JP2012113269A - Light irradiation device for exposure apparatus - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a compact light irradiation device for an exposure apparatus and capable of effectively preventing a lamp and a cover glass from being damaged when an impact is acted.SOLUTION: The light irradiation device is provided with plural light sources 73, and a substantially rectangular cassette 81 supporting the plural light sources 73. At the light source 73, absorbing members 88 and 89 are disposed which absorb an impact force applied to the cassette 81 and relax the impact force acting on the light source 73.

Description

  The present invention relates to a light irradiation apparatus for an exposure apparatus, and more particularly, to an exposure apparatus applicable to an exposure apparatus that exposes and transfers a mask pattern of a mask onto a substrate of a large flat panel display such as a liquid crystal display or a plasma display. The present invention relates to a light irradiation apparatus.

  Conventionally, various exposure apparatuses such as a proximity exposure apparatus, a scan exposure apparatus, a projection exposure apparatus, a mirror projection, and a contact type exposure apparatus have been devised as apparatuses for manufacturing a panel such as a color filter of a flat panel display apparatus. For example, in the division sequential proximity exposure apparatus, a mask smaller than the substrate is held on the mask stage, the substrate is held on the work stage and both are placed close to each other, and then the work stage is moved stepwise relative to the mask. By irradiating the substrate with light for pattern exposure from the mask side at each step, a plurality of patterns drawn on the mask are exposed and transferred onto the substrate to produce a plurality of panels on one substrate. In the scanning exposure apparatus, exposure light is irradiated through a mask onto a substrate being conveyed at a constant speed, and a mask pattern is exposed and transferred onto the substrate.

  In recent years, since display devices are gradually becoming larger in size, the exposure device is also required to expand the exposure area, and the output of the light source used must be increased. For this reason, an illumination optical system is known that uses a plurality of light source units (so-called multi-lamps) to increase the output of the entire light source.

  Generally, a light source unit for an exposure apparatus includes an ultra-high pressure mercury lamp and a reflecting mirror that emits light with directivity from the lamp, and the front surface of the lamp is covered with a cover glass such as quartz glass. Protected. However, if an impact is applied to the cover glass or the lamp for some reason, the cover glass may be cracked or the lamp may be damaged.

  Various proposals have been made to protect the lamp from shocks by providing a buffer member, since not only the light source unit for the exposure apparatus but also serious damage to subsequent work if the lamp is damaged (for example, (See Patent Documents 1 and 2.)

  In the vehicle bumper breakage prevention structure described in Patent Document 1, a cushion is disposed behind the ramp at an interval, and the collision energy is absorbed by deformation of the cushion. In addition, the backlight device and the liquid crystal display device described in Patent Document 2 have a plurality of protrusions for holding the distance between the light source and the diffusion plate at a predetermined value or more. A member softer than the material is arranged to suppress damage to the diffusion plate due to vibration or drop impact.

JP-A-6-72264 JP 2008-53176 A

  However, according to the vehicle bumper breakage prevention structure disclosed in Patent Document 1, since the cushion is disposed with a space behind the lamp, when this structure is applied to a multi-lamp for an exposure apparatus, a large space is required. There was a problem that the weight increased. Further, according to the technique of Patent Document 2 in which a soft member is arranged at the tip of the protrusion, since the tip of the protrusion is sharp, a large stress is applied to the lamp holder, and the lamp may be damaged. There was room for.

  The present invention has been made in view of the above-described problems, and an object thereof is to provide a light irradiation apparatus for an exposure apparatus that can effectively prevent damage to a lamp and a cover glass from impact in a small space. It is in.

The above object of the present invention can be achieved by the following constitution.
(1) A plurality of light source units each including a light emitting unit and a reflecting mirror that emits light with directivity emitted from the light emitting unit;
A substantially rectangular cassette to which each of the plurality of light source units can be attached;
A buffer member that is disposed in the light source unit and absorbs an impact force applied to each cassette and relaxes the impact force acting on the light source unit;
A light irradiation apparatus for an exposure apparatus, comprising:
(2) The light irradiation apparatus for an exposure apparatus according to (1), wherein the buffer member is formed in a frame shape and is disposed along the outer peripheral edge on the front surface side of the reflecting mirror.
(3) The cassette is formed of quartz glass, and includes a plurality of cover glasses that transmit light from the light source unit,
The light irradiation apparatus for an exposure apparatus according to (1), wherein another shock-absorbing member is disposed along the outer peripheral edge of the cover glass in the cassette.
(4) The light irradiation apparatus for an exposure apparatus according to (3), wherein the cover glass is provided with an air circulation hole for cooling the light source unit.

