JP2012083659A - Method for manufacturing glass substrate for electronic device - Google Patents
Method for manufacturing glass substrate for electronic device Download PDFInfo
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- JP2012083659A JP2012083659A JP2010231741A JP2010231741A JP2012083659A JP 2012083659 A JP2012083659 A JP 2012083659A JP 2010231741 A JP2010231741 A JP 2010231741A JP 2010231741 A JP2010231741 A JP 2010231741A JP 2012083659 A JP2012083659 A JP 2012083659A
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/07—Cutting armoured, multi-layered, coated or laminated, glass products
- C03B33/074—Glass products comprising an outer layer or surface coating of non-glass material
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/07—Cutting armoured, multi-layered, coated or laminated, glass products
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
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- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Liquid Crystal (AREA)
- Manufacturing & Machinery (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
Description
本発明は、カバーガラスやタッチパネルを有する電子装置に関し、特に、1枚のガラス母材から多数の完成ガラス基板を効率よく製造できる電子装置用ガラス基板の製造方法に関するものである。 The present invention relates to an electronic device having a cover glass and a touch panel, and more particularly to a method of manufacturing a glass substrate for an electronic device that can efficiently manufacture a large number of completed glass substrates from a single glass base material.
携帯電話機、携帯音楽プレイヤー、携帯型パソコンなど、携帯可能な小型のコンピュータ装置が広く普及しつつある。そして、これらの表示装置を覆うカバーガラスは、単に、電子装置を保護する用途に限定されず、タッチパネルとして付加機能を発揮する場合も多い。 Portable small computer devices such as cellular phones, portable music players, and portable personal computers are becoming widespread. And the cover glass which covers these display apparatuses is not only limited to the use which protects an electronic device, but often exhibits an additional function as a touch panel.
一方、これら携帯用電子装置では、小型化の要請だけでなく、その軽量化の要請が強く、また、激しい価格競争にも晒されている。 On the other hand, these portable electronic devices are strongly demanded not only for miniaturization but also for weight reduction, and are also exposed to intense price competition.
かかる状況下、カバーガラスやタッチパネルを製造するには、1枚のガラス母材から多数の完成ガラス基板を切り出すことが考えられる。ここで、化学研磨によってガラス基板を切り出すことも考えられるが、製造コストを抑制するには、機械的に切断分離する方が有利である。 Under such circumstances, in order to manufacture a cover glass and a touch panel, it is conceivable to cut a large number of completed glass substrates from one glass base material. Here, it is conceivable to cut out the glass substrate by chemical polishing, but it is advantageous to cut and separate mechanically in order to reduce the manufacturing cost.
しかしながら、機械的な切断分離法を採ると、如何に注意してもガラス切断端面からガラスカレットが飛散することが避けられないという問題がある。 However, when the mechanical cutting and separating method is adopted, there is a problem that the glass cullet is unavoidably scattered from the glass cutting end face, no matter what care is taken.
そして、飛散したカレットが一旦ガラス基板に付着すると、洗浄工程では容易には除去できないので、その後、ガラス表面にシート材を貼着する場合には、付着したカレットを手作業で除去しなければならない煩雑さがある。しかも、カレットを除去するべく、スクライバなどを使用すると、ガラス表面に形成されている導電膜などを毀損してしまうおそれもある。 And once the scattered cullet adheres to the glass substrate, it cannot be easily removed in the cleaning process, so when adhering the sheet material to the glass surface, the adhered cullet must be removed manually. There is complexity. In addition, if a scriber or the like is used to remove cullet, the conductive film formed on the glass surface may be damaged.
本発明は、上記の問題点に鑑みてなされたものであって、1枚のガラス母材から多数の完成ガラス基板を効率よく製造できる電子装置用ガラス基板の製造方法を提供することを目的とする。 The present invention has been made in view of the above problems, and an object of the present invention is to provide a method of manufacturing a glass substrate for an electronic device that can efficiently manufacture a large number of finished glass substrates from a single glass base material. To do.
