JP2012071301A5 - - Google Patents
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- Publication number
- JP2012071301A5 JP2012071301A5 JP2011192410A JP2011192410A JP2012071301A5 JP 2012071301 A5 JP2012071301 A5 JP 2012071301A5 JP 2011192410 A JP2011192410 A JP 2011192410A JP 2011192410 A JP2011192410 A JP 2011192410A JP 2012071301 A5 JP2012071301 A5 JP 2012071301A5
- Authority
- JP
- Japan
- Prior art keywords
- oxide film
- filtration filter
- micropores
- porous body
- mist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000001914 filtration Methods 0.000 claims 10
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims 4
- 239000003595 mist Substances 0.000 claims 4
- 238000004519 manufacturing process Methods 0.000 claims 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims 2
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims 2
- 229910052782 aluminium Inorganic materials 0.000 claims 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 2
- 229910052804 chromium Inorganic materials 0.000 claims 2
- 239000011651 chromium Substances 0.000 claims 2
- 239000013078 crystal Substances 0.000 claims 2
- 238000009826 distribution Methods 0.000 claims 2
- 229910052733 gallium Inorganic materials 0.000 claims 2
- 239000011796 hollow space material Substances 0.000 claims 2
- 229910052738 indium Inorganic materials 0.000 claims 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims 2
- 229910052742 iron Inorganic materials 0.000 claims 2
- 230000001678 irradiating effect Effects 0.000 claims 2
- 229910052749 magnesium Inorganic materials 0.000 claims 2
- 239000011777 magnesium Substances 0.000 claims 2
- 239000000203 mixture Substances 0.000 claims 2
- 229910052710 silicon Inorganic materials 0.000 claims 2
- 239000010703 silicon Substances 0.000 claims 2
- 229910052718 tin Inorganic materials 0.000 claims 2
- 229910052719 titanium Inorganic materials 0.000 claims 2
- 239000010936 titanium Substances 0.000 claims 2
- 229910052720 vanadium Inorganic materials 0.000 claims 2
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims 2
- 229910052726 zirconium Inorganic materials 0.000 claims 2
- 238000005229 chemical vapour deposition Methods 0.000 claims 1
- 238000010276 construction Methods 0.000 claims 1
- 238000000151 deposition Methods 0.000 claims 1
- 230000008021 deposition Effects 0.000 claims 1
- 239000011148 porous material Substances 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011192410A JP5810445B2 (ja) | 2010-09-03 | 2011-09-05 | 多孔質体および濾過フィルタの製造方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010197442 | 2010-09-03 | ||
| JP2010197442 | 2010-09-03 | ||
| JP2011192410A JP5810445B2 (ja) | 2010-09-03 | 2011-09-05 | 多孔質体および濾過フィルタの製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012071301A JP2012071301A (ja) | 2012-04-12 |
| JP2012071301A5 true JP2012071301A5 (enExample) | 2014-10-23 |
| JP5810445B2 JP5810445B2 (ja) | 2015-11-11 |
Family
ID=46167684
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011192410A Active JP5810445B2 (ja) | 2010-09-03 | 2011-09-05 | 多孔質体および濾過フィルタの製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5810445B2 (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5397794B1 (ja) | 2013-06-04 | 2014-01-22 | Ｒｏｃａ株式会社 | 酸化物結晶薄膜の製造方法 |
| JP6233959B2 (ja) * | 2013-10-10 | 2017-11-22 | 株式会社Flosfia | 酸化物結晶薄膜の製造方法 |
| JP6587800B2 (ja) | 2014-12-26 | 2019-10-09 | Ｊｆｅスチール株式会社 | 積層鉄心の製造方法 |
| JP7011119B2 (ja) * | 2017-02-21 | 2022-02-10 | 株式会社 京都モノテック | モノリスフィルタとそれを利用した固体分離装置、および、そのモノリスフィルタ製造方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59102403A (ja) * | 1982-12-01 | 1984-06-13 | Mitsubishi Heavy Ind Ltd | 多孔質隔膜の製造方法 |
| JP2002066278A (ja) * | 2000-08-31 | 2002-03-05 | Japan Science & Technology Corp | 二酸化チタン多孔性膜とそれを用いた水処理方法および水処理装置 |
| JP2007203241A (ja) * | 2006-02-03 | 2007-08-16 | Tottori Univ | 分離膜及びその製造方法並びに物質の分離方法 |
| JP4371427B2 (ja) * | 2007-03-29 | 2009-11-25 | 株式会社ノリタケカンパニーリミテド | 水素ガス分離材製造方法 |
| US20090107330A1 (en) * | 2007-10-30 | 2009-04-30 | Yunfeng Gu | Amorphous silica hybrid membrane structure |
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2011
- 2011-09-05 JP JP2011192410A patent/JP5810445B2/ja active Active
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