JP2011508259A5 - - Google Patents
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- Publication number
- JP2011508259A5 JP2011508259A5 JP2010539426A JP2010539426A JP2011508259A5 JP 2011508259 A5 JP2011508259 A5 JP 2011508259A5 JP 2010539426 A JP2010539426 A JP 2010539426A JP 2010539426 A JP2010539426 A JP 2010539426A JP 2011508259 A5 JP2011508259 A5 JP 2011508259A5
- Authority
- JP
- Japan
- Prior art keywords
- substituted
- unsubstituted
- acid
- imageable
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 150000001875 compounds Chemical class 0.000 claims 8
- SEOVTRFCIGRIMH-UHFFFAOYSA-N indole-3-acetic acid Chemical compound C1=CC=C2C(CC(=O)O)=CNC2=C1 SEOVTRFCIGRIMH-UHFFFAOYSA-N 0.000 claims 4
- 229920005596 polymer binder Polymers 0.000 claims 4
- 239000002491 polymer binding agent Substances 0.000 claims 4
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 claims 3
- 125000000217 alkyl group Chemical group 0.000 claims 3
- 125000000753 cycloalkyl group Chemical group 0.000 claims 3
- 229910052739 hydrogen Inorganic materials 0.000 claims 3
- 239000001257 hydrogen Substances 0.000 claims 3
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 3
- 239000005011 phenolic resin Substances 0.000 claims 3
- -1 poly (vinyl acetal Chemical class 0.000 claims 3
- 230000005855 radiation Effects 0.000 claims 3
- 229920002554 vinyl polymer Polymers 0.000 claims 3
- MUVQKFGNPGZBII-UHFFFAOYSA-N 1-anthrol Chemical group C1=CC=C2C=C3C(O)=CC=CC3=CC2=C1 MUVQKFGNPGZBII-UHFFFAOYSA-N 0.000 claims 2
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical group C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 claims 2
- WUBBRNOQWQTFEX-UHFFFAOYSA-N 4-aminosalicylic acid Chemical compound NC1=CC=C(C(O)=O)C(O)=C1 WUBBRNOQWQTFEX-UHFFFAOYSA-N 0.000 claims 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 2
- NPKSPKHJBVJUKB-UHFFFAOYSA-N N-phenylglycine Chemical compound OC(=O)CNC1=CC=CC=C1 NPKSPKHJBVJUKB-UHFFFAOYSA-N 0.000 claims 2
- 239000002253 acid Substances 0.000 claims 2
- 229960004909 aminosalicylic acid Drugs 0.000 claims 2
- 239000011230 binding agent Substances 0.000 claims 2
- 239000011248 coating agent Substances 0.000 claims 2
- 238000000576 coating method Methods 0.000 claims 2
- 125000005843 halogen group Chemical group 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 150000002989 phenols Chemical group 0.000 claims 2
- 229920002689 polyvinyl acetate Polymers 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- DVVXXHVHGGWWPE-UHFFFAOYSA-N 2-(dimethylamino)benzoic acid Chemical compound CN(C)C1=CC=CC=C1C(O)=O DVVXXHVHGGWWPE-UHFFFAOYSA-N 0.000 claims 1
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical group [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 claims 1
- YDIYEOMDOWUDTJ-UHFFFAOYSA-N 4-(dimethylamino)benzoic acid Chemical compound CN(C)C1=CC=C(C(O)=O)C=C1 YDIYEOMDOWUDTJ-UHFFFAOYSA-N 0.000 claims 1
- ALYNCZNDIQEVRV-PZFLKRBQSA-N 4-amino-3,5-ditritiobenzoic acid Chemical compound [3H]c1cc(cc([3H])c1N)C(O)=O ALYNCZNDIQEVRV-PZFLKRBQSA-N 0.000 claims 1
- ALYNCZNDIQEVRV-UHFFFAOYSA-N 4-aminobenzoic acid Chemical compound NC1=CC=C(C(O)=O)C=C1 ALYNCZNDIQEVRV-UHFFFAOYSA-N 0.000 claims 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 1
- 229910052782 aluminium Inorganic materials 0.000 claims 1
- 229960004050 aminobenzoic acid Drugs 0.000 claims 1
- 125000000732 arylene group Chemical group 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 125000004432 carbon atom Chemical group C* 0.000 claims 1
- 230000002708 enhancing effect Effects 0.000 claims 1