上記の目的を達成するため、本発明に係る電子装置用ガラス基板の製造方法は、複数の使用領域に区分されているガラス基板について、その表裏面の一方又は双方に薄膜層を形成する第1工程と、第1工程を終えたガラス基板を内包するようガラス基板の全体を保護フィルムで覆う第2工程と、前記保護フィルムで覆われた状態で、前記ガラス基板を保護フィルムと共に、複数の使用領域毎に機械的に切断分離する第3工程と、切断分離された個々のガラス基板から保護フィルムを剥離する第4工程と、保護フィルムを剥離したガラス基板について、その表裏面の一方又は双方にシート材を貼着する第5工程と、を有して構成される。 In order to achieve the above object, a method for manufacturing a glass substrate for an electronic device according to the present invention is a first method in which a thin film layer is formed on one or both of the front and back surfaces of a glass substrate divided into a plurality of use regions. A second step of covering the entire glass substrate with a protective film so as to enclose the glass substrate after the step and the first step, and a plurality of uses of the glass substrate together with the protective film in a state covered with the protective film A third step of mechanically cutting and separating each region, a fourth step of peeling the protective film from each cut and separated glass substrate, and one or both of the front and back surfaces of the glass substrate from which the protective film has been peeled off And a fifth step of sticking the sheet material.
薄膜層としては、好適には導電膜を例示することができ、第1工程を終えたガラス基板は、全光線透過率が80%以上の透光性を有するのが好適である。ここで、導電膜は、特に限定されないが、好ましくは、導電性ポリマを塗布して形成される。そして、好ましくは、塗布面の単位面積[cm2]当たり、300Ω〜3000MΩの抵抗率を発揮するよう構成すべきである。また、第1工程を終えたガラス基板の表面鉛筆硬度は、B〜6Hであるべきである。なお、抵抗率が低いほど硬度が低く、低効率が高いほど硬度が高い。 As the thin film layer, a conductive film can be preferably exemplified, and the glass substrate that has finished the first step preferably has translucency with a total light transmittance of 80% or more. Here, the conductive film is not particularly limited, but is preferably formed by applying a conductive polymer. And preferably, it should be comprised so that the resistivity of 300 ohms-3000 Mohm may be exhibited per unit area [cm < 2 >] of an application surface. Moreover, the surface pencil hardness of the glass substrate which finished the 1st process should be B-6H. The lower the resistivity, the lower the hardness, and the higher the efficiency, the higher the hardness.
ここで、導電性ポリマをガラス基板に塗布しても、ガラス基板の平坦度が高いと、十分な接着強度を発揮することができない。そこで、好ましくは、第1工程に先行して、薄膜層を設けるガラス基板の表面を粗面化する表面処理を実行するべきである。表面処理としては、ガラス表面にエッチング液を接触させるのが好適であり、ガラス基板の必要箇所を封止した状態で、ガラス基板をエッチング液に浸漬するのが簡易的である。 Here, even if the conductive polymer is applied to the glass substrate, if the flatness of the glass substrate is high, sufficient adhesive strength cannot be exhibited. Therefore, preferably, prior to the first step, surface treatment for roughening the surface of the glass substrate on which the thin film layer is provided should be performed. As the surface treatment, it is preferable to bring the etching solution into contact with the glass surface, and it is simple to immerse the glass substrate in the etching solution in a state where the necessary portions of the glass substrate are sealed.
導電性の薄膜層を形成する場合には、電子装置を保護する帯電防止の用途からは、ガラス基板の表裏面の双方に形成することが考えられる。しかし、製造コストを考慮すると、使用者に露出する一方面のみに形成するのが好適である。 In the case of forming a conductive thin film layer, it is conceivable that the conductive thin film layer is formed on both the front and back surfaces of the glass substrate from the antistatic application for protecting the electronic device. However, in consideration of manufacturing cost, it is preferable to form only on one side exposed to the user.
