JP2013045107A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2013045107A5 JP2013045107A5 JP2012170838A JP2012170838A JP2013045107A5 JP 2013045107 A5 JP2013045107 A5 JP 2013045107A5 JP 2012170838 A JP2012170838 A JP 2012170838A JP 2012170838 A JP2012170838 A JP 2012170838A JP 2013045107 A5 JP2013045107 A5 JP 2013045107A5
- Authority
- JP
- Japan
- Prior art keywords
- cylindrical
- process direction
- cross
- lens
- light field
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13/216,976 | 2011-08-24 | ||
| US13/216,976 US8405913B2 (en) | 2011-08-24 | 2011-08-24 | Anamorphic projection optical system |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013045107A JP2013045107A (ja) | 2013-03-04 |
| JP2013045107A5 true JP2013045107A5 (enExample) | 2015-09-17 |
| JP5883361B2 JP5883361B2 (ja) | 2016-03-15 |
Family
ID=47148579
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012170838A Expired - Fee Related JP5883361B2 (ja) | 2011-08-24 | 2012-08-01 | アナモルフィック光学系を用いる単一パス画像形成システム |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US8405913B2 (enExample) |
| EP (1) | EP2561995B1 (enExample) |
| JP (1) | JP5883361B2 (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8390917B1 (en) * | 2011-08-24 | 2013-03-05 | Palo Alto Research Center Incorporated | Multiple line single-pass imaging using spatial light modulator and anamorphic projection optics |
| US9630424B2 (en) | 2011-08-24 | 2017-04-25 | Palo Alto Research Center Incorporated | VCSEL-based variable image optical line generator |
| US8767270B2 (en) * | 2011-08-24 | 2014-07-01 | Palo Alto Research Center Incorporated | Single-pass imaging apparatus with image data scrolling for improved resolution contrast and exposure extent |
| US9030515B2 (en) | 2011-08-24 | 2015-05-12 | Palo Alto Research Center Incorporated | Single-pass imaging method using spatial light modulator and anamorphic projection optics |
| US9354379B2 (en) | 2014-09-29 | 2016-05-31 | Palo Alto Research Center Incorporated | Light guide based optical system for laser line generator |
| US11453165B2 (en) * | 2019-02-05 | 2022-09-27 | Silicon Light Machines Corporation | Stacked PLV driver architecture for a microelectromechanical system spatial light modulator |
| US11333894B2 (en) * | 2019-03-12 | 2022-05-17 | Silicon Light Machines Corporation | Anamorphic illumination optics for a MEMS spatial light modulator |
| US10594887B1 (en) * | 2019-03-18 | 2020-03-17 | Xerox Corporation | Method for measuring beam to beam stitch error in the presence of variable width beams |
Family Cites Families (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3800699A (en) | 1970-06-17 | 1974-04-02 | A Carley | Fountain solution image apparatus for electronic lithography |
| JPS6234118A (ja) * | 1985-08-08 | 1987-02-14 | Canon Inc | 光変調装置 |
| US5105369A (en) * | 1989-12-21 | 1992-04-14 | Texas Instruments Incorporated | Printing system exposure module alignment method and apparatus of manufacture |
| US6121984A (en) | 1995-01-11 | 2000-09-19 | Texas Instruments Incorporated | DMD modulated continuous wave light source for imaging systems |
| US5754217A (en) * | 1995-04-19 | 1998-05-19 | Texas Instruments Incorporated | Printing system and method using a staggered array spatial light modulator having masked mirror elements |
| KR19980028035A (ko) * | 1995-10-25 | 1998-07-15 | 윌리엄 이. 힐러 | 하드 카피 장치용 조명 시스템 |
| US5828485A (en) | 1996-02-07 | 1998-10-27 | Light & Sound Design Ltd. | Programmable light beam shape altering device using programmable micromirrors |
| JP2001330912A (ja) * | 2000-05-18 | 2001-11-30 | Fuji Photo Film Co Ltd | 画像記録装置 |
| US6606739B2 (en) | 2000-11-14 | 2003-08-12 | Ball Semiconductor, Inc. | Scaling method for a digital photolithography system |
| JP2002162889A (ja) * | 2000-11-22 | 2002-06-07 | Sony Corp | フィルム保持装置及び定着処理システム |
| US6567217B1 (en) | 2001-11-06 | 2003-05-20 | Eastman Kodak Company | Image-forming system with enhanced gray levels |
| JP2003329953A (ja) * | 2002-05-14 | 2003-11-19 | Fuji Photo Film Co Ltd | 画像記録装置 |
| CN101487982A (zh) | 2002-08-24 | 2009-07-22 | 无掩模平版印刷公司 | 连续地直接写的光刻技术 |
| JP4223936B2 (ja) | 2003-02-06 | 2009-02-12 | 株式会社リコー | 投射光学系、拡大投射光学系、拡大投射装置及び画像投射装置 |
| US8282221B2 (en) | 2003-11-01 | 2012-10-09 | Silicon Quest Kabushiki Kaisha | Projection apparatus using variable light source |
| JP4938069B2 (ja) * | 2004-03-31 | 2012-05-23 | 日立ビアメカニクス株式会社 | パターン露光方法およびパターン露光装置 |
| US7061581B1 (en) | 2004-11-22 | 2006-06-13 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| JP2006154603A (ja) * | 2004-12-01 | 2006-06-15 | Nippon Hoso Kyokai <Nhk> | ホログラム記録装置 |
| KR100814644B1 (ko) | 2006-07-31 | 2008-03-18 | 주식회사 나노브릭 | 이미지 프로젝션 시스템 및 방법 |
| CN1916768A (zh) | 2006-09-08 | 2007-02-21 | 中国科学院光电技术研究所 | 个性化隐形眼镜定制设备 |
| US7719766B2 (en) | 2007-06-20 | 2010-05-18 | Texas Instruments Incorporated | Illumination source and method therefor |
| TWI524091B (zh) * | 2008-12-05 | 2016-03-01 | 麥可尼克資料處理公司 | 使用旋轉印刷臂以投射或觀看在工作部件上之影像之方法及裝置 |
| WO2010092189A1 (en) * | 2009-02-16 | 2010-08-19 | Micronic Laser Systems Ab | Reconfigurable micro-mechanical light modulator and method |
-
2011
- 2011-08-24 US US13/216,976 patent/US8405913B2/en active Active
-
2012
- 2012-08-01 JP JP2012170838A patent/JP5883361B2/ja not_active Expired - Fee Related
- 2012-08-20 EP EP12180982.6A patent/EP2561995B1/en active Active