DE102009000099A1 - Mikrospiegelarray mit Doppelbiegebalken Anordnung und elektronischer Aktorik - Google Patents
Mikrospiegelarray mit Doppelbiegebalken Anordnung und elektronischer Aktorik Download PDFInfo
- Publication number
- DE102009000099A1 DE102009000099A1 DE200910000099 DE102009000099A DE102009000099A1 DE 102009000099 A1 DE102009000099 A1 DE 102009000099A1 DE 200910000099 DE200910000099 DE 200910000099 DE 102009000099 A DE102009000099 A DE 102009000099A DE 102009000099 A1 DE102009000099 A1 DE 102009000099A1
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- Germany
- Prior art keywords
- mirror
- joint
- tilting
- electrode
- individual
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000005452 bending Methods 0.000 title description 2
- 230000005855 radiation Effects 0.000 claims abstract description 31
- 238000005286 illumination Methods 0.000 claims description 30
- 230000007935 neutral effect Effects 0.000 claims description 17
- 230000003287 optical effect Effects 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 5
- 238000000034 method Methods 0.000 claims description 4
- 238000001393 microlithography Methods 0.000 claims description 4
- 238000003384 imaging method Methods 0.000 claims description 3
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 238000000708 deep reactive-ion etching Methods 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
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- 238000003491 array Methods 0.000 description 3
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- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
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- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
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- 230000001360 synchronised effect Effects 0.000 description 2
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- BUHVIAUBTBOHAG-FOYDDCNASA-N (2r,3r,4s,5r)-2-[6-[[2-(3,5-dimethoxyphenyl)-2-(2-methylphenyl)ethyl]amino]purin-9-yl]-5-(hydroxymethyl)oxolane-3,4-diol Chemical compound COC1=CC(OC)=CC(C(CNC=2C=3N=CN(C=3N=CN=2)[C@H]2[C@@H]([C@H](O)[C@@H](CO)O2)O)C=2C(=CC=CC=2)C)=C1 BUHVIAUBTBOHAG-FOYDDCNASA-N 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
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Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
- G02B26/0841—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting element being moved or deformed by electrostatic means
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Mounting And Adjusting Of Optical Elements (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Optical Elements Other Than Lenses (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (18)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE200910000099 DE102009000099A1 (de) | 2009-01-09 | 2009-01-09 | Mikrospiegelarray mit Doppelbiegebalken Anordnung und elektronischer Aktorik |
| PCT/EP2009/000825 WO2009100856A1 (en) | 2008-02-15 | 2009-02-06 | Facet mirror for use in a projection exposure apparatus for microlithography |
| KR1020147002581A KR101591610B1 (ko) | 2008-02-15 | 2009-02-06 | 마이크로리소그래피용 투영 노광 장치에 사용하기 위한 패싯 미러 |
| CN2009801053643A CN101946190B (zh) | 2008-02-15 | 2009-02-06 | 微光刻的投射曝光设备使用的分面镜 |
| JP2010546247A JP5487118B2 (ja) | 2008-02-15 | 2009-02-06 | マイクロリソグラフィのための投影露光装置に使用するファセットミラー |
| CN201310194962.0A CN103293665B (zh) | 2008-02-15 | 2009-02-06 | 微光刻的投射曝光设备使用的分面镜 |