- 239000003617 indole-3-acetic acid Substances 0.000 claims 1
- 125000005647 linker group Chemical group 0.000 claims 1
- 229910052757 nitrogen Inorganic materials 0.000 claims 1
- 125000004430 oxygen atom Chemical group O* 0.000 claims 1
- 229920001568 phenolic resin Polymers 0.000 claims 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 claims 1
- 229910052717 sulfur Inorganic materials 0.000 claims 1
- 239000011593 sulfur Substances 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/959,492 | 2007-12-19 | ||
| US11/959,492 US8088549B2 (en) | 2007-12-19 | 2007-12-19 | Radiation-sensitive elements with developability-enhancing compounds |
| PCT/US2008/013405 WO2009085093A1 (en) | 2007-12-19 | 2008-12-05 | Radiation-sensitive elements with developability-enhancing compounds |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011508259A JP2011508259A (ja) | 2011-03-10 |
| JP2011508259A5 true JP2011508259A5 (OSRAM) | 2013-02-14 |
| JP5547652B2 JP5547652B2 (ja) | 2014-07-16 |
Family
ID=40416923
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010539426A Expired - Fee Related JP5547652B2 (ja) | 2007-12-19 | 2008-12-05 | 現像性向上化合物を有する輻射線感光性要素 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US8088549B2 (OSRAM) |
| EP (1) | EP2222469B1 (OSRAM) |
| JP (1) | JP5547652B2 (OSRAM) |
| CN (1) | CN101903177B (OSRAM) |
| WO (1) | WO2009085093A1 (OSRAM) |
Families Citing this family (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8084189B2 (en) * | 2008-05-22 | 2011-12-27 | Eastman Kodak Company | Method of imaging and developing positive-working imageable elements |
| US8298750B2 (en) | 2009-09-08 | 2012-10-30 | Eastman Kodak Company | Positive-working radiation-sensitive imageable elements |
| US8329383B2 (en) * | 2009-11-05 | 2012-12-11 | Eastman Kodak Company | Negative-working lithographic printing plate precursors |
| EP2366545B1 (en) | 2010-03-19 | 2012-12-05 | Agfa Graphics N.V. | A lithographic printing plate precursor |
| US8530143B2 (en) | 2010-11-18 | 2013-09-10 | Eastman Kodak Company | Silicate-free developer compositions |
| US20120129093A1 (en) * | 2010-11-18 | 2012-05-24 | Moshe Levanon | Silicate-free developer compositions |
| US8939080B2 (en) | 2010-11-18 | 2015-01-27 | Eastman Kodak Company | Methods of processing using silicate-free developer compositions |
| US8647811B2 (en) * | 2012-01-12 | 2014-02-11 | Eastman Kodak Company | Positive-working lithographic printing plate precursors |
| US20130255515A1 (en) | 2012-03-27 | 2013-10-03 | Celin Savariar-Hauck | Positive-working lithographic printing plate precursors |
| US9562129B2 (en) | 2013-01-01 | 2017-02-07 | Agfa Graphics Nv | (Ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors |
| US9229325B2 (en) | 2014-02-25 | 2016-01-05 | Eastman Kodak Company | Method for making lithographic printing plates |
| EP2933278B1 (en) | 2014-04-17 | 2018-08-22 | Agfa Nv | (Ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors |
| ES2617557T3 (es) | 2014-05-15 | 2017-06-19 | Agfa Graphics Nv | Copolímeros (de etileno, vinilacetal) y su uso en precursores de plancha de impresión litográfica |
| ES2660063T3 (es) | 2014-06-13 | 2018-03-20 | Agfa Nv | Copolímeros (de etileno, vinilacetal) y su uso en precursores de plancha de impresión litográfica |
| EP2963496B1 (en) | 2014-06-30 | 2017-04-05 | Agfa Graphics NV | A lithographic printing plate precursor including ( ethylene, vinyl acetal ) copolymers |
| ES2655798T3 (es) | 2014-12-08 | 2018-02-21 | Agfa Nv | Sistema para reducir los residuos de ablación |
