JP2011516892A5 - - Google Patents

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Publication number
JP2011516892A5
JP2011516892A5 JP2011504197A JP2011504197A JP2011516892A5 JP 2011516892 A5 JP2011516892 A5 JP 2011516892A5 JP 2011504197 A JP2011504197 A JP 2011504197A JP 2011504197 A JP2011504197 A JP 2011504197A JP 2011516892 A5 JP2011516892 A5 JP 2011516892A5
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Japan
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ray
optical system
source
microfocus
ray irradiation
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JP2011504197A
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Japanese (ja)
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JP2011516892A (ja
JP5531009B2 (ja
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Priority claimed from PCT/US2009/040178 external-priority patent/WO2009126868A1/en
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Publication of JP2011516892A5 publication Critical patent/JP2011516892A5/ja
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JP2011504197A 2008-04-11 2009-04-10 ポリキャピラリ光学系を有するx線発生装置 Active JP5531009B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US4414808P 2008-04-11 2008-04-11
US61/044,148 2008-04-11
PCT/US2009/040178 WO2009126868A1 (en) 2008-04-11 2009-04-10 X-ray generator with polycapillary optic

Publications (3)

Publication Number Publication Date
JP2011516892A JP2011516892A (ja) 2011-05-26
JP2011516892A5 true JP2011516892A5 (https=) 2014-04-10
JP5531009B2 JP5531009B2 (ja) 2014-06-25

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JP2011504197A Active JP5531009B2 (ja) 2008-04-11 2009-04-10 ポリキャピラリ光学系を有するx線発生装置

Country Status (5)

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US (2) US7933383B2 (https=)
EP (1) EP2263238B1 (https=)
JP (1) JP5531009B2 (https=)
CA (1) CA2720776C (https=)
WO (1) WO2009126868A1 (https=)

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WO2009126868A1 (en) * 2008-04-11 2009-10-15 Rigaku Innovative Technologies, Inc. X-ray generator with polycapillary optic
FR2958858B1 (fr) * 2010-04-15 2012-06-29 Joel Kerjean Dispositif de guidage de photons pour appareil de radiotherapie
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US20130182827A1 (en) * 2011-12-02 2013-07-18 Canon Kabushiki Kaisha X-ray waveguide and x-ray waveguide system
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JP5964705B2 (ja) * 2012-09-14 2016-08-03 浜松ホトニクス株式会社 ポリキャピラリレンズ
WO2014045273A1 (en) * 2012-09-24 2014-03-27 Convergent R.N.R Ltd X-ray reflective lens arrangement
CN202905197U (zh) * 2012-10-09 2013-04-24 北京师范大学 用于聚焦同步辐射光源的光学器件
US20140161233A1 (en) * 2012-12-06 2014-06-12 Bruker Axs Gmbh X-ray apparatus with deflectable electron beam
US9846132B2 (en) 2013-10-21 2017-12-19 Kla-Tencor Corporation Small-angle scattering X-ray metrology systems and methods
US9885962B2 (en) * 2013-10-28 2018-02-06 Kla-Tencor Corporation Methods and apparatus for measuring semiconductor device overlay using X-ray metrology
JP6069609B2 (ja) * 2015-03-26 2017-02-01 株式会社リガク 二重湾曲x線集光素子およびその構成体、二重湾曲x線分光素子およびその構成体の製造方法
WO2017051890A1 (ja) * 2015-09-25 2017-03-30 国立大学法人大阪大学 X線顕微鏡
US10677744B1 (en) * 2016-06-03 2020-06-09 U.S. Department Of Energy Multi-cone x-ray imaging Bragg crystal spectrometer
KR102348995B1 (ko) * 2016-07-15 2022-01-10 가부시키가이샤 리가쿠 X선 검사 장치, x선 박막 검사 방법 및 로킹 커브 측정 방법
JP6857400B2 (ja) * 2018-03-01 2021-04-14 株式会社リガク X線発生装置、及びx線分析装置
JP2023539007A (ja) * 2020-07-15 2023-09-13 デンマークス、テクニスケ、ウニベルシテット 実験室ベースの3D走査X線ラウエマイクロ回折システム及び方法(LAB3DμXRD)
CN119738425B (zh) * 2024-12-13 2026-02-17 北京师范大学 一种组合镀膜毛细管x光单色聚焦透镜的分析系统及焦斑大小调节方法

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