CN101848863A - 簇硼的制造方法 - Google Patents

簇硼的制造方法 Download PDF

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Publication number
CN101848863A
CN101848863A CN200880114580A CN200880114580A CN101848863A CN 101848863 A CN101848863 A CN 101848863A CN 200880114580 A CN200880114580 A CN 200880114580A CN 200880114580 A CN200880114580 A CN 200880114580A CN 101848863 A CN101848863 A CN 101848863A
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CN
China
Prior art keywords
acetonitrile
solvent
water
hexane
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN200880114580A
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English (en)
Chinese (zh)
Inventor
K·S·库克
M·奥克斯福德
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Semequip Inc
Original Assignee
Semequip Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semequip Inc filed Critical Semequip Inc
Publication of CN101848863A publication Critical patent/CN101848863A/zh
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B35/00—Boron; Compounds thereof
    • C01B35/02—Boron; Borides
    • C01B35/026—Higher boron hydrides, i.e. containing at least three boron atoms
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B6/00—Hydrides of metals including fully or partially hydrided metals, alloys or intermetallic compounds ; Compounds containing at least one metal-hydrogen bond, e.g. (GeH3)2S, SiH GeH; Monoborane or diborane; Addition complexes thereof
    • C01B6/06—Hydrides of aluminium, gallium, indium, thallium, germanium, tin, lead, arsenic, antimony, bismuth or polonium; Monoborane; Diborane; Addition complexes thereof
    • C01B6/10—Monoborane; Diborane; Addition complexes thereof
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T442/00—Fabric [woven, knitted, or nonwoven textile or cloth, etc.]
    • Y10T442/30—Woven fabric [i.e., woven strand or strip material]
    • Y10T442/3927—Including a paper or wood pulp layer

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Catalysts (AREA)
CN200880114580A 2007-11-02 2008-11-03 簇硼的制造方法 Pending CN101848863A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US168507P 2007-11-02 2007-11-02
US61/001,685 2007-11-02
PCT/US2008/012470 WO2009058406A1 (en) 2007-11-02 2008-11-03 Methods of preparing clusterboron

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CN201410102721.3A Division CN103922359A (zh) 2007-11-02 2008-11-03 簇硼的制造方法

Publications (1)

Publication Number Publication Date
CN101848863A true CN101848863A (zh) 2010-09-29

Family

ID=40591391

Family Applications (2)

Application Number Title Priority Date Filing Date
CN200880114580A Pending CN101848863A (zh) 2007-11-02 2008-11-03 簇硼的制造方法
CN201410102721.3A Pending CN103922359A (zh) 2007-11-02 2008-11-03 簇硼的制造方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
CN201410102721.3A Pending CN103922359A (zh) 2007-11-02 2008-11-03 簇硼的制造方法

Country Status (6)

Country Link
US (1) US8673251B2 (https=)
EP (1) EP2212251B1 (https=)
JP (1) JP5710975B2 (https=)
KR (1) KR101510914B1 (https=)
CN (2) CN101848863A (https=)
WO (1) WO2009058406A1 (https=)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG2014011944A (en) 2005-08-30 2014-08-28 Advanced Tech Materials Boron ion implantation using alternative fluorinated boron precursors, and formation of large boron hydrides for implantation
KR101586868B1 (ko) * 2007-11-02 2016-01-19 세미이큅, 인코포레이티드 클러스터붕소를 제조하는 방법
CN102668016B (zh) 2009-10-27 2016-02-24 安格斯公司 离子注入系统及方法
US8598022B2 (en) 2009-10-27 2013-12-03 Advanced Technology Materials, Inc. Isotopically-enriched boron-containing compounds, and methods of making and using same
TWI466179B (zh) 2010-02-26 2014-12-21 尖端科技材料股份有限公司 用以增進離子植入系統中之離子源的壽命及性能之方法與設備
US8779383B2 (en) 2010-02-26 2014-07-15 Advanced Technology Materials, Inc. Enriched silicon precursor compositions and apparatus and processes for utilizing same
US9598352B2 (en) 2011-11-18 2017-03-21 The Curators Of The University Of Missouri Process and device for the production of polyhedral boranes
SG11201601015RA (en) 2013-08-16 2016-03-30 Entegris Inc Silicon implantation in substrates and provision of silicon precursor compositions therefor
US11651957B2 (en) 2015-05-28 2023-05-16 SemiNuclear, Inc. Process and manufacture of low-dimensional materials supporting both self-thermalization and self-localization
US9972489B2 (en) * 2015-05-28 2018-05-15 SemiNuclear, Inc. Composition and method for making picocrystalline artificial borane atoms
RU2744435C2 (ru) 2016-11-29 2021-03-09 Семиньюклиар, Инк. Композиция и способ получения пикокристаллических искусственных атомов борана

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3577679B2 (ja) * 1995-03-24 2004-10-13 日本化学工業株式会社 メソポーラスアルミノシリケートの製造方法
US6086837A (en) * 1997-04-24 2000-07-11 Bechtel Bwxt Idaho, Llc Method of synthesizing enriched decaborane for use in generating boron neutron capture therapy pharmaceuticals
US6525224B1 (en) * 1999-06-08 2003-02-25 Northern Illinois University Fused polyhedron borane dianion
KR100864048B1 (ko) * 2002-06-26 2008-10-17 세미이큅, 인코포레이티드 이온 소스
TWI375660B (en) * 2004-01-22 2012-11-01 Semequip Inc Isotopically-enriched boranes and methods of preparing them
KR101196068B1 (ko) * 2004-02-02 2012-11-01 세미이큅, 인코포레이티드 Ｂ10ｈ10 2- 암모늄염의 생산 방법 및 ｂ18ｈ22의 생산방법

Also Published As

Publication number Publication date
EP2212251B1 (en) 2016-12-21
US8673251B2 (en) 2014-03-18
US20110165053A1 (en) 2011-07-07
WO2009058406A1 (en) 2009-05-07
KR101510914B1 (ko) 2015-04-10
EP2212251A4 (en) 2011-11-02
JP2011502923A (ja) 2011-01-27
JP5710975B2 (ja) 2015-04-30
KR20100092447A (ko) 2010-08-20
EP2212251A1 (en) 2010-08-04
CN103922359A (zh) 2014-07-16

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Application publication date: 20100929