JP2012511635A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2012511635A5 JP2012511635A5 JP2011540782A JP2011540782A JP2012511635A5 JP 2012511635 A5 JP2012511635 A5 JP 2012511635A5 JP 2011540782 A JP2011540782 A JP 2011540782A JP 2011540782 A JP2011540782 A JP 2011540782A JP 2012511635 A5 JP2012511635 A5 JP 2012511635A5
- Authority
- JP
- Japan
- Prior art keywords
- forming
- perfluoropolyether
- functionalized region
- substrate
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims description 30
- 239000010702 perfluoropolyether Substances 0.000 claims description 28
- 239000000758 substrate Substances 0.000 claims description 15
- 150000002898 organic sulfur compounds Chemical class 0.000 claims description 13
- 150000001408 amides Chemical class 0.000 claims description 12
- 239000000203 mixture Substances 0.000 claims description 11
- 238000005530 etching Methods 0.000 claims description 8
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 4
- 239000010931 gold Substances 0.000 claims description 4
- 229910052737 gold Inorganic materials 0.000 claims description 4
- 238000000813 microcontact printing Methods 0.000 claims description 4
- 239000002094 self assembled monolayer Substances 0.000 claims description 4
- 239000013545 self-assembled monolayer Substances 0.000 claims description 4
- 238000003486 chemical etching Methods 0.000 claims description 3
- WRTMQOHKMFDUKX-UHFFFAOYSA-N triiodide Chemical compound I[I-]I WRTMQOHKMFDUKX-UHFFFAOYSA-N 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims description 2
- -1 hexafluoropropyleneoxy group Chemical group 0.000 description 14
- 125000005647 linker group Chemical group 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 125000005708 carbonyloxy group Chemical group [*:2]OC([*:1])=O 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 125000006551 perfluoro alkylene group Chemical group 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- 239000012991 xanthate Substances 0.000 description 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12160508P | 2008-12-11 | 2008-12-11 | |
| US12159808P | 2008-12-11 | 2008-12-11 | |
| US61/121,605 | 2008-12-11 | ||
| US61/121,598 | 2008-12-11 | ||
| PCT/US2009/066358 WO2010068535A1 (en) | 2008-12-11 | 2009-12-02 | Patterning process |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012511635A JP2012511635A (ja) | 2012-05-24 |
| JP2012511635A5 true JP2012511635A5 (https=) | 2013-01-24 |
| JP5864259B2 JP5864259B2 (ja) | 2016-02-17 |
Family
ID=42243038
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011540782A Expired - Fee Related JP5864259B2 (ja) | 2008-12-11 | 2009-12-02 | パターン形成方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (4) | US8901263B2 (https=) |
| EP (2) | EP2370269B1 (https=) |
| JP (1) | JP5864259B2 (https=) |
| CN (2) | CN102307734B (https=) |
| WO (2) | WO2010068531A1 (https=) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8747599B2 (en) * | 2008-05-29 | 2014-06-10 | Chidella Krishna Sastry | Process for making self-patterning substrates and the product thereof |
| US8901263B2 (en) * | 2008-12-11 | 2014-12-02 | 3M Innovative Properties Company | Amide-linked perfluoropolyether thiol compounds and processes for their preparation and use |