  According to the light irradiation apparatus for an exposure apparatus of the present invention, even if an obstacle arranged in the vicinity collides with the light irradiation apparatus, the impact force is absorbed by the buffer member, and a large impact force is applied to the light source unit. Therefore, the light emitting part of the light source part and the cover glass can be prevented from being damaged.

It is a partial exploded view for demonstrating the division | segmentation successive proximity exposure apparatus which concerns on 1st Embodiment of this invention. It is a front view of the division | segmentation successive proximity exposure apparatus shown in FIG. It is sectional drawing of a mask stage. (A) is a front view which shows the light irradiation apparatus of an illumination optical system, (b) is sectional drawing along the IV-IV line of (a), (c) is IV 'of (a). It is sectional drawing along line -IV '. (A) is a front view which shows a cassette, (b) is sectional drawing seen from the V direction of (a), (c) is sectional drawing of the cassette seen from the V 'direction of (a). It is a figure which shows this with an integrator lens. It is an expanded sectional view of the light source part vicinity attached to the cassette. It is a principal part enlarged view which shows the state in which the cassette was attached to the support body. It is the schematic which shows the distance from the output surface of each light source part to the entrance surface of an integrator lens. It is a figure for showing the control composition of each light source part. It is a figure for demonstrating a lifetime detection means. (A), (b) is a figure which shows arrangement | positioning of the light source part attached to a cassette. It is a figure which shows the support body to which the cassette of Fig.11 (a) was attached.

Hereinafter, embodiments of a light irradiation apparatus for an exposure apparatus according to the present invention will be described in detail with reference to the drawings.
First, a divided sequential proximity exposure apparatus to which the light irradiation apparatus for an exposure apparatus of this embodiment is applied will be described. As shown in FIGS. 1 and 2, the division sequential proximity exposure apparatus PE of the present embodiment includes a mask stage 10 that holds a mask M, a substrate stage 20 that holds a glass substrate (material to be exposed) W, and pattern exposure. And an illumination optical system 70 for irradiating light.

  A glass substrate W (hereinafter simply referred to as “substrate W”) is disposed to face the mask M, and a surface (on the opposite surface side of the mask M) for exposing and transferring a pattern drawn on the mask M. A photosensitive agent is applied to the surface.

  The mask stage 10 is a mask stage base 11 in which a rectangular opening 11a is formed at the center, and a mask holding part that is mounted on the opening 11a of the mask stage base 11 so as to be movable in the X axis, Y axis, and θ directions. A mask holding frame 12 and a mask driving mechanism 16 that is provided on the upper surface of the mask stage base 11 and adjusts the position of the mask M by moving the mask holding frame 12 in the X axis, Y axis, and θ directions. .

  The mask stage base 11 is supported by a column 51 standing on the apparatus base 50 and a Z-axis moving device 52 provided at the upper end of the column 51 so as to be movable in the Z-axis direction (see FIG. 2). It is arranged above the stage 20.

  As shown in FIG. 3, a plurality of planar bearings 13 are arranged on the upper surface of the peripheral edge of the opening 11a of the mask stage base 11, and the mask holding frame 12 has a flange 12a provided at the outer peripheral edge of the upper end. It is mounted on the flat bearing 13. As a result, the mask holding frame 12 is inserted into the opening 11a of the mask stage base 11 through a predetermined gap, so that the mask holding frame 12 can move in the X axis, Y axis, and θ directions by the gap.

  A chuck portion 14 that holds the mask M is fixed to the lower surface of the mask holding frame 12 via a spacer 15. The chuck portion 14 is provided with a plurality of suction nozzles 14a for sucking the peripheral portion of the mask M on which the mask pattern is not drawn, and the mask M is not shown in the drawing through the suction nozzle 14a. It is detachably held on the chuck portion 14 by the apparatus. The chuck portion 14 can move in the X axis, Y axis, and θ directions with respect to the mask stage base 11 together with the mask holding frame 12.

