CN101821302A - 高功能性多光子可固化反应性物质 - Google Patents

高功能性多光子可固化反应性物质 Download PDF

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Publication number
CN101821302A
CN101821302A CN200880111196A CN200880111196A CN101821302A CN 101821302 A CN101821302 A CN 101821302A CN 200880111196 A CN200880111196 A CN 200880111196A CN 200880111196 A CN200880111196 A CN 200880111196A CN 101821302 A CN101821302 A CN 101821302A
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China
Prior art keywords
photon
bridge
acrylate
multiphoton curable
group
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Pending
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CN200880111196A
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English (en)
Chinese (zh)
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罗伯特·J·德沃
毛国平
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3M Innovative Properties Co
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3M Innovative Properties Co
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Publication of CN101821302A publication Critical patent/CN101821302A/zh
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • C08F20/36—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
CN200880111196A 2007-10-11 2008-09-09 高功能性多光子可固化反应性物质 Pending CN101821302A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US97922907P 2007-10-11 2007-10-11
US60/979,229 2007-10-11
PCT/US2008/075715 WO2009048705A1 (en) 2007-10-11 2008-09-09 Highly functional multiphoton curable reactive species

Publications (1)

Publication Number Publication Date
CN101821302A true CN101821302A (zh) 2010-09-01

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN200880111196A Pending CN101821302A (zh) 2007-10-11 2008-09-09 高功能性多光子可固化反应性物质

Country Status (5)

Country Link
US (1) US20100227272A1 (enExample)
EP (1) EP2207820A4 (enExample)
JP (1) JP2011501772A (enExample)
CN (1) CN101821302A (enExample)
WO (1) WO2009048705A1 (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102575630A (zh) * 2009-07-30 2012-07-11 3M创新有限公司 喷嘴及其制造方法
CN103492951A (zh) * 2011-04-22 2014-01-01 3M创新有限公司 增大多光子成像分辨率的方法
CN111679417A (zh) * 2013-12-06 2020-09-18 3M创新有限公司 具有保护元件的半潜式显微镜物镜和物镜在多光子成像方法中的用途

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WO2009032815A1 (en) * 2007-09-06 2009-03-12 3M Innovative Properties Company Tool for making microstructured articles
JP5951928B2 (ja) 2007-09-06 2016-07-13 スリーエム イノベイティブ プロパティズ カンパニー 光出力の領域制御を提供する光抽出構造体を有する光ガイド
EP2197645B1 (en) * 2007-09-06 2014-10-22 3M Innovative Properties Company Methods of forming molds and methods of forming articles using said molds
US8451457B2 (en) 2007-10-11 2013-05-28 3M Innovative Properties Company Chromatic confocal sensor
JP5524856B2 (ja) 2007-12-12 2014-06-18 スリーエム イノベイティブ プロパティズ カンパニー エッジ明瞭性が向上した構造の製造方法
EP2257854B1 (en) * 2008-02-26 2018-10-31 3M Innovative Properties Company Multi-photon exposure system
US20130057863A1 (en) * 2010-02-15 2013-03-07 Biomodics Aps Nanoporous optical sensor element
CN106671317A (zh) 2011-02-02 2017-05-17 3M创新有限公司 喷嘴及其制备方法
EP2935861A1 (en) 2012-12-21 2015-10-28 3M Innovative Properties Company Method of making a nozzle including injection molding
EP3077421B1 (en) 2013-12-06 2018-01-31 3M Innovative Properties Company Liquid photoreactive composition and method of fabricating structures
CN110121574A (zh) 2016-12-23 2019-08-13 3M创新有限公司 在结构化表面上制作喷嘴结构
CN110100047B (zh) 2016-12-23 2022-04-01 3M创新有限公司 电铸微结构制品的方法
KR101948789B1 (ko) * 2017-08-04 2019-02-15 부산대학교 산학협력단 신규한 유기 발광 화합물 및 이를 포함하는 유기발광소자
WO2019133585A1 (en) 2017-12-26 2019-07-04 3M Innovative Properties Company Fuel injector nozzle structure with choked through-hole outlet opening
WO2020080945A1 (en) * 2018-10-19 2020-04-23 Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek Tno High speed photochemistry for 3d lithography

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US4262072A (en) * 1979-06-25 1981-04-14 Minnesota Mining And Manufacturing Company Poly(ethylenically unsaturated alkoxy) heterocyclic protective coatings
US4249011A (en) * 1979-06-25 1981-02-03 Minnesota Mining And Manufacturing Company Poly(ethylenically unsaturated alkoxy) heterocyclic compounds
US4668601A (en) * 1985-01-18 1987-05-26 Minnesota Mining And Manufacturing Company Protective coating for phototools
CA2065368A1 (en) * 1989-08-21 1991-02-22 Carl R. Amos Methods of and apparatus for manipulating electromagnetic phenomenon
JP2724232B2 (ja) * 1990-05-02 1998-03-09 株式会社日立製作所 自動焦点手段およびその自動焦点手段を用いた光ディスク装置
GB9121789D0 (en) * 1991-10-14 1991-11-27 Minnesota Mining & Mfg Positive-acting photothermographic materials
US5298741A (en) * 1993-01-13 1994-03-29 Trustees Of Tufts College Thin film fiber optic sensor array and apparatus for concurrent viewing and chemical sensing of a sample
US5858624A (en) * 1996-09-20 1999-01-12 Minnesota Mining And Manufacturing Company Method for assembling planarization and indium-tin-oxide layer on a liquid crystal display color filter with a transfer process
JPH1124081A (ja) * 1997-06-27 1999-01-29 Minnesota Mining & Mfg Co <3M> 光学要素および積層体転写シート
US7046905B1 (en) * 1999-10-08 2006-05-16 3M Innovative Properties Company Blacklight with structured surfaces
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KR100811017B1 (ko) * 2000-06-15 2008-03-11 쓰리엠 이노베이티브 프로퍼티즈 캄파니 다중방향성 광반응성 흡수 방법
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TWM298289U (en) * 2006-03-17 2006-09-21 Hon Hai Prec Ind Co Ltd Light guide plates and electronic products using the same

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102575630A (zh) * 2009-07-30 2012-07-11 3M创新有限公司 喷嘴及其制造方法
CN102575630B (zh) * 2009-07-30 2014-07-23 3M创新有限公司 喷嘴及其制造方法
CN103492951A (zh) * 2011-04-22 2014-01-01 3M创新有限公司 增大多光子成像分辨率的方法
CN111679417A (zh) * 2013-12-06 2020-09-18 3M创新有限公司 具有保护元件的半潜式显微镜物镜和物镜在多光子成像方法中的用途
CN111679417B (zh) * 2013-12-06 2022-08-19 3M创新有限公司 具有保护元件的半潜式显微镜物镜和物镜在多光子成像方法中的用途

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Publication number Publication date
US20100227272A1 (en) 2010-09-09
JP2011501772A (ja) 2011-01-13
WO2009048705A1 (en) 2009-04-16
EP2207820A4 (en) 2011-10-26
EP2207820A1 (en) 2010-07-21

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Application publication date: 20100901