JP2011507202A5 - - Google Patents
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- Publication number
- JP2011507202A5 JP2011507202A5 JP2010538606A JP2010538606A JP2011507202A5 JP 2011507202 A5 JP2011507202 A5 JP 2011507202A5 JP 2010538606 A JP2010538606 A JP 2010538606A JP 2010538606 A JP2010538606 A JP 2010538606A JP 2011507202 A5 JP2011507202 A5 JP 2011507202A5
- Authority
- JP
- Japan
- Prior art keywords
- charged particle
- sample
- particle beam
- portions
- region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims 33
- 239000002245 particle Substances 0.000 claims 32
- 150000002500 ions Chemical class 0.000 claims 4
- 239000007789 gas Substances 0.000 claims 2
- 229910052756 noble gas Inorganic materials 0.000 claims 2
- 238000010438 heat treatment Methods 0.000 claims 1
- 229910052734 helium Inorganic materials 0.000 claims 1
- 239000001307 helium Substances 0.000 claims 1
- -1 helium ions Chemical class 0.000 claims 1
- 230000007935 neutral effect Effects 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US1422907P | 2007-12-17 | 2007-12-17 | |
| US61/014,229 | 2007-12-17 | ||
| PCT/EP2008/067419 WO2009077450A2 (en) | 2007-12-17 | 2008-12-12 | Scanning charged particle beams |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011507202A JP2011507202A (ja) | 2011-03-03 |
| JP2011507202A5 true JP2011507202A5 (enExample) | 2011-12-08 |
| JP5473004B2 JP5473004B2 (ja) | 2014-04-16 |
Family
ID=40497572
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010538606A Active JP5473004B2 (ja) | 2007-12-17 | 2008-12-12 | 走査荷電粒子ビーム |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US8304750B2 (enExample) |
| EP (1) | EP2238606B1 (enExample) |
| JP (1) | JP5473004B2 (enExample) |
| AT (1) | ATE521979T1 (enExample) |
| WO (1) | WO2009077450A2 (enExample) |
Families Citing this family (42)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102036461B (zh) | 2004-07-21 | 2012-11-14 | 梅威申医疗系统有限公司 | 用于同步回旋加速器的可编程的射频波形发生器 |
| CN101361156B (zh) | 2005-11-18 | 2012-12-12 | 梅维昂医疗系统股份有限公司 | 用于实施放射治疗的设备 |
| US8003964B2 (en) | 2007-10-11 | 2011-08-23 | Still River Systems Incorporated | Applying a particle beam to a patient |
| US8933650B2 (en) | 2007-11-30 | 2015-01-13 | Mevion Medical Systems, Inc. | Matching a resonant frequency of a resonant cavity to a frequency of an input voltage |
| US8581523B2 (en) | 2007-11-30 | 2013-11-12 | Mevion Medical Systems, Inc. | Interrupted particle source |
| WO2009114230A2 (en) * | 2008-03-07 | 2009-09-17 | Carl Zeiss Smt, Inc. | Reducing particle implantation |
| US8669525B2 (en) * | 2008-06-20 | 2014-03-11 | Carl Zeiss Microscopy, Llc | Sample inspection methods, systems and components |
| US8884224B2 (en) * | 2009-04-08 | 2014-11-11 | Hermes Microvision, Inc. | Charged particle beam imaging assembly and imaging method thereof |
| EP3479933A1 (en) | 2009-09-17 | 2019-05-08 | Sciaky Inc. | Electron beam layer manufacturing apparatus |
| WO2011041100A1 (en) * | 2009-09-30 | 2011-04-07 | Carl Zeiss Nts, Llc | Variable energy charged particle systems |