  The mask driving mechanism 16 includes two Y-axis direction driving devices 16y attached to one side along the X-axis direction of the mask holding frame 12, and one X-axis attached to one side along the Y-axis direction of the mask holding frame 12. Direction drive device 16x.

  The Y-axis direction driving device 16y is installed on the mask stage base 11, and has a driving actuator (for example, an electric actuator) 16a having a rod 16b that expands and contracts in the Y-axis direction, and a pin support mechanism 16c at the tip of the rod 16b. And a guide rail 16e attached to a side portion of the mask holding frame 12 along the X-axis direction and movably attached to the slider 16d. The X-axis direction drive device 16x has the same configuration as the Y-axis direction drive device 16y.

  In the mask drive mechanism 16, the mask holding frame 12 is moved in the X-axis direction by driving one X-axis direction drive device 16x, and the two Y-axis direction drive devices 16y are driven equally. The mask holding frame 12 is moved in the Y axis direction. In addition, the mask holding frame 12 is moved in the θ direction (rotated about the Z axis) by driving one of the two Y-axis direction driving devices 16y.

  Further, on the upper surface of the mask stage base 11, as shown in FIG. 1, a gap sensor 17 for measuring a gap between the opposing surfaces of the mask M and the substrate W, and a mounting position of the mask M held by the chuck portion 14. And an alignment camera 18 for confirming the above. The gap sensor 17 and the alignment camera 18 are held so as to be movable in the X-axis and Y-axis directions via the moving mechanism 19 and are arranged in the mask holding frame 12.

  On the mask holding frame 12, as shown in FIG. 1, aperture blades 38 are provided at both ends in the X-axis direction of the opening 11a of the mask stage base 11 to shield both ends of the mask M as necessary. It is done. The aperture blade 38 is movable in the X-axis direction by an aperture blade drive mechanism 39 including a motor, a ball screw, a linear guide, and the like, and adjusts the shielding area at both ends of the mask M. The aperture blades 38 are provided not only at both ends of the opening 11a in the X-axis direction but also at both ends of the opening 11a in the Y-axis direction.

  As shown in FIGS. 1 and 2, the substrate stage 20 includes a substrate holding unit 21 that holds the substrate W, and a substrate that moves the substrate holding unit 21 in the X-axis, Y-axis, and Z-axis directions with respect to the apparatus base 50. Drive mechanism 22. The substrate holding unit 21 detachably holds the substrate W by a vacuum suction mechanism (not shown). The substrate drive mechanism 22 includes a Y-axis table 23, a Y-axis feed mechanism 24, an X-axis table 25, an X-axis feed mechanism 26, and a Z-tilt adjustment mechanism 27 below the substrate holding unit 21.

  As shown in FIG. 2, the Y-axis feed mechanism 24 includes a linear guide 28 and a feed drive mechanism 29, and a slider 30 attached to the back surface of the Y-axis table 23 extends 2 on the apparatus base 50. The Y-axis table 23 is driven along the guide rail 31 by a motor 32 and a ball screw device 33 while straddling the guide rail 31 through a rolling element (not shown).

  The X-axis feed mechanism 26 has the same configuration as the Y-axis feed mechanism 24 and drives the X-axis table 25 in the X direction with respect to the Y-axis table 23. Further, the Z-tilt adjustment mechanism 27 has one movable wedge mechanism formed by combining the wedge-shaped moving bodies 34 and 35 and the feed drive mechanism 36 at one end side in the X direction and two at the other end side. Consists of. The feed drive mechanisms 29 and 36 may be a combination of a motor and a ball screw device, or may be a linear motor having a stator and a mover. Further, the number of Z-tilt adjustment mechanisms 27 installed is arbitrary.

  Thereby, the substrate driving mechanism 22 feeds and drives the substrate holding unit 21 in the X direction and the Y direction, and moves the substrate holding unit 21 to Z so as to finely adjust the gap between the opposing surfaces of the mask M and the substrate W. Fine movement and tilt adjustment in the axial direction.

  Bar mirrors 61 and 62 are respectively attached to the X-direction side and Y-direction side of the substrate holding unit 21, and a total of three laser interferometers are installed at the Y-direction end and the X-direction end of the apparatus base 50. 63, 64, 65 are provided. As a result, the laser light is applied to the bar mirrors 61 and 62 from the laser interferometers 63, 64 and 65, the laser light reflected by the bar mirrors 61 and 62 is received, and the laser light and the laser reflected by the bar mirrors 61 and 62 are received. The position of the substrate stage 20 is detected by measuring interference with light.