本発明の第2工程では、ガラス基板の全体が保護フィルムで覆われるが、単に覆うだけでなく、ガラス基板の全面に保護フィルムを粘着させるのが好適である。このような構成を採ると、その後の第3工程においてガラス基板を機械的に切断しても、ガラスカレットがガラス基板に付着することがなく、第4工程で保護フィルムを剥離するだけで、ガラスカレットを、保護フィルムと共に除去することができる。 In the second step of the present invention, the entire glass substrate is covered with a protective film. However, it is preferable not only to cover the glass substrate but also to adhere the protective film to the entire surface of the glass substrate. By adopting such a configuration, even if the glass substrate is mechanically cut in the subsequent third step, the glass cullet is not attached to the glass substrate, and only the protective film is peeled off in the fourth step. The cullet can be removed along with the protective film.
保護フィルムとガラス基板(正確にはガラス基板の薄膜層)との接着強度は、最適に設定する必要があり、本発明者の検討によれば、保護フィルムの貼付面積25mm×25mmにおける180°方向への剥離試験(剥離速度300mm/min)において、保護フィルムの接着力を、1.5〜3.5[N]に設定すべきことが判明した。 The adhesive strength between the protective film and the glass substrate (more precisely, the thin film layer of the glass substrate) needs to be set optimally. According to the study of the present inventor, the 180 ° direction in the protective film application area of 25 mm × 25 mm In the peeling test (peeling speed 300 mm / min), it was found that the adhesive strength of the protective film should be set to 1.5 to 3.5 [N].
ここで、接着力が強すぎると、第4工程の保護フィルムの剥離時に、ガラス基板の薄膜層が剥がれてしまい、一方、接着力が弱すぎると、第3工程のガラス基板の切断分離時に、保護フィルムが剥がれることで、ガラスカレットなどがガラス基板に付着してしまう。 Here, if the adhesive force is too strong, the thin film layer of the glass substrate is peeled off when the protective film is peeled off in the fourth step, whereas if the adhesive force is too weak, the glass substrate is cut and separated in the third step, A glass cullet etc. will adhere to a glass substrate because a protective film peels.
また、第3工程では、保護フィルムとガラス基板とを一気に切断する必要があるので、保護フィルムのフィルム厚は、10〜50μmの範囲に設定すべきである。また、第3工程では、ロータリーカッタのカッタ刃を回転させてガラス表面を走査して、保護フィルムとガラス基板とを切断するのが好適である。カッタ刃の接触圧力は、第3工程で使用する切断装置の内部機構に基づき、一定圧力に維持されるべきであり、この一定圧力は、7N〜10Nの範囲内の最適値に設定される。 Moreover, since it is necessary to cut | disconnect a protective film and a glass substrate at a stretch at a 3rd process, the film thickness of a protective film should be set to the range of 10-50 micrometers. In the third step, it is preferable to scan the glass surface by rotating the cutter blade of the rotary cutter to cut the protective film and the glass substrate. The contact pressure of the cutter blade should be maintained at a constant pressure based on the internal mechanism of the cutting device used in the third step, and this constant pressure is set to an optimum value within a range of 7N to 10N.
何れにしても、7N〜10N程度の圧力で、ガラス基板と保護フィルムとを容易に切断できるよう、保護フィルムのフィルム厚を、10〜50μmとし、ガラス基板の板厚を1.0mm以下とするのが好適である。 In any case, the thickness of the protective film is set to 10 to 50 μm and the thickness of the glass substrate is set to 1.0 mm or less so that the glass substrate and the protective film can be easily cut at a pressure of about 7N to 10N. Is preferred.
ガラス基板は、単板によるガラス基板でも良いし、2枚のガラス基板を貼合せた貼り合せ基板でも良い。後者の例としては、表示装置を構成するガラス基板を例示することができ、好適には、液晶ディスプレイ用の貼合せガラス基板がこれに該当する。 The glass substrate may be a single glass substrate or a bonded substrate obtained by bonding two glass substrates. As an example of the latter, a glass substrate constituting the display device can be exemplified, and a laminated glass substrate for a liquid crystal display suitably corresponds to this.
