JP2012204624A - 描画装置、および、物品の製造方法 - Google Patents

描画装置、および、物品の製造方法 Download PDF

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Publication number
JP2012204624A
JP2012204624A JP2011068014A JP2011068014A JP2012204624A JP 2012204624 A JP2012204624 A JP 2012204624A JP 2011068014 A JP2011068014 A JP 2011068014A JP 2011068014 A JP2011068014 A JP 2011068014A JP 2012204624 A JP2012204624 A JP 2012204624A
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JP
Japan
Prior art keywords
array
aperture
focusing lens
electron beam
optical system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2011068014A
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English (en)
Japanese (ja)
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JP2012204624A5 (enExample
Inventor
Kentaro Sano
健太郎 佐野
Masato Muraki
真人 村木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2011068014A priority Critical patent/JP2012204624A/ja
Priority to TW101109328A priority patent/TW201239943A/zh
Priority to US13/423,960 priority patent/US8610082B2/en
Priority to KR1020120029784A priority patent/KR20120110026A/ko
Publication of JP2012204624A publication Critical patent/JP2012204624A/ja
Publication of JP2012204624A5 publication Critical patent/JP2012204624A5/ja
Pending legal-status Critical Current

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JP2011068014A 2011-03-25 2011-03-25 描画装置、および、物品の製造方法 Pending JP2012204624A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2011068014A JP2012204624A (ja) 2011-03-25 2011-03-25 描画装置、および、物品の製造方法
TW101109328A TW201239943A (en) 2011-03-25 2012-03-19 Drawing apparatus and method of manufacturing article
US13/423,960 US8610082B2 (en) 2011-03-25 2012-03-19 Drawing apparatus and method of manufacturing article
KR1020120029784A KR20120110026A (ko) 2011-03-25 2012-03-23 묘화 장치 및 물품 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011068014A JP2012204624A (ja) 2011-03-25 2011-03-25 描画装置、および、物品の製造方法

Publications (2)

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JP2012204624A true JP2012204624A (ja) 2012-10-22
JP2012204624A5 JP2012204624A5 (enExample) 2014-05-08

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ID=47185262

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JP2011068014A Pending JP2012204624A (ja) 2011-03-25 2011-03-25 描画装置、および、物品の製造方法

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JP (1) JP2012204624A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2023118434A (ja) * 2022-02-15 2023-08-25 株式会社ニューフレアテクノロジー マルチ荷電粒子ビーム装置の光学系調整方法及びプログラム
TWI932818B (zh) 2021-12-23 2026-07-21 荷蘭商Ａｓｍｌ荷蘭公司 電子光學器件、補償子光束特性之變化的方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6031225A (ja) * 1983-08-01 1985-02-18 Nippon Telegr & Teleph Corp <Ntt> 荷電ビ−ム露光装置
JP2002353113A (ja) * 2001-05-25 2002-12-06 Canon Inc 荷電粒子線露光装置及び方法
JP2006080155A (ja) * 2004-09-07 2006-03-23 Hitachi High-Technologies Corp 電子ビーム応用装置
WO2009127658A1 (en) * 2008-04-15 2009-10-22 Mapper Lithography Ip B.V. Projection lens arrangement
JP2010153277A (ja) * 2008-12-26 2010-07-08 Hitachi High-Technologies Corp 荷電粒子線装置及び荷電粒子線装置による画像取得条件決定方法
JP2010171446A (ja) * 2002-10-25 2010-08-05 Mapper Lithography Ip Bv リソグラフィシステム

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6031225A (ja) * 1983-08-01 1985-02-18 Nippon Telegr & Teleph Corp <Ntt> 荷電ビ−ム露光装置
JP2002353113A (ja) * 2001-05-25 2002-12-06 Canon Inc 荷電粒子線露光装置及び方法
JP2010171446A (ja) * 2002-10-25 2010-08-05 Mapper Lithography Ip Bv リソグラフィシステム
JP2006080155A (ja) * 2004-09-07 2006-03-23 Hitachi High-Technologies Corp 電子ビーム応用装置
WO2009127658A1 (en) * 2008-04-15 2009-10-22 Mapper Lithography Ip B.V. Projection lens arrangement
JP2010153277A (ja) * 2008-12-26 2010-07-08 Hitachi High-Technologies Corp 荷電粒子線装置及び荷電粒子線装置による画像取得条件決定方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI932818B (zh) 2021-12-23 2026-07-21 荷蘭商Ａｓｍｌ荷蘭公司 電子光學器件、補償子光束特性之變化的方法
JP2023118434A (ja) * 2022-02-15 2023-08-25 株式会社ニューフレアテクノロジー マルチ荷電粒子ビーム装置の光学系調整方法及びプログラム
JP7726090B2 (ja) 2022-02-15 2025-08-20 株式会社ニューフレアテクノロジー マルチ荷電粒子ビーム装置の光学系調整方法及びプログラム

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