JP2012145908A5 - - Google Patents

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Publication number
JP2012145908A5
JP2012145908A5 JP2011151277A JP2011151277A JP2012145908A5 JP 2012145908 A5 JP2012145908 A5 JP 2012145908A5 JP 2011151277 A JP2011151277 A JP 2011151277A JP 2011151277 A JP2011151277 A JP 2011151277A JP 2012145908 A5 JP2012145908 A5 JP 2012145908A5
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JP
Japan
Prior art keywords
diffraction grating
blazed diffraction
grating
plane
blazed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2011151277A
Other languages
English (en)
Japanese (ja)
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JP5864920B2 (ja
JP2012145908A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP2011151277A external-priority patent/JP5864920B2/ja
Priority to JP2011151277A priority Critical patent/JP5864920B2/ja
Priority to EP13004129.6A priority patent/EP2667228B1/en
Priority to EP11009814.2A priority patent/EP2466346B1/en
Priority to ES11009814T priority patent/ES2427789T3/es
Priority to US13/330,748 priority patent/US9678253B2/en
Publication of JP2012145908A publication Critical patent/JP2012145908A/ja
Publication of JP2012145908A5 publication Critical patent/JP2012145908A5/ja
Publication of JP5864920B2 publication Critical patent/JP5864920B2/ja
Application granted granted Critical
Priority to US15/590,427 priority patent/US10168457B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2011151277A 2010-12-20 2011-07-07 回折格子の製造方法 Active JP5864920B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2011151277A JP5864920B2 (ja) 2010-12-20 2011-07-07 回折格子の製造方法
EP13004129.6A EP2667228B1 (en) 2010-12-20 2011-12-13 Diffraction grating
EP11009814.2A EP2466346B1 (en) 2010-12-20 2011-12-13 Manufacturing method of diffraction grating in CdTe or CdZnTe
ES11009814T ES2427789T3 (es) 2010-12-20 2011-12-13 Método de fabricación de una rejilla de difracción en CdTe o CdZnTe
US13/330,748 US9678253B2 (en) 2010-12-20 2011-12-20 Manufacturing method of diffraction grating
US15/590,427 US10168457B2 (en) 2010-12-20 2017-05-09 Manufacturing method of diffraction grating

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2010282546 2010-12-20
JP2010282546 2010-12-20
JP2011151277A JP5864920B2 (ja) 2010-12-20 2011-07-07 回折格子の製造方法

Publications (3)

Publication Number Publication Date
JP2012145908A JP2012145908A (ja) 2012-08-02
JP2012145908A5 true JP2012145908A5 (enExample) 2014-03-27
JP5864920B2 JP5864920B2 (ja) 2016-02-17

Family

ID=45445703

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011151277A Active JP5864920B2 (ja) 2010-12-20 2011-07-07 回折格子の製造方法

Country Status (4)

Country Link
US (2) US9678253B2 (enExample)
EP (2) EP2667228B1 (enExample)
JP (1) JP5864920B2 (enExample)
ES (1) ES2427789T3 (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5731811B2 (ja) * 2010-12-15 2015-06-10 キヤノン株式会社 ブレーズ型回折格子の製造方法及びそのための型の製造方法
JP6032869B2 (ja) * 2011-03-10 2016-11-30 キヤノン株式会社 ブレーズ型回折格子
JP6049320B2 (ja) * 2012-06-20 2016-12-21 キヤノン株式会社 回折格子および回折格子の製造方法
JP6049319B2 (ja) 2012-06-20 2016-12-21 キヤノン株式会社 回折格子および回折格子の製造方法
JP5972100B2 (ja) * 2012-08-13 2016-08-17 キヤノン株式会社 反射型回折素子
CN103499851B (zh) 2013-09-29 2015-06-10 清华大学深圳研究生院 一种闪耀凹面光栅制作方法
JP2015121605A (ja) * 2013-12-20 2015-07-02 キヤノン株式会社 回折格子および回折格子の製造方法
JP6253724B2 (ja) * 2016-07-08 2017-12-27 キヤノン株式会社 反射型回折素子
CN109407192A (zh) * 2018-11-26 2019-03-01 中国科学院长春光学精密机械与物理研究所 一种光栅刻划机刻线位置测量光路的调整方法及其系统
CN110788710B (zh) * 2019-10-16 2021-02-19 中国电子科技集团公司第十一研究所 一种碲锌镉晶体表面磨抛装置
CN112372036B (zh) * 2020-10-30 2023-05-23 东北林业大学 一种亚波长闪耀光栅结构的加工方法
JP7647481B2 (ja) * 2021-10-05 2025-03-18 日本電気硝子株式会社 イマージョン回折素子
WO2025097039A1 (en) * 2023-11-03 2025-05-08 Applied Materials, Inc. Blazed grating formation by staircase etch

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5946363B2 (ja) * 1979-04-06 1984-11-12 日本電信電話株式会社 平面回折格子の製法
EP0007108B1 (en) * 1978-07-18 1983-04-13 Nippon Telegraph and Telephone Public Corporation A method of manufacturing a diffraction grating structure
US4376663A (en) * 1980-11-18 1983-03-15 The United States Of America As Represented By The Secretary Of The Army Method for growing an epitaxial layer of CdTe on an epitaxial layer of HgCdTe grown on a CdTe substrate
US4475792A (en) * 1982-07-27 1984-10-09 The United States Of America As Represented By The Secretary Of The Navy High resolution diffraction grating
JP2003075622A (ja) * 2001-09-05 2003-03-12 Toshiba Corp 回折格子、回折格子の加工方法及び光学要素
JP5669434B2 (ja) * 2009-05-09 2015-02-12 キヤノン株式会社 回折素子及び回折素子の製造方法及びそれを用いた分光器

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