| EP2555902B1 (en) | 2010-03-31 | 2018-04-25 | Sciaky Inc. | Raster methodology for electron beam layer manufacturing using closed loop control |
| WO2012017789A1 (ja) * | 2010-08-06 | 2012-02-09 | 株式会社日立ハイテクノロジーズ | ガス電解電離イオン源及びその使用方法、並びに、イオンビーム装置、並びに、エミッタチップ及びその製造方法 |
| TWI447385B (zh) * | 2011-09-16 | 2014-08-01 | 華亞科技股份有限公司 | 一種使用聚焦離子束系統進行晶片平面成像的方法 |
| WO2014052718A2 (en) | 2012-09-28 | 2014-04-03 | Mevion Medical Systems, Inc. | Focusing a particle beam |
| TW201424466A (zh) | 2012-09-28 | 2014-06-16 | Mevion Medical Systems Inc | 磁場再生器 |
| CN104813750B (zh) | 2012-09-28 | 2018-01-12 | 梅维昂医疗系统股份有限公司 | 调整主线圈位置的磁垫片 |
| JP6367201B2 (ja) | 2012-09-28 | 2018-08-01 | メビオン・メディカル・システムズ・インコーポレーテッド | 粒子ビームの強度の制御 |
| WO2014052734A1 (en) | 2012-09-28 | 2014-04-03 | Mevion Medical Systems, Inc. | Controlling particle therapy |
| US10254739B2 (en) | 2012-09-28 | 2019-04-09 | Mevion Medical Systems, Inc. | Coil positioning system |
| CN104813747B (zh) | 2012-09-28 | 2018-02-02 | 梅维昂医疗系统股份有限公司 | 使用磁场颤振聚焦粒子束 |
| EP3342462B1 (en) | 2012-09-28 | 2019-05-01 | Mevion Medical Systems, Inc. | Adjusting energy of a particle beam |
| US9681531B2 (en) | 2012-09-28 | 2017-06-13 | Mevion Medical Systems, Inc. | Control system for a particle accelerator |
| JP6291568B2 (ja) | 2013-05-30 | 2018-03-14 | チョウ タイ フック ジュエリー カンパニー リミテッド | 材料にマーキングする方法、材料にマーキングするためのシステム、及び該方法によってマーキングされた材料 |
| US8791656B1 (en) | 2013-05-31 | 2014-07-29 | Mevion Medical Systems, Inc. | Active return system |
| US9730308B2 (en) | 2013-06-12 | 2017-08-08 | Mevion Medical Systems, Inc. | Particle accelerator that produces charged particles having variable energies |
| US9218934B2 (en) | 2013-07-08 | 2015-12-22 | Carl Zeiss Microscopy, Llc | Charged particle beam system and method of operating a charged particle beam system |
| CN110237447B (zh) | 2013-09-27 | 2021-11-02 | 梅维昂医疗系统股份有限公司 | 粒子治疗系统 |
| JP6246348B2 (ja) | 2013-10-11 | 2017-12-13 | チョウ タイ フック ジュエリー カンパニー リミテッド | ジェムストーン及びダイヤモンドを含む宝石にマーキングを施す方法及び当該方法に従ってマーキングされた宝石 |
| US10675487B2 (en) | 2013-12-20 | 2020-06-09 | Mevion Medical Systems, Inc. | Energy degrader enabling high-speed energy switching |
| US9962560B2 (en) | 2013-12-20 | 2018-05-08 | Mevion Medical Systems, Inc. | Collimator and energy degrader |
| US9661736B2 (en) | 2014-02-20 | 2017-05-23 | Mevion Medical Systems, Inc. | Scanning system for a particle therapy system |
| US9950194B2 (en) | 2014-09-09 | 2018-04-24 | Mevion Medical Systems, Inc. | Patient positioning system |
| US9619728B2 (en) * | 2015-05-31 | 2017-04-11 | Fei Company | Dynamic creation of backup fiducials |
| US10786689B2 (en) | 2015-11-10 | 2020-09-29 | Mevion Medical Systems, Inc. | Adaptive aperture |
| CN109803723B (zh) | 2016-07-08 | 2021-05-14 | 迈胜医疗设备有限公司 | 一种粒子疗法系统 |
| US11103730B2 (en) | 2017-02-23 | 2021-08-31 | Mevion Medical Systems, Inc. | Automated treatment in particle therapy |
| JP6940676B2 (ja) | 2017-06-30 | 2021-09-29 | メビオン・メディカル・システムズ・インコーポレーテッド | リニアモーターを使用して制御される構成可能コリメータ |
| CN118192160A (zh) * | 2017-07-21 | 2024-06-14 | 卡尔蔡司Smt有限责任公司 | 用于处理光刻掩模的多余材料的方法与设备 |
