JP2012511635A5 - - Google Patents
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- Publication number
- JP2012511635A5 JP2012511635A5 JP2011540782A JP2011540782A JP2012511635A5 JP 2012511635 A5 JP2012511635 A5 JP 2012511635A5 JP 2011540782 A JP2011540782 A JP 2011540782A JP 2011540782 A JP2011540782 A JP 2011540782A JP 2012511635 A5 JP2012511635 A5 JP 2012511635A5
- Authority
- JP
- Japan
- Prior art keywords
- forming
- perfluoropolyether
- functionalized region
- substrate
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims description 30
- 239000010702 perfluoropolyether Substances 0.000 claims description 28
- 239000000758 substrate Substances 0.000 claims description 15
- 150000002898 organic sulfur compounds Chemical class 0.000 claims description 13
- 150000001408 amides Chemical class 0.000 claims description 12
- 239000000203 mixture Substances 0.000 claims description 11
- 238000005530 etching Methods 0.000 claims description 8
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 4
- 239000010931 gold Substances 0.000 claims description 4
- 229910052737 gold Inorganic materials 0.000 claims description 4
- 238000000813 microcontact printing Methods 0.000 claims description 4
- 239000002094 self assembled monolayer Substances 0.000 claims description 4
- 239000013545 self-assembled monolayer Substances 0.000 claims description 4
- 238000003486 chemical etching Methods 0.000 claims description 3
- WRTMQOHKMFDUKX-UHFFFAOYSA-N triiodide Chemical compound I[I-]I WRTMQOHKMFDUKX-UHFFFAOYSA-N 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims description 2
- -1 hexafluoropropyleneoxy group Chemical group 0.000 description 14
- 125000005647 linker group Chemical group 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 125000005708 carbonyloxy group Chemical group [*:2]OC([*:1])=O 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 125000006551 perfluoro alkylene group Chemical group 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- 239000012991 xanthate Substances 0.000 description 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12159808P | 2008-12-11 | 2008-12-11 | |
| US12160508P | 2008-12-11 | 2008-12-11 | |
| US61/121,605 | 2008-12-11 | ||
| US61/121,598 | 2008-12-11 | ||
| PCT/US2009/066358 WO2010068535A1 (en) | 2008-12-11 | 2009-12-02 | Patterning process |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012511635A JP2012511635A (ja) | 2012-05-24 |
| JP2012511635A5 true JP2012511635A5 (https=) | 2013-01-24 |
| JP5864259B2 JP5864259B2 (ja) | 2016-02-17 |
Family
ID=42243038
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011540782A Expired - Fee Related JP5864259B2 (ja) | 2008-12-11 | 2009-12-02 | パターン形成方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (4) | US8901263B2 (https=) |
| EP (2) | EP2370401B1 (https=) |
| JP (1) | JP5864259B2 (https=) |
| CN (2) | CN102307734B (https=) |
| WO (2) | WO2010068535A1 (https=) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8747599B2 (en) * | 2008-05-29 | 2014-06-10 | Chidella Krishna Sastry | Process for making self-patterning substrates and the product thereof |
| CN102307734B (zh) * | 2008-12-11 | 2015-06-03 | 3M创新有限公司 | 图案化方法 |
| JP5643774B2 (ja) | 2009-02-26 | 2014-12-17 | スリーエム イノベイティブ プロパティズ カンパニー | 低視認性の重ね合わせられた微小パターンを有する、タッチスクリーンセンサ及びパターン基材 |
| EP2446067B1 (en) | 2009-06-25 | 2019-11-20 | 3M Innovative Properties Company | Methods of wet etching a self-assembled monolayer patterned substrate and metal patterned articles |
| WO2011002617A1 (en) | 2009-06-30 | 2011-01-06 | 3M Innovative Properties Company | Electronic displays and metal micropatterned substrates having a graphic |