| EP2401669B1 (en) | 2009-02-26 | 2016-04-06 | 3M Innovative Properties Company | Touch screen sensor and patterned substrate having overlaid micropatterns with low visibility |
| US8647522B2 (en) | 2009-06-25 | 2014-02-11 | 3M Innovative Properties Company | Methods of wet etching a self-assembled monolayer patterned substrate and metal patterned articles |
| US8553400B2 (en) | 2009-06-30 | 2013-10-08 | 3M Innovative Properties Company | Electronic displays and metal micropatterned substrates having a graphic |
| US8258341B2 (en) * | 2009-07-10 | 2012-09-04 | E.I. Du Pont De Nemours And Company | Polyfluorosulfonamido amine and intermediate |
| JP5843784B2 (ja) | 2009-12-22 | 2016-01-13 | スリーエム イノベイティブ プロパティズ カンパニー | 加圧ローラーを使用するマイクロコンタクトプリンティングのための装置及び方法 |
| US9714469B2 (en) * | 2010-12-23 | 2017-07-25 | Rolex Sa | Composition for increasing the lipophobicity of a watch-making component |
| FR2969663B1 (fr) * | 2010-12-23 | 2013-01-18 | Surfactis Technologies | Composition hydrophobe et lipophobe de molecules bisphosphoniques et thiols |
| WO2012115151A1 (ja) * | 2011-02-22 | 2012-08-30 | 国立大学法人北海道大学 | 粒子集積体、粒子集積体の製造方法、光増強素子及び光化学反応を利用する装置 |
| CN103477728B (zh) * | 2011-03-30 | 2016-05-18 | 富士胶片株式会社 | 印刷配线基板及其制造方法、印刷配线基板用的金属表面处理液以及集成电路封装基板 |
| US9449630B2 (en) * | 2014-06-02 | 2016-09-20 | Seagate Technology Llc | Sliders having at least two regions on the trailing edge surface |
| KR102399569B1 (ko) * | 2015-10-28 | 2022-05-19 | 삼성디스플레이 주식회사 | 마스크 어셈블리, 표시 장치의 제조 장치 및 표시 장치의 제조 방법 |
| JP6439895B1 (ja) | 2017-08-04 | 2018-12-19 | ダイキン工業株式会社 | パターン形成用基体 |
| CN107459641B (zh) * | 2017-08-30 | 2019-08-09 | 龙岩思康新材料有限公司 | 一种全氟聚醚改性烯丙氧基体的制备方法 |
| CN109928891B (zh) * | 2017-12-18 | 2022-12-06 | 乳源东阳光氟有限公司 | 一种聚酰胺连接的全氟聚醚及其制备方法和应用 |
| TWI837203B (zh) | 2018-11-02 | 2024-04-01 | 日商東京威力科創股份有限公司 | 膜形成方法及膜形成裝置 |
| US10934454B2 (en) * | 2019-01-22 | 2021-03-02 | Amazon Technologies, Inc. | Coating composition for a metal substrate |
| CN112724403B (zh) * | 2019-10-14 | 2022-10-04 | 中国科学院上海有机化学研究所 | 聚(γ-硫代丁内酯)及其制备方法 |
| US20210350879A1 (en) * | 2020-05-11 | 2021-11-11 | Massachusetts Institute Of Technology | Dna canvas for information storage and nanofabrication |
| KR102880388B1 (ko) * | 2020-07-31 | 2025-11-04 | 엘지전자 주식회사 | 가전기기용 외장부재 및 그 제조 방법 |
| US20240166557A1 (en) | 2021-05-06 | 2024-05-23 | 3M Innovative Properties Company | Angular physical vapor deposition for coating substrates |
| JP2023081626A (ja) * | 2021-12-01 | 2023-06-13 | 株式会社東芝 | ヘッドサスペンションアッセンブリ、及び磁気記録再生装置 |
| CN118871504A (zh) * | 2022-02-22 | 2024-10-29 | 大金工业株式会社 | 含有氟代聚醚基的硫醇化合物 |
| CN114957677B (zh) * | 2022-05-29 | 2023-01-31 | 北京化工大学 | 一种应用于19f磁共振成像的含氟聚合物纳米探针的制备方法 |
Family Cites Families (54)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3250807A (en) * | 1963-08-23 | 1966-05-10 | Du Pont | Dicarboxylic acids of fluorocarbon ethers and fluorides, esters, amides and salts thereof |
| US3250808A (en) | 1963-10-31 | 1966-05-10 | Du Pont | Fluorocarbon ethers derived from hexafluoropropylene epoxide |
| US4204064A (en) | 1964-01-29 | 1980-05-20 | L'oreal | Sulfur containing heterocyclic amino acid derivatives |
