JP2012243802A5 - - Google Patents

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Publication number
JP2012243802A5
JP2012243802A5 JP2011109448A JP2011109448A JP2012243802A5 JP 2012243802 A5 JP2012243802 A5 JP 2012243802A5 JP 2011109448 A JP2011109448 A JP 2011109448A JP 2011109448 A JP2011109448 A JP 2011109448A JP 2012243802 A5 JP2012243802 A5 JP 2012243802A5
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JP
Japan
Prior art keywords
crossovers
array
charged particle
aperture
openings
Prior art date
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Application number
JP2011109448A
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English (en)
Japanese (ja)
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JP5832141B2 (ja
JP2012243802A (ja
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Publication date
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Priority to JP2011109448A priority Critical patent/JP5832141B2/ja
Priority claimed from JP2011109448A external-priority patent/JP5832141B2/ja
Priority to US13/471,309 priority patent/US8748841B2/en
Priority to TW101117109A priority patent/TWI476807B/zh
Publication of JP2012243802A publication Critical patent/JP2012243802A/ja
Publication of JP2012243802A5 publication Critical patent/JP2012243802A5/ja
Application granted granted Critical
Publication of JP5832141B2 publication Critical patent/JP5832141B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2011109448A 2011-05-16 2011-05-16 描画装置、および、物品の製造方法 Expired - Fee Related JP5832141B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2011109448A JP5832141B2 (ja) 2011-05-16 2011-05-16 描画装置、および、物品の製造方法
US13/471,309 US8748841B2 (en) 2011-05-16 2012-05-14 Drawing apparatus and method of manufacturing article
TW101117109A TWI476807B (zh) 2011-05-16 2012-05-14 繪圖裝置與製造物品之方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011109448A JP5832141B2 (ja) 2011-05-16 2011-05-16 描画装置、および、物品の製造方法

Publications (3)

Publication Number Publication Date
JP2012243802A JP2012243802A (ja) 2012-12-10
JP2012243802A5 true JP2012243802A5 (OSRAM) 2014-07-03
JP5832141B2 JP5832141B2 (ja) 2015-12-16

Family

ID=47175160

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011109448A Expired - Fee Related JP5832141B2 (ja) 2011-05-16 2011-05-16 描画装置、および、物品の製造方法

Country Status (3)

Country Link
US (1) US8748841B2 (OSRAM)
JP (1) JP5832141B2 (OSRAM)
TW (1) TWI476807B (OSRAM)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2007604C2 (en) * 2011-10-14 2013-05-01 Mapper Lithography Ip Bv Charged particle system comprising a manipulator device for manipulation of one or more charged particle beams.
JP5822535B2 (ja) * 2011-05-16 2015-11-24 キヤノン株式会社 描画装置、および、物品の製造方法
TWI477925B (zh) * 2011-10-04 2015-03-21 Nuflare Technology Inc Multi - beam charged particle beam mapping device and multi - beam charged particle beam rendering method
JP2013236053A (ja) * 2012-04-13 2013-11-21 Canon Inc 荷電粒子光学系、描画装置及び物品の製造方法
US8890092B2 (en) * 2013-01-28 2014-11-18 Industry—University Cooperation Foundation Sunmoon University Multi-particle beam column having an electrode layer including an eccentric aperture
JP6193611B2 (ja) 2013-04-30 2017-09-06 キヤノン株式会社 描画装置、及び物品の製造方法
US10230458B2 (en) * 2013-06-10 2019-03-12 Nxp Usa, Inc. Optical die test interface with separate voltages for adjacent electrodes
JP6212299B2 (ja) * 2013-06-26 2017-10-11 キヤノン株式会社 ブランキング装置、描画装置、および物品の製造方法
JP6453072B2 (ja) * 2014-12-22 2019-01-16 株式会社ニューフレアテクノロジー マルチ荷電粒子ビーム描画装置及びマルチ荷電粒子ビーム描画方法
KR20240042242A (ko) 2015-07-22 2024-04-01 에이에스엠엘 네델란즈 비.브이. 복수의 하전 입자 빔을 이용하는 장치
CN113192815B (zh) 2016-01-27 2024-10-29 Asml荷兰有限公司 多个带电粒子束的装置
TWI729368B (zh) * 2017-02-08 2021-06-01 荷蘭商Ａｓｍｌ荷蘭公司 源轉換單元、多射束裝置及組態多射束裝置之方法
TWI787802B (zh) * 2017-02-08 2022-12-21 荷蘭商Ａｓｍｌ荷蘭公司 源轉換單元、多射束裝置及組態多射束裝置之方法
US10768431B2 (en) 2017-12-20 2020-09-08 Aperture In Motion, LLC Light control devices and methods for regional variation of visual information and sampling
EP3576128A1 (en) * 2018-05-28 2019-12-04 ASML Netherlands B.V. Electron beam apparatus, inspection tool and inspection method
JP7192254B2 (ja) * 2018-05-31 2022-12-20 株式会社ニューフレアテクノロジー マルチ荷電粒子ビーム描画装置及びその調整方法
DE102018115012A1 (de) 2018-06-21 2019-12-24 Carl Zeiss Microscopy Gmbh Teilchenstrahlsystem
US11145485B2 (en) * 2018-12-26 2021-10-12 Nuflare Technology, Inc. Multiple electron beams irradiation apparatus
JP7167750B2 (ja) * 2019-02-08 2022-11-09 株式会社ニューフレアテクノロジー 荷電粒子ビーム描画装置及び荷電粒子ビーム描画方法
JP7238672B2 (ja) * 2019-07-25 2023-03-14 株式会社ニューフレアテクノロジー マルチビーム描画方法及びマルチビーム描画装置
KR102733491B1 (ko) * 2019-08-26 2024-11-22 삼성디스플레이 주식회사 레이저 광원 및 레이저 결정화 장치
WO2022058252A1 (en) * 2020-09-17 2022-03-24 Asml Netherlands B.V. Objective lens array assembly, electron-optical system, electron-optical system array, method of focusing, objective lens arrangement
IL303577A (en) * 2020-12-14 2023-08-01 Asml Netherlands Bv Charged particle system, a sample processing method using multiple beams of charged particles
DE102021122388A1 (de) * 2021-08-30 2023-03-02 Carl Zeiss Microscopy Gmbh Teilchenstrahlsäule

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH097538A (ja) * 1995-06-26 1997-01-10 Nippon Telegr & Teleph Corp <Ntt> 荷電ビーム描画装置
US6014200A (en) * 1998-02-24 2000-01-11 Nikon Corporation High throughput electron beam lithography system
US6876619B1 (en) * 1999-07-28 2005-04-05 Koninklijke Philips Electronics N.V. Optical scanning device
TW584901B (en) * 2001-11-30 2004-04-21 Sony Corp Exposure method of using complementary dividing moldboard mask
JP4156862B2 (ja) * 2002-05-10 2008-09-24 株式会社アドバンテスト 電子ビーム露光装置及び電子ビーム処理装置
JP3803105B2 (ja) * 2004-09-07 2006-08-02 株式会社日立ハイテクノロジーズ 電子ビーム応用装置
NL2003304C2 (en) * 2008-08-07 2010-09-14 Ims Nanofabrication Ag Compensation of dose inhomogeneity and image distortion.
US8610082B2 (en) * 2011-03-25 2013-12-17 Canon Kabushiki Kaisha Drawing apparatus and method of manufacturing article

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