JP2012514863A - 特にマイクロリソグラフィ用の投影露光システムで用いるファセットミラーを構成する個別ミラー - Google Patents

特にマイクロリソグラフィ用の投影露光システムで用いるファセットミラーを構成する個別ミラー Download PDF

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Publication number
JP2012514863A
JP2012514863A JP2011544842A JP2011544842A JP2012514863A JP 2012514863 A JP2012514863 A JP 2012514863A JP 2011544842 A JP2011544842 A JP 2011544842A JP 2011544842 A JP2011544842 A JP 2011544842A JP 2012514863 A JP2012514863 A JP 2012514863A
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mirror
joint
individual mirror
individual
electrode
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JP2012514863A5 (https=
Inventor
ヴェルベル アルミン
ミュールベルガー ノルベルト
バッハ フロリアン
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カール・ツァイス・エスエムティー・ゲーエムベーハー
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Publication of JP2012514863A publication Critical patent/JP2012514863A/ja
Publication of JP2012514863A5 publication Critical patent/JP2012514863A5/ja
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/0841—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting element being moved or deformed by electrostatic means
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2011544842A 2009-01-09 2010-01-08 特にマイクロリソグラフィ用の投影露光システムで用いるファセットミラーを構成する個別ミラー Pending JP2012514863A (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US14345609P 2009-01-09 2009-01-09
US61/143,456 2009-01-09
DE200910000099 DE102009000099A1 (de) 2009-01-09 2009-01-09 Mikrospiegelarray mit Doppelbiegebalken Anordnung und elektronischer Aktorik
DE102009000099.2 2009-01-09
PCT/EP2010/000044 WO2010079133A2 (de) 2009-01-09 2010-01-08 Einzelspiegel zum aufbau eines facettenspiegels, insbesondere zum einsatz in einer projektionsbelichtungsanlage für die mikro-lithographie

Publications (2)

Publication Number Publication Date
JP2012514863A true JP2012514863A (ja) 2012-06-28
JP2012514863A5 JP2012514863A5 (https=) 2012-12-20

Family

ID=42262714

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011544842A Pending JP2012514863A (ja) 2009-01-09 2010-01-08 特にマイクロリソグラフィ用の投影露光システムで用いるファセットミラーを構成する個別ミラー

Country Status (5)

Country Link
US (1) US9013676B2 (https=)
JP (1) JP2012514863A (https=)
CN (1) CN102272636A (https=)
DE (1) DE102009000099A1 (https=)
WO (1) WO2010079133A2 (https=)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015537235A (ja) * 2012-10-05 2015-12-24 カール・ツァイス・エスエムティー・ゲーエムベーハー ミラー素子の傾動を調整するための方法及びコンポーネント
JP2016524184A (ja) * 2013-05-22 2016-08-12 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学素子及び当該光学素子に対する放射の影響を低減する手段を備えた光学コンポーネント
JP2017083856A (ja) * 2012-11-29 2017-05-18 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学系の少なくとも１つの光学素子を作動させる機構
JP2023524648A (ja) * 2020-04-27 2023-06-13 カール・ツァイス・エスエムティー・ゲーエムベーハー 駆動デバイス、光学系、及びリソグラフィ装置
JP2024511398A (ja) * 2021-03-22 2024-03-13 カール・ツァイス・エスエムティー・ゲーエムベーハー ファセットシステム及びリソグラフィ装置