| US3810874A (en) * | 1969-03-10 | 1974-05-14 | Minnesota Mining & Mfg | Polymers prepared from poly(perfluoro-alkylene oxide) compounds |
| US4022928A (en) * | 1975-05-22 | 1977-05-10 | Piwcyzk Bernhard P | Vacuum deposition methods and masking structure |
| DE3486428T2 (de) * | 1983-12-26 | 1996-10-10 | Daikin Ind Ltd | Halogen enthaltendes Polyether |
| EP0293863A3 (en) * | 1987-06-02 | 1991-01-02 | Daikin Industries, Limited | Fluorine-containing polyether and process for preparing the same |
| JPH01115193A (ja) * | 1987-10-29 | 1989-05-08 | Kashima Kogyo Kk | フレキシブル印刷配線板 |
| US4882216A (en) | 1987-08-10 | 1989-11-21 | Kashima Industries Co. | Epoxy resin film covered with metal foil and flexible printed wiring board |
| IT1249319B (it) * | 1991-04-26 | 1995-02-22 | Ausimont Spa | Perfluoropolieteri ad elevata viscosita' e basso contenuto di ossigeno perossidico, e procedimento per la loro preparazione |
| US5182342A (en) * | 1992-02-28 | 1993-01-26 | E. I. Du Pont De Nemours And Company | Hydrofluorocarbon solvents for fluoromonomer polymerization |
| US5190661A (en) | 1992-06-08 | 1993-03-02 | Brigham Young University | Process of removing ions from solutions using a complex with sulfur-containing hydrocarbons |
| US5512131A (en) | 1993-10-04 | 1996-04-30 | President And Fellows Of Harvard College | Formation of microstamped patterns on surfaces and derivative articles |
| US6518168B1 (en) | 1995-08-18 | 2003-02-11 | President And Fellows Of Harvard College | Self-assembled monolayer directed patterning of surfaces |
| JPH10124844A (ja) * | 1996-10-23 | 1998-05-15 | Hitachi Ltd | 磁気記録媒体及びそれを用いた磁気記憶装置 |
| FR2761691B1 (fr) * | 1997-04-03 | 1999-05-14 | Oreal | Polymeres a fonction terminale thiol |
| DE69940558D1 (en) * | 1998-11-30 | 2009-04-23 | Du Pont | Fluoromonomerpolymerisation |
| US6555288B1 (en) * | 1999-06-21 | 2003-04-29 | Corning Incorporated | Optical devices made from radiation curable fluorinated compositions |
| US7041232B2 (en) * | 2001-03-26 | 2006-05-09 | International Business Machines Corporation | Selective etching of substrates with control of the etch profile |
| WO2002092660A2 (en) | 2001-05-14 | 2002-11-21 | Omnova Soltions Inc | Polymeric surfactants derived from cyclic monomers having pendant fluorinated carbon groups |
| ITMI20011340A1 (it) | 2001-06-26 | 2002-12-26 | Ausimont Spa | Pfpe aventi almeno un terminale alchiletereo e relativo processo dipreparazione |
| US6778753B2 (en) * | 2001-07-25 | 2004-08-17 | E. I. Du Pont De Nemours And Company | Halogenated optical polymer composition |
| US6878634B2 (en) * | 2002-04-10 | 2005-04-12 | Canon Kabushiki Kaisha | Structure having recesses and projections, method of manufacturing structure, and functional device |
| EP2093565B1 (en) | 2002-05-22 | 2014-11-19 | Platypus Technologies, Inc. | Uses of devices and methods for cellular assays |
| SE0202630L (sv) * | 2002-09-06 | 2004-03-07 | Sca Hygiene Prod Ab | Sensoring absorbing article |
| US6923921B2 (en) * | 2002-12-30 | 2005-08-02 | 3M Innovative Properties Company | Fluorinated polyether compositions |
