JP2012514315A5 - - Google Patents

Download PDF

Info

Publication number
JP2012514315A5
JP2012514315A5 JP2011527532A JP2011527532A JP2012514315A5 JP 2012514315 A5 JP2012514315 A5 JP 2012514315A5 JP 2011527532 A JP2011527532 A JP 2011527532A JP 2011527532 A JP2011527532 A JP 2011527532A JP 2012514315 A5 JP2012514315 A5 JP 2012514315A5
Authority
JP
Japan
Prior art keywords
substrate
liquid
opening
optical system
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2011527532A
Other languages
English (en)
Japanese (ja)
Other versions
JP2012514315A (ja
JP5408258B2 (ja
Filing date
Publication date
Priority claimed from US12/644,703 external-priority patent/US8896806B2/en
Application filed filed Critical
Publication of JP2012514315A publication Critical patent/JP2012514315A/ja
Publication of JP2012514315A5 publication Critical patent/JP2012514315A5/ja
Application granted granted Critical
Publication of JP5408258B2 publication Critical patent/JP5408258B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2011527532A 2008-12-29 2009-12-25 露光装置、露光方法、及びデバイス製造方法 Active JP5408258B2 (ja)

Applications Claiming Priority (11)

Application Number Priority Date Filing Date Title
US19383408P 2008-12-29 2008-12-29
US19383608P 2008-12-29 2008-12-29
US19383308P 2008-12-29 2008-12-29
US19383508P 2008-12-29 2008-12-29
US61/193,833 2008-12-29
US61/193,835 2008-12-29
US61/193,834 2008-12-29
US61/193,836 2008-12-29
US12/644,703 2009-12-22
US12/644,703 US8896806B2 (en) 2008-12-29 2009-12-22 Exposure apparatus, exposure method, and device manufacturing method
PCT/JP2009/071914 WO2010076894A1 (en) 2008-12-29 2009-12-25 Exposure apparatus, exposure method, and device manufacturing method

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2013230683A Division JP5668825B2 (ja) 2008-12-29 2013-11-06 露光装置、液浸部材、露光方法、及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2012514315A JP2012514315A (ja) 2012-06-21
JP2012514315A5 true JP2012514315A5 (https=) 2013-01-31
JP5408258B2 JP5408258B2 (ja) 2014-02-05

Family

ID=42061940

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2011527532A Active JP5408258B2 (ja) 2008-12-29 2009-12-25 露光装置、露光方法、及びデバイス製造方法
JP2013230683A Active JP5668825B2 (ja) 2008-12-29 2013-11-06 露光装置、液浸部材、露光方法、及びデバイス製造方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2013230683A Active JP5668825B2 (ja) 2008-12-29 2013-11-06 露光装置、液浸部材、露光方法、及びデバイス製造方法

Country Status (5)

