JP2013033726A - 異常検出装置及び異常検出方法 - Google Patents

異常検出装置及び異常検出方法 Download PDF

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Publication number
JP2013033726A
JP2013033726A JP2012142092A JP2012142092A JP2013033726A JP 2013033726 A JP2013033726 A JP 2013033726A JP 2012142092 A JP2012142092 A JP 2012142092A JP 2012142092 A JP2012142092 A JP 2012142092A JP 2013033726 A JP2013033726 A JP 2013033726A
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Japan
Prior art keywords
signal
waveform pattern
frequency signal
abnormal discharge
unit
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JP2012142092A
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English (en)
Japanese (ja)
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JP2013033726A5 (https=
Inventor
Masako Nakatani
理子 中谷
Haruki Omine
治樹 大嶺
Tetsu Tsunamoto
哲 綱本
Hiroshi Nagaike
宏史 長池
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to JP2012142092A priority Critical patent/JP2013033726A/ja
Priority to TW101122756A priority patent/TW201316374A/zh
Priority to KR1020120069186A priority patent/KR20130007469A/ko
Priority to US13/534,594 priority patent/US20130056154A1/en
Priority to CN2012102169091A priority patent/CN102856149A/zh
Publication of JP2013033726A publication Critical patent/JP2013033726A/ja
Publication of JP2013033726A5 publication Critical patent/JP2013033726A5/ja
Withdrawn legal-status Critical Current

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32917Plasma diagnostics
    • H01J37/32935Monitoring and controlling tubes by information coming from the object and/or discharge
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082Radio frequency generated discharge
    • H01J37/32174Circuits specially adapted for controlling the RF discharge
    • H01J37/32183Matching circuits

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
JP2012142092A 2011-06-27 2012-06-25 異常検出装置及び異常検出方法 Withdrawn JP2013033726A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2012142092A JP2013033726A (ja) 2011-06-27 2012-06-25 異常検出装置及び異常検出方法
TW101122756A TW201316374A (zh) 2011-06-27 2012-06-26 異常檢測裝置及異常檢測方法
KR1020120069186A KR20130007469A (ko) 2011-06-27 2012-06-27 이상 검출 장치 및 이상 검출 방법
US13/534,594 US20130056154A1 (en) 2011-06-27 2012-06-27 Abnormality detecting unit and abnormality detecting method
CN2012102169091A CN102856149A (zh) 2011-06-27 2012-06-27 异常检测装置和异常检测方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2011141492 2011-06-27
JP2011141492 2011-06-27
JP2012142092A JP2013033726A (ja) 2011-06-27 2012-06-25 異常検出装置及び異常検出方法

Publications (2)

Publication Number Publication Date
JP2013033726A true JP2013033726A (ja) 2013-02-14
JP2013033726A5 JP2013033726A5 (https=) 2015-08-06

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JP2012142092A Withdrawn JP2013033726A (ja) 2011-06-27 2012-06-25 異常検出装置及び異常検出方法

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Country Link
JP (1) JP2013033726A (https=)
KR (1) KR20130007469A (https=)
TW (1) TW201316374A (https=)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016174081A (ja) * 2015-03-17 2016-09-29 東京エレクトロン株式会社 基板処理方法及び基板処理装置
CN114935708A (zh) * 2022-05-24 2022-08-23 广西电网有限责任公司柳州供电局 一种线路放电异常的识别方法
WO2023112504A1 (ja) * 2021-12-13 2023-06-22 株式会社プロテリアル 状態監視システムおよび状態監視方法
CN116378949A (zh) * 2023-03-21 2023-07-04 中国科学院沈阳科学仪器股份有限公司 一种新型极高真空离子泵异常放电检测与抑制装置
KR20240013701A (ko) 2022-07-22 2024-01-30 도쿄엘렉트론가부시키가이샤 검출 방법 및 플라즈마 처리 장치
CN118091398A (zh) * 2024-04-09 2024-05-28 浙江索高电气科技有限公司 一种高压开关设备局部放电故障识别方法、设备及介质
CN118898363A (zh) * 2024-07-15 2024-11-05 无锡军工智能电气股份有限公司 矿用电力智能运行监控系统及方法
CN120632492A (zh) * 2025-08-13 2025-09-12 浙江冠博流体科技有限公司 流体管路系统隔膜阀故障自适应识别方法
KR20260010328A (ko) 2024-07-12 2026-01-20 도쿄엘렉트론가부시키가이샤 이상 방전 검출 방법 및 제어 장치

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI562252B (en) * 2014-02-17 2016-12-11 Shinkawa Kk Detecting discharging device, wire bonding device and detecting discharging method
JP7061626B2 (ja) * 2018-01-16 2022-04-28 株式会社日立ハイテク 検体処理システム
JP7067516B2 (ja) * 2019-03-26 2022-05-16 日本電産株式会社 プラズマ処理装置
WO2022064558A1 (ja) * 2020-09-23 2022-03-31 株式会社Kokusai Electric 半導体装置の製造方法、異常予兆検知方法、異常予兆検知プログラム、及び基板処理装置
KR102709642B1 (ko) 2021-11-26 2024-09-25 주식회사 뉴파워 프라즈마 잡음 특성 향상을 위한 rf 제너레이터 전원 제어 시스템

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016174081A (ja) * 2015-03-17 2016-09-29 東京エレクトロン株式会社 基板処理方法及び基板処理装置
CN105990194A (zh) * 2015-03-17 2016-10-05 东京毅力科创株式会社 基板处理方法和基板处理装置
TWI686844B (zh) * 2015-03-17 2020-03-01 日商東京威力科創股份有限公司 基板處理方法及基板處理裝置
WO2023112504A1 (ja) * 2021-12-13 2023-06-22 株式会社プロテリアル 状態監視システムおよび状態監視方法
CN114935708A (zh) * 2022-05-24 2022-08-23 广西电网有限责任公司柳州供电局 一种线路放电异常的识别方法
KR20240013701A (ko) 2022-07-22 2024-01-30 도쿄엘렉트론가부시키가이샤 검출 방법 및 플라즈마 처리 장치
CN116378949A (zh) * 2023-03-21 2023-07-04 中国科学院沈阳科学仪器股份有限公司 一种新型极高真空离子泵异常放电检测与抑制装置
CN118091398A (zh) * 2024-04-09 2024-05-28 浙江索高电气科技有限公司 一种高压开关设备局部放电故障识别方法、设备及介质
KR20260010328A (ko) 2024-07-12 2026-01-20 도쿄엘렉트론가부시키가이샤 이상 방전 검출 방법 및 제어 장치
CN118898363A (zh) * 2024-07-15 2024-11-05 无锡军工智能电气股份有限公司 矿用电力智能运行监控系统及方法
CN120632492A (zh) * 2025-08-13 2025-09-12 浙江冠博流体科技有限公司 流体管路系统隔膜阀故障自适应识别方法

Also Published As

Publication number Publication date
TW201316374A (zh) 2013-04-16
KR20130007469A (ko) 2013-01-18

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