JP2012506458A5 - - Google Patents

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Publication number
JP2012506458A5
JP2012506458A5 JP2011532342A JP2011532342A JP2012506458A5 JP 2012506458 A5 JP2012506458 A5 JP 2012506458A5 JP 2011532342 A JP2011532342 A JP 2011532342A JP 2011532342 A JP2011532342 A JP 2011532342A JP 2012506458 A5 JP2012506458 A5 JP 2012506458A5
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JP
Japan
Prior art keywords
compound
agent
cfhcf
liquid
ocf
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2011532342A
Other languages
English (en)
Japanese (ja)
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JP2012506458A (ja
Filing date
Publication date
Priority claimed from US12/254,954 external-priority patent/US8022107B2/en
Application filed filed Critical
Publication of JP2012506458A publication Critical patent/JP2012506458A/ja
Publication of JP2012506458A5 publication Critical patent/JP2012506458A5/ja
Pending legal-status Critical Current

Links

JP2011532342A 2008-10-21 2009-10-21 フッ化ポリオキシアルキレングリコールジエステル界面活性剤 Pending JP2012506458A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/254,954 US8022107B2 (en) 2008-10-21 2008-10-21 Fluorinated polyoxyalkylene glycol diester surfactants
US12/254,954 2008-10-21
PCT/US2009/061413 WO2010048246A2 (en) 2008-10-21 2009-10-21 Fluorinated polyoxyalkylene glycol diester surfactants

Publications (2)

Publication Number Publication Date
JP2012506458A JP2012506458A (ja) 2012-03-15
JP2012506458A5 true JP2012506458A5 (OSRAM) 2012-12-06

Family

ID=41666418

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011532342A Pending JP2012506458A (ja) 2008-10-21 2009-10-21 フッ化ポリオキシアルキレングリコールジエステル界面活性剤

Country Status (8)

Country Link
US (1) US8022107B2 (OSRAM)
EP (1) EP2337804B1 (OSRAM)
JP (1) JP2012506458A (OSRAM)
KR (1) KR20110073602A (OSRAM)
CN (1) CN102203144A (OSRAM)
AU (1) AU2009307695B2 (OSRAM)
CA (1) CA2736387A1 (OSRAM)
WO (1) WO2010048246A2 (OSRAM)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1914211A1 (en) * 2006-10-10 2008-04-23 Lafarge Cement shrinkage reducing agent and method for obtaining cement based articles having reduced shrinkage
KR101639586B1 (ko) * 2013-03-06 2016-07-14 유니마테크 가부시키가이샤 함불소 칼슘 컴퍼지트 입자, 그 제조법 및 그것을 유효 성분으로 하는 표면 처리제
EP3295496B1 (en) 2015-05-08 2020-07-15 Celgard LLC Improved, coated or treated microporous battery separators, rechargeable lithium batteries, systems, and related methods of manufacture and/or use
US20170066208A1 (en) 2015-09-08 2017-03-09 Canon Kabushiki Kaisha Substrate pretreatment for reducing fill time in nanoimprint lithography
US10488753B2 (en) 2015-09-08 2019-11-26 Canon Kabushiki Kaisha Substrate pretreatment and etch uniformity in nanoimprint lithography
EP3423534B1 (en) * 2016-03-03 2020-05-20 The Chemours Company FC, LLC Fluorinated ester compound additives for architectural coatings
US10134588B2 (en) * 2016-03-31 2018-11-20 Canon Kabushiki Kaisha Imprint resist and substrate pretreatment for reducing fill time in nanoimprint lithography
US10095106B2 (en) 2016-03-31 2018-10-09 Canon Kabushiki Kaisha Removing substrate pretreatment compositions in nanoimprint lithography
US10620539B2 (en) 2016-03-31 2020-04-14 Canon Kabushiki Kaisha Curing substrate pretreatment compositions in nanoimprint lithography
GB201609437D0 (en) * 2016-05-27 2016-07-13 Sphere Fluidics Ltd Surfactants
US10509313B2 (en) 2016-06-28 2019-12-17 Canon Kabushiki Kaisha Imprint resist with fluorinated photoinitiator and substrate pretreatment for reducing fill time in nanoimprint lithography
US10317793B2 (en) 2017-03-03 2019-06-11 Canon Kabushiki Kaisha Substrate pretreatment compositions for nanoimprint lithography
JP7165017B2 (ja) * 2018-10-03 2022-11-02 三菱マテリアル電子化成株式会社 ペルフルオロエーテル含有化合物及びノニオン系含フッ素界面活性剤
EP3950772A1 (en) * 2020-08-05 2022-02-09 Emulseo SAS Novel fluorosurfactants and uses thereof in microfluidics
JP7599197B2 (ja) * 2020-08-31 2024-12-13 国立研究開発法人産業技術総合研究所 ポリバレントフッ素系界面活性剤
US12436088B2 (en) 2020-11-03 2025-10-07 Droplet Genomics, Uab Integrated platform for selective microfluidic particle processing
JPWO2022138511A1 (OSRAM) * 2020-12-25 2022-06-30
CN116635359A (zh) * 2020-12-25 2023-08-22 Ａｇｃ株式会社 含氟聚醚化合物的制造方法、含氟二乙烯基聚醚化合物的制造方法及含氟二乙烯基聚醚化合物
WO2025064453A1 (en) * 2023-09-18 2025-03-27 Bio-Rad Laboratories, Inc. Emulsion stabilizing fluorosurfactants with improved manufacturability