| JP4430618B2 (ja) * | 2003-02-06 | 2010-03-10 | 積水化学工業株式会社 | プロトン伝導性膜、その製造方法及びそれを用いた燃料電池 |
| US20040241396A1 (en) * | 2003-05-29 | 2004-12-02 | 3M Innovative Properties Company | Method of modifying a surface of a substrate and articles therefrom |
| US20050164402A1 (en) * | 2003-07-14 | 2005-07-28 | Belisle Christopher M. | Sample presentation device |
| JP4718463B2 (ja) * | 2003-08-21 | 2011-07-06 | スリーエム イノベイティブ プロパティズ カンパニー | パーフルオロポリエーテルアミド連結ホスホネート、ホスフェートおよびそれらの誘導体 |
| US7387714B2 (en) * | 2003-11-06 | 2008-06-17 | 3M Innovative Properties Company | Electrochemical sensor strip |
| MXPA06006738A (es) | 2003-12-19 | 2006-08-31 | Univ North Carolina | Metodos para fabricar micro- y nano-estructuras aisladas utilizando litografia suave o de impresion. |
| JP2005200304A (ja) * | 2004-01-13 | 2005-07-28 | Hitachi Ltd | 含フッ素化合物、それを用いた撥液膜及びそれを用いた各種製品 |
| US7148360B2 (en) * | 2004-01-30 | 2006-12-12 | 3M Innovative Properties Company | Perfluoropolyether benzotriazole compounds |
| US6991826B2 (en) * | 2004-04-20 | 2006-01-31 | 3M Innovative Properties Company | Antisoiling coatings for antireflective substrates |
| US7342080B2 (en) * | 2004-05-07 | 2008-03-11 | 3M Innovative Properties Company | Polymerizable compositions, methods of making the same, and composite articles therefrom |
| US7160583B2 (en) * | 2004-12-03 | 2007-01-09 | 3M Innovative Properties Company | Microfabrication using patterned topography and self-assembled monolayers |
| US20060216524A1 (en) | 2005-03-23 | 2006-09-28 | 3M Innovative Properties Company | Perfluoropolyether urethane additives having (meth)acryl groups and hard coats |
| US20060266731A1 (en) * | 2005-05-31 | 2006-11-30 | Yu Steven Y | Etchant rinse method |
| US20070292679A1 (en) | 2006-06-14 | 2007-12-20 | 3M Innovative Properties Company | Optical article having an antistatic fluorochemical surface layer |
| US20080047930A1 (en) | 2006-08-23 | 2008-02-28 | Graciela Beatriz Blanchet | Method to form a pattern of functional material on a substrate |
| US8764996B2 (en) | 2006-10-18 | 2014-07-01 | 3M Innovative Properties Company | Methods of patterning a material on polymeric substrates |
| JP5415960B2 (ja) * | 2006-12-20 | 2014-02-12 | スリーエム イノベイティブ プロパティズ カンパニー | ペンダントシリル基を有するフルオロケミカルウレタン化合物 |
| US7968804B2 (en) * | 2006-12-20 | 2011-06-28 | 3M Innovative Properties Company | Methods of patterning a deposit metal on a substrate |
| US7745653B2 (en) * | 2007-03-08 | 2010-06-29 | 3M Innovative Properties Company | Fluorochemical compounds having pendent silyl groups |
| US7335786B1 (en) | 2007-03-29 | 2008-02-26 | 3M Innovative Properties Company | Michael-adduct fluorochemical silanes |
| US20080315459A1 (en) | 2007-06-21 | 2008-12-25 | 3M Innovative Properties Company | Articles and methods for replication of microstructures and nanofeatures |
| US8015970B2 (en) | 2007-07-26 | 2011-09-13 | 3M Innovative Properties Company | Respirator, welding helmet, or face shield that has low surface energy hard-coat lens |
| US8492315B2 (en) | 2007-08-28 | 2013-07-23 | Life Bioscience, Inc. | Method of providing a pattern of biological-binding areas for biological testing |
| CN101815719A (zh) | 2007-10-01 | 2010-08-25 | 3M创新有限公司 | 阳离子氟化醚硅烷组合物以及相关方法 |
