JP2013010936A5 - - Google Patents
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- Publication number
- JP2013010936A5 JP2013010936A5 JP2012117271A JP2012117271A JP2013010936A5 JP 2013010936 A5 JP2013010936 A5 JP 2013010936A5 JP 2012117271 A JP2012117271 A JP 2012117271A JP 2012117271 A JP2012117271 A JP 2012117271A JP 2013010936 A5 JP2013010936 A5 JP 2013010936A5
- Authority
- JP
- Japan
- Prior art keywords
- fluoroalkyl
- monomers
- alkyl
- combination
- copolymers according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000000178 monomer Substances 0.000 claims 6
- 125000000217 alkyl group Chemical group 0.000 claims 3
- 229920001577 copolymer Polymers 0.000 claims 3
- 125000003709 fluoroalkyl group Chemical group 0.000 claims 3
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims 1
- 239000002253 acid Substances 0.000 claims 1
- 150000002596 lactones Chemical class 0.000 claims 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 claims 1
- 238000001459 lithography Methods 0.000 description 2
- IBDVWXAVKPRHCU-UHFFFAOYSA-N 2-(2-methylprop-2-enoyloxy)ethyl 3-oxobutanoate Chemical compound CC(=O)CC(=O)OCCOC(=O)C(C)=C IBDVWXAVKPRHCU-UHFFFAOYSA-N 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000001878 scanning electron micrograph Methods 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201161490883P | 2011-05-27 | 2011-05-27 | |
| US61/490,883 | 2011-05-27 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013010936A JP2013010936A (ja) | 2013-01-17 |
| JP2013010936A5 true JP2013010936A5 (cg-RX-API-DMAC7.html) | 2016-03-17 |
| JP5897986B2 JP5897986B2 (ja) | 2016-04-06 |
Family
ID=46298243
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012117271A Expired - Fee Related JP5897986B2 (ja) | 2011-05-27 | 2012-05-23 | ポリマー組成物およびこのポリマーを含むフォトレジスト |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US8603728B2 (cg-RX-API-DMAC7.html) |
| EP (1) | EP2527379A1 (cg-RX-API-DMAC7.html) |
| JP (1) | JP5897986B2 (cg-RX-API-DMAC7.html) |
| CN (1) | CN102796223A (cg-RX-API-DMAC7.html) |
| TW (1) | TWI507428B (cg-RX-API-DMAC7.html) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5793489B2 (ja) * | 2011-11-30 | 2015-10-14 | 富士フイルム株式会社 | 感活性光線性又は感放射線性組成物、それを用いたレジスト膜、パターン形成方法、及び電子デバイスの製造方法 |
| US9581901B2 (en) | 2013-12-19 | 2017-02-28 | Rohm And Haas Electronic Materials Llc | Photoacid-generating copolymer and associated photoresist composition, coated substrate, and method of forming an electronic device |
| JP6267532B2 (ja) | 2014-02-14 | 2018-01-24 | 信越化学工業株式会社 | レジスト保護膜材料及びパターン形成方法 |
| KR102233577B1 (ko) | 2014-02-25 | 2021-03-30 | 삼성전자주식회사 | 반도체 소자의 패턴 형성 방법 |
| CN107251190B (zh) * | 2014-12-24 | 2020-11-10 | 正交公司 | 电子装置的光刻图案化 |
| CN119684123A (zh) * | 2024-08-29 | 2025-03-25 | 珠海基石科技有限公司 | 含氟单体及其制备方法 |
| CN119161524B (zh) * | 2024-11-19 | 2025-04-08 | 中节能万润股份有限公司 | 一种用于电子束光刻胶的聚合物及其制备方法和应用 |
Family Cites Families (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0654382B2 (ja) | 1986-11-18 | 1994-07-20 | 富士写真フイルム株式会社 | 感光性組成物 |
| AU632605B2 (en) * | 1989-08-14 | 1993-01-07 | Mitsubishi Rayon Company Limited | Material for dentistry |
| US5229245A (en) * | 1991-07-26 | 1993-07-20 | Industrial Technology Research Institute | Positively working photosensitive composition |
| US5185403A (en) * | 1991-07-31 | 1993-02-09 | Morton Coatings, Inc. | Thermosetting acrylic polymers and coating compositions containing said acrylic polymers and fluorocarbon resins |
