CN102307734B - 图案化方法 - Google Patents

图案化方法 Download PDF

Info

Publication number
CN102307734B
CN102307734B CN200980156190.3A CN200980156190A CN102307734B CN 102307734 B CN102307734 B CN 102307734B CN 200980156190 A CN200980156190 A CN 200980156190A CN 102307734 B CN102307734 B CN 102307734B
Authority
CN
China
Prior art keywords
pfpe
functionalized
compound
perfluoropolyether
base material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN200980156190.3A
Other languages
English (en)
Chinese (zh)
Other versions
CN102307734A (zh
Inventor
祖丽君
马修·H·弗雷
苏赖斯·艾耶尔
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Innovative Properties Co
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of CN102307734A publication Critical patent/CN102307734A/zh
Application granted granted Critical
Publication of CN102307734B publication Critical patent/CN102307734B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D303/00—Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
    • C07D303/02—Compounds containing oxirane rings
    • C07D303/48—Compounds containing oxirane rings with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, directly attached to ring carbon atoms, e.g. ester or nitrile radicals
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/18—Processes for applying liquids or other fluent materials performed by dipping
    • B05D1/185—Processes for applying liquids or other fluent materials performed by dipping applying monomolecular layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/23—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
    • C07C323/39—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton at least one of the nitrogen atoms being part of any of the groups, X being a hetero atom, Y being any atom
    • C07C323/40—Y being a hydrogen or a carbon atom
    • C07C323/41—Y being a hydrogen or an acyclic carbon atom
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/50—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton
    • C07C323/51—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
    • C07C323/52—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being acyclic and saturated
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/50—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton
    • C07C323/51—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
    • C07C323/60—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton with the carbon atom of at least one of the carboxyl groups bound to nitrogen atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/38—Polymerisation using regulators, e.g. chain terminating agents, e.g. telomerisation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/002—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds
    • C08G65/005—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens
    • C08G65/007—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens containing fluorine
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/32—Polymers modified by chemical after-treatment
    • C08G65/329—Polymers modified by chemical after-treatment with organic compounds
    • C08G65/334—Polymers modified by chemical after-treatment with organic compounds containing sulfur
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D171/00—Coating compositions based on polyethers obtained by reactions forming an ether link in the main chain; Coating compositions based on derivatives of such polymers
    • C09D171/02—Polyalkylene oxides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Materials Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Composite Materials (AREA)
  • Manufacturing & Machinery (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Polyethers (AREA)
CN200980156190.3A 2008-12-11 2009-12-02 图案化方法 Expired - Fee Related CN102307734B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US12159808P 2008-12-11 2008-12-11
US12160508P 2008-12-11 2008-12-11
US61/121,605 2008-12-11
US61/121,598 2008-12-11
PCT/US2009/066358 WO2010068535A1 (en) 2008-12-11 2009-12-02 Patterning process

Publications (2)

Publication Number Publication Date
CN102307734A CN102307734A (zh) 2012-01-04
CN102307734B true CN102307734B (zh) 2015-06-03

Family

ID=42243038

Family Applications (2)

Application Number Title Priority Date Filing Date
CN200980156190.3A Expired - Fee Related CN102307734B (zh) 2008-12-11 2009-12-02 图案化方法
CN200980156199.4A Expired - Fee Related CN102307851B (zh) 2008-12-11 2009-12-02 酰胺连接的全氟聚醚硫醇化合物及其制备方法和用途

Family Applications After (1)

Application Number Title Priority Date Filing Date
CN200980156199.4A Expired - Fee Related CN102307851B (zh) 2008-12-11 2009-12-02 酰胺连接的全氟聚醚硫醇化合物及其制备方法和用途

Country Status (5)

