JP2012226316A5 - - Google Patents
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- Publication number
- JP2012226316A5 JP2012226316A5 JP2012061928A JP2012061928A JP2012226316A5 JP 2012226316 A5 JP2012226316 A5 JP 2012226316A5 JP 2012061928 A JP2012061928 A JP 2012061928A JP 2012061928 A JP2012061928 A JP 2012061928A JP 2012226316 A5 JP2012226316 A5 JP 2012226316A5
- Authority
- JP
- Japan
- Prior art keywords
- mask blank
- surface treatment
- thin film
- treatment method
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004381 surface treatment Methods 0.000 claims 22
- 238000000034 method Methods 0.000 claims 19
- 239000010409 thin film Substances 0.000 claims 17
- 239000007788 liquid Substances 0.000 claims 9
- 239000000463 material Substances 0.000 claims 8
- 238000001312 dry etching Methods 0.000 claims 7
- 238000005530 etching Methods 0.000 claims 6
- 239000007789 gas Substances 0.000 claims 5
- 239000003112 inhibitor Substances 0.000 claims 5
- 238000004519 manufacturing process Methods 0.000 claims 5
- 238000004140 cleaning Methods 0.000 claims 4
- 239000010408 film Substances 0.000 claims 4
- 150000002500 ions Chemical class 0.000 claims 4
- 239000000758 substrate Substances 0.000 claims 4
- 229910052715 tantalum Inorganic materials 0.000 claims 3
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 2
- 229910052782 aluminium Inorganic materials 0.000 claims 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 2
- 239000011575 calcium Substances 0.000 claims 2
- 229910052791 calcium Inorganic materials 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 claims 2
- 239000011777 magnesium Substances 0.000 claims 2
- 229910052749 magnesium Inorganic materials 0.000 claims 2
- 239000001301 oxygen Substances 0.000 claims 2
- 229910052760 oxygen Inorganic materials 0.000 claims 2
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims 2
- 229910052710 silicon Inorganic materials 0.000 claims 2
- 239000010703 silicon Substances 0.000 claims 2
- 229910001936 tantalum oxide Inorganic materials 0.000 claims 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims 1
- 239000000460 chlorine Substances 0.000 claims 1
- 229910052801 chlorine Inorganic materials 0.000 claims 1
- 229910052802 copper Inorganic materials 0.000 claims 1
- 239000010949 copper Substances 0.000 claims 1
- 239000008367 deionised water Substances 0.000 claims 1
- 229910021641 deionized water Inorganic materials 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 claims 1
- 239000011737 fluorine Substances 0.000 claims 1
- 229910010272 inorganic material Inorganic materials 0.000 claims 1
- 239000011147 inorganic material Substances 0.000 claims 1
- 229910052742 iron Inorganic materials 0.000 claims 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 claims 1
- 229910052757 nitrogen Inorganic materials 0.000 claims 1
- 239000011368 organic material Substances 0.000 claims 1
- 230000007261 regionalization Effects 0.000 claims 1
- 239000004094 surface-active agent Substances 0.000 claims 1
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012061928A JP5925543B2 (ja) | 2011-04-06 | 2012-03-19 | マスクブランクの表面処理方法、マスクブランクの製造方法、およびマスクの製造方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011084784 | 2011-04-06 | ||
| JP2011084784 | 2011-04-06 | ||
| JP2012061928A JP5925543B2 (ja) | 2011-04-06 | 2012-03-19 | マスクブランクの表面処理方法、マスクブランクの製造方法、およびマスクの製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012226316A JP2012226316A (ja) | 2012-11-15 |
| JP2012226316A5 true JP2012226316A5 (enExample) | 2015-01-15 |
| JP5925543B2 JP5925543B2 (ja) | 2016-05-25 |
Family
ID=47276493
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012061928A Active JP5925543B2 (ja) | 2011-04-06 | 2012-03-19 | マスクブランクの表面処理方法、マスクブランクの製造方法、およびマスクの製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5925543B2 (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20150079502A1 (en) * | 2012-03-14 | 2015-03-19 | Hoya Corporation | Mask blank and method of manufacturing a transfer mask |
| JP6540758B2 (ja) * | 2017-07-31 | 2019-07-10 | 信越化学工業株式会社 | フォトマスクブランク |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0697141A (ja) * | 1992-09-10 | 1994-04-08 | Hitachi Ltd | 電子デバイス洗浄方法および装置並びにこの洗浄方法を用いて洗浄したシリコンウエハ基板あるいはガラス基板を使用して製造した電子デバイスおよび前記使用純水の評価方法 |
| JP2006078825A (ja) * | 2004-09-10 | 2006-03-23 | Shin Etsu Chem Co Ltd | フォトマスクブランクおよびフォトマスクならびにこれらの製造方法 |
| JP4845978B2 (ja) * | 2008-02-27 | 2011-12-28 | Hoya株式会社 | フォトマスクブランクおよびフォトマスク並びにフォトマスクの製造方法 |
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2012
- 2012-03-19 JP JP2012061928A patent/JP5925543B2/ja active Active