CN102272636A - 构造尤其用于微光刻投射曝光系统的分面镜的个体反射镜 - Google Patents

构造尤其用于微光刻投射曝光系统的分面镜的个体反射镜 Download PDF

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Publication number
CN102272636A
CN102272636A CN2010800042108A CN201080004210A CN102272636A CN 102272636 A CN102272636 A CN 102272636A CN 2010800042108 A CN2010800042108 A CN 2010800042108A CN 201080004210 A CN201080004210 A CN 201080004210A CN 102272636 A CN102272636 A CN 102272636A
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CN
China
Prior art keywords
mirror
hinge
individual
electrode
tipping
Prior art date
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Pending
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CN2010800042108A
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English (en)
Chinese (zh)
Inventor
阿明.沃伯
诺伯特.米尔伯格
弗洛里安.巴赫
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Carl Zeiss SMT GmbH
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Carl Zeiss SMT GmbH
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Filing date
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Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Publication of CN102272636A publication Critical patent/CN102272636A/zh
Pending legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/0841—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting element being moved or deformed by electrostatic means
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CN2010800042108A 2009-01-09 2010-01-08 构造尤其用于微光刻投射曝光系统的分面镜的个体反射镜 Pending CN102272636A (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US14345609P 2009-01-09 2009-01-09
US61/143,456 2009-01-09
DE200910000099 DE102009000099A1 (de) 2009-01-09 2009-01-09 Mikrospiegelarray mit Doppelbiegebalken Anordnung und elektronischer Aktorik
DE102009000099.2 2009-01-09
PCT/EP2010/000044 WO2010079133A2 (de) 2009-01-09 2010-01-08 Einzelspiegel zum aufbau eines facettenspiegels, insbesondere zum einsatz in einer projektionsbelichtungsanlage für die mikro-lithographie

Publications (1)

Publication Number Publication Date
CN102272636A true CN102272636A (zh) 2011-12-07

Family

ID=42262714

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2010800042108A Pending CN102272636A (zh) 2009-01-09 2010-01-08 构造尤其用于微光刻投射曝光系统的分面镜的个体反射镜

Country Status (5)

Country Link
US (1) US9013676B2 (https=)
JP (1) JP2012514863A (https=)
CN (1) CN102272636A (https=)
DE (1) DE102009000099A1 (https=)
WO (1) WO2010079133A2 (https=)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104204899A (zh) * 2012-03-21 2014-12-10 弗兰霍菲尔运输应用研究公司 微镜装置及微镜装置的制造方法
CN104246616A (zh) * 2012-04-16 2014-12-24 卡尔蔡司Smt有限责任公司 微光刻投射曝光设备的光学系统
CN109643070A (zh) * 2016-08-29 2019-04-16 卡尔蔡司Smt有限责任公司 控制装置
TWI792275B (zh) * 2014-09-30 2023-02-11 德商卡爾蔡司Ｓｍｔ有限公司 反射鏡配置、特別是用於微影投射曝光裝置的反射鏡配置、以及將熱流從一反射鏡配置之區域散熱的方法