Country Link
US (4) US8901263B2 (https=)
EP (2) EP2370401B1 (https=)
JP (1) JP5864259B2 (https=)
CN (2) CN102307734B (https=)
WO (2) WO2010068535A1 (https=)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8747599B2 (en) * 2008-05-29 2014-06-10 Chidella Krishna Sastry Process for making self-patterning substrates and the product thereof
CN102307734B (zh) * 2008-12-11 2015-06-03 3M创新有限公司 图案化方法
JP5643774B2 (ja) 2009-02-26 2014-12-17 スリーエム イノベイティブ プロパティズ カンパニー 低視認性の重ね合わせられた微小パターンを有する、タッチスクリーンセンサ及びパターン基材
EP2446067B1 (en) 2009-06-25 2019-11-20 3M Innovative Properties Company Methods of wet etching a self-assembled monolayer patterned substrate and metal patterned articles
WO2011002617A1 (en) 2009-06-30 2011-01-06 3M Innovative Properties Company Electronic displays and metal micropatterned substrates having a graphic
US8258341B2 (en) 2009-07-10 2012-09-04 E.I. Du Pont De Nemours And Company Polyfluorosulfonamido amine and intermediate
US8950324B2 (en) 2009-12-22 2015-02-10 3M Innovative Properties Company Apparatus and method for microcontact printing using a pressurized roller
EP2655577B1 (fr) * 2010-12-23 2014-04-23 Rolex S.A. Composition pour augmenter la lipophobicite d'un composant horloger
FR2969663B1 (fr) * 2010-12-23 2013-01-18 Surfactis Technologies Composition hydrophobe et lipophobe de molecules bisphosphoniques et thiols
EP2679322B1 (en) * 2011-02-22 2019-02-06 National University Corporation Hokkaido University Particle aggregate, manufacturing method for particle aggregate, fluorescence enhancing element, and device using photochemical reactions
WO2012132970A1 (ja) * 2011-03-30 2012-10-04 富士フイルム株式会社 プリント配線基板およびその製造方法、並びに、金属表面処理液
US9449630B2 (en) * 2014-06-02 2016-09-20 Seagate Technology Llc Sliders having at least two regions on the trailing edge surface
KR102399569B1 (ko) * 2015-10-28 2022-05-19 삼성디스플레이 주식회사 마스크 어셈블리, 표시 장치의 제조 장치 및 표시 장치의 제조 방법
EP3663087A4 (en) 2017-08-04 2021-04-21 Daikin Industries, Ltd. SUBSTRATE FOR PATTERN FORMATION
CN107459641B (zh) * 2017-08-30 2019-08-09 龙岩思康新材料有限公司 一种全氟聚醚改性烯丙氧基体的制备方法
CN109928891B (zh) * 2017-12-18 2022-12-06 乳源东阳光氟有限公司 一种聚酰胺连接的全氟聚醚及其制备方法和应用
TWI837203B (zh) 2018-11-02 2024-04-01 日商東京威力科創股份有限公司 膜形成方法及膜形成裝置
US10934454B2 (en) * 2019-01-22 2021-03-02 Amazon Technologies, Inc. Coating composition for a metal substrate
CN112724403B (zh) * 2019-10-14 2022-10-04 中国科学院上海有机化学研究所 聚(γ-硫代丁内酯)及其制备方法
US20210350879A1 (en) * 2020-05-11 2021-11-11 Massachusetts Institute Of Technology Dna canvas for information storage and nanofabrication
KR102880388B1 (ko) * 2020-07-31 2025-11-04 엘지전자 주식회사 가전기기용 외장부재 및 그 제조 방법
WO2022234360A1 (en) 2021-05-06 2022-11-10 3M Innovative Properties Company Angular physical vapor deposition for coating substrates
JP2023081626A (ja) * 2021-12-01 2023-06-13 株式会社東芝 ヘッドサスペンションアッセンブリ、及び磁気記録再生装置
TW202346474A (zh) * 2022-02-22 2023-12-01 日商大金工業股份有限公司 含有氟聚醚基之硫醇化合物
CN114957677B (zh) * 2022-05-29 2023-01-31 北京化工大学 一种应用于19f磁共振成像的含氟聚合物纳米探针的制备方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4022928A (en) * 1975-05-22 1977-05-10 Piwcyzk Bernhard P Vacuum deposition methods and masking structure
US5512131A (en) * 1993-10-04 1996-04-30 President And Fellows Of Harvard College Formation of microstamped patterns on surfaces and derivative articles
US20040241396A1 (en) * 2003-05-29 2004-12-02 3M Innovative Properties Company Method of modifying a surface of a substrate and articles therefrom
WO2005101466A2 (en) * 2003-12-19 2005-10-27 The University Of North Carolina At Chapel Hill Methods for fabricating isolated micro- and nano- structures using soft or imprint lithography