  As shown in FIGS. 2 and 4, the illumination optical system 70 includes a light irradiation device 80 including a plurality of light source units 73, an integrator lens 74 into which light beams emitted from the plurality of light source units 73 are incident, An optical control unit 76 capable of voltage control including switching on and off of the lamp 71 of the light source unit 73, a concave mirror 77 that changes the direction of the optical path emitted from the exit surface of the integrator lens 74, a plurality of light source units 73, and an integrator An exposure control shutter 78 that is disposed between the lens 74 and controls the opening and closing so as to transmit and block the irradiated light. A DUV cut filter, a polarization filter, and a band pass filter may be disposed between the integrator lens 74 and the exposure surface. The concave mirror 77 has a mirror whose curvature can be changed manually or automatically. A clearance angle correction unit may be provided.

  As shown in FIGS. 4 to 6, the light irradiation device 80 includes an ultrahigh pressure mercury lamp 71 as a light emitting unit and a reflecting mirror as a reflecting optical system that emits light with directivity emitted from the lamp 71. 72, a plurality of light source units 73 including a plurality of light source units 73, a plurality of cassettes 81 to which a predetermined number of light source units 73 can be respectively mounted, and a support body 82 to which a plurality of cassettes 81 can be mounted. . As the light emitting unit, an LED may be applied instead of the ultrahigh pressure mercury lamp 71.

  In the illumination optical system 70, when a 160 W ultrahigh pressure mercury lamp 71 is used, an exposure apparatus that manufactures a 6th generation flat panel has 374 light source units, and an exposure apparatus that manufactures a 7th generation flat panel. In an exposure apparatus that manufactures 572 light source units and 8th generation flat panels, 774 light source units are required. However, in this embodiment, in order to simplify the description, as shown in FIG. 4, the cassette 81 to which a total of six light source sections 73 in three rows in the α direction and two rows in the β direction are attached is arranged in three rows × A description will be given on the assumption that 54 light source sections 73 are arranged in a total of nine rows in three rows. In the light source unit 73 of the present embodiment, the opening 72a of the reflecting mirror 72 is formed in a substantially square shape, and the four sides are arranged along the α and β directions.

  Each cassette 81 includes a light source support unit 83 that supports a predetermined number of light source units 73, and a concave lamp pressing cover 84 that is attached to the light source support unit 83 by pressing the light source unit 73 supported by the light source support unit 83. Are formed in a substantially rectangular parallelepiped shape having the same configuration.

  The light source support portion 83 is provided corresponding to the number of the light source portions 73 and is provided on the cover side of the window portions 83 a that emit light from the light source portion 73. A lamp recess 83b that surrounds the opening 72a (or the opening of the reflecting mirror mounting portion to which the reflecting mirror 72 is mounted) is formed. A plurality of cover glasses 85 are attached to the window 83a on the side opposite to the cover.

  A buffer member 88 is attached to the front outer peripheral edge 72d of the reflecting mirror 72 so as to cover a part of the front surface and the side surface of the front outer peripheral edge 72d. The buffer member 88 is formed in a substantially square frame shape having a substantially L-shaped cross section by an elastic material such as rubber. The light source support 83 of the cassette 81 is mounted with another buffer member 89 formed in a substantially annular shape by an elastic material along the outer peripheral edge 85 b of the cover glass 85. The mounting of the buffer members 88 and 89 to the reflecting mirror 72 and the cover glass 85 may be a fitting type or a screwing type. In addition, attachment of the cover glass 85 is arbitrary and does not need to be provided.

  The bottom surface of each lamp recess 83b has intersections p between the irradiation surface (here, the opening surface 72b of the reflecting mirror 72) that irradiates light from the light source unit 73 and the optical axis L of the light source unit 73, respectively, α and β. A single curved surface in the direction, for example, a flat surface or a curved surface (in this embodiment, a flat surface) is formed so as to be positioned on the spherical surface r.

