JP2011507202A5 - - Google Patents

Download PDF

Info

Publication number
JP2011507202A5
JP2011507202A5 JP2010538606A JP2010538606A JP2011507202A5 JP 2011507202 A5 JP2011507202 A5 JP 2011507202A5 JP 2010538606 A JP2010538606 A JP 2010538606A JP 2010538606 A JP2010538606 A JP 2010538606A JP 2011507202 A5 JP2011507202 A5 JP 2011507202A5
Authority
JP
Japan
Prior art keywords
charged particle
sample
particle beam
portions
region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2010538606A
Other languages
English (en)
Japanese (ja)
Other versions
JP2011507202A (ja
JP5473004B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/EP2008/067419 external-priority patent/WO2009077450A2/en
Publication of JP2011507202A publication Critical patent/JP2011507202A/ja
Publication of JP2011507202A5 publication Critical patent/JP2011507202A5/ja
Application granted granted Critical
Publication of JP5473004B2 publication Critical patent/JP5473004B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2010538606A 2007-12-17 2008-12-12 走査荷電粒子ビーム Active JP5473004B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US1422907P 2007-12-17 2007-12-17
US61/014,229 2007-12-17
PCT/EP2008/067419 WO2009077450A2 (en) 2007-12-17 2008-12-12 Scanning charged particle beams

Publications (3)

Publication Number Publication Date
JP2011507202A JP2011507202A (ja) 2011-03-03
JP2011507202A5 true JP2011507202A5 (enExample) 2011-12-08
JP5473004B2 JP5473004B2 (ja) 2014-04-16

Family

ID=40497572

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010538606A Active JP5473004B2 (ja) 2007-12-17 2008-12-12 走査荷電粒子ビーム

Country Status (5)

Country Link
US (1) US8304750B2 (enExample)
EP (1) EP2238606B1 (enExample)
JP (1) JP5473004B2 (enExample)
AT (1) ATE521979T1 (enExample)
WO (1) WO2009077450A2 (enExample)