Family Cites Families (50)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3250807A (en) 1963-08-23 1966-05-10 Du Pont Dicarboxylic acids of fluorocarbon ethers and fluorides, esters, amides and salts thereof
US3250808A (en) 1963-10-31 1966-05-10 Du Pont Fluorocarbon ethers derived from hexafluoropropylene epoxide
US4204064A (en) * 1964-01-29 1980-05-20 L'oreal Sulfur containing heterocyclic amino acid derivatives
US3810874A (en) * 1969-03-10 1974-05-14 Minnesota Mining & Mfg Polymers prepared from poly(perfluoro-alkylene oxide) compounds
DE3486428T2 (de) * 1983-12-26 1996-10-10 Daikin Ind Ltd Halogen enthaltendes Polyether
EP0293863A3 (en) * 1987-06-02 1991-01-02 Daikin Industries, Limited Fluorine-containing polyether and process for preparing the same
US4882216A (en) * 1987-08-10 1989-11-21 Kashima Industries Co. Epoxy resin film covered with metal foil and flexible printed wiring board
JPH01115193A (ja) * 1987-10-29 1989-05-08 Kashima Kogyo Kk フレキシブル印刷配線板
IT1249319B (it) * 1991-04-26 1995-02-22 Ausimont Spa Perfluoropolieteri ad elevata viscosita' e basso contenuto di ossigeno perossidico, e procedimento per la loro preparazione
US5182342A (en) * 1992-02-28 1993-01-26 E. I. Du Pont De Nemours And Company Hydrofluorocarbon solvents for fluoromonomer polymerization
US5190661A (en) * 1992-06-08 1993-03-02 Brigham Young University Process of removing ions from solutions using a complex with sulfur-containing hydrocarbons
WO1997007429A1 (en) * 1995-08-18 1997-02-27 President And Fellows Of Harvard College Self-assembled monolayer directed patterning of surfaces
JPH10124844A (ja) * 1996-10-23 1998-05-15 Hitachi Ltd 磁気記録媒体及びそれを用いた磁気記憶装置
FR2761691B1 (fr) * 1997-04-03 1999-05-14 Oreal Polymeres a fonction terminale thiol
JP2003524675A (ja) * 1998-11-30 2003-08-19 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー フルオロモノマー重合
US6555288B1 (en) * 1999-06-21 2003-04-29 Corning Incorporated Optical devices made from radiation curable fluorinated compositions
US7041232B2 (en) * 2001-03-26 2006-05-09 International Business Machines Corporation Selective etching of substrates with control of the etch profile
CA2447132C (en) 2001-05-14 2008-10-07 Omnova Solutions Inc. Polymeric surfactants derived from cyclic monomers having pendant fluorinated carbon groups
ITMI20011340A1 (it) * 2001-06-26 2002-12-26 Ausimont Spa Pfpe aventi almeno un terminale alchiletereo e relativo processo dipreparazione
US6778753B2 (en) 2001-07-25 2004-08-17 E. I. Du Pont De Nemours And Company Halogenated optical polymer composition
US6878634B2 (en) * 2002-04-10 2005-04-12 Canon Kabushiki Kaisha Structure having recesses and projections, method of manufacturing structure, and functional device
EP2093565B1 (en) * 2002-05-22 2014-11-19 Platypus Technologies, Inc. Uses of devices and methods for cellular assays
SE0202630L (sv) * 2002-09-06 2004-03-07 Sca Hygiene Prod Ab Sensoring absorbing article
US6923921B2 (en) * 2002-12-30 2005-08-02 3M Innovative Properties Company Fluorinated polyether compositions
WO2004070738A1 (ja) * 2003-02-06 2004-08-19 Sekisui Chemical Co., Ltd. プロトン伝導性膜、その製造方法及びそれを用いた燃料電池
US20050164402A1 (en) * 2003-07-14 2005-07-28 Belisle Christopher M. Sample presentation device
US7678426B2 (en) * 2003-08-21 2010-03-16 3M Innovative Properties Company Perfluoropolyether amide-linked phosphonates, phosphates, and derivatives thereof
US7387714B2 (en) * 2003-11-06 2008-06-17 3M Innovative Properties Company Electrochemical sensor strip
JP2005200304A (ja) * 2004-01-13 2005-07-28 Hitachi Ltd 含フッ素化合物、それを用いた撥液膜及びそれを用いた各種製品
US7148360B2 (en) * 2004-01-30 2006-12-12 3M Innovative Properties Company Perfluoropolyether benzotriazole compounds
US6991826B2 (en) * 2004-04-20 2006-01-31 3M Innovative Properties Company Antisoiling coatings for antireflective substrates
US7342080B2 (en) 2004-05-07 2008-03-11 3M Innovative Properties Company Polymerizable compositions, methods of making the same, and composite articles therefrom
US7160583B2 (en) * 2004-12-03 2007-01-09 3M Innovative Properties Company Microfabrication using patterned topography and self-assembled monolayers
US20060216524A1 (en) 2005-03-23 2006-09-28 3M Innovative Properties Company Perfluoropolyether urethane additives having (meth)acryl groups and hard coats
US20060266731A1 (en) * 2005-05-31 2006-11-30 Yu Steven Y Etchant rinse method
US20070292679A1 (en) * 2006-06-14 2007-12-20 3M Innovative Properties Company Optical article having an antistatic fluorochemical surface layer
US20080047930A1 (en) * 2006-08-23 2008-02-28 Graciela Beatriz Blanchet Method to form a pattern of functional material on a substrate
US8764996B2 (en) * 2006-10-18 2014-07-01 3M Innovative Properties Company Methods of patterning a material on polymeric substrates
US7968804B2 (en) * 2006-12-20 2011-06-28 3M Innovative Properties Company Methods of patterning a deposit metal on a substrate
WO2008076639A1 (en) * 2006-12-20 2008-06-26 3M Innovative Properties Company Fluorochemical urethane compounds having pendent silyl groups
US7745653B2 (en) * 2007-03-08 2010-06-29 3M Innovative Properties Company Fluorochemical compounds having pendent silyl groups
US7335786B1 (en) * 2007-03-29 2008-02-26 3M Innovative Properties Company Michael-adduct fluorochemical silanes
US20080315459A1 (en) * 2007-06-21 2008-12-25 3M Innovative Properties Company Articles and methods for replication of microstructures and nanofeatures
US8015970B2 (en) * 2007-07-26 2011-09-13 3M Innovative Properties Company Respirator, welding helmet, or face shield that has low surface energy hard-coat lens
US8492315B2 (en) * 2007-08-28 2013-07-23 Life Bioscience, Inc. Method of providing a pattern of biological-binding areas for biological testing
US8080170B2 (en) * 2007-10-01 2011-12-20 3M Innovative Properties Company Cationic fluorinated ether silane compositions and related methods
CN101815755B (zh) * 2007-10-01 2012-09-05 3M创新有限公司 包含阳离子氟化醚硅烷的组合物以及相关方法
CN101903477B (zh) * 2007-12-19 2013-10-30 3M创新有限公司 用于微接触印刷的油墨溶液
CN102017071B (zh) * 2008-02-28 2013-12-18 3M创新有限公司 图案化基底上的导体的方法
CN102307734B (zh) 2008-12-11 2015-06-03 3M创新有限公司 图案化方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4022928A (en) * 1975-05-22 1977-05-10 Piwcyzk Bernhard P Vacuum deposition methods and masking structure
US5512131A (en) * 1993-10-04 1996-04-30 President And Fellows Of Harvard College Formation of microstamped patterns on surfaces and derivative articles
US20040241396A1 (en) * 2003-05-29 2004-12-02 3M Innovative Properties Company Method of modifying a surface of a substrate and articles therefrom
WO2005101466A2 (en) * 2003-12-19 2005-10-27 The University Of North Carolina At Chapel Hill Methods for fabricating isolated micro- and nano- structures using soft or imprint lithography