Family Cites Families (19)

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Publication number Priority date Publication date Assignee Title
US3231604A (en) 1962-01-23 1966-01-25 Du Pont Polyethylene oxide and polypropylene oxide perfluoroalkyl substituted oxyalkanoates
US4079084A (en) 1972-03-15 1978-03-14 Imperial Chemical Industries Limited Fluorocarbon surfactants
CA1023768A (en) 1972-12-21 1978-01-03 Horst Jager Polyfluoroalkyl iodides, process for their manufacture, and their use
US3929873A (en) 1973-10-23 1975-12-30 Eastman Kodak Co Oxidation of polyethylene glycols to dicarboxylic acids
SU566829A1 (ru) 1976-03-17 1977-07-30 Предприятие П/Я А-7850 Полиоксиэтиленгликолевые эфиры фторированных алифатических кислот в качестве поверхностно-активных веществ
DE2656423A1 (de) 1976-12-13 1978-06-15 Hoechst Ag 2.2-dihydroperfluoralkansaeureester von polyglykolen und polyglykolmonoaethern sowie verfahren zu ihrer herstellung
JP3572077B2 (ja) 1993-07-29 2004-09-29 イー・アイ・デユポン・ドウ・ヌムール・アンド・カンパニー ヨウ化パーフルオロアルキル類の製造方法
WO1995011877A1 (fr) 1993-10-27 1995-05-04 Elf Atochem S.A. Alcools polyfluores et leurs procedes de preparation
US5759968A (en) 1995-09-05 1998-06-02 Hitachi Maxell, Ltd. Lubricating agent and magnetic recording medium comprising the same
JPH10251578A (ja) 1997-03-07 1998-09-22 Ricoh Co Ltd インクジェット用水性インク
JPH10251579A (ja) 1997-03-07 1998-09-22 Ricoh Co Ltd インクジェット用水性インク
US6537662B1 (en) 1999-01-11 2003-03-25 3M Innovative Properties Company Soil-resistant spin finish compositions
DE60311254T2 (de) 2002-05-16 2007-07-19 Daikin Industries, Ltd. Fluor enthaltende wasserlösliche nichtionische tenside, verwendung davon und herstellungsverfahren dafür
JP4368607B2 (ja) 2003-04-01 2009-11-18 パナソニック株式会社 潤滑剤、ならびに磁気記録媒体および磁気記録媒体の製造方法
JP2005215153A (ja) 2004-01-28 2005-08-11 Canon Inc 定着用部材及び定着装置
US7385077B1 (en) 2007-03-27 2008-06-10 E. I. Du Pont De Nemours And Company Fluoroalkyl surfactants
US7737307B2 (en) * 2007-08-06 2010-06-15 E. I. Du Pont De Nemours And Company Fluorinated nonionic surfactants
US7399887B1 (en) 2007-08-06 2008-07-15 E. I. Du Pont De Nemours And Company Fluorinated sulfonate surfactants
US20090110840A1 (en) 2007-10-24 2009-04-30 Peter Michael Murphy Hydrophillic fluorinated soil resist copolymers

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