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DE102010039927A1 (de) * 2010-08-30 2012-03-01 Carl Zeiss Smt Gmbh Substrat für Spiegel für die EUV-Lithographie
DE102010062720B4 (de) 2010-12-09 2012-07-12 Carl Zeiss Smt Gmbh EUV-Lithographiesystem
DE102011002953A1 (de) * 2011-01-21 2012-07-26 Carl Zeiss Smt Gmbh Substrat für Spiegel für die EUV-Lithographie
DE102011003928B4 (de) * 2011-02-10 2012-10-31 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithographie
DE102011081914A1 (de) 2011-08-31 2012-09-06 Carl Zeiss Smt Gmbh Beleuchtungsoptik zur Beleuchtung eines in einem Objektfeld anordenbaren, strukturierten Objektes
DE102012200736A1 (de) * 2012-01-19 2013-07-25 Carl Zeiss Smt Gmbh Spiegelanordnung, insbesondere zum Einsatz in einer mikrolithographischen Projektionsbelichtungsanlage
DE102012209412A1 (de) 2012-06-04 2013-12-05 Carl Zeiss Smt Gmbh Optisches Verfahren und optische Messvorrichtung zum Messen von Winkellagen von Facetten zumindest eines Facettenspiegels für EUV-Anwendungen
DE102012212064A1 (de) 2012-07-11 2014-01-16 Carl Zeiss Smt Gmbh Lithographianlage mit segmentiertem Spiegel
DE102012212453A1 (de) 2012-07-17 2014-01-23 Carl Zeiss Smt Gmbh Beleuchtungsoptik
DE102012218219A1 (de) * 2012-10-05 2014-04-10 Carl Zeiss Smt Gmbh Verfahren zur Regelung der Verkippung eines Spiegelelements
DE102012221831A1 (de) 2012-11-29 2014-06-05 Carl Zeiss Smt Gmbh Anordnung zur Aktuierung wenigstens eines optischen Elementes in einem optischen System
DE102013218748A1 (de) * 2013-09-18 2014-10-02 Carl Zeiss Smt Gmbh Optisches Bauelement
WO2014187599A1 (en) * 2013-05-22 2014-11-27 Carl Zeiss Smt Gmbh Optical component comprising an optical device and means for reducing radiation-induced influences on said optical device
DE102013211269A1 (de) 2013-06-17 2014-04-30 Carl Zeiss Smt Gmbh Beleuchtungsoptik zur Beleuchtung eines in einem Objektfeld anordenbaren, strukturierten Objektes sowie Metrologiesystem für die Untersuchung eines strukturierten Objektes
DE102013214746A1 (de) 2013-07-29 2014-08-07 Carl Zeiss Smt Gmbh Optisches System sowie Verfahren zum Herstellen derselben
DE102014215048A1 (de) * 2014-07-31 2016-02-04 Robert Bosch Gmbh Mikrospiegelvorrichtung, Mikrospiegelarray und Projektionseinrichtung
DE102020205279A1 (de) * 2020-04-27 2021-10-28 Carl Zeiss Smt Gmbh Ansteuervorrichtung, optisches system und lithographieanlage
DE102021200113A1 (de) 2021-01-08 2022-07-14 Carl Zeiss Smt Gmbh Optische Vorrichtung, Verfahren zur Steuerung einer optischen Vorrichtung, Computerprogrammprodukt und Lithografiesystem
DE102021202769A1 (de) 2021-03-22 2022-09-22 Carl Zeiss Smt Gmbh Optische Baugruppe sowie Verfahren zu deren Herstellung, Verfahren zur Deformation eines optischen Elements und Projektionsbelichtungsanlage
DE102021202768A1 (de) * 2021-03-22 2022-09-22 Carl Zeiss Smt Gmbh Facettensystem und lithographieanlage
DE102021211626A1 (de) * 2021-10-14 2023-04-20 Carl Zeiss Smt Gmbh EUV-Mehrfachspiegelanordnung
DE102022203257A1 (de) * 2022-04-01 2023-10-05 Carl Zeiss Smt Gmbh Ansteuervorrichtung, optisches system, lithographieanlage und verfahren
DE102022203438B4 (de) 2022-04-06 2023-12-07 Carl Zeiss Smt Gmbh Optische Anordnung, optisches Modul, optische Abbildungseinrichtung und -verfahren, Verfahren zum Abstützen eines optischen Elements, mit aktiv verkippbarem optischem Element
DE102022209391A1 (de) * 2022-09-09 2024-03-14 Carl Zeiss Smt Gmbh Verfahren zum Betreiben eines optischen Bauelements, optisches Bauelement

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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104204899A (zh) * 2012-03-21 2014-12-10 弗兰霍菲尔运输应用研究公司 微镜装置及微镜装置的制造方法
CN104204899B (zh) * 2012-03-21 2017-06-30 弗劳恩霍夫应用研究促进协会 微镜装置及微镜装置的制造方法
CN104246616A (zh) * 2012-04-16 2014-12-24 卡尔蔡司Smt有限责任公司 微光刻投射曝光设备的光学系统
CN104246616B (zh) * 2012-04-16 2017-04-26 卡尔蔡司Smt有限责任公司 微光刻投射曝光设备的光学系统
US9817317B2 (en) 2012-04-16 2017-11-14 Carl Zeiss Smt Gmbh Optical system of a microlithographic projection exposure apparatus
TWI792275B (zh) * 2014-09-30 2023-02-11 德商卡爾蔡司Ｓｍｔ有限公司 反射鏡配置、特別是用於微影投射曝光裝置的反射鏡配置、以及將熱流從一反射鏡配置之區域散熱的方法
CN109643070A (zh) * 2016-08-29 2019-04-16 卡尔蔡司Smt有限责任公司 控制装置

Also Published As

Publication number Publication date
JP2012514863A (ja) 2012-06-28
US20110273694A1 (en) 2011-11-10
US9013676B2 (en) 2015-04-21
WO2010079133A3 (de) 2010-10-07
WO2010079133A2 (de) 2010-07-15
DE102009000099A1 (de) 2010-07-22

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Application publication date: 20111207