| EP09709960.0A EP2243047B1 (en) | 2008-02-15 | 2009-02-06 | Facet mirror for use in a projection exposure apparatus for microlithography |
| KR1020107020158A KR101593712B1 (ko) | 2008-02-15 | 2009-02-06 | 마이크로리소그래피용 투영 노광 장치에 사용하기 위한 패싯 미러 |
| TW098104633A TWI603154B (zh) | 2008-02-15 | 2009-02-13 | 微影中用於投射曝光裝置之組合反射鏡 |
| TW104102293A TWI639892B (zh) | 2008-02-15 | 2009-02-13 | 微影中用於投射曝光裝置之組合反射鏡 |
| CN2010800042108A CN102272636A (zh) | 2009-01-09 | 2010-01-08 | 构造尤其用于微光刻投射曝光系统的分面镜的个体反射镜 |
| JP2011544842A JP2012514863A (ja) | 2009-01-09 | 2010-01-08 | 特にマイクロリソグラフィ用の投影露光システムで用いるファセットミラーを構成する個別ミラー |
| PCT/EP2010/000044 WO2010079133A2 (de) | 2009-01-09 | 2010-01-08 | Einzelspiegel zum aufbau eines facettenspiegels, insbesondere zum einsatz in einer projektionsbelichtungsanlage für die mikro-lithographie |
| US12/848,603 US9411241B2 (en) | 2008-02-15 | 2010-08-02 | Facet mirror for use in a projection exposure apparatus for microlithography |
| US13/172,448 US9013676B2 (en) | 2009-01-09 | 2011-06-29 | Individual mirror for constructing a faceted mirror, in particular for use in a projection exposure system for microlithography |
| JP2014033165A JP2014140047A (ja) | 2008-02-15 | 2014-02-24 | マイクロリソグラフィのための投影露光装置に使用するファセットミラー |
| JP2016020985A JP6121581B2 (ja) | 2008-02-15 | 2016-02-05 | マイクロリソグラフィのための投影露光装置に使用するファセットミラー |
| US15/202,104 US9996012B2 (en) | 2008-02-15 | 2016-07-05 | Facet mirror for use in a projection exposure apparatus for microlithography |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE200910000099 DE102009000099A1 (de) | 2009-01-09 | 2009-01-09 | Mikrospiegelarray mit Doppelbiegebalken Anordnung und elektronischer Aktorik |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE102009000099A1 true DE102009000099A1 (de) | 2010-07-22 |
Family
ID=42262714
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE200910000099 Withdrawn DE102009000099A1 (de) | 2008-02-15 | 2009-01-09 | Mikrospiegelarray mit Doppelbiegebalken Anordnung und elektronischer Aktorik |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US9013676B2 (https=) |
| JP (1) | JP2012514863A (https=) |
| CN (1) | CN102272636A (https=) |
| DE (1) | DE102009000099A1 (https=) |
| WO (1) | WO2010079133A2 (https=) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102012212453A1 (de) | 2012-07-17 | 2014-01-23 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik |
| DE102012218219A1 (de) * | 2012-10-05 | 2014-04-10 | Carl Zeiss Smt Gmbh | Verfahren zur Regelung der Verkippung eines Spiegelelements |
| DE102013214746A1 (de) | 2013-07-29 | 2014-08-07 | Carl Zeiss Smt Gmbh | Optisches System sowie Verfahren zum Herstellen derselben |
| DE102013218748A1 (de) * | 2013-09-18 | 2014-10-02 | Carl Zeiss Smt Gmbh | Optisches Bauelement |
| WO2016015903A1 (de) * | 2014-07-31 | 2016-02-04 | Robert Bosch Gmbh | Mikrospiegelvorrichtung, mikrospiegelarray und projektionseinrichtung |
| US9448490B2 (en) | 2010-12-09 | 2016-09-20 | Carl Zeiss Smt Gmbh | EUV lithography system |
| DE102022203438A1 (de) | 2022-04-06 | 2023-10-12 | Carl Zeiss Smt Gmbh | Optische Anordnung, optisches Modul, optische Abbildungseinrichtung und -verfahren, Verfahren zum Abstützen eines optischen Elements, mit aktiv verkippbarem optischem Element |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102010039927A1 (de) * | 2010-08-30 | 2012-03-01 | Carl Zeiss Smt Gmbh | Substrat für Spiegel für die EUV-Lithographie |
| DE102011002953A1 (de) * | 2011-01-21 | 2012-07-26 | Carl Zeiss Smt Gmbh | Substrat für Spiegel für die EUV-Lithographie |