Country Link
US (2) US8896806B2 (https=)
JP (2) JP5408258B2 (https=)
KR (2) KR101831984B1 (https=)
TW (4) TWI644182B (https=)
WO (1) WO2010076894A1 (https=)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4884180B2 (ja) * 2006-11-21 2012-02-29 東京エレクトロン株式会社 基板処理装置および基板処理方法
US8896806B2 (en) * 2008-12-29 2014-11-25 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US20110222031A1 (en) * 2010-03-12 2011-09-15 Nikon Corporation Liquid immersion member, exposure apparatus, liquid recovering method, device fabricating method, program, and storage medium
NL2009271A (en) 2011-09-15 2013-03-18 Asml Netherlands Bv A fluid handling structure, a lithographic apparatus and a device manufacturing method.
US9268231B2 (en) * 2012-04-10 2016-02-23 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9823580B2 (en) 2012-07-20 2017-11-21 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9568828B2 (en) 2012-10-12 2017-02-14 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9494870B2 (en) * 2012-10-12 2016-11-15 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9720331B2 (en) * 2012-12-27 2017-08-01 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
US9651873B2 (en) 2012-12-27 2017-05-16 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
JP6212884B2 (ja) * 2013-03-15 2017-10-18 株式会社ニコン 露光装置、露光方法、及びデバイス製造方法
WO2015052781A1 (ja) * 2013-10-08 2015-04-16 株式会社ニコン 液浸部材、露光装置及び露光方法、並びにデバイス製造方法
KR20170026563A (ko) 2014-07-01 2017-03-08 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 및 리소그래피 장치를 제조하는 방법
EP3510446B1 (en) 2016-09-12 2022-10-05 ASML Netherlands B.V. Fluid handling structure for lithographic apparatus
KR102649164B1 (ko) * 2017-12-15 2024-03-20 에이에스엠엘 네델란즈 비.브이. 유체 핸들링 구조체, 리소그래피 장치, 유체 핸들링 구조체를 사용하는 방법 및 리소그래피 장치를 사용하는 방법
JP6610726B2 (ja) * 2018-07-11 2019-11-27 株式会社ニコン 液浸部材、露光装置及び露光方法、並びにデバイス製造方法
CN114402263A (zh) 2019-09-13 2022-04-26 Asml荷兰有限公司 流体处置系统和光刻设备

Family Cites Families (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8004A (en) * 1851-03-25 Francis b
EP1944654A3 (en) 1996-11-28 2010-06-02 Nikon Corporation An exposure apparatus and an exposure method
DE69829614T2 (de) 1997-03-10 2006-03-09 Asml Netherlands B.V. Lithographiegerät mit einer positioniervorrichtung mit zwei objekthaltern
US6897963B1 (en) 1997-12-18 2005-05-24 Nikon Corporation Stage device and exposure apparatus
US6208407B1 (en) 1997-12-22 2001-03-27 Asm Lithography B.V. Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement
WO1999046835A1 (en) 1998-03-11 1999-09-16 Nikon Corporation Ultraviolet laser apparatus and exposure apparatus comprising the ultraviolet laser apparatus
WO2001035168A1 (en) 1999-11-10 2001-05-17 Massachusetts Institute Of Technology Interference lithography utilizing phase-locked scanning beams
US6452292B1 (en) 2000-06-26 2002-09-17 Nikon Corporation Planar motor with linear coil arrays
KR100815222B1 (ko) 2001-02-27 2008-03-19 에이에스엠엘 유에스, 인크. 리소그래피 장치 및 적어도 하나의 레티클 상에 형성된 적어도 두 개의 패턴으로부터의 이미지로 기판 스테이지 상의 필드를 노출시키는 방법
TW529172B (en) 2001-07-24 2003-04-21 Asml Netherlands Bv Imaging apparatus
KR20050035890A (ko) 2002-08-23 2005-04-19 가부시키가이샤 니콘 투영 광학계, 포토리소그래피 방법, 노광 장치 및 그 이용방법
SG135052A1 (en) * 2002-11-12 2007-09-28 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
EP1571697A4 (en) * 2002-12-10 2007-07-04 Nikon Corp EXPOSURE SYSTEM AND COMPONENT MANUFACTURING METHOD
EP1498778A1 (en) * 2003-06-27 2005-01-19 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
EP2264531B1 (en) 2003-07-09 2013-01-16 Nikon Corporation Exposure apparatus and device manufacturing method
EP1660925B1 (en) 2003-09-03 2015-04-29 Nikon Corporation Apparatus and method for providing fluid for immersion lithography
US7411653B2 (en) 2003-10-28 2008-08-12 Asml Netherlands B.V. Lithographic apparatus
EP2267537B1 (en) 2003-10-28 2017-09-13 ASML Netherlands BV Lithographic apparatus
KR101440743B1 (ko) * 2004-01-05 2014-09-17 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
US7589822B2 (en) 2004-02-02 2009-09-15 Nikon Corporation Stage drive method and stage unit, exposure apparatus, and device manufacturing method
EP3093873B1 (en) 2004-02-04 2017-10-11 Nikon Corporation Exposure apparatus, exposure method, and method for producing a device
JP4677986B2 (ja) 2004-04-19 2011-04-27 株式会社ニコン ノズル部材、露光方法、露光装置及びデバイス製造方法
CN1954408B (zh) 2004-06-04 2012-07-04 尼康股份有限公司 曝光装置、曝光方法及元件制造方法
CN103558737A (zh) 2004-06-09 2014-02-05 尼康股份有限公司 基板保持装置、具备其之曝光装置、方法
JP4543767B2 (ja) 2004-06-10 2010-09-15 株式会社ニコン 露光装置及びデバイス製造方法
US7399614B2 (en) * 2004-06-30 2008-07-15 Applera Corporation 5-methylcytosine detection, compositions and methods therefor
US7701550B2 (en) 2004-08-19 2010-04-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE602006012746D1 (de) * 2005-01-14 2010-04-22 Asml Netherlands Bv Lithografische Vorrichtung und Herstellungsverfahren
US7411654B2 (en) 2005-04-05 2008-08-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7411658B2 (en) 2005-10-06 2008-08-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2007184336A (ja) 2006-01-05 2007-07-19 Canon Inc 露光装置及びデバイス製造方法
EP1995768A4 (en) 2006-03-13 2013-02-06 Nikon Corp EXPOSURE DEVICE, MAINTENANCE METHOD, EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD
US9477158B2 (en) 2006-04-14 2016-10-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8634053B2 (en) 2006-12-07 2014-01-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8004651B2 (en) 2007-01-23 2011-08-23 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
US8134685B2 (en) 2007-03-23 2012-03-13 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
US8300207B2 (en) 2007-05-17 2012-10-30 Nikon Corporation Exposure apparatus, immersion system, exposing method, and device fabricating method
US20090122282A1 (en) 2007-05-21 2009-05-14 Nikon Corporation Exposure apparatus, liquid immersion system, exposing method, and device fabricating method
US8233139B2 (en) 2008-03-27 2012-07-31 Nikon Corporation Immersion system, exposure apparatus, exposing method, and device fabricating method
US8896806B2 (en) * 2008-12-29 2014-11-25 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method

