JP2011502923A5 - - Google Patents
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- Publication number
- JP2011502923A5 JP2011502923A5 JP2010532073A JP2010532073A JP2011502923A5 JP 2011502923 A5 JP2011502923 A5 JP 2011502923A5 JP 2010532073 A JP2010532073 A JP 2010532073A JP 2010532073 A JP2010532073 A JP 2010532073A JP 2011502923 A5 JP2011502923 A5 JP 2011502923A5
- Authority
- JP
- Japan
- Prior art keywords
- acetonitrile
- layer
- hexane
- solution
- solvent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 claims 48
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 claims 36
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 11
- CBWJKNQKWLEEPG-UHFFFAOYSA-N dihydridoborate(1-) Chemical compound [BH2-] CBWJKNQKWLEEPG-UHFFFAOYSA-N 0.000 claims 5
- 238000000034 method Methods 0.000 claims 5
- 239000002904 solvent Substances 0.000 claims 5
- 230000002194 synthesizing effect Effects 0.000 claims 5
- 238000005406 washing Methods 0.000 claims 5
- 239000000203 mixture Substances 0.000 claims 4
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 claims 3
- 230000002378 acidificating effect Effects 0.000 claims 3
- 230000002051 biphasic effect Effects 0.000 claims 3
- 239000003456 ion exchange resin Substances 0.000 claims 3
- 229920003303 ion-exchange polymer Polymers 0.000 claims 3
- 239000012046 mixed solvent Substances 0.000 claims 3
- 239000011541 reaction mixture Substances 0.000 claims 3
- 239000011877 solvent mixture Substances 0.000 claims 3
- 239000002253 acid Substances 0.000 claims 2
- 239000006227 byproduct Substances 0.000 claims 2
- 229920001429 chelating resin Polymers 0.000 claims 2
- 239000013557 residual solvent Substances 0.000 claims 2
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US168507P | 2007-11-02 | 2007-11-02 | |
| US61/001,685 | 2007-11-02 | ||
| PCT/US2008/012470 WO2009058406A1 (en) | 2007-11-02 | 2008-11-03 | Methods of preparing clusterboron |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011502923A JP2011502923A (ja) | 2011-01-27 |
| JP2011502923A5 true JP2011502923A5 (https=) | 2011-12-15 |
| JP5710975B2 JP5710975B2 (ja) | 2015-04-30 |
Family
ID=40591391
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010532073A Expired - Fee Related JP5710975B2 (ja) | 2007-11-02 | 2008-11-03 | クラスターボロンの調製方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US8673251B2 (https=) |
| EP (1) | EP2212251B1 (https=) |
| JP (1) | JP5710975B2 (https=) |
| KR (1) | KR101510914B1 (https=) |
| CN (2) | CN103922359A (https=) |
| WO (1) | WO2009058406A1 (https=) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103170447B (zh) | 2005-08-30 | 2015-02-18 | 先进科技材料公司 | 使用替代的氟化含硼前驱体的硼离子注入和用于注入的大氢化硼的形成 |
| JP5710976B2 (ja) * | 2007-11-02 | 2015-04-30 | セメクイップ， インコーポレイテッド | クラスターボロンの調製方法 |
| SG10201605310RA (en) | 2009-10-27 | 2016-08-30 | Entegris Inc | Ion implantation system and method |
| US8598022B2 (en) | 2009-10-27 | 2013-12-03 | Advanced Technology Materials, Inc. | Isotopically-enriched boron-containing compounds, and methods of making and using same |
| US8779383B2 (en) | 2010-02-26 | 2014-07-15 | Advanced Technology Materials, Inc. | Enriched silicon precursor compositions and apparatus and processes for utilizing same |
| TWI386983B (zh) * | 2010-02-26 | 2013-02-21 | 尖端科技材料股份有限公司 | 用以增進離子植入系統中之離子源的壽命及性能之方法與設備 |
| US9598352B2 (en) | 2011-11-18 | 2017-03-21 | The Curators Of The University Of Missouri | Process and device for the production of polyhedral boranes |
| WO2015023903A1 (en) | 2013-08-16 | 2015-02-19 | Entegris, Inc. | Silicon implantation in substrates and provision of silicon precursor compositions therefor |
| US9972489B2 (en) * | 2015-05-28 | 2018-05-15 | SemiNuclear, Inc. | Composition and method for making picocrystalline artificial borane atoms |
| US11651957B2 (en) | 2015-05-28 | 2023-05-16 | SemiNuclear, Inc. | Process and manufacture of low-dimensional materials supporting both self-thermalization and self-localization |
| RU2744435C2 (ru) * | 2016-11-29 | 2021-03-09 | Семиньюклиар, Инк. | Композиция и способ получения пикокристаллических искусственных атомов борана |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3577679B2 (ja) * | 1995-03-24 | 2004-10-13 | 日本化学工業株式会社 | メソポーラスアルミノシリケートの製造方法 |
| US6086837A (en) * | 1997-04-24 | 2000-07-11 | Bechtel Bwxt Idaho, Llc | Method of synthesizing enriched decaborane for use in generating boron neutron capture therapy pharmaceuticals |
| US6525224B1 (en) * | 1999-06-08 | 2003-02-25 | Northern Illinois University | Fused polyhedron borane dianion |
| KR100864048B1 (ko) * | 2002-06-26 | 2008-10-17 | 세미이큅, 인코포레이티드 | 이온 소스 |
| TWI375660B (en) * | 2004-01-22 | 2012-11-01 | Semequip Inc | Isotopically-enriched boranes and methods of preparing them |
| KR101196068B1 (ko) * | 2004-02-02 | 2012-11-01 | 세미이큅, 인코포레이티드 | Ｂ10ｈ10 2- 암모늄염의 생산 방법 및 ｂ18ｈ22의 생산방법 |
-
2008
- 2008-11-03 CN CN201410102721.3A patent/CN103922359A/zh active Pending
- 2008-11-03 WO PCT/US2008/012470 patent/WO2009058406A1/en not_active Ceased
- 2008-11-03 KR KR20107010912A patent/KR101510914B1/ko not_active Expired - Fee Related
- 2008-11-03 CN CN200880114580A patent/CN101848863A/zh active Pending
- 2008-11-03 US US12/741,201 patent/US8673251B2/en not_active Expired - Fee Related
- 2008-11-03 JP JP2010532073A patent/JP5710975B2/ja not_active Expired - Fee Related
- 2008-11-03 EP EP08843579.7A patent/EP2212251B1/en not_active Not-in-force
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