| WO2020185544A1 (en) | 2019-03-08 | 2020-09-17 | Mevion Medical Systems, Inc. | Delivery of radiation by column and generating a treatment plan therefor |
| DE102020103339A1 (de) | 2020-02-10 | 2021-08-12 | Carl Zeiss Microscopy Gmbh | Verfahren zum Betrieb eines Teilchenstrahlgeräts, Computerprogrammprodukt und Teilchenstrahlgerät zur Durchführung des Verfahrens |
| US12191110B2 (en) * | 2021-04-20 | 2025-01-07 | The University Of Liverpool | Reduced spatial/temporal overlaps to increase temporal overlaps to increase precision in focused ion beam FIB instruments for milling and imaging and focused ion beams for lithography |
| US11804361B2 (en) * | 2021-05-18 | 2023-10-31 | Nuflare Technology, Inc. | Charged particle beam writing method, charged particle beam writing apparatus, and computer-readable recording medium |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0638329B2 (ja) * | 1986-12-29 | 1994-05-18 | セイコー電子工業株式会社 | 集束イオンビーム走査方法 |
| JPH0638329A (ja) | 1992-07-17 | 1994-02-10 | Totoku Electric Co Ltd | 絶縁被膜剥離装置および型巻線の製造方法 |
| JP4054445B2 (ja) * | 1998-06-30 | 2008-02-27 | 株式会社東芝 | 荷電ビーム描画方法 |
| US6614026B1 (en) | 1999-04-15 | 2003-09-02 | Applied Materials, Inc. | Charged particle beam column |
| JP4053723B2 (ja) * | 2000-09-27 | 2008-02-27 | 株式会社東芝 | 露光用マスクの製造方法 |
| EP1271605A4 (en) * | 2000-11-02 | 2009-09-02 | Ebara Corp | ELECTRON BEAM APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE COMPRISING SAID APPARATUS |
| GB2374723B (en) * | 2001-04-20 | 2005-04-20 | Leo Electron Microscopy Ltd | Scanning electron microscope |
| JP2003045780A (ja) * | 2001-07-30 | 2003-02-14 | Nec Corp | マスク描画データの作成方法 |
| DE10233002B4 (de) | 2002-07-19 | 2006-05-04 | Leo Elektronenmikroskopie Gmbh | Objektivlinse für ein Elektronenmikroskopiesystem und Elektronenmikroskopiesystem |
| DE10236738B9 (de) * | 2002-08-09 | 2010-07-15 | Carl Zeiss Nts Gmbh | Elektronenmikroskopiesystem und Elektronenmikroskopieverfahren |
| DE10331137B4 (de) | 2003-07-09 | 2008-04-30 | Carl Zeiss Nts Gmbh | Detektorsystem für ein Rasterelektronenmikroskop und Rasterelektronenmikroskop mit einem entsprechenden Detektorsystem |
| US7511279B2 (en) * | 2003-10-16 | 2009-03-31 | Alis Corporation | Ion sources, systems and methods |
| US7557359B2 (en) | 2003-10-16 | 2009-07-07 | Alis Corporation | Ion sources, systems and methods |
| US7259373B2 (en) | 2005-07-08 | 2007-08-21 | Nexgensemi Holdings Corporation | Apparatus and method for controlled particle beam manufacturing |
| JP4748714B2 (ja) * | 2005-10-28 | 2011-08-17 | エスアイアイ・ナノテクノロジー株式会社 | 荷電粒子ビーム走査照射方法、荷電粒子ビーム装置、試料観察方法、及び、試料加工方法 |
| WO2009114230A2 (en) * | 2008-03-07 | 2009-09-17 | Carl Zeiss Smt, Inc. | Reducing particle implantation |
-
2008
- 2008-12-12 US US12/744,152 patent/US8304750B2/en active Active
- 2008-12-12 JP JP2010538606A patent/JP5473004B2/ja active Active
- 2008-12-12 AT AT08862809T patent/ATE521979T1/de not_active IP Right Cessation
- 2008-12-12 EP EP08862809A patent/EP2238606B1/en active Active
- 2008-12-12 WO PCT/EP2008/067419 patent/WO2009077450A2/en not_active Ceased
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