989338B2 (ja) | 処理液生成装置、処理液生成方法、基板処理装置及び基板処理方法 | |
| MX2016011436A (es) | Metodo de produccion para estructura soldada. | |
| TW200801853A (en) | Treating device and manufacturing method for substrate |