| EP3130465B1 (en) | 2015-08-12 | 2020-05-13 | Agfa Nv | Heat-sensitive lithographic printing plate precursor |
| US9588429B1 (en) | 2015-09-03 | 2017-03-07 | Eastman Kodak Company | Lithographic developer composition and method of use |
| WO2017157579A1 (en) | 2016-03-16 | 2017-09-21 | Agfa Graphics Nv | Method for processing a lithographic printing plate |
| EP3637188A1 (en) | 2018-10-08 | 2020-04-15 | Agfa Nv | An effervescent developer precursor for processing a lithographic printing plate precursor |
| EP3778253A1 (en) | 2019-08-13 | 2021-02-17 | Agfa Nv | Method for processing a lithographic printing plate |
| US11633948B2 (en) | 2020-01-22 | 2023-04-25 | Eastman Kodak Company | Method for making lithographic printing plates |
| US11760081B2 (en) | 2020-09-04 | 2023-09-19 | Eastman Kodak Company | Lithographic printing plate precursor and method of use |
| EP4382306A1 (en) | 2022-12-08 | 2024-06-12 | Eco3 Bv | Lithographic printing press make-ready method |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1335517A (en) | 1972-08-17 | 1973-10-31 | Oce Van Der Grinten Nv | Light-sensitive reprographic elements sensitised with quinone diazides containing aromatic amino acids in the light-sensitive layer |
| US5238771A (en) * | 1988-05-31 | 1993-08-24 | Konica Corporation | Lithographic printing plate utilizing aluminum substrate with photosensitive layer containing o-naphthoquinonediazide sulfonic acid ester, alkali soluble resin and select additive |
| JP2645587B2 (ja) * | 1989-03-29 | 1997-08-25 | 富士写真フイルム株式会社 | 微細パターン形成材料及び微細パターン形成方法 |
| JP3317597B2 (ja) * | 1994-10-18 | 2002-08-26 | 富士写真フイルム株式会社 | ポジ型感光性組成物 |
| US5713287A (en) | 1995-05-11 | 1998-02-03 | Creo Products Inc. | Direct-to-Press imaging method using surface modification of a single layer coating |
| US6174646B1 (en) * | 1997-10-21 | 2001-01-16 | Konica Corporation | Image forming method |
| US6255033B1 (en) | 1999-07-30 | 2001-07-03 | Creo, Ltd. | Positive acting photoresist compositions and imageable element |
| US20040091811A1 (en) | 2002-10-30 | 2004-05-13 | Munnelly Heidi M. | Hetero-substituted aryl acetic acid co-initiators for IR-sensitive compositions |
| AU2003251710A1 (en) | 2002-08-19 | 2004-03-11 | Dsm Ip Assets B.V. | Cellulases and hemicellulases and uses thereof |
| US7270932B2 (en) * | 2004-02-06 | 2007-09-18 | Rohm And Haas Electronic Materials Llc | Imaging composition and method |
| US7144676B2 (en) * | 2004-02-06 | 2006-12-05 | Rohm And Haas Electronic Materials Llc | Imaging compositions and methods |
| ATE355183T1 (de) | 2004-03-16 | 2006-03-15 | Fuji Photo Film Co Ltd | Positiv arbeitende photoempfindliche zusammensetzung |
| JP4391285B2 (ja) | 2004-03-26 | 2009-12-24 | 富士フイルム株式会社 | 感光性平版印刷版 |
| JP2006058430A (ja) | 2004-08-18 | 2006-03-02 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
| JP4384575B2 (ja) * | 2004-09-27 | 2009-12-16 | 富士フイルム株式会社 | 平版印刷版原版 |
| JP4498177B2 (ja) * | 2005-03-15 | 2010-07-07 | 富士フイルム株式会社 | ポジ型感光性組成物及びそれを用いた画像記録材料 |
| US7175969B1 (en) | 2006-07-18 | 2007-02-13 | Eastman Kodak Company | Method of preparing negative-working radiation-sensitive elements |
-
2007
- 2007-12-19 US US11/959,492 patent/US8088549B2/en not_active Expired - Fee Related
-
2008
- 2008-12-05 CN CN200880121530.4A patent/CN101903177B/zh active Active
- 2008-12-05 JP JP2010539426A patent/JP5547652B2/ja not_active Expired - Fee Related
- 2008-12-05 EP EP08868020.2A patent/EP2222469B1/en not_active Not-in-force
- 2008-12-05 WO PCT/US2008/013405 patent/WO2009085093A1/en not_active Ceased
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