| US8501641B2 (en) | 2007-10-01 | 2013-08-06 | 3M Innovative Properties Company | Compositions comprising cationic fluorinated ether silanes, and related methods |
| EP2231793B1 (en) | 2007-12-19 | 2014-01-22 | 3M Innovative Properties Company | Ink solutions for microcontact printing |
| EP2257969B1 (en) * | 2008-02-28 | 2017-12-20 | 3M Innovative Properties Company | Methods of patterning a conductor on a substrate |
| US8901263B2 (en) * | 2008-12-11 | 2014-12-02 | 3M Innovative Properties Company | Amide-linked perfluoropolyether thiol compounds and processes for their preparation and use |
-
2009
- 2009-12-02 US US13/132,673 patent/US8901263B2/en not_active Expired - Fee Related
- 2009-12-02 WO PCT/US2009/066337 patent/WO2010068531A1/en not_active Ceased
- 2009-12-02 CN CN200980156190.3A patent/CN102307734B/zh not_active Expired - Fee Related
- 2009-12-02 WO PCT/US2009/066358 patent/WO2010068535A1/en not_active Ceased
- 2009-12-02 EP EP09832396.7A patent/EP2370269B1/en not_active Not-in-force
- 2009-12-02 EP EP09832393.4A patent/EP2370401B1/en not_active Not-in-force
- 2009-12-02 US US13/130,320 patent/US8858813B2/en not_active Expired - Fee Related
- 2009-12-02 CN CN200980156199.4A patent/CN102307851B/zh not_active Expired - Fee Related
- 2009-12-02 JP JP2011540782A patent/JP5864259B2/ja not_active Expired - Fee Related
-
2014
- 2014-10-30 US US14/527,877 patent/US9688649B2/en not_active Expired - Fee Related
-
2017
- 2017-05-24 US US15/603,495 patent/US20170253570A1/en not_active Abandoned
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2012511635A5 (https=) | ||
| JP5864259B2 (ja) | パターン形成方法 | |
| Chinwangso et al. | Multidentate adsorbates for self-assembled monolayer films | |
| Kang et al. | Self-assembled rigid monolayers of 4 ‘-substituted-4-mercaptobiphenyls on gold and silver surfaces | |
| JP2021520640A5 (https=) | ||
| WO2006107083A3 (en) | Surface modifier | |
| BR0206352A (pt) | Composição fluoroquìmica, método para tratar um substrato, substrato, e, oligÈmero fluoroquìmico | |
| WO2008081832A1 (ja) | コアシェル型ハイパーブランチポリマー、レジスト組成物、半導体装置の製造方法、半導体装置 | |
| EP2287270A3 (en) | Composition containing fluorinated amide | |
| GB0326904D0 (en) | Formation of self-assembled monolayers | |
| JP2008525619A5 (https=) | ||
| TW200500384A (en) | Novel thiol compound, copolymer and method for producing the copolymer | |
| JP2010285403A5 (https=) | ||
| EP1968752A2 (en) | Nanotube assembly | |
| JP2006321856A5 (https=) | ||
| JP4376540B2 (ja) | 金属表面修飾剤および新規含硫黄化合物 | |
| JP2008525204A (ja) | Ｓａｍの成長に基づいたナノファブリケーション | |
| JPWO2005091070A1 (ja) | リソグラフィー用基板表面処理剤 | |
| JP2004033824A (ja) | 多芳香環化合物による紫外線耐性自己組織化単分子膜 | |
| Ishida | Self-assembled monolayers for molecular nanoelectronics | |
| JP2009114409A (ja) | 共重合体の単分子膜または積層膜およびそれらの製造方法 | |
| Lee | ROBUST FUNCTIONALIZED ORGANIC THIN FILMS ON GOLD: FABRICATION, CHARACTERIZATION, AND THEIR APPLICATIONS | |
| JP2010264659A (ja) | 治具およびその製造方法 | |
| Choi | Functional Polymers for Advanced Lithography | |
| Hayes | Phase behavior of two-component organothiol self-assembled monolayers on gold: templates for the growth of novel polyaniline nanostructures |