| US8258341B2 (en) | 2009-07-10 | 2012-09-04 | E.I. Du Pont De Nemours And Company | Polyfluorosulfonamido amine and intermediate |
| US8950324B2 (en) | 2009-12-22 | 2015-02-10 | 3M Innovative Properties Company | Apparatus and method for microcontact printing using a pressurized roller |
| EP2655577B1 (fr) * | 2010-12-23 | 2014-04-23 | Rolex S.A. | Composition pour augmenter la lipophobicite d'un composant horloger |
| FR2969663B1 (fr) * | 2010-12-23 | 2013-01-18 | Surfactis Technologies | Composition hydrophobe et lipophobe de molecules bisphosphoniques et thiols |
| EP2679322B1 (en) * | 2011-02-22 | 2019-02-06 | National University Corporation Hokkaido University | Particle aggregate, manufacturing method for particle aggregate, fluorescence enhancing element, and device using photochemical reactions |
| WO2012132970A1 (ja) * | 2011-03-30 | 2012-10-04 | 富士フイルム株式会社 | プリント配線基板およびその製造方法、並びに、金属表面処理液 |
| US9449630B2 (en) * | 2014-06-02 | 2016-09-20 | Seagate Technology Llc | Sliders having at least two regions on the trailing edge surface |
| KR102399569B1 (ko) * | 2015-10-28 | 2022-05-19 | 삼성디스플레이 주식회사 | 마스크 어셈블리, 표시 장치의 제조 장치 및 표시 장치의 제조 방법 |
| EP3663087A4 (en) | 2017-08-04 | 2021-04-21 | Daikin Industries, Ltd. | SUBSTRATE FOR PATTERN FORMATION |
| CN107459641B (zh) * | 2017-08-30 | 2019-08-09 | 龙岩思康新材料有限公司 | 一种全氟聚醚改性烯丙氧基体的制备方法 |
| CN109928891B (zh) * | 2017-12-18 | 2022-12-06 | 乳源东阳光氟有限公司 | 一种聚酰胺连接的全氟聚醚及其制备方法和应用 |
| TWI837203B (zh) | 2018-11-02 | 2024-04-01 | 日商東京威力科創股份有限公司 | 膜形成方法及膜形成裝置 |
| US10934454B2 (en) * | 2019-01-22 | 2021-03-02 | Amazon Technologies, Inc. | Coating composition for a metal substrate |
| CN112724403B (zh) * | 2019-10-14 | 2022-10-04 | 中国科学院上海有机化学研究所 | 聚(γ-硫代丁内酯)及其制备方法 |
| US20210350879A1 (en) * | 2020-05-11 | 2021-11-11 | Massachusetts Institute Of Technology | Dna canvas for information storage and nanofabrication |
| KR102880388B1 (ko) * | 2020-07-31 | 2025-11-04 | 엘지전자 주식회사 | 가전기기용 외장부재 및 그 제조 방법 |
| WO2022234360A1 (en) | 2021-05-06 | 2022-11-10 | 3M Innovative Properties Company | Angular physical vapor deposition for coating substrates |
| JP2023081626A (ja) * | 2021-12-01 | 2023-06-13 | 株式会社東芝 | ヘッドサスペンションアッセンブリ、及び磁気記録再生装置 |
| TW202346474A (zh) * | 2022-02-22 | 2023-12-01 | 日商大金工業股份有限公司 | 含有氟聚醚基之硫醇化合物 |
| CN114957677B (zh) * | 2022-05-29 | 2023-01-31 | 北京化工大学 | 一种应用于19f磁共振成像的含氟聚合物纳米探针的制备方法 |
Family Cites Families (54)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3250807A (en) | 1963-08-23 | 1966-05-10 | Du Pont | Dicarboxylic acids of fluorocarbon ethers and fluorides, esters, amides and salts thereof |
| US3250808A (en) | 1963-10-31 | 1966-05-10 | Du Pont | Fluorocarbon ethers derived from hexafluoropropylene epoxide |
| US4204064A (en) * | 1964-01-29 | 1980-05-20 | L'oreal | Sulfur containing heterocyclic amino acid derivatives |
| US3810874A (en) * | 1969-03-10 | 1974-05-14 | Minnesota Mining & Mfg | Polymers prepared from poly(perfluoro-alkylene oxide) compounds |
| US4022928A (en) * | 1975-05-22 | 1977-05-10 | Piwcyzk Bernhard P | Vacuum deposition methods and masking structure |
| DE3486428T2 (de) * | 1983-12-26 | 1996-10-10 | Daikin Ind Ltd | Halogen enthaltendes Polyether |
| EP0293863A3 (en) * | 1987-06-02 | 1991-01-02 | Daikin Industries, Limited | Fluorine-containing polyether and process for preparing the same |
| US4882216A (en) * | 1987-08-10 | 1989-11-21 | Kashima Industries Co. | Epoxy resin film covered with metal foil and flexible printed wiring board |
