JP2011222977A5 - - Google Patents

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Publication number
JP2011222977A5
JP2011222977A5 JP2011061737A JP2011061737A JP2011222977A5 JP 2011222977 A5 JP2011222977 A5 JP 2011222977A5 JP 2011061737 A JP2011061737 A JP 2011061737A JP 2011061737 A JP2011061737 A JP 2011061737A JP 2011222977 A5 JP2011222977 A5 JP 2011222977A5
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JP
Japan
Prior art keywords
electrode
groove
main surface
ceramic
ceramic dielectric
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2011061737A
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English (en)
Japanese (ja)
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JP5218865B2 (ja
JP2011222977A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP2011061737A external-priority patent/JP5218865B2/ja
Priority to JP2011061737A priority Critical patent/JP5218865B2/ja
Priority to CN201180012562.2A priority patent/CN102782831B/zh
Priority to US13/635,778 priority patent/US8848335B2/en
Priority to PCT/JP2011/057040 priority patent/WO2011118659A1/ja
Priority to KR1020127023625A priority patent/KR101429591B1/ko
Priority to TW100110169A priority patent/TWI471974B/zh
Publication of JP2011222977A publication Critical patent/JP2011222977A/ja
Publication of JP2011222977A5 publication Critical patent/JP2011222977A5/ja
Publication of JP5218865B2 publication Critical patent/JP5218865B2/ja
Application granted granted Critical
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2011061737A 2010-03-26 2011-03-18 静電チャック Active JP5218865B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2011061737A JP5218865B2 (ja) 2010-03-26 2011-03-18 静電チャック
KR1020127023625A KR101429591B1 (ko) 2010-03-26 2011-03-23 정전 척
US13/635,778 US8848335B2 (en) 2010-03-26 2011-03-23 Electrostatic chuck
PCT/JP2011/057040 WO2011118659A1 (ja) 2010-03-26 2011-03-23 静電チャック
CN201180012562.2A CN102782831B (zh) 2010-03-26 2011-03-23 静电吸盘
TW100110169A TWI471974B (zh) 2010-03-26 2011-03-24 Electrostatic sucker

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2010073689 2010-03-26
JP2010073689 2010-03-26
JP2011061737A JP5218865B2 (ja) 2010-03-26 2011-03-18 静電チャック

Publications (3)

Publication Number Publication Date
JP2011222977A JP2011222977A (ja) 2011-11-04
JP2011222977A5 true JP2011222977A5 (enExample) 2012-10-18
JP5218865B2 JP5218865B2 (ja) 2013-06-26

Family

ID=44673208

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011061737A Active JP5218865B2 (ja) 2010-03-26 2011-03-18 静電チャック

Country Status (6)