Similar Documents

Publication Publication Date Title
JP2012514315A5 (https=)
JP6447653B2 (ja) 液浸リソグラフィ装置及び液浸リソグラフィ方法
JP2010283405A5 (ja) ノズル部材、露光装置、露光方法、及びデバイス製造方法
JP2011035429A5 (https=)
JP2010093302A5 (https=)
JP2011109147A5 (ja) 露光方法、露光装置、及びデバイス製造方法
JP2010109391A5 (https=)
JP2010118680A5 (https=)
JP2012044223A5 (ja) ノズル部材、露光装置、露光方法、及びデバイス製造方法
JP2012080137A5 (https=)
JP2011023764A5 (ja) 流路形成部材、露光装置、露光方法、及びデバイス製造方法
JP2011258965A5 (ja) 露光装置
JP2014078748A5 (https=)
JP2007528115A5 (https=)
TW201030479A (en) Exposure apparatus, exposure method, and device manufacturing method
JP2010528449A5 (ja) 露光装置、及びデバイス製造方法
CN103802493B (zh) 输送装置以及记录装置
JP2013248888A5 (https=)
CN110356111A (zh) 喷射材料注入方法、喷射材料喷射装置和压印装置
JP2005219002A (ja) 素子分別収納装置
JP2014524668A5 (ja) 露光装置、液体保持方法、及びデバイス製造方法
JP2012023378A5 (ja) 液浸部材、液浸露光装置、及びデバイス製造方法
CN105081866B (zh) 机床的机内清洗装置及其所使用的清洗用管
JP2010278299A5 (https=)
JP2009076520A5 (https=)