| JPH01115193A (ja) * | 1987-10-29 | 1989-05-08 | Kashima Kogyo Kk | フレキシブル印刷配線板 |
| IT1249319B (it) * | 1991-04-26 | 1995-02-22 | Ausimont Spa | Perfluoropolieteri ad elevata viscosita' e basso contenuto di ossigeno perossidico, e procedimento per la loro preparazione |
| US5182342A (en) * | 1992-02-28 | 1993-01-26 | E. I. Du Pont De Nemours And Company | Hydrofluorocarbon solvents for fluoromonomer polymerization |
| US5190661A (en) * | 1992-06-08 | 1993-03-02 | Brigham Young University | Process of removing ions from solutions using a complex with sulfur-containing hydrocarbons |
| US5512131A (en) * | 1993-10-04 | 1996-04-30 | President And Fellows Of Harvard College | Formation of microstamped patterns on surfaces and derivative articles |
| WO1997007429A1 (en) * | 1995-08-18 | 1997-02-27 | President And Fellows Of Harvard College | Self-assembled monolayer directed patterning of surfaces |
| JPH10124844A (ja) * | 1996-10-23 | 1998-05-15 | Hitachi Ltd | 磁気記録媒体及びそれを用いた磁気記憶装置 |
| FR2761691B1 (fr) * | 1997-04-03 | 1999-05-14 | Oreal | Polymeres a fonction terminale thiol |
| JP2003524675A (ja) * | 1998-11-30 | 2003-08-19 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | フルオロモノマー重合 |
| US6555288B1 (en) * | 1999-06-21 | 2003-04-29 | Corning Incorporated | Optical devices made from radiation curable fluorinated compositions |
| US7041232B2 (en) * | 2001-03-26 | 2006-05-09 | International Business Machines Corporation | Selective etching of substrates with control of the etch profile |
| CA2447132C (en) | 2001-05-14 | 2008-10-07 | Omnova Solutions Inc. | Polymeric surfactants derived from cyclic monomers having pendant fluorinated carbon groups |
| ITMI20011340A1 (it) * | 2001-06-26 | 2002-12-26 | Ausimont Spa | Pfpe aventi almeno un terminale alchiletereo e relativo processo dipreparazione |
| US6778753B2 (en) | 2001-07-25 | 2004-08-17 | E. I. Du Pont De Nemours And Company | Halogenated optical polymer composition |
| US6878634B2 (en) * | 2002-04-10 | 2005-04-12 | Canon Kabushiki Kaisha | Structure having recesses and projections, method of manufacturing structure, and functional device |
| EP2093565B1 (en) * | 2002-05-22 | 2014-11-19 | Platypus Technologies, Inc. | Uses of devices and methods for cellular assays |
| SE0202630L (sv) * | 2002-09-06 | 2004-03-07 | Sca Hygiene Prod Ab | Sensoring absorbing article |
| US6923921B2 (en) * | 2002-12-30 | 2005-08-02 | 3M Innovative Properties Company | Fluorinated polyether compositions |
| WO2004070738A1 (ja) * | 2003-02-06 | 2004-08-19 | Sekisui Chemical Co., Ltd. | プロトン伝導性膜、その製造方法及びそれを用いた燃料電池 |
| US20040241396A1 (en) * | 2003-05-29 | 2004-12-02 | 3M Innovative Properties Company | Method of modifying a surface of a substrate and articles therefrom |
| US20050164402A1 (en) * | 2003-07-14 | 2005-07-28 | Belisle Christopher M. | Sample presentation device |
| US7678426B2 (en) * | 2003-08-21 | 2010-03-16 | 3M Innovative Properties Company | Perfluoropolyether amide-linked phosphonates, phosphates, and derivatives thereof |
| US7387714B2 (en) * | 2003-11-06 | 2008-06-17 | 3M Innovative Properties Company | Electrochemical sensor strip |
| DK1704585T3 (en) * | 2003-12-19 | 2017-05-22 | Univ North Carolina Chapel Hill | Methods for preparing isolated micro- and nanostructures using soft lithography or printing lithography |
| JP2005200304A (ja) * | 2004-01-13 | 2005-07-28 | Hitachi Ltd | 含フッ素化合物、それを用いた撥液膜及びそれを用いた各種製品 |
| US7148360B2 (en) * | 2004-01-30 | 2006-12-12 | 3M Innovative Properties Company | Perfluoropolyether benzotriazole compounds |