そして、液晶ディスプレイ用のガラス基板を製造する場合には、第5工程において、2枚のガラス基板の各表面に、各々、偏光シート材が貼着される。本発明では、第4工程において保護フィルムを剥離すると、自動的にガラスカレットが除去されるので、第4工程に連続して第5工程を設けることができる。 And when manufacturing the glass substrate for liquid crystal displays, a polarizing sheet material is each affixed on each surface of two glass substrates in a 5th process. In this invention, since a glass cullet will be removed automatically when a protective film is peeled in a 4th process, a 5th process can be provided continuously from a 4th process.
なお、第4工程に先行して洗浄工程を設けても良いが、洗浄液に浸漬するウェット洗浄は不要であり、イオンブロワ又は超音波洗浄によるドライ洗浄工程を設けることで足りる。このように本発明では、ウェット洗浄を設けないので、乾燥工程が不要となり、乾燥工程における処理時間の無駄や、乾燥処理における薄膜層の劣化を解消することができる。 Although a cleaning process may be provided prior to the fourth process, wet cleaning immersed in the cleaning liquid is not necessary, and a dry cleaning process using an ion blower or ultrasonic cleaning is sufficient. As described above, in the present invention, since no wet cleaning is provided, a drying process is not required, and waste of processing time in the drying process and deterioration of the thin film layer in the drying process can be solved.
以上説明した本発明の電子装置用ガラス基板の製造方法によれば、1枚のガラス母材から多数の完成ガラス基板を効率よく製造することができる。 According to the method for manufacturing a glass substrate for an electronic device of the present invention described above, a large number of completed glass substrates can be efficiently manufactured from one glass base material.
以下、実施例に基づいて本発明を詳細に説明する。図1は、実施例に係る電子装置用ガラス基板の製造方法を説明するフロー図である。この実施例では、ラミネート加工を終えたガラス基板は、梱包されて別の加工工場に移送され、ガラス基板としては、液晶ディスプレイを構成する貼合せガラス基板を例示するが、何れも、特に限定されるものではない。 Hereinafter, the present invention will be described in detail based on examples. FIG. 1 is a flowchart illustrating a method for manufacturing a glass substrate for an electronic device according to an embodiment. In this embodiment, the laminated glass substrate is packed and transferred to another processing factory. As the glass substrate, a laminated glass substrate constituting a liquid crystal display is exemplified, but both are particularly limited. It is not something.
以下、図1に基づいて説明すると、本実施例では、ガラス母材GLを加工してN×M個の液晶ディスプレイが製造される。すなわち、加工対象のガラス母材GLは、液晶ディスプレイの表示セルCEL・・・CELが、縦横に形成された貼合せガラス基板GLである。この貼合せガラス基板GLは、内面側にカラーフィルタを設けた第1基板G1と、内面側にトランジスタアレイが配置された第2基板G2との間に、液晶が封入されてN×M個の表示セルCELが構成されている。 Hereinafter, with reference to FIG. 1, in this embodiment, N × M liquid crystal displays are manufactured by processing the glass base material GL. That is, the glass base material GL to be processed is a laminated glass substrate GL in which display cells CEL... CEL of a liquid crystal display are formed vertically and horizontally. The laminated glass substrate GL includes N × M pieces of liquid crystal sealed between a first substrate G1 having a color filter on the inner surface side and a second substrate G2 having a transistor array disposed on the inner surface side. A display cell CEL is configured.
