JP2012227334A5 - - Google Patents
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- Publication number
- JP2012227334A5 JP2012227334A5 JP2011093099A JP2011093099A JP2012227334A5 JP 2012227334 A5 JP2012227334 A5 JP 2012227334A5 JP 2011093099 A JP2011093099 A JP 2011093099A JP 2011093099 A JP2011093099 A JP 2011093099A JP 2012227334 A5 JP2012227334 A5 JP 2012227334A5
- Authority
- JP
- Japan
- Prior art keywords
- gas
- etching method
- plasma etching
- microwave
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007789 gas Substances 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 7
- 238000001020 plasma etching Methods 0.000 claims description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 6
- 229910052710 silicon Inorganic materials 0.000 claims description 6
- 239000010703 silicon Substances 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims description 6
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 3
- 229910052731 fluorine Inorganic materials 0.000 claims description 3
- 239000011737 fluorine Substances 0.000 claims description 3
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims description 2
- 229910001882 dioxygen Inorganic materials 0.000 claims description 2
- 230000010287 polarization Effects 0.000 claims description 2
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011093099A JP5774356B2 (ja) | 2011-04-19 | 2011-04-19 | プラズマ処理方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011093099A JP5774356B2 (ja) | 2011-04-19 | 2011-04-19 | プラズマ処理方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015132487A Division JP5918886B2 (ja) | 2015-07-01 | 2015-07-01 | プラズマ処理方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012227334A JP2012227334A (ja) | 2012-11-15 |
| JP2012227334A5 true JP2012227334A5 (https=) | 2014-04-24 |
| JP5774356B2 JP5774356B2 (ja) | 2015-09-09 |
Family
ID=47277165
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011093099A Active JP5774356B2 (ja) | 2011-04-19 | 2011-04-19 | プラズマ処理方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5774356B2 (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014216331A (ja) * | 2013-04-22 | 2014-11-17 | 株式会社日立ハイテクノロジーズ | プラズマエッチング方法 |
| JP7218226B2 (ja) * | 2019-03-22 | 2023-02-06 | 株式会社アルバック | プラズマエッチング方法 |
| JP7756056B2 (ja) | 2022-08-25 | 2025-10-17 | 東京エレクトロン株式会社 | エッチング方法及びプラズマ処理装置 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59114798A (ja) * | 1982-12-22 | 1984-07-02 | 島田理化工業株式会社 | マイクロ波プラズマ装置 |
| JPH06163466A (ja) * | 1992-11-26 | 1994-06-10 | Sumitomo Metal Ind Ltd | 薄膜の除去方法 |
| DE19706682C2 (de) * | 1997-02-20 | 1999-01-14 | Bosch Gmbh Robert | Anisotropes fluorbasiertes Plasmaätzverfahren für Silizium |
| JP4593402B2 (ja) * | 2005-08-25 | 2010-12-08 | 株式会社日立ハイテクノロジーズ | エッチング方法およびエッチング装置 |
| JP5172417B2 (ja) * | 2008-03-27 | 2013-03-27 | Ｓｐｐテクノロジーズ株式会社 | シリコン構造体の製造方法及びその製造装置並びにその製造プログラム |
| JP2010050046A (ja) * | 2008-08-25 | 2010-03-04 | Hitachi High-Technologies Corp | プラズマ処理装置 |
| JP5063626B2 (ja) * | 2009-02-19 | 2012-10-31 | 株式会社日立ハイテクノロジーズ | プラズマ処理装置 |
-
2011
- 2011-04-19 JP JP2011093099A patent/JP5774356B2/ja active Active
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