JP2011509511A5 - - Google Patents
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- Publication number
- JP2011509511A5 JP2011509511A5 JP2010541818A JP2010541818A JP2011509511A5 JP 2011509511 A5 JP2011509511 A5 JP 2011509511A5 JP 2010541818 A JP2010541818 A JP 2010541818A JP 2010541818 A JP2010541818 A JP 2010541818A JP 2011509511 A5 JP2011509511 A5 JP 2011509511A5
- Authority
- JP
- Japan
- Prior art keywords
- filament
- ion source
- ionization chamber
- source according
- wall
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007789 gas Substances 0.000 claims 5
- 230000001133 acceleration Effects 0.000 claims 1
- 229910052734 helium Inorganic materials 0.000 claims 1
- 239000001307 helium Substances 0.000 claims 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims 1
- 230000008018 melting Effects 0.000 claims 1
- 238000002844 melting Methods 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 229910052754 neon Inorganic materials 0.000 claims 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP0890027.5 | 2008-01-11 | ||
| EP08290027A EP2079096B1 (fr) | 2008-01-11 | 2008-01-11 | Source d'ions à décharge électrique par filament |
| PCT/FR2009/000016 WO2009112667A1 (fr) | 2008-01-11 | 2009-01-08 | Source d'ions à décharge électrique par filament |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011509511A JP2011509511A (ja) | 2011-03-24 |
| JP2011509511A5 true JP2011509511A5 (https=) | 2011-12-15 |
| JP5340308B2 JP5340308B2 (ja) | 2013-11-13 |
Family
ID=39431164
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010541818A Active JP5340308B2 (ja) | 2008-01-11 | 2009-01-08 | フィラメント放電イオン源 |
Country Status (5)
| Country | Link |
|---|---|
| EP (1) | EP2079096B1 (https=) |
| JP (1) | JP5340308B2 (https=) |
| KR (1) | KR20100131978A (https=) |
| AT (1) | ATE554497T1 (https=) |
| TW (1) | TWI445036B (https=) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB0921791D0 (en) * | 2009-12-14 | 2010-01-27 | Aviza Technologies Ltd | Ion beam source |
| JP6219594B2 (ja) * | 2013-05-15 | 2017-10-25 | Hoya株式会社 | 薄膜形成装置、及び薄膜形成方法 |
| JP2019067488A (ja) * | 2017-09-28 | 2019-04-25 | 日新イオン機器株式会社 | イオン源およびイオン注入装置 |
| CN114959551B (zh) * | 2022-04-29 | 2023-12-19 | 超微中程纳米科技（苏州）有限公司 | 模具钢刀具离子氮化工艺 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3156842A (en) | 1962-10-08 | 1964-11-10 | Gordon W Mcclure | Gas ionizer |
| US3970892A (en) | 1975-05-19 | 1976-07-20 | Hughes Aircraft Company | Ion plasma electron gun |
| US4025818A (en) | 1976-04-20 | 1977-05-24 | Hughes Aircraft Company | Wire ion plasma electron gun |
| US4412153A (en) * | 1980-03-03 | 1983-10-25 | Varian Associates, Inc. | Dual filament ion source |
| US4694222A (en) | 1984-04-02 | 1987-09-15 | Rpc Industries | Ion plasma electron gun |
| US4642522A (en) | 1984-06-18 | 1987-02-10 | Hughes Aircraft Company | Wire-ion-plasma electron gun employing auxiliary grid |
| US4608513A (en) | 1984-09-13 | 1986-08-26 | Varian Associates, Inc. | Dual filament ion source with improved beam characteristics |
| FR2591035B1 (fr) | 1985-11-29 | 1988-02-26 | Onera (Off Nat Aerospatiale) | Canon a electrons operant par emission secondaire sous bombardement ionique |
| FR2596580A1 (fr) * | 1986-03-26 | 1987-10-02 | Centre Nat Rech Scient | Generateur de plasma |
| US4910435A (en) | 1988-07-20 | 1990-03-20 | American International Technologies, Inc. | Remote ion source plasma electron gun |
| JPH065219A (ja) * | 1992-06-22 | 1994-01-14 | Nissin Electric Co Ltd | イオン源装置 |
| JP3968874B2 (ja) | 1998-06-22 | 2007-08-29 | 日新イオン機器株式会社 | 三相交流を用いたプラズマ発生装置 |
| WO2006047609A2 (en) * | 2004-10-25 | 2006-05-04 | Epion Corporation | Ionizer and method for gas-cluster ion-beam formation |
-
2008
- 2008-01-11 EP EP08290027A patent/EP2079096B1/fr active Active
- 2008-01-11 AT AT08290027T patent/ATE554497T1/de active
-
2009
- 2009-01-08 KR KR1020107017761A patent/KR20100131978A/ko not_active Ceased
- 2009-01-08 JP JP2010541818A patent/JP5340308B2/ja active Active
- 2009-01-09 TW TW098100596A patent/TWI445036B/zh not_active IP Right Cessation
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