  A contact portion 86 that contacts the rear portion of the light source portion 73 is provided on the bottom surface of the lamp pressing cover 84. Each contact portion 86 is provided with an actuator such as a motor or a cylinder, a spring press, screwing, or the like. A configured lamp holding mechanism 87 is provided. Thereby, each light source part 73 fits the opening 72a of the reflecting mirror 72 into the lamp recess 83b of the light source support part 83 via the buffer member 88, attaches the lamp pressing cover 84 to the light source support part 83, and the lamp. The cassette 81 is positioned by pressing the rear portion of the light source unit 73 with the pressing mechanism 87.

  Therefore, as shown in FIG. 5C, the integrator lens 74 on which the light of the predetermined number of light source units 73 is incident from each irradiation surface irradiated with the light of the predetermined number of light source units 73 positioned on the cassette 81. The distance of each optical axis L to the incident surface is substantially constant. Further, in the storage space between the light source support portion 83 and the lamp pressing cover 84, the back surface 72c of the reflecting mirror 72 of the adjacent light source portion 73 is directly opposed, and other than the light source portion 73, the lamp pressing mechanism 87, and the like. Does not block the flow of air in the storage space, and provides good air fluidity.

  As shown in FIG. 4, the support 82 has a support body 91 having a plurality of cassette mounting portions 90 to which a plurality of cassettes 81 are mounted, and is attached to the support body 91 and covers the rear part of each cassette 81. A support cover 92.

  As shown in FIG. 7, each cassette mounting portion 90 is formed with an opening 90a facing the light source support portion 83, and a plane around which the rectangular plane around the light source support portion 83 faces around the opening 90a. A concave portion for cassette (a cutout having an L-shaped cross section) 90c having a bottom surface 90b is formed. A cassette fixing means 93 for fixing the cassette 81 is provided around the cassette concave portion 90c of the support body 91. In this embodiment, the cassette fixing means 93 is engaged with the concave portion 81a formed in the cassette 81. Then, the cassette 81 is fixed. The cassette fixing means 93 may be an engagement (for example, a claw engagement or a hook engagement) that can be fixed / released at the same time that the cassette 81 is inserted into and removed from the cassette mounting portion 90.

  Each plane 90b of the cassette recesses 90c arranged in the α direction or the β direction has an intersection point p between the irradiation surface that irradiates the light of all the light source parts 73 of each cassette 81 and the optical axis L of the light source part 73. , Β are formed so as to intersect at a predetermined angle γ so as to be positioned on a single curved surface, for example, a spherical surface r (see FIG. 8).

  Therefore, each cassette 81 is engaged with the cassette fixing means 93 in the recess 81a of the cassette 81 in a state where the light source support 83 is fitted and positioned in the cassette recess 90c of each cassette mounting portion 90. Each is fixed to the support 82. Then, a support cover 92 is attached to the support body 91 in a state where each cassette 81 is attached to the support body 91. Therefore, as shown in FIG. 8, each irradiation surface irradiated with the light of all the light source units 73 positioned in each cassette 81 and the incident surface of the integrator lens 74 on which the light of a predetermined number of light source units 73 is incident. The distance of each optical axis L is also substantially constant.

  In addition, each light source unit 73, each cassette 81, and support 82 of the light irradiation device 80 is provided with a cooling structure for cooling each lamp 71. Specifically, as shown in FIG. 6, a cooling path 75 a is formed in the base member 75 to which the lamp 71 and the reflecting mirror 72 of each light source unit 73 are attached, and each cover glass 85 of the cassette 81 includes A through hole 85a which is one or a plurality of air circulation holes is formed. In addition, a plurality of exhaust holes (communication holes) 84a are formed on the bottom surface of the lamp pressing cover 84 of the cassette 81 (see FIG. 7), and the support cover 92 of the support 82 also has a plurality of exhaust holes 92a. It is formed (see FIG. 4C). Further, a blower unit (forced exhaust means) 79 formed outside the support 82 is connected to each exhaust hole 92a via an exhaust pipe 79a.

  Therefore, by pulling and exhausting the air in the support 82 by the blower unit 79, the external air sucked from the through hole 85a of the cover glass 85 is moved between the lamp 71 and the reflecting mirror 72 in the direction indicated by the arrow. It passes through the gap s between them and is guided to a cooling path 75 a formed in the base member 75 of the light source unit 73. Each air source 73 is cooled by this air.

  Note that the forced exhaust means is not limited to the blower unit 79 and may be any means that draws air in the support 82 such as a fan, an inverter, a vacuum pump, or the like. Further, the air exhaust by the blower unit 79 is not limited to the rear side, but may be from any side of the upper side, the lower side, the left side, and the right side.

