JP2012529750A5 - - Google Patents

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JP2012529750A5
JP2012529750A5 JP2012515098A JP2012515098A JP2012529750A5 JP 2012529750 A5 JP2012529750 A5 JP 2012529750A5 JP 2012515098 A JP2012515098 A JP 2012515098A JP 2012515098 A JP2012515098 A JP 2012515098A JP 2012529750 A5 JP2012529750 A5 JP 2012529750A5
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coil
current
application example
processing system
inductor
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JP2012515098A
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JP2012529750A (ja
JP5643301B2 (ja
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Priority claimed from PCT/US2010/037942 external-priority patent/WO2010144555A2/en
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JP2012515098A 2009-06-12 2010-06-09 プラズマ処理システム及び電力分配器 Active JP5643301B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US18671009P 2009-06-12 2009-06-12
US61/186,710 2009-06-12
PCT/US2010/037942 WO2010144555A2 (en) 2009-06-12 2010-06-09 Adjusting current ratios in inductively coupled plasma processing systems

Publications (3)

Publication Number Publication Date
JP2012529750A JP2012529750A (ja) 2012-11-22
JP2012529750A5 true JP2012529750A5 (enExample) 2013-07-25
JP5643301B2 JP5643301B2 (ja) 2014-12-17

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JP2012515098A Active JP5643301B2 (ja) 2009-06-12 2010-06-09 プラズマ処理システム及び電力分配器

Country Status (7)

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US (1) US9305750B2 (enExample)
JP (1) JP5643301B2 (enExample)
KR (1) KR101708075B1 (enExample)
CN (1) CN102804930A (enExample)
SG (2) SG176069A1 (enExample)
TW (1) TW201127224A (enExample)
WO (1) WO2010144555A2 (enExample)

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JP5781349B2 (ja) 2011-03-30 2015-09-24 東京エレクトロン株式会社 プラズマ処理装置
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US9462672B2 (en) 2012-02-22 2016-10-04 Lam Research Corporation Adjustment of power and frequency based on three or more states
US9320126B2 (en) 2012-12-17 2016-04-19 Lam Research Corporation Determining a value of a variable on an RF transmission model
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CN103060778B (zh) * 2013-01-23 2015-03-11 深圳市劲拓自动化设备股份有限公司 平板式pecvd装置
KR20140122548A (ko) * 2013-04-10 2014-10-20 피에스케이 주식회사 전력 공급 장치, 전력 공급 방법, 그리고 그를 이용한 기판 처리 장치
KR102175081B1 (ko) * 2013-12-27 2020-11-06 세메스 주식회사 플라즈마 발생 장치 및 그를 포함하는 기판 처리 장치
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CN108882494B (zh) * 2017-05-08 2022-06-17 北京北方华创微电子装备有限公司 等离子体装置
US11290080B2 (en) 2017-11-29 2022-03-29 COMET Technologies USA, Inc. Retuning for impedance matching network control
CN111192752B (zh) * 2018-11-14 2021-08-31 江苏鲁汶仪器有限公司 一种功率分配电感耦合线圈及具有其的等离子体处理装置
CN111199860A (zh) 2018-11-20 2020-05-26 江苏鲁汶仪器有限公司 一种刻蚀均匀性调节装置及方法
US11114279B2 (en) 2019-06-28 2021-09-07 COMET Technologies USA, Inc. Arc suppression device for plasma processing equipment
US11107661B2 (en) 2019-07-09 2021-08-31 COMET Technologies USA, Inc. Hybrid matching network topology
CN114144853B (zh) 2019-08-28 2024-12-27 科米特技术美国股份有限公司 高功率低频线圈
US11342887B2 (en) * 2019-12-18 2022-05-24 Nxp Usa, Inc. Wideband RF power splitters and amplifiers including wideband RF power splitters
KR102147877B1 (ko) * 2020-04-01 2020-08-25 주식회사 기가레인 플라즈마 안테나 모듈
CN113496863B (zh) * 2020-04-01 2022-04-12 吉佳蓝科技股份有限公司 等离子体天线模块
KR20230071629A (ko) * 2021-11-16 2023-05-23 삼성전자주식회사 플라즈마 처리 장치 및 이를 이용한 반도체 소자 제조 방법
US12087549B2 (en) 2021-12-30 2024-09-10 Mks Instruments, Inc. Demagnetizing coils for linearity improvement of current ratio of plasma processing systems

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