| US6011119A (en) * | 1995-07-28 | 2000-01-04 | Mitsui Chemicals, Inc. | Resin composition for electrophotographic toner, and toner |
| DE69709859T2 (de) * | 1996-05-10 | 2002-09-19 | E.I. Du Pont De Nemours And Co., Wilmington | Acryl polymere |
| JP3623058B2 (ja) | 1996-06-13 | 2005-02-23 | 和光純薬工業株式会社 | 新規ポリマー及びこれを用いたレジスト組成物並びにこれを用いたパターン形成方法 |
| TW491860B (en) | 1997-04-30 | 2002-06-21 | Wako Pure Chem Ind Ltd | Acrylic or methacrylic acid derivatives and polymers obtained therefrom |
| JP3788549B2 (ja) | 1997-09-30 | 2006-06-21 | 旭電化工業株式会社 | ポリビニルブチラール樹脂組成物 |
| US6254878B1 (en) * | 1999-07-01 | 2001-07-03 | E. I. Du Pont De Nemours And Company | Nail polish compositions containing acrylic polymers |
| JP3984488B2 (ja) * | 2001-03-27 | 2007-10-03 | 日本ペイント株式会社 | 硬化性塗料組成物および塗膜形成方法 |
| US7575846B2 (en) * | 2003-01-31 | 2009-08-18 | Mitsubishi Rayon Co., Ltd. | Resist polymer and resist composition |
| JP4301872B2 (ja) * | 2003-06-19 | 2009-07-22 | ダイセル化学工業株式会社 | ラクトン環含有重合性単量体、高分子化合物、フォトレジスト用樹脂組成物、及び半導体の製造方法 |
| US7063931B2 (en) * | 2004-01-08 | 2006-06-20 | International Business Machines Corporation | Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use |
| JP4442887B2 (ja) * | 2004-02-27 | 2010-03-31 | 三菱レイヨン株式会社 | レジスト用重合体 |
| TWI368825B (en) * | 2004-07-07 | 2012-07-21 | Fujifilm Corp | Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same |
| JP4714488B2 (ja) * | 2004-08-26 | 2011-06-29 | 富士フイルム株式会社 | ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
| JP2006171667A (ja) * | 2004-11-22 | 2006-06-29 | Fuji Photo Film Co Ltd | ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
| US7247419B2 (en) * | 2005-04-11 | 2007-07-24 | Az Electronic Materials Usa Corp. | Nanocomposite photosensitive composition and use thereof |
| EP1720072B1 (en) * | 2005-05-01 | 2019-06-05 | Rohm and Haas Electronic Materials, L.L.C. | Compositons and processes for immersion lithography |
| JP4614092B2 (ja) * | 2006-01-31 | 2011-01-19 | 信越化学工業株式会社 | フッ素アルコール化合物の製造方法 |
| JP2007284368A (ja) * | 2006-04-14 | 2007-11-01 | Daicel Chem Ind Ltd | （メタ）アクリル系単量体及びレジスト樹脂の保護膜用樹脂 |
| JP2007284381A (ja) * | 2006-04-18 | 2007-11-01 | Daicel Chem Ind Ltd | フォトレジスト用（メタ）アクリル系単量体、その高分子化合物及びフォトレジスト用樹脂組成物 |
| JP2008165146A (ja) * | 2007-01-05 | 2008-07-17 | Fujifilm Corp | ポジ型感光性組成物、それを用いたパターン形成方法及び該ポジ型感光性組成物に用いられる樹脂 |
| JP5401046B2 (ja) * | 2007-03-14 | 2014-01-29 | 富士フイルム株式会社 | レジスト表面疎水化用樹脂の製造方法、その製造方法及び該樹脂を含有するポジ型レジスト組成物の調整方法、レジスト膜の形成方法、及び、パターン形成方法 |
| JP4621754B2 (ja) * | 2007-03-28 | 2011-01-26 | 富士フイルム株式会社 | ポジ型レジスト組成物およびパターン形成方法 |
| JP4743450B2 (ja) * | 2008-09-05 | 2011-08-10 | 信越化学工業株式会社 | ポジ型レジスト材料及びパターン形成方法 |
| KR101343962B1 (ko) * | 2008-12-15 | 2013-12-20 | 샌트랄 글래스 컴퍼니 리미티드 | 함불소 중합성 단량체, 함불소 중합체, 레지스트 재료 및 패턴 형성 방법 그리고 반도체 장치 |
| KR101413611B1 (ko) * | 2009-04-21 | 2014-07-01 | 샌트랄 글래스 컴퍼니 리미티드 | 탑코트 조성물 및 패턴 형성 방법 |
| EP2287667B1 (en) | 2009-06-26 | 2013-03-27 | Rohm and Haas Electronic Materials, L.L.C. | Self-aligned spacer multiple patterning methods |
| JP5741297B2 (ja) * | 2010-08-05 | 2015-07-01 | Jsr株式会社 | 感放射線性樹脂組成物、レジストパターン形成方法及び重合体 |
-
2012
- 2012-05-22 EP EP12168975A patent/EP2527379A1/en not_active Withdrawn
- 2012-05-23 JP JP2012117271A patent/JP5897986B2/ja not_active Expired - Fee Related
- 2012-05-24 TW TW101118475A patent/TWI507428B/zh not_active IP Right Cessation
- 2012-05-28 CN CN2012102429953A patent/CN102796223A/zh active Pending
- 2012-05-29 US US13/482,559 patent/US8603728B2/en not_active Expired - Fee Related