| DE102011003928B4 (de) * | 2011-02-10 | 2012-10-31 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die Projektionslithographie |
| DE102011081914A1 (de) | 2011-08-31 | 2012-09-06 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik zur Beleuchtung eines in einem Objektfeld anordenbaren, strukturierten Objektes |
| DE102012200736A1 (de) * | 2012-01-19 | 2013-07-25 | Carl Zeiss Smt Gmbh | Spiegelanordnung, insbesondere zum Einsatz in einer mikrolithographischen Projektionsbelichtungsanlage |
| DE102012005546A1 (de) * | 2012-03-21 | 2013-09-26 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Mikrospiegelanordnung und Verfahren zur Herstellung einer Mikrospiegelanordnung |
| DE102012206153A1 (de) | 2012-04-16 | 2013-10-17 | Carl Zeiss Smt Gmbh | Optisches System einer mikrolithographischen Projektionsbelichtungsanlage |
| DE102012209412A1 (de) | 2012-06-04 | 2013-12-05 | Carl Zeiss Smt Gmbh | Optisches Verfahren und optische Messvorrichtung zum Messen von Winkellagen von Facetten zumindest eines Facettenspiegels für EUV-Anwendungen |
| DE102012212064A1 (de) | 2012-07-11 | 2014-01-16 | Carl Zeiss Smt Gmbh | Lithographianlage mit segmentiertem Spiegel |
| DE102012221831A1 (de) | 2012-11-29 | 2014-06-05 | Carl Zeiss Smt Gmbh | Anordnung zur Aktuierung wenigstens eines optischen Elementes in einem optischen System |
| WO2014187599A1 (en) * | 2013-05-22 | 2014-11-27 | Carl Zeiss Smt Gmbh | Optical component comprising an optical device and means for reducing radiation-induced influences on said optical device |
| DE102013211269A1 (de) | 2013-06-17 | 2014-04-30 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik zur Beleuchtung eines in einem Objektfeld anordenbaren, strukturierten Objektes sowie Metrologiesystem für die Untersuchung eines strukturierten Objektes |
| DE102014219770A1 (de) * | 2014-09-30 | 2016-03-31 | Carl Zeiss Smt Gmbh | Spiegelanordnung, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage, sowie Verfahren zur Ableitung eines Wärmestromes aus dem Bereich einer Spiegelanordnung |
| DE102016216188A1 (de) * | 2016-08-29 | 2018-03-01 | Carl Zeiss Smt Gmbh | Steuereinrichtung |
| DE102020205279A1 (de) * | 2020-04-27 | 2021-10-28 | Carl Zeiss Smt Gmbh | Ansteuervorrichtung, optisches system und lithographieanlage |
| DE102021200113A1 (de) | 2021-01-08 | 2022-07-14 | Carl Zeiss Smt Gmbh | Optische Vorrichtung, Verfahren zur Steuerung einer optischen Vorrichtung, Computerprogrammprodukt und Lithografiesystem |
| DE102021202769A1 (de) | 2021-03-22 | 2022-09-22 | Carl Zeiss Smt Gmbh | Optische Baugruppe sowie Verfahren zu deren Herstellung, Verfahren zur Deformation eines optischen Elements und Projektionsbelichtungsanlage |
| DE102021202768A1 (de) * | 2021-03-22 | 2022-09-22 | Carl Zeiss Smt Gmbh | Facettensystem und lithographieanlage |
| DE102021211626A1 (de) * | 2021-10-14 | 2023-04-20 | Carl Zeiss Smt Gmbh | EUV-Mehrfachspiegelanordnung |
| DE102022203257A1 (de) * | 2022-04-01 | 2023-10-05 | Carl Zeiss Smt Gmbh | Ansteuervorrichtung, optisches system, lithographieanlage und verfahren |
| DE102022209391A1 (de) * | 2022-09-09 | 2024-03-14 | Carl Zeiss Smt Gmbh | Verfahren zum Betreiben eines optischen Bauelements, optisches Bauelement |
Citations (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4662746A (en) * | 1985-10-30 | 1987-05-05 | Texas Instruments Incorporated | Spatial light modulator and method |