| US6991826B2 (en) * | 2004-04-20 | 2006-01-31 | 3M Innovative Properties Company | Antisoiling coatings for antireflective substrates |
| US7342080B2 (en) | 2004-05-07 | 2008-03-11 | 3M Innovative Properties Company | Polymerizable compositions, methods of making the same, and composite articles therefrom |
| US7160583B2 (en) * | 2004-12-03 | 2007-01-09 | 3M Innovative Properties Company | Microfabrication using patterned topography and self-assembled monolayers |
| US20060216524A1 (en) | 2005-03-23 | 2006-09-28 | 3M Innovative Properties Company | Perfluoropolyether urethane additives having (meth)acryl groups and hard coats |
| US20060266731A1 (en) * | 2005-05-31 | 2006-11-30 | Yu Steven Y | Etchant rinse method |
| US20070292679A1 (en) * | 2006-06-14 | 2007-12-20 | 3M Innovative Properties Company | Optical article having an antistatic fluorochemical surface layer |
| US20080047930A1 (en) * | 2006-08-23 | 2008-02-28 | Graciela Beatriz Blanchet | Method to form a pattern of functional material on a substrate |
| US8764996B2 (en) * | 2006-10-18 | 2014-07-01 | 3M Innovative Properties Company | Methods of patterning a material on polymeric substrates |
| US7968804B2 (en) * | 2006-12-20 | 2011-06-28 | 3M Innovative Properties Company | Methods of patterning a deposit metal on a substrate |
| WO2008076639A1 (en) * | 2006-12-20 | 2008-06-26 | 3M Innovative Properties Company | Fluorochemical urethane compounds having pendent silyl groups |
| US7745653B2 (en) * | 2007-03-08 | 2010-06-29 | 3M Innovative Properties Company | Fluorochemical compounds having pendent silyl groups |
| US7335786B1 (en) * | 2007-03-29 | 2008-02-26 | 3M Innovative Properties Company | Michael-adduct fluorochemical silanes |
| US20080315459A1 (en) * | 2007-06-21 | 2008-12-25 | 3M Innovative Properties Company | Articles and methods for replication of microstructures and nanofeatures |
| US8015970B2 (en) * | 2007-07-26 | 2011-09-13 | 3M Innovative Properties Company | Respirator, welding helmet, or face shield that has low surface energy hard-coat lens |
| US8492315B2 (en) * | 2007-08-28 | 2013-07-23 | Life Bioscience, Inc. | Method of providing a pattern of biological-binding areas for biological testing |
| US8080170B2 (en) * | 2007-10-01 | 2011-12-20 | 3M Innovative Properties Company | Cationic fluorinated ether silane compositions and related methods |
| CN101815755B (zh) * | 2007-10-01 | 2012-09-05 | 3M创新有限公司 | 包含阳离子氟化醚硅烷的组合物以及相关方法 |
| CN101903477B (zh) * | 2007-12-19 | 2013-10-30 | 3M创新有限公司 | 用于微接触印刷的油墨溶液 |
| CN102017071B (zh) * | 2008-02-28 | 2013-12-18 | 3M创新有限公司 | 图案化基底上的导体的方法 |
| CN102307734B (zh) | 2008-12-11 | 2015-06-03 | 3M创新有限公司 | 图案化方法 |
-
2009
- 2009-12-02 CN CN200980156190.3A patent/CN102307734B/zh not_active Expired - Fee Related
- 2009-12-02 WO PCT/US2009/066358 patent/WO2010068535A1/en not_active Ceased
- 2009-12-02 WO PCT/US2009/066337 patent/WO2010068531A1/en not_active Ceased
- 2009-12-02 EP EP09832393.4A patent/EP2370401B1/en not_active Not-in-force
- 2009-12-02 US US13/132,673 patent/US8901263B2/en not_active Expired - Fee Related
- 2009-12-02 CN CN200980156199.4A patent/CN102307851B/zh not_active Expired - Fee Related
- 2009-12-02 JP JP2011540782A patent/JP5864259B2/ja not_active Expired - Fee Related
- 2009-12-02 EP EP09832396.7A patent/EP2370269B1/en not_active Not-in-force
- 2009-12-02 US US13/130,320 patent/US8858813B2/en not_active Expired - Fee Related
-
2014
- 2014-10-30 US US14/527,877 patent/US9688649B2/en not_active Expired - Fee Related
-
2017
- 2017-05-24 US US15/603,495 patent/US20170253570A1/en not_active Abandoned
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