Families Citing this family (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2259664B1 (en) 2004-07-21 2017-10-18 Mevion Medical Systems, Inc. A programmable radio frequency waveform generator for a synchrocyclotron
ES2594619T3 (es) 2005-11-18 2016-12-21 Mevion Medical Systems, Inc. Radioterapia con partículas cargadas
US8003964B2 (en) 2007-10-11 2011-08-23 Still River Systems Incorporated Applying a particle beam to a patient
US8933650B2 (en) 2007-11-30 2015-01-13 Mevion Medical Systems, Inc. Matching a resonant frequency of a resonant cavity to a frequency of an input voltage
US8581523B2 (en) 2007-11-30 2013-11-12 Mevion Medical Systems, Inc. Interrupted particle source
WO2009114230A2 (en) 2008-03-07 2009-09-17 Carl Zeiss Smt, Inc. Reducing particle implantation
JP5586593B2 (ja) * 2008-06-20 2014-09-10 カール ツァイス マイクロスコーピー エルエルシー 試料検査方法、システム及び構成要素
US8884224B2 (en) * 2009-04-08 2014-11-11 Hermes Microvision, Inc. Charged particle beam imaging assembly and imaging method thereof
EP2477768B1 (en) 2009-09-17 2019-04-17 Sciaky Inc. Electron beam layer manufacturing
WO2011041100A1 (en) * 2009-09-30 2011-04-07 Carl Zeiss Nts, Llc Variable energy charged particle systems
WO2011123195A1 (en) 2010-03-31 2011-10-06 Sciaky, Inc. Raster methodology, apparatus and system for electron beam layer manufacturing using closed loop control
US8847173B2 (en) * 2010-08-06 2014-09-30 Hitachi High-Technologies Corporation Gas field ion source and method for using same, ion beam device, and emitter tip and method for manufacturing same
TWI447385B (zh) * 2011-09-16 2014-08-01 Inotera Memories Inc 一種使用聚焦離子束系統進行晶片平面成像的方法
US9723705B2 (en) 2012-09-28 2017-08-01 Mevion Medical Systems, Inc. Controlling intensity of a particle beam
TW201434508A (zh) 2012-09-28 2014-09-16 Mevion Medical Systems Inc 一粒子束之能量調整
EP2901822B1 (en) 2012-09-28 2020-04-08 Mevion Medical Systems, Inc. Focusing a particle beam
US9155186B2 (en) 2012-09-28 2015-10-06 Mevion Medical Systems, Inc. Focusing a particle beam using magnetic field flutter
TW201422278A (zh) 2012-09-28 2014-06-16 Mevion Medical Systems Inc 粒子加速器之控制系統
TW201424466A (zh) 2012-09-28 2014-06-16 Mevion Medical Systems Inc 磁場再生器
US10254739B2 (en) 2012-09-28 2019-04-09 Mevion Medical Systems, Inc. Coil positioning system
EP2901824B1 (en) 2012-09-28 2020-04-15 Mevion Medical Systems, Inc. Magnetic shims to adjust a position of a main coil and corresponding method
EP2900326B1 (en) 2012-09-28 2019-05-01 Mevion Medical Systems, Inc. Controlling particle therapy
SG11201509479WA (en) 2013-05-30 2015-12-30 Goldway Technology Ltd Method of marking material and system therefore, and material marked according to same method
US8791656B1 (en) 2013-05-31 2014-07-29 Mevion Medical Systems, Inc. Active return system
US9730308B2 (en) 2013-06-12 2017-08-08 Mevion Medical Systems, Inc. Particle accelerator that produces charged particles having variable energies
US9530611B2 (en) 2013-07-08 2016-12-27 Carl Zeiss Microscopy, Llc Charged particle beam system and method of operating a charged particle beam system
ES2768659T3 (es) 2013-09-27 2020-06-23 Mevion Medical Systems Inc Exploración de haces de partículas
WO2015051640A1 (en) 2013-10-11 2015-04-16 Goldway Technology Limited Method of providing markings to precious stones including gemstones and diamonds, and markings and marked precious stones marked according to such a method
US9962560B2 (en) 2013-12-20 2018-05-08 Mevion Medical Systems, Inc. Collimator and energy degrader
US10675487B2 (en) 2013-12-20 2020-06-09 Mevion Medical Systems, Inc. Energy degrader enabling high-speed energy switching
US9661736B2 (en) 2014-02-20 2017-05-23 Mevion Medical Systems, Inc. Scanning system for a particle therapy system
US9950194B2 (en) 2014-09-09 2018-04-24 Mevion Medical Systems, Inc. Patient positioning system
US9619728B2 (en) * 2015-05-31 2017-04-11 Fei Company Dynamic creation of backup fiducials
US10786689B2 (en) 2015-11-10 2020-09-29 Mevion Medical Systems, Inc. Adaptive aperture
JP7059245B2 (ja) 2016-07-08 2022-04-25 メビオン・メディカル・システムズ・インコーポレーテッド 治療計画の決定
US11103730B2 (en) 2017-02-23 2021-08-31 Mevion Medical Systems, Inc. Automated treatment in particle therapy
CN111093767B (zh) 2017-06-30 2022-08-23 美国迈胜医疗系统有限公司 使用线性电动机而被控制的可配置准直仪
KR102370458B1 (ko) * 2017-07-21 2022-03-04 칼 짜이스 에스엠티 게엠베하 포토리소그래피 마스크의 과잉 재료의 폐기를 위한 방법 및 장치
CN113811356B (zh) 2019-03-08 2025-01-03 美国迈胜医疗系统有限公司 用于粒子治疗系统的准直器和射程调节器
DE102020103339A1 (de) 2020-02-10 2021-08-12 Carl Zeiss Microscopy Gmbh Verfahren zum Betrieb eines Teilchenstrahlgeräts, Computerprogrammprodukt und Teilchenstrahlgerät zur Durchführung des Verfahrens
US12191110B2 (en) * 2021-04-20 2025-01-07 The University Of Liverpool Reduced spatial/temporal overlaps to increase temporal overlaps to increase precision in focused ion beam FIB instruments for milling and imaging and focused ion beams for lithography
US11804361B2 (en) * 2021-05-18 2023-10-31 Nuflare Technology, Inc. Charged particle beam writing method, charged particle beam writing apparatus, and computer-readable recording medium