| US5523193A (en) * | 1988-05-31 | 1996-06-04 | Texas Instruments Incorporated | Method and apparatus for patterning and imaging member |
| US5835256A (en) * | 1995-06-19 | 1998-11-10 | Reflectivity, Inc. | Reflective spatial light modulator with encapsulated micro-mechanical elements |
| US6028689A (en) * | 1997-01-24 | 2000-02-22 | The United States Of America As Represented By The Secretary Of The Air Force | Multi-motion micromirror |
| US6366414B1 (en) * | 1999-09-03 | 2002-04-02 | Agere Systems Guardian Corp. | Micro-electro-mechanical optical device |
| EP1225481A2 (de) | 2001-01-23 | 2002-07-24 | Carl Zeiss Semiconductor Manufacturing Technologies Ag | Kollektor für Beleuchtungssysteme mit einer Wellenlänge 193 nm |
| US6438199B1 (en) | 1998-05-05 | 2002-08-20 | Carl-Zeiss-Stiftung | Illumination system particularly for microlithography |
| EP1289273A1 (de) | 2001-08-28 | 2003-03-05 | Siemens Aktiengesellschaft | Scanning-Kamera |
| DE69529880T2 (de) * | 1994-11-14 | 2003-11-20 | Texas Instruments Inc., Dallas | Mikromechanische Vorrichtung |
| US6658084B2 (en) | 2000-10-27 | 2003-12-02 | Carl Zeiss Smt Ag | Illumination system with variable adjustment of the illumination |
| US6859515B2 (en) | 1998-05-05 | 2005-02-22 | Carl-Zeiss-Stiftung Trading | Illumination system, particularly for EUV lithography |
| DE10343333A1 (de) * | 2003-09-12 | 2005-04-14 | Carl Zeiss Smt Ag | Beleuchtungssystem für eine Mikrolithographie-Projektionsbelichtungsanlage |
| US7002730B2 (en) * | 2001-04-19 | 2006-02-21 | Nikon Corporation | Mirror device, optical switch, thin film elastic structure, and thin elastic structure producing method |
| US20060132747A1 (en) | 2003-04-17 | 2006-06-22 | Carl Zeiss Smt Ag | Optical element for an illumination system |
| DE102006036064A1 (de) | 2006-08-02 | 2008-02-07 | Carl Zeiss Smt Ag | Beleuchtungssystem für eine Projektionsbelichtungsanlage mit Wellenlängen ≦ 193 nm |
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| US5444566A (en) * | 1994-03-07 | 1995-08-22 | Texas Instruments Incorporated | Optimized electronic operation of digital micromirror devices |
| US6300665B1 (en) * | 2000-09-28 | 2001-10-09 | Xerox Corporation | Structure for an optical switch on a silicon on insulator substrate |
| US6480320B2 (en) * | 2001-02-07 | 2002-11-12 | Transparent Optical, Inc. | Microelectromechanical mirror and mirror array |
| US6757093B2 (en) * | 2001-05-21 | 2004-06-29 | Jds Uniphase Corporation | MEMS reflectors having tail portions that extend inside a recess and head portions that extend outside the recess and methods of forming same |
| US7015491B2 (en) * | 2001-06-01 | 2006-03-21 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and device manufactured thereby, control system |
| ATE464585T1 (de) * | 2002-02-09 | 2010-04-15 | Zeiss Carl Smt Ag | Facettenspiegel mit mehreren spiegelfacetten |
| JP3987382B2 (ja) | 2002-06-11 | 2007-10-10 | 富士通株式会社 | マイクロミラー素子およびその製造方法 |
| US6825968B2 (en) * | 2002-10-11 | 2004-11-30 | Exajoule, Llc | Micromirror systems with electrodes configured for sequential mirror attraction |
| US20040160118A1 (en) * | 2002-11-08 | 2004-08-19 | Knollenberg Clifford F. | Actuator apparatus and method for improved deflection characteristics |
| US6900922B2 (en) | 2003-02-24 | 2005-05-31 | Exajoule, Llc | Multi-tilt micromirror systems with concealed hinge structures |
| JP2004306217A (ja) * | 2003-04-09 | 2004-11-04 | Sony Corp | マイクロマシンおよびその製造方法 |
| US7982690B2 (en) * | 2006-12-27 | 2011-07-19 | Silicon Quest Kabushiki-Kaisha | Deformable micromirror device |