  Furthermore, as shown in FIG. 4, a water cooling pipe (cooling pipe) 91a is provided on the periphery of the support body 91, and each light source unit 73 can be provided by circulating cooling water in the water cooling pipe 91a by the water pump 69. It is cooling. The water cooling tube 91a may be formed in the support body 91 or attached to the surface of the support body 91. Further, only one of the exhaust cooling structure and the water cooling cooling structure may be provided. Further, the water-cooled pipes 91a are not limited to the arrangement shown in FIG. 4, and the water-cooled pipes 91a are arranged so as to pass around all the cassettes 81, or a part of the circumference of all the cassettes 81 is arranged. The cooling water may be circulated in a zigzag so as to pass.

  Further, as shown in FIG. 9, a lighting power source 95 and a control circuit 96 for supplying power to the lamp 71 are individually connected to the light source unit 73 of each cassette 81, and each extending backward from each light source unit 73. The wiring 97 is connected to and integrated with at least one connector 98 provided in each cassette 81. The connector 98 of each cassette 81 and the optical control unit 76 provided outside the support 82 are connected by another wiring 99, respectively. As a result, the optical control unit 76 transmits a control signal to the control circuit 96 of each lamp 71 and performs voltage control for adjusting the voltage including turning on and off the lamp 71.

  Note that the lighting power supply 95 and the control circuit 96 of each light source unit 73 may be provided collectively in the cassette 81 or may be provided outside the cassette. Further, the contact portion 86 of the lamp pressing cover 84 is formed so as not to interfere with each wiring 97 from each light source portion 73.

  Further, as shown in FIG. 10, a life time detecting means 94 including a fuse 94a is provided for each lamp 71, the lighting time is counted by the timer 96a, and a current is supplied to the fuse 94a when the rated life time has come. Then, the fuse 94a is cut. Therefore, by checking whether or not the fuse 94a is cut, it is possible to detect whether the lamp 71 has been used for the rated lifetime. The lifetime detecting means 94 is not limited to the one including the fuse 94a, and may be any device that can recognize the rated lifetime of the lamp 71 at a glance at the time of lamp replacement maintenance. For example, an IC tag may be arranged for each lamp 71 so that the IC tag can be used to check whether the lamp 71 has been used for a rated lifetime, or the usage time of the lamp 71 can be checked.

  In FIG. 10, the lighting power source 95 and the control circuit 96 are provided for each light source unit 73, but one light source unit 73 is provided for each of the plurality of light source units 73, and a predetermined number of light source units 73 in the cassette 81 are collected. May be managed.

  In the above embodiment, in order to simplify the description, a cassette 81 having a total of six light source sections 73 attached in three rows in the α direction and two rows in the β direction has been described as an example. Eight or more light source parts 73 are arranged in 81, and are attached to the cassette 81 with point symmetry or line symmetry with an arrangement as shown in FIGS. 11 (a) and 11 (b). That is, light sources 73 are arranged in different numbers in the α direction and the β direction, and a line connecting the centers of the light sources 73 located on the outermost periphery attached to the light source support 83 of the cassette 81 with four sides is rectangular. Make. Further, the cassette mounting portion 90 of the support 82 to which each cassette 81 is mounted matches the number n (n: a positive integer of 2 or more) arranged in the α and β directions orthogonal to each other as shown in FIG. And formed into a rectangular shape. Here, this rectangular shape is most efficient when the number of rows and columns of the cassette is the same as the number of rows and columns of the cassette element.

  Here, the aspect ratio (length / width ratio) of each lens element of the integrator lens 74 is determined corresponding to the aspect ratio of the area of the exposure region. In addition, each lens element of the integrator lens has a structure incapable of capturing light incident from an angle greater than the incident aperture angle. That is, the lens element has a smaller incident aperture angle on the short side than on the long side. For this reason, the aspect ratio (length / width ratio) of the entire light source unit 73 disposed on the support 82 is set to a rectangular shape corresponding to the aspect ratio of the incident surface of the integrator lens 74, so that the light use efficiency is increased. Becomes better.

