JP2012099816A5 - - Google Patents

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Publication number
JP2012099816A5
JP2012099816A5 JP2011236199A JP2011236199A JP2012099816A5 JP 2012099816 A5 JP2012099816 A5 JP 2012099816A5 JP 2011236199 A JP2011236199 A JP 2011236199A JP 2011236199 A JP2011236199 A JP 2011236199A JP 2012099816 A5 JP2012099816 A5 JP 2012099816A5
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JP
Japan
Prior art keywords
layer
tunnel junction
magnetic tunnel
ferromagnetic
junction cell
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2011236199A
Other languages
English (en)
Japanese (ja)
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JP2012099816A (ja
Filing date
Publication date
Priority claimed from US12/916,738 external-priority patent/US20120104522A1/en
Application filed filed Critical
Publication of JP2012099816A publication Critical patent/JP2012099816A/ja
Publication of JP2012099816A5 publication Critical patent/JP2012099816A5/ja
Pending legal-status Critical Current

Links

JP2011236199A 2010-11-01 2011-10-27 磁気トンネル接合セル、装置、およびメモリアレイ Pending JP2012099816A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/916,738 2010-11-01
US12/916,738 US20120104522A1 (en) 2010-11-01 2010-11-01 Magnetic tunnel junction cells having perpendicular anisotropy and enhancement layer

Publications (2)

Publication Number Publication Date
JP2012099816A JP2012099816A (ja) 2012-05-24
JP2012099816A5 true JP2012099816A5 (enExample) 2012-07-05

Family

ID=45995736

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011236199A Pending JP2012099816A (ja) 2010-11-01 2011-10-27 磁気トンネル接合セル、装置、およびメモリアレイ

Country Status (4)

Country Link
US (1) US20120104522A1 (enExample)
JP (1) JP2012099816A (enExample)
KR (1) KR20120046085A (enExample)
CN (1) CN102456830A (enExample)

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JP2012238631A (ja) * 2011-05-10 2012-12-06 Sony Corp 記憶素子、記憶装置
US9214624B2 (en) 2012-07-27 2015-12-15 Qualcomm Incorporated Amorphous spacerlattice spacer for perpendicular MTJs
US8836056B2 (en) * 2012-09-26 2014-09-16 Intel Corporation Perpendicular MTJ stacks with magnetic anisotropy enhancing layer and crystallization barrier layer
US8796796B2 (en) * 2012-12-20 2014-08-05 Samsung Electronics Co., Ltd. Method and system for providing magnetic junctions having improved polarization enhancement and reference layers
US9461242B2 (en) 2013-09-13 2016-10-04 Micron Technology, Inc. Magnetic memory cells, methods of fabrication, semiconductor devices, memory systems, and electronic systems
US9608197B2 (en) 2013-09-18 2017-03-28 Micron Technology, Inc. Memory cells, methods of fabrication, and semiconductor devices
US9306155B2 (en) * 2013-11-11 2016-04-05 Samsung Electronics Co., Ltd. Method and system for providing a bulk perpendicular magnetic anisotropy free layer in a perpendicular magnetic junction usable in spin transfer torque magnetic random access memory applications
US9281466B2 (en) 2014-04-09 2016-03-08 Micron Technology, Inc. Memory cells, semiconductor structures, semiconductor devices, and methods of fabrication
KR101695468B1 (ko) * 2014-07-09 2017-01-13 한국과학기술원 트랜지스터와 결합하여 직접화한 고출력 스핀발진기
US9007725B1 (en) 2014-10-07 2015-04-14 Western Digital (Fremont), Llc Sensor with positive coupling between dual ferromagnetic free layer laminates
US9349945B2 (en) 2014-10-16 2016-05-24 Micron Technology, Inc. Memory cells, semiconductor devices, and methods of fabrication
US10439131B2 (en) 2015-01-15 2019-10-08 Micron Technology, Inc. Methods of forming semiconductor devices including tunnel barrier materials
KR102566954B1 (ko) 2016-08-04 2023-08-16 삼성전자주식회사 자기 메모리 소자 및 그 제조 방법
EP3563432A4 (en) * 2016-12-28 2020-07-08 INTEL Corporation Perpendicular spin transfer torque magnetic mechanism
US9972773B1 (en) * 2017-08-28 2018-05-15 Samsung Electronics Co., Ltd. Method and system for providing magnetic junctions utilizing high crystallization temperature-containing insertion layer(s)
US10665773B2 (en) * 2018-01-26 2020-05-26 Taiwan Semiconductor Manufacturing Company, Ltd. Nitride capping layer for spin torque transfer (STT)-magnetoresistive random access memory (MRAM)
WO2019159154A1 (en) * 2018-02-19 2019-08-22 Bruker France Sas Nuclear spin hyperpolarization in a porous matrix
CN114503296A (zh) * 2019-09-27 2022-05-13 华为技术有限公司 一种mtj单元、vcma驱动方法及mram
CN111261772A (zh) * 2020-02-10 2020-06-09 北京航空航天大学 磁隧道结及其形成方法、磁存储器
EP4362626A1 (en) * 2022-10-31 2024-05-01 Commissariat à l'énergie atomique et aux énergies alternatives Magnetic device and corresponding method

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6034887A (en) * 1998-08-05 2000-03-07 International Business Machines Corporation Non-volatile magnetic memory cell and devices
US20070096229A1 (en) * 2005-10-28 2007-05-03 Masatoshi Yoshikawa Magnetoresistive element and magnetic memory device
US8063459B2 (en) * 2007-02-12 2011-11-22 Avalanche Technologies, Inc. Non-volatile magnetic memory element with graded layer
JP5387908B2 (ja) * 2007-02-23 2014-01-15 日本電気株式会社 磁性体装置及び磁気ランダムアクセスメモリ
JP4738395B2 (ja) * 2007-09-25 2011-08-03 株式会社東芝 磁気抵抗効果素子およびそれを用いた磁気ランダムアクセスメモリ
JP2011175987A (ja) * 2008-05-09 2011-09-08 Fuji Electric Co Ltd スピンバルブ素子および記憶装置
WO2010080542A1 (en) * 2008-12-17 2010-07-15 Yadav Technology, Inc. Spin-transfer torque magnetic random access memory having magnetic tunnel junction with perpendicular magnetic anisotropy
US7936598B2 (en) * 2009-04-28 2011-05-03 Seagate Technology Magnetic stack having assist layer
JP2011138954A (ja) * 2009-12-28 2011-07-14 Canon Anelva Corp 強磁性層の垂直磁化を用いた磁気トンネル接合デバイスの製造方法
US8374048B2 (en) * 2010-08-11 2013-02-12 Grandis, Inc. Method and system for providing magnetic tunneling junction elements having a biaxial anisotropy

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