JP2011501772A - 高機能性多光子硬化性反応種 - Google Patents

高機能性多光子硬化性反応種 Download PDF

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Publication number
JP2011501772A
JP2011501772A JP2010528922A JP2010528922A JP2011501772A JP 2011501772 A JP2011501772 A JP 2011501772A JP 2010528922 A JP2010528922 A JP 2010528922A JP 2010528922 A JP2010528922 A JP 2010528922A JP 2011501772 A JP2011501772 A JP 2011501772A
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JP
Japan
Prior art keywords
multiphoton
photoreactive composition
bridge
reactive species
photoinitiator
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JP2010528922A
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English (en)
Japanese (ja)
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JP2011501772A5 (enExample
Inventor
ジェイ． デボー，ロバート
マオ，グオピン
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3M Innovative Properties Co
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3M Innovative Properties Co
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Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of JP2011501772A publication Critical patent/JP2011501772A/ja
Publication of JP2011501772A5 publication Critical patent/JP2011501772A5/ja
Withdrawn legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • C08F20/36—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2010528922A 2007-10-11 2008-09-09 高機能性多光子硬化性反応種 Withdrawn JP2011501772A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US97922907P 2007-10-11 2007-10-11
PCT/US2008/075715 WO2009048705A1 (en) 2007-10-11 2008-09-09 Highly functional multiphoton curable reactive species

Publications (2)

Publication Number Publication Date
JP2011501772A true JP2011501772A (ja) 2011-01-13
JP2011501772A5 JP2011501772A5 (enExample) 2011-10-27

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ID=40549497

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010528922A Withdrawn JP2011501772A (ja) 2007-10-11 2008-09-09 高機能性多光子硬化性反応種

Country Status (5)

Country Link
US (1) US20100227272A1 (enExample)
EP (1) EP2207820A4 (enExample)
JP (1) JP2011501772A (enExample)
CN (1) CN101821302A (enExample)
WO (1) WO2009048705A1 (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014517856A (ja) * 2011-04-22 2014-07-24 スリーエム イノベイティブ プロパティズ カンパニー 改善された多光子撮像解像方法
JP2017500608A (ja) * 2013-12-06 2017-01-05 スリーエム イノベイティブ プロパティズ カンパニー 保護要素を備えた半液浸系顕微鏡対物レンズ及び多光子結像方法におけるその使用
KR101948789B1 (ko) * 2017-08-04 2019-02-15 부산대학교 산학협력단 신규한 유기 발광 화합물 및 이를 포함하는 유기발광소자

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100308497A1 (en) * 2007-09-06 2010-12-09 David Moses M Tool for making microstructured articles
JP5161310B2 (ja) * 2007-09-06 2013-03-13 スリーエム イノベイティブ プロパティズ カンパニー 成形型を形成する方法及び前記成形型を使用して物品を形成する方法
CN101796443A (zh) 2007-09-06 2010-08-04 3M创新有限公司 具有提供输出光区域控制的光提取结构的光导装置
WO2009048808A1 (en) 2007-10-11 2009-04-16 3M Innovative Properties Company Chromatic confocal sensor
EP2232531B1 (en) 2007-12-12 2018-09-19 3M Innovative Properties Company Method for making structures with improved edge definition
US8605256B2 (en) * 2008-02-26 2013-12-10 3M Innovative Properties Company Multi-photon exposure system
CN102575630B (zh) 2009-07-30 2014-07-23 3M创新有限公司 喷嘴及其制造方法
EP2537020A1 (en) * 2010-02-15 2012-12-26 Danmarks Tekniske Universitet A nanoporous optical sensor element
JP6373007B2 (ja) 2011-02-02 2018-08-15 スリーエム イノベイティブ プロパティズ カンパニー ノズル及びノズルを作製する方法
EP2935861A1 (en) 2012-12-21 2015-10-28 3M Innovative Properties Company Method of making a nozzle including injection molding
EP3077421B1 (en) 2013-12-06 2018-01-31 3M Innovative Properties Company Liquid photoreactive composition and method of fabricating structures
CN110100047B (zh) 2016-12-23 2022-04-01 3M创新有限公司 电铸微结构制品的方法
US20200086434A1 (en) 2016-12-23 2020-03-19 3M Innovative Properties Company Making nozzle structures on a structured surface
WO2019133585A1 (en) 2017-12-26 2019-07-04 3M Innovative Properties Company Fuel injector nozzle structure with choked through-hole outlet opening
WO2020080945A1 (en) * 2018-10-19 2020-04-23 Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek Tno High speed photochemistry for 3d lithography