  In the exposure apparatus PE configured as described above, when the exposure control shutter 78 is controlled to be opened during exposure in the illumination optical system 70, the light emitted from the ultrahigh pressure mercury lamp 71 is incident on the incident surface of the integrator lens 74. Incident. The light emitted from the exit surface of the integrator lens 74 is changed in its traveling direction by the concave mirror 77 and converted into parallel light. The parallel light is irradiated as pattern exposure light substantially perpendicularly to the surface of the mask M held on the mask stage 10 and the surface of the substrate W held on the substrate stage 20. Is transferred onto the substrate W by exposure.

  As described above, according to the light irradiation device 80 for an exposure apparatus of this embodiment, the buffer member 88 that absorbs the impact force applied to the support 82 and reduces the impact force that acts on the light source unit 73 is provided on the light source unit 73. Since the other buffer member 89 is arranged on the cover glass 85 in the reflecting mirror 72, even if an obstacle arranged in the vicinity collides with the light irradiation device 80, the impact force is applied to each buffer member 88. , 89 and a large impact force is prevented from acting on the light source unit 73, and damage to the lamp 71 and the cover glass 85 can be prevented.

Since the buffer member 88 is formed in a frame shape, it can be easily and reliably disposed along the front-side outer peripheral edge 72d of the reflecting mirror 72. Further, since the other buffer member 89 is formed in an annular shape, it can be easily and surely disposed along the outer peripheral edge 85b of the cover glass 85, and further from the outer peripheral edge 85b of the cover glass 85 to the outside. The light that leaks into the light can be prevented, and the illuminance is improved compared to the case where the buffer member 89 is not provided.
Further, the material of each of the buffer members 88 and 89 is not limited to an elastic material, and may be any metal material or non-metal material as long as it can absorb an impact force.

  Note that the present invention is not limited to the above-described embodiments and examples, and modifications, improvements, and the like can be made as appropriate.

  For example, the lamp pressing cover 84 of the present embodiment has a concave box shape, but is not limited thereto, and may be, for example, a mesh shape as long as the light source portion can be positioned and fixed by the contact portion. . Further, when each light source unit 73 is fitted and fixed to the light source support unit 83, the lamp pressing cover 84 may be omitted. Also, the shape of the support cover 92 can be arbitrarily designed according to the arrangement of the illumination optical system 70.

  Further, the number of light source parts 73 arranged in the cassette 81 is eight or more, and the total number of light source parts arranged in the support 82 is eight to about 800. If it is about 800, practicality and efficiency are improved. Furthermore, the number of cassettes 81 mounted on the support 82 is preferably 5% or less of the total number of light source units 73. In this case, the number of light source units 73 arranged in one cassette 81 is small. 5% or more.

  Further, for example, in the above-described embodiment, the divided sequential proximity exposure apparatus is described as the exposure apparatus, but the present invention is not limited to this, and the present invention is a scanning proximity exposure apparatus, a mirror projection exposure apparatus, a lens projection exposure apparatus, The present invention can also be applied to a contact type exposure apparatus. Further, the present invention can be applied to any exposure apparatus such as a batch type, a sequential type, and a scanning type.

71 Super high pressure mercury lamp (light emitting part)
72 Reflecting mirror 72d Front side outer periphery 73 Light source 80 Light exposure device 81 for exposure apparatus Cassette 85 Cover glass 85a Through hole (air circulation hole)
85b Outer peripheral edge 88 Buffer member 89 Other buffer member

Claims (4)

A plurality of light source units each including a light emitting unit and a reflecting mirror that emits light with directivity emitted from the light emitting unit;
A substantially rectangular cassette to which each of the plurality of light source units can be attached;
A buffer member that is disposed in the light source unit and absorbs an impact force applied to each cassette and relaxes the impact force acting on the light source unit;
A light irradiation apparatus for an exposure apparatus, comprising:   2. The light irradiation apparatus for an exposure apparatus according to claim 1, wherein the buffer member is formed in a frame shape and is disposed along the outer peripheral edge on the front surface side of the reflecting mirror. The cassette is formed of quartz glass, and includes a plurality of cover glasses that transmit light from the light source unit,
The light irradiation apparatus for an exposure apparatus according to claim 1, wherein another shock-absorbing member is disposed along the outer peripheral edge of the cover glass in the cassette. The light irradiation apparatus for an exposure apparatus according to claim 3, wherein the cover glass is provided with an air circulation hole for cooling the light source unit.

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