貼合せガラス基板GLは、第1基板G1と第2基板G2の周縁を封止した状態で、エッチング液に浸漬され、そのガラス表面が化学研磨される。その結果、ガラス表面が適度に粗面化される(ST1)。また、この化学研磨処理(ST1)によって、貼合せガラス基板GLを適度に薄型化することができる。塗布処理(ST2)に供される貼合せガラス基板GLの板厚は、好ましくは、1.0mm以下であり、より好ましくは、0.5〜0.7mm程度である。 The bonded glass substrate GL is immersed in an etching solution in a state where the peripheral edges of the first substrate G1 and the second substrate G2 are sealed, and the glass surface is chemically polished. As a result, the glass surface is appropriately roughened (ST1). In addition, the bonded glass substrate GL can be appropriately thinned by the chemical polishing treatment (ST1). The thickness of the laminated glass substrate GL provided for the coating treatment (ST2) is preferably 1.0 mm or less, and more preferably about 0.5 to 0.7 mm.
次に、ガラス基板GLの洗浄と封止材の除去処理を終えた貼合せガラス基板GLについて、スリットコータを使用して、第1ガラス基板G1の表面に、導電性ポリマLAYを塗布する(ST2:図2(a)参照)。この実施例では、ポリチオフェン系の導電性ポリマが使用され、ドライ乾燥処理(ST3)を経た乾燥状態において、ガラス基板G1の全光線透過率が80%以上の透光性を有するよう設定されている。また、塗布面の単位面積[cm2]当たり、用途に応じて300Ω〜3000MΩの範囲の最適な抵抗率に設定される。また、乾燥状態のガラス基板G1の表面鉛筆硬度は、抵抗率に対応してB〜6H程度となるよう設定されている。 Next, the conductive polymer LAY is applied to the surface of the first glass substrate G1 using the slit coater for the bonded glass substrate GL that has been subjected to the cleaning of the glass substrate GL and the removal of the sealing material (ST2). : See FIG. 2 (a)). In this embodiment, a polythiophene-based conductive polymer is used, and the total light transmittance of the glass substrate G1 is set to have a light-transmitting property of 80% or more in the dry state after the dry drying process (ST3). . Moreover, per unit area [cm < 2 >] of an application surface is set to the optimal resistivity of the range of 300 (ohm) -3000M (ohm) according to a use. Further, the surface pencil hardness of the glass substrate G1 in a dry state is set to be about B to 6H corresponding to the resistivity.
続いて、貼合せガラス基板GLを、一対の保護フィルムFi1,Fi2を貼着して覆うラミネート加工を実施する(ST4)。なお、ドライ洗浄処理(ST3)とラミネート加工処理(ST4)は、クリーンルームにおいて実施されるのが好適である。保護フィルムの素材は、特に限定されないが、この実施例では、ポリエステルフィルムに、アクリル系粘着剤が塗布されたものが、貼合せガラス基板GLの表裏面に各々貼着される。 Subsequently, the laminated glass substrate GL is laminated to cover the pair of protective films Fi1, Fi2 (ST4). The dry cleaning process (ST3) and the laminating process (ST4) are preferably performed in a clean room. Although the raw material of a protective film is not specifically limited, In this Example, what applied the acrylic adhesive to the polyester film is each affixed on the front and back of the bonding glass substrate GL.
ここで、保護フィルムとガラス基板との接着力が問題となるが、強すぎても弱すぎても問題であり、最適な接着力となる粘着層が形成される。具体的には、保護フィルムFi1がガラス基板G1に粘着された状態で、保護フィルムFi1の貼付面積25mm×25mmにおける180°方向への剥離試験(剥離速度300mm/min)において、保護フィルムの接着力が、1.5〜3.5[N/25mm]の範囲に設定されている。 Here, although the adhesive force between the protective film and the glass substrate is a problem, it is a problem if it is too strong or too weak, and an adhesive layer that provides an optimum adhesive force is formed. Specifically, in the state where the protective film Fi1 is adhered to the glass substrate G1, the adhesive strength of the protective film in the 180 ° direction peeling test (peeling speed 300 mm / min) in the pasting area 25 mm × 25 mm of the protective film Fi1. Is set in the range of 1.5 to 3.5 [N / 25 mm].