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US4262072A (en) * 1979-06-25 1981-04-14 Minnesota Mining And Manufacturing Company Poly(ethylenically unsaturated alkoxy) heterocyclic protective coatings
US4249011A (en) * 1979-06-25 1981-02-03 Minnesota Mining And Manufacturing Company Poly(ethylenically unsaturated alkoxy) heterocyclic compounds
US4668601A (en) * 1985-01-18 1987-05-26 Minnesota Mining And Manufacturing Company Protective coating for phototools
CA2065368A1 (en) * 1989-08-21 1991-02-22 Carl R. Amos Methods of and apparatus for manipulating electromagnetic phenomenon
JP2724232B2 (ja) * 1990-05-02 1998-03-09 株式会社日立製作所 自動焦点手段およびその自動焦点手段を用いた光ディスク装置
GB9121789D0 (en) * 1991-10-14 1991-11-27 Minnesota Mining & Mfg Positive-acting photothermographic materials
US5298741A (en) * 1993-01-13 1994-03-29 Trustees Of Tufts College Thin film fiber optic sensor array and apparatus for concurrent viewing and chemical sensing of a sample
US5858624A (en) * 1996-09-20 1999-01-12 Minnesota Mining And Manufacturing Company Method for assembling planarization and indium-tin-oxide layer on a liquid crystal display color filter with a transfer process
JPH1124081A (ja) * 1997-06-27 1999-01-29 Minnesota Mining & Mfg Co <3M> 光学要素および積層体転写シート
US7046905B1 (en) * 1999-10-08 2006-05-16 3M Innovative Properties Company Blacklight with structured surfaces
US6852766B1 (en) * 2000-06-15 2005-02-08 3M Innovative Properties Company Multiphoton photosensitization system
WO2001096959A2 (en) * 2000-06-15 2001-12-20 3M Innovative Properties Company Multidirectional photoreactive absorption method
ATE440305T1 (de) * 2000-06-15 2009-09-15 3M Innovative Properties Co Erzeugung eines mehrfarbenbildes mittels eines multiphoton photochemischen verfahren
US7381516B2 (en) * 2002-10-02 2008-06-03 3M Innovative Properties Company Multiphoton photosensitization system
EP1245372B1 (en) * 2001-03-26 2011-09-28 Novartis AG Mould and method for the production of ophthalmic lenses
US20020192569A1 (en) * 2001-05-15 2002-12-19 The Chromaline Corporation Devices and methods for exposure of photoreactive compositions with light emitting diodes
US6904225B2 (en) * 2001-05-22 2005-06-07 Nichia Corporation Optical waveguide plate of surface light emitting apparatus
US6750266B2 (en) * 2001-12-28 2004-06-15 3M Innovative Properties Company Multiphoton photosensitization system
US7478942B2 (en) * 2003-01-23 2009-01-20 Samsung Electronics Co., Ltd. Light guide plate with light reflection pattern
CN100454087C (zh) * 2003-02-28 2009-01-21 夏普株式会社 面辐射变换元件及其制造方法和液晶显示装置
US20050254035A1 (en) * 2004-05-11 2005-11-17 Chromaplex, Inc. Multi-photon lithography
DE602005012068D1 (de) * 2005-06-10 2009-02-12 Obducat Ab Kopieren eines Musters mit Hilfe eines Zwischenstempels
TWM298289U (en) * 2006-03-17 2006-09-21 Hon Hai Prec Ind Co Ltd Light guide plates and electronic products using the same

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014517856A (ja) * 2011-04-22 2014-07-24 スリーエム イノベイティブ プロパティズ カンパニー 改善された多光子撮像解像方法
JP2017500608A (ja) * 2013-12-06 2017-01-05 スリーエム イノベイティブ プロパティズ カンパニー 保護要素を備えた半液浸系顕微鏡対物レンズ及び多光子結像方法におけるその使用
US10228617B2 (en) 2013-12-06 2019-03-12 3M Innovative Properties Company Semi-submersible microscope objective with protective element and use of the same in multiphoton imaging method
KR101948789B1 (ko) * 2017-08-04 2019-02-15 부산대학교 산학협력단 신규한 유기 발광 화합물 및 이를 포함하는 유기발광소자

Also Published As

Publication number Publication date
WO2009048705A1 (en) 2009-04-16
US20100227272A1 (en) 2010-09-09
CN101821302A (zh) 2010-09-01
EP2207820A1 (en) 2010-07-21
EP2207820A4 (en) 2011-10-26

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