Also Published As

Publication number Publication date
JP5864259B2 (ja) 2016-02-17
US9688649B2 (en) 2017-06-27
CN102307734A (zh) 2012-01-04
US20110237765A1 (en) 2011-09-29
WO2010068531A1 (en) 2010-06-17
US8858813B2 (en) 2014-10-14
WO2010068535A1 (en) 2010-06-17
EP2370269A4 (en) 2013-05-08
EP2370401A1 (en) 2011-10-05
EP2370269B1 (en) 2015-08-05
US8901263B2 (en) 2014-12-02
US20150051362A1 (en) 2015-02-19
EP2370401B1 (en) 2018-01-24
CN102307851A (zh) 2012-01-04
CN102307851B (zh) 2015-05-06
US20170253570A1 (en) 2017-09-07
EP2370401A4 (en) 2014-05-28
EP2370269A1 (en) 2011-10-05
JP2012511635A (ja) 2012-05-24
US20110226733A1 (en) 2011-09-22

Similar Documents

Publication Publication Date Title
CN102307734B (zh) 图案化方法
US7678426B2 (en) Perfluoropolyether amide-linked phosphonates, phosphates, and derivatives thereof
JP6399975B2 (ja) 自己組織化単層パターン化基材の湿式エッチング方法、及び金属パターン化物品
EP2231793B1 (en) Ink solutions for microcontact printing
JP2012511635A5 (https=)
WO2004027889A1 (ja) パターン表面をテンプレートとして用いる材料とその製法
TW200915004A (en) Processed substrates having water-repellent areas in patterns, process for production thereof, and process for production of members having patterms made of functional material films
Laffineur et al. Mechanically polished copper surfaces modified with n-dodecanethiol and 3-perfluorooctyl-propanethiol
US20130260560A1 (en) Patterning Processes Comprising Amplified Patterns
JP2017120342A (ja) パターン形成方法及び対象物の被処理面の改質方法
US6866791B1 (en) Method of forming patterned nickel and doped nickel films via microcontact printing and uses thereof
US20130292877A1 (en) Nanoimprinting method
WO2005091070A1 (ja) リソグラフィー用基板表面処理剤
Kwon et al. Patterning of polypyrrole using a fluoropolymer as an adsorption-protecting molecule
JP5022529B2 (ja) 銅フィリング方法
MATSUMURA et al. Site-Selective Direct Nickel Metallization on Precursor Polyimide Using Microcontact Printing

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20150603

Termination date: 20191202