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0638329B2 (ja) * 1986-12-29 1994-05-18 セイコー電子工業株式会社 集束イオンビーム走査方法
JPH0638329A (ja) 1992-07-17 1994-02-10 Totoku Electric Co Ltd 絶縁被膜剥離装置および型巻線の製造方法
JP4054445B2 (ja) * 1998-06-30 2008-02-27 株式会社東芝 荷電ビーム描画方法
US6614026B1 (en) 1999-04-15 2003-09-02 Applied Materials, Inc. Charged particle beam column
JP4053723B2 (ja) * 2000-09-27 2008-02-27 株式会社東芝 露光用マスクの製造方法
US6593152B2 (en) * 2000-11-02 2003-07-15 Ebara Corporation Electron beam apparatus and method of manufacturing semiconductor device using the apparatus
GB2374723B (en) 2001-04-20 2005-04-20 Leo Electron Microscopy Ltd Scanning electron microscope
JP2003045780A (ja) * 2001-07-30 2003-02-14 Nec Corp マスク描画データの作成方法
DE10233002B4 (de) * 2002-07-19 2006-05-04 Leo Elektronenmikroskopie Gmbh Objektivlinse für ein Elektronenmikroskopiesystem und Elektronenmikroskopiesystem
DE10236738B9 (de) * 2002-08-09 2010-07-15 Carl Zeiss Nts Gmbh Elektronenmikroskopiesystem und Elektronenmikroskopieverfahren
DE10331137B4 (de) 2003-07-09 2008-04-30 Carl Zeiss Nts Gmbh Detektorsystem für ein Rasterelektronenmikroskop und Rasterelektronenmikroskop mit einem entsprechenden Detektorsystem
US7557359B2 (en) 2003-10-16 2009-07-07 Alis Corporation Ion sources, systems and methods
US7511279B2 (en) * 2003-10-16 2009-03-31 Alis Corporation Ion sources, systems and methods
US7259373B2 (en) 2005-07-08 2007-08-21 Nexgensemi Holdings Corporation Apparatus and method for controlled particle beam manufacturing
JP4748714B2 (ja) * 2005-10-28 2011-08-17 エスアイアイ・ナノテクノロジー株式会社 荷電粒子ビーム走査照射方法、荷電粒子ビーム装置、試料観察方法、及び、試料加工方法
WO2009114230A2 (en) * 2008-03-07 2009-09-17 Carl Zeiss Smt, Inc. Reducing particle implantation

Similar Documents

Publication Publication Date Title
JP2011507202A5 (enExample)
EP2522992A3 (en) Testing apparatus using charged particles and device manufacturing method using the testing apparatus
JP2009517839A5 (enExample)
US20140072102A1 (en) Source of x-rays generating a beam of nanometric size and imaging device comprising at least one such source
US8644637B2 (en) Image processing method
JP6294216B2 (ja) 電子検出が改善された荷電粒子顕微鏡
JP2006032107A5 (enExample)
JP2015087237A (ja) 質量分布計測方法及び質量分布計測装置
US9000396B2 (en) Charged particle detectors
IL267815B (en) Reduced coulomb interactions in a multi-beam column
JP2023110072A (ja) 走査型電子顕微鏡および走査型電子顕微鏡の２次電子検出方法
JP2019186197A (ja) 透過荷電粒子顕微鏡における動的試料の調査法
JP2015087236A (ja) 質量分布計測方法及び質量分布計測装置
TW201022856A (en) Simultaneous measurement of beams in lithography system
US20230175993A1 (en) Joint nanoscale three-dimensional imaging and chemical analysis
US9029768B2 (en) Detector and charged particle beam instrument
EP2786398A1 (en) Mass distribution spectrometry method and mass distribution spectrometer
JP4958313B2 (ja) 走査型電子顕微鏡およびその使用方法
KR20250047116A (ko) 이온 빔 시스템용 2차 전자 검출기
JP2018124100A (ja) 荷電粒子検出器及び荷電粒子線装置
JP6518504B2 (ja) 画像処理装置、電子顕微鏡、および画像処理方法
US20090309021A1 (en) Ion detection method and apparatus with scanning electron beam
JP2005063874A (ja) イオン注入装置
JP2007073529A (ja) イメージインテンシファイア装置および方法
CN110208302A (zh) 一种粒子激发x射线荧光分析深度分辨的装置及方法