Country Link
US (1) US8848335B2 (enExample)
JP (1) JP5218865B2 (enExample)
KR (1) KR101429591B1 (enExample)
CN (1) CN102782831B (enExample)
TW (1) TWI471974B (enExample)
WO (1) WO2011118659A1 (enExample)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5972630B2 (ja) * 2011-03-30 2016-08-17 日本碍子株式会社 静電チャックの製法
JP5992375B2 (ja) 2013-08-08 2016-09-14 株式会社東芝 静電チャック、載置プレート支持台及び静電チャックの製造方法
DE102014008030A1 (de) * 2014-05-28 2015-12-03 Berliner Glas Kgaa Herbert Kubatz Gmbh & Co Verfahren zur Herstellung einer elektrostatischen Haltevorrichtung
JP6424049B2 (ja) * 2014-09-12 2018-11-14 株式会社日立ハイテクノロジーズ プラズマ処理装置
JP6346855B2 (ja) * 2014-12-25 2018-06-20 東京エレクトロン株式会社 静電吸着方法及び基板処理装置
JP6520160B2 (ja) * 2015-02-02 2019-05-29 住友大阪セメント株式会社 静電チャック装置
JP6124156B2 (ja) * 2015-04-21 2017-05-10 Toto株式会社 静電チャックおよびウェーハ処理装置
US10340171B2 (en) 2016-05-18 2019-07-02 Lam Research Corporation Permanent secondary erosion containment for electrostatic chuck bonds
JP2019523989A (ja) * 2016-06-01 2019-08-29 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 静電チャック及び静電チャックのための製造方法
US11069553B2 (en) * 2016-07-07 2021-07-20 Lam Research Corporation Electrostatic chuck with features for preventing electrical arcing and light-up and improving process uniformity
US10910195B2 (en) 2017-01-05 2021-02-02 Lam Research Corporation Substrate support with improved process uniformity
JP6832171B2 (ja) 2017-01-24 2021-02-24 東京エレクトロン株式会社 プラズマ処理装置のチャンバ本体の内部のクリーニングを含むプラズマ処理方法
US10147610B1 (en) 2017-05-30 2018-12-04 Lam Research Corporation Substrate pedestal module including metallized ceramic tubes for RF and gas delivery
US11289355B2 (en) * 2017-06-02 2022-03-29 Lam Research Corporation Electrostatic chuck for use in semiconductor processing
US10190216B1 (en) 2017-07-25 2019-01-29 Lam Research Corporation Showerhead tilt mechanism
US11469084B2 (en) 2017-09-05 2022-10-11 Lam Research Corporation High temperature RF connection with integral thermal choke
JP7308254B2 (ja) * 2018-02-19 2023-07-13 日本特殊陶業株式会社 保持装置
JP6504532B1 (ja) * 2018-03-14 2019-04-24 Toto株式会社 静電チャック
KR102543933B1 (ko) 2018-04-05 2023-06-14 램 리써치 코포레이션 냉각제 가스 존들 및 대응하는 그루브 및 단극성 정전 클램핑 전극 패턴들을 갖는 정전 척들
US11183368B2 (en) 2018-08-02 2021-11-23 Lam Research Corporation RF tuning systems including tuning circuits having impedances for setting and adjusting parameters of electrodes in electrostatic chucks
US11842915B2 (en) * 2019-01-24 2023-12-12 Kyocera Corporation Electrostatic chuck
JP6729735B1 (ja) * 2019-03-05 2020-07-22 Toto株式会社 静電チャック
US20210159107A1 (en) * 2019-11-21 2021-05-27 Applied Materials, Inc. Edge uniformity tunability on bipolar electrostatic chuck
JP7548664B2 (ja) * 2020-03-02 2024-09-10 東京エレクトロン株式会社 静電チャックの製造方法、静電チャック及び基板処理装置
KR20230078792A (ko) * 2020-10-01 2023-06-02 램 리써치 코포레이션 연장된 정전 척 (electrostatic chuck) 전극을 갖는 고온 페데스탈
US11776794B2 (en) * 2021-02-19 2023-10-03 Applied Materials, Inc. Electrostatic chuck assembly for cryogenic applications
TWI785522B (zh) * 2021-03-08 2022-12-01 台灣積體電路製造股份有限公司 靜電夾具的操作方法和靜電夾具
CN115050682B (zh) * 2021-03-08 2026-03-17 台湾积体电路制造股份有限公司 静电夹具的操作方法和静电夹具
CN114899138B (zh) * 2022-05-11 2025-12-23 北京华卓精科科技股份有限公司 一种耐蚀静电卡盘及其制造方法
JP7343069B1 (ja) 2023-03-27 2023-09-12 Toto株式会社 静電チャック
JP7545603B1 (ja) 2024-03-07 2024-09-04 日本特殊陶業株式会社 保持部材
CN118219388B (zh) * 2024-03-26 2025-10-10 君原电子科技(海宁)有限公司 一种静电卡盘陶瓷板干压成型方法

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Publication number Priority date Publication date Assignee Title
US5822171A (en) 1994-02-22 1998-10-13 Applied Materials, Inc. Electrostatic chuck with improved erosion resistance
KR100404631B1 (ko) 1994-01-31 2004-02-05 어플라이드 머티어리얼스, 인코포레이티드 두께가일정한절연체막을갖는정전기척
JP3457477B2 (ja) * 1995-09-06 2003-10-20 日本碍子株式会社 静電チャック
US5810933A (en) 1996-02-16 1998-09-22 Novellus Systems, Inc. Wafer cooling device
KR100635845B1 (ko) * 1999-07-08 2006-10-18 램 리써치 코포레이션 정전기 척 및 그 제조 방법
JP2002231799A (ja) * 2001-02-06 2002-08-16 Toto Ltd 静電チャック、静電チャックの吸着表面に形成された凹部への放電防止方法、およびその静電チャックを用いた基板固定加熱冷却装置
KR20040070008A (ko) * 2003-01-29 2004-08-06 쿄세라 코포레이션 정전척
US7586734B2 (en) 2004-06-28 2009-09-08 Kyocera Corporation Electrostatic chuck
US20090086400A1 (en) 2007-09-28 2009-04-02 Intevac, Inc. Electrostatic chuck apparatus
JP4974873B2 (ja) * 2007-12-26 2012-07-11 新光電気工業株式会社 静電チャック及び基板温調固定装置

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