| US7053981B2 (en) * | 2004-03-31 | 2006-05-30 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| JP2006018176A (ja) * | 2004-07-05 | 2006-01-19 | Olympus Corp | 静電型可変形状鏡 |
| DE102006020734A1 (de) * | 2006-05-04 | 2007-11-15 | Carl Zeiss Smt Ag | Beleuchtungssystem für die EUV-Lithographie sowie erstes und zweites optisches Element zum Einsatz in einem derartigen Beleuchtungssystem |
| US20080144155A1 (en) * | 2006-12-13 | 2008-06-19 | Spatial Photonics, Inc. | Non-contact micro mirrors |
| EP1950594A1 (de) * | 2007-01-17 | 2008-07-30 | Carl Zeiss SMT AG | Abbildende Optik, Projektionsbelichtunsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik, Verfahren zur Herstellung eines mikrostrukturierten Bauteils mit einer derartigen Projektionsbelichtungsanlage, durch das Herstellungsverfahren gefertigtes mikrostrukturiertes Bauelement sowie Verwendung einer derartigen abbildenden Optik |
| CN201083961Y (zh) * | 2007-09-19 | 2008-07-09 | 芯硕半导体（合肥）有限公司 | 具有对焦机构的直写光刻装置 |
| JP5487118B2 (ja) * | 2008-02-15 | 2014-05-07 | カール・ツァイス・エスエムティー・ゲーエムベーハー | マイクロリソグラフィのための投影露光装置に使用するファセットミラー |
-
2009
- 2009-01-09 DE DE200910000099 patent/DE102009000099A1/de not_active Withdrawn
-
2010
- 2010-01-08 WO PCT/EP2010/000044 patent/WO2010079133A2/de not_active Ceased
- 2010-01-08 JP JP2011544842A patent/JP2012514863A/ja active Pending
- 2010-01-08 CN CN2010800042108A patent/CN102272636A/zh active Pending
-
2011
- 2011-06-29 US US13/172,448 patent/US9013676B2/en active Active
Patent Citations (15)
| Publication number | Priority date | Publication date | Assignee | Title |
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Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9448490B2 (en) | 2010-12-09 | 2016-09-20 | Carl Zeiss Smt Gmbh | EUV lithography system |
| DE102012212453A1 (de) | 2012-07-17 | 2014-01-23 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik |
| WO2014012929A1 (en) | 2012-07-17 | 2014-01-23 | Carl Zeiss Smt Gmbh | Illumination optical unit |
| US9891530B2 (en) | 2012-07-17 | 2018-02-13 | Carl Zeiss Smt Gmbh | Illumination optical unit |
| DE102012218219A1 (de) * | 2012-10-05 | 2014-04-10 | Carl Zeiss Smt Gmbh | Verfahren zur Regelung der Verkippung eines Spiegelelements |
| DE102013214746A1 (de) | 2013-07-29 | 2014-08-07 | Carl Zeiss Smt Gmbh | Optisches System sowie Verfahren zum Herstellen derselben |
| DE102013218748A1 (de) * | 2013-09-18 | 2014-10-02 | Carl Zeiss Smt Gmbh | Optisches Bauelement |
| WO2016015903A1 (de) * | 2014-07-31 | 2016-02-04 | Robert Bosch Gmbh | Mikrospiegelvorrichtung, mikrospiegelarray und projektionseinrichtung |
| DE102022203438A1 (de) | 2022-04-06 | 2023-10-12 | Carl Zeiss Smt Gmbh | Optische Anordnung, optisches Modul, optische Abbildungseinrichtung und -verfahren, Verfahren zum Abstützen eines optischen Elements, mit aktiv verkippbarem optischem Element |
| DE102022203438B4 (de) | 2022-04-06 | 2023-12-07 | Carl Zeiss Smt Gmbh | Optische Anordnung, optisches Modul, optische Abbildungseinrichtung und -verfahren, Verfahren zum Abstützen eines optischen Elements, mit aktiv verkippbarem optischem Element |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2012514863A (ja) | 2012-06-28 |
| CN102272636A (zh) | 2011-12-07 |
| US20110273694A1 (en) | 2011-11-10 |
| US9013676B2 (en) | 2015-04-21 |
| WO2010079133A3 (de) | 2010-10-07 |
| WO2010079133A2 (de) | 2010-07-15 |
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