また、保護フィルムFi1,Fi2の膜厚は、作業性や防湿性を損なわない範囲で薄いほど好ましく、具体的には、50μm以下であることが好ましく、好適には、膜厚10〜50μmのフィルム材が使用される。なお、10μm未満であると貼着作業が困難化する。 The film thickness of the protective films Fi1 and Fi2 is preferably as thin as possible without impairing workability and moisture resistance. Specifically, the film is preferably 50 μm or less, and preferably a film having a film thickness of 10 to 50 μm. Material is used. If the thickness is less than 10 μm, the sticking operation becomes difficult.
いずれにしても、貼着作業(ST4)が終われば、ラミネート加工を終えた複数枚の貼合せガラス基板を梱包して、他の加工工場に出荷することができる。すなわち、本実施例によれば、傷付き易い導電膜が確実に保護されるので、同一工場で全ての加工処理を終える必要が無くなり、この点も大きな利点となる。なお、同一工場での一貫作業が否定されるものではないことは勿論である。 In any case, when the sticking operation (ST4) is finished, a plurality of laminated glass substrates that have been laminated can be packed and shipped to another processing factory. That is, according to the present embodiment, the conductive film that is easily damaged is reliably protected, so that it is not necessary to finish all the processing processes in the same factory, which is also a great advantage. It goes without saying that consistent work at the same factory is not denied.
この点を踏まえ、ここでは、梱包及び出荷工程を経ることを前提に説明するが、入荷作業を終えた他の加工工場では、ラミネート加工を終えた複数枚の貼合せガラス基板GL,・・・,GLを取り出し、個々の貼合せガラス基板GLについて、その表面側と裏面側にスクライブラインを形成して個々の表示セル領域CELを切り出す(ST5〜ST6)。図2(b)は、縦横に形成されたスクライブラインCUTを図示したものであり、第1面に第1スクライブラインを形成した後、第2面の対応位置に第2スクライブラインを形成することで、貼合せガラス基板GLが保護フィルムFi1,Fi2と共に切断される。 Based on this point, the explanation here is based on the premise that the packing and shipping process is performed. However, in other processing factories that have finished receiving work, a plurality of laminated glass substrates GL,. , GL is taken out, and individual display cell regions CEL are cut out by forming scribe lines on the front and back sides of the individual laminated glass substrates GL (ST5 to ST6). FIG. 2B illustrates the scribe line CUT formed vertically and horizontally. After the first scribe line is formed on the first surface, the second scribe line is formed at the corresponding position on the second surface. Thus, the laminated glass substrate GL is cut together with the protective films Fi1 and Fi2.
なお、本実施例では、ガラス基板GLの板厚が1.0mm以下であって、保護フィルムFi1,Fi2の膜厚が50μm以下であるので、ロータリーカッタのカッタ刃を、8N程度の圧力で保護フィルムFiに押し当てて走査させることで、個々の表示セル領域CELを切り出すことができる。 In this embodiment, since the glass substrate GL has a thickness of 1.0 mm or less and the protective films Fi1 and Fi2 have a thickness of 50 μm or less, the cutter blade of the rotary cutter is protected with a pressure of about 8N. Each display cell region CEL can be cut out by pressing the film Fi and scanning it.
このようにして切断分離処理が終われば、イオンブロア処理を実行する(ST7)。ここで、イオンブロア処理は、ワークCEL(切り出された個々の貼合せガラス基板)に、イオンを吹き付けることで、保護フィルムに帯電しているかもしれない静電気を除電すると共に、埃などの異物を除去する処理である。なお、切断分離処理で仮にガラスカレットが発生し、これが残存したとても、ガラスカレットは保護フィルムに付着しているに過ぎないので何の問題も生じない。 When the cutting and separating process is completed in this way, an ion blower process is executed (ST7). Here, the ion blower process removes static electricity that may have been charged on the protective film by blowing ions onto the workpiece CEL (each cut out laminated glass substrate) and removes foreign matters such as dust. It is a process to remove. It should be noted that a glass cullet is temporarily generated in the cutting and separating process, and the remaining glass cullet is merely attached to the protective film, so that no problem occurs.