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DE102010039927A1 (de) * 2010-08-30 2012-03-01 Carl Zeiss Smt Gmbh Substrat für Spiegel für die EUV-Lithographie
DE102010062720B4 (de) 2010-12-09 2012-07-12 Carl Zeiss Smt Gmbh EUV-Lithographiesystem
DE102011002953A1 (de) * 2011-01-21 2012-07-26 Carl Zeiss Smt Gmbh Substrat für Spiegel für die EUV-Lithographie
DE102011003928B4 (de) * 2011-02-10 2012-10-31 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithographie
DE102011081914A1 (de) 2011-08-31 2012-09-06 Carl Zeiss Smt Gmbh Beleuchtungsoptik zur Beleuchtung eines in einem Objektfeld anordenbaren, strukturierten Objektes
DE102012200736A1 (de) * 2012-01-19 2013-07-25 Carl Zeiss Smt Gmbh Spiegelanordnung, insbesondere zum Einsatz in einer mikrolithographischen Projektionsbelichtungsanlage
DE102012005546A1 (de) * 2012-03-21 2013-09-26 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Mikrospiegelanordnung und Verfahren zur Herstellung einer Mikrospiegelanordnung
DE102012206153A1 (de) 2012-04-16 2013-10-17 Carl Zeiss Smt Gmbh Optisches System einer mikrolithographischen Projektionsbelichtungsanlage
DE102012209412A1 (de) 2012-06-04 2013-12-05 Carl Zeiss Smt Gmbh Optisches Verfahren und optische Messvorrichtung zum Messen von Winkellagen von Facetten zumindest eines Facettenspiegels für EUV-Anwendungen
DE102012212064A1 (de) 2012-07-11 2014-01-16 Carl Zeiss Smt Gmbh Lithographianlage mit segmentiertem Spiegel
DE102012212453A1 (de) 2012-07-17 2014-01-23 Carl Zeiss Smt Gmbh Beleuchtungsoptik
DE102013218748A1 (de) * 2013-09-18 2014-10-02 Carl Zeiss Smt Gmbh Optisches Bauelement
DE102013211269A1 (de) 2013-06-17 2014-04-30 Carl Zeiss Smt Gmbh Beleuchtungsoptik zur Beleuchtung eines in einem Objektfeld anordenbaren, strukturierten Objektes sowie Metrologiesystem für die Untersuchung eines strukturierten Objektes
DE102013214746A1 (de) 2013-07-29 2014-08-07 Carl Zeiss Smt Gmbh Optisches System sowie Verfahren zum Herstellen derselben
DE102014215048A1 (de) * 2014-07-31 2016-02-04 Robert Bosch Gmbh Mikrospiegelvorrichtung, Mikrospiegelarray und Projektionseinrichtung
DE102014219770A1 (de) * 2014-09-30 2016-03-31 Carl Zeiss Smt Gmbh Spiegelanordnung, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage, sowie Verfahren zur Ableitung eines Wärmestromes aus dem Bereich einer Spiegelanordnung
DE102016216188A1 (de) * 2016-08-29 2018-03-01 Carl Zeiss Smt Gmbh Steuereinrichtung
DE102021200113A1 (de) 2021-01-08 2022-07-14 Carl Zeiss Smt Gmbh Optische Vorrichtung, Verfahren zur Steuerung einer optischen Vorrichtung, Computerprogrammprodukt und Lithografiesystem
DE102021202769A1 (de) 2021-03-22 2022-09-22 Carl Zeiss Smt Gmbh Optische Baugruppe sowie Verfahren zu deren Herstellung, Verfahren zur Deformation eines optischen Elements und Projektionsbelichtungsanlage
DE102021211626A1 (de) * 2021-10-14 2023-04-20 Carl Zeiss Smt Gmbh EUV-Mehrfachspiegelanordnung
DE102022203257A1 (de) * 2022-04-01 2023-10-05 Carl Zeiss Smt Gmbh Ansteuervorrichtung, optisches system, lithographieanlage und verfahren
DE102022203438B4 (de) 2022-04-06 2023-12-07 Carl Zeiss Smt Gmbh Optische Anordnung, optisches Modul, optische Abbildungseinrichtung und -verfahren, Verfahren zum Abstützen eines optischen Elements, mit aktiv verkippbarem optischem Element
DE102022209391A1 (de) * 2022-09-09 2024-03-14 Carl Zeiss Smt Gmbh Verfahren zum Betreiben eines optischen Bauelements, optisches Bauelement

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US20040160118A1 (en) * 2002-11-08 2004-08-19 Knollenberg Clifford F. Actuator apparatus and method for improved deflection characteristics
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JP2004013099A (ja) * 2002-06-11 2004-01-15 Fujitsu Ltd マイクロミラー素子およびその製造方法
US20040160118A1 (en) * 2002-11-08 2004-08-19 Knollenberg Clifford F. Actuator apparatus and method for improved deflection characteristics
JP2006518882A (ja) * 2003-02-24 2006-08-17 エクサジュール リミテッド ライアビリティ カンパニー 隠されたヒンジ構造を備えるマルチチルト型マイクロミラーシステム
JP2004306217A (ja) * 2003-04-09 2004-11-04 Sony Corp マイクロマシンおよびその製造方法
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Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015537235A (ja) * 2012-10-05 2015-12-24 カール・ツァイス・エスエムティー・ゲーエムベーハー ミラー素子の傾動を調整するための方法及びコンポーネント
JP2017083856A (ja) * 2012-11-29 2017-05-18 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学系の少なくとも１つの光学素子を作動させる機構
US10303065B2 (en) 2012-11-29 2019-05-28 Carl Zeiss Smt Gmbh Arrangement for actuating at least one optical element in an optical system
JP2016524184A (ja) * 2013-05-22 2016-08-12 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学素子及び当該光学素子に対する放射の影響を低減する手段を備えた光学コンポーネント
JP2023524648A (ja) * 2020-04-27 2023-06-13 カール・ツァイス・エスエムティー・ゲーエムベーハー 駆動デバイス、光学系、及びリソグラフィ装置
JP7333877B2 (ja) 2020-04-27 2023-08-25 カール・ツァイス・エスエムティー・ゲーエムベーハー 駆動デバイス、光学系、及びリソグラフィ装置
US12276916B2 (en) 2020-04-27 2025-04-15 Carl Zeiss Smt Gmbh Drive device, optical system and lithography apparatus
TWI888542B (zh) * 2020-04-27 2025-07-01 德商卡爾蔡司Ｓｍｔ有限公司 驅動裝置、光學系統與微影設備
JP2024511398A (ja) * 2021-03-22 2024-03-13 カール・ツァイス・エスエムティー・ゲーエムベーハー ファセットシステム及びリソグラフィ装置
JP7777146B2 (ja) 2021-03-22 2025-11-27 カール・ツァイス・エスエムティー・ゲーエムベーハー ファセットシステム及びリソグラフィ装置

Also Published As

Publication number Publication date
CN102272636A (zh) 2011-12-07
US20110273694A1 (en) 2011-11-10
US9013676B2 (en) 2015-04-21
WO2010079133A3 (de) 2010-10-07
WO2010079133A2 (de) 2010-07-15
DE102009000099A1 (de) 2010-07-22

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