イオンブロア処理が終われば、続いて、保護フィルムFi1,Fi2を剥離する(ST8)。この剥離処理は、人為的に実行されるが、保護フィルムFi1の接着強度が適度に設定されているので、特に作業困難性を伴うものではない。 When the ion blower treatment is finished, the protective films Fi1 and Fi2 are subsequently peeled off (ST8). Although this peeling process is performed artificially, since the adhesive strength of the protective film Fi1 is set appropriately, it is not particularly difficult to work.
そして、最後に、ワークCELの表裏面に、偏光シートを各々貼着すれば、液晶ディスプレイが完成する(ST9)。 And finally, if each polarizing sheet is stuck on the front and back surfaces of the work CEL, a liquid crystal display is completed (ST9).
以上、本発明の一実施例について具体的に説明したが、具体的な記載内容は特に本発明を限定するものではない。 As mentioned above, although one Example of this invention was described concretely, the concrete description content does not specifically limit this invention.
ST2 第1工程
ST4 第2工程
ST5〜ST6 第3工程
ST8 第4工程
ST9 第5工程
ST2 First step ST4 Second step ST5 to ST6 Third step ST8 Fourth step ST9 Fifth step
Claims (11)
第1工程を終えたガラス基板を内包するようガラス基板の全体を保護フィルムで覆う第2工程と、
前記保護フィルムで覆われた状態で、前記ガラス基板を保護フィルムと共に、複数の使用領域毎に機械的に切断分離する第3工程と、
切断分離された個々のガラス基板から保護フィルムを剥離する第4工程と、
保護フィルムを剥離したガラス基板について、その表裏面の一方又は双方にシート材を貼着する第5工程と、を有して構成される
電子装置用のガラス基板の製造方法。 For a glass substrate divided into a plurality of use regions, a first step of forming a thin film layer on one or both of the front and back surfaces;
A second step of covering the entire glass substrate with a protective film so as to enclose the glass substrate after the first step;
A third step of mechanically cutting and separating the glass substrate together with the protective film for each of a plurality of use areas in a state covered with the protective film;
A fourth step of peeling the protective film from the individual glass substrates cut and separated;
About the glass substrate which peeled the protective film, The 5th process of sticking a sheet material on the one or both of the front and back surfaces, The manufacturing method of the glass substrate for electronic devices comprised.
The glass substrate which finished the 3rd process is a manufacturing method in any one of Claims 1-10 supplied to a 4th process through the dry cleaning process by an ion blower or ultrasonic cleaning.
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TW100137126A TW201224593A (en) | 2010-10-14 | 2011-10-13 | Method of producing glass substrate for electronic device |
CN2011800589716A CN103370285A (en) | 2010-10-14 | 2011-10-13 | Method of producing glass substrate for electronic device |
PCT/JP2011/073560 WO2012050167A1 (en) | 2010-10-14 | 2011-10-13 | Method of producing glass substrate for electronic device |
KR1020137012417A KR20130086232A (en) | 2010-10-14 | 2011-10-13 | Method of producing glass substrate for electronic device |
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JP2015214468A (en) * | 2014-05-13 | 2015-12-03 | 旭硝子株式会社 | Composite production method and laminate production method |
WO2016021670A1 (en) * | 2014-08-08 | 2016-02-11 | ナガセケムテックス株式会社 | Transparent conductor, liquid crystal display device and method for producing transparent conductor |
JP2016050162A (en) * | 2014-09-02 | 2016-04-11 | 旭硝子株式会社 | Manufacturing method of glass substrate |
WO2016174956A1 (en) * | 2015-04-30 | 2016-11-03 | 日本電気硝子株式会社 | Method for producing flexible laminate |
JP2017141133A (en) * | 2016-02-12 | 2017-08-17 | 三菱ケミカル株式会社 | Method for manufacturing electronic device substrate |
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JP2014108920A (en) * | 2012-12-03 | 2014-06-12 | Taesung Engineering Corp | Processing method of single reinforced glass plate on which cell unit g2 system touch sensors are formed, and production method therefor |
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