JP2018502215A5 - - Google Patents
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- Publication number
- JP2018502215A5 JP2018502215A5 JP2017523838A JP2017523838A JP2018502215A5 JP 2018502215 A5 JP2018502215 A5 JP 2018502215A5 JP 2017523838 A JP2017523838 A JP 2017523838A JP 2017523838 A JP2017523838 A JP 2017523838A JP 2018502215 A5 JP2018502215 A5 JP 2018502215A5
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- metal oxide
- film according
- oxide thin
- omega
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910044991 metal oxide Inorganic materials 0.000 claims 3
- 150000004706 metal oxides Chemical class 0.000 claims 3
- 239000010409 thin film Substances 0.000 claims 3
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP14192219.5 | 2014-11-07 | ||
| EP14192219.5A EP3018111A1 (en) | 2014-11-07 | 2014-11-07 | Metal oxide thin film, method for depositing metal oxide thin film and device comprising metal oxide thin film |
| PCT/EP2015/002229 WO2016071000A1 (en) | 2014-11-07 | 2015-11-05 | Metal oxide thin film, method for depositing metal oxide thin film and device comprising metal oxide thin film |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018502215A JP2018502215A (ja) | 2018-01-25 |
| JP2018502215A5 true JP2018502215A5 (enExample) | 2018-03-15 |
| JP7091577B2 JP7091577B2 (ja) | 2022-06-28 |
Family
ID=51947135
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017523838A Active JP7091577B2 (ja) | 2014-11-07 | 2015-11-05 | 金属酸化物薄膜、金属酸化物薄膜を堆積する方法及び金属酸化物薄膜を備える装置 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US10366803B2 (enExample) |
| EP (1) | EP3018111A1 (enExample) |
| JP (1) | JP7091577B2 (enExample) |
| KR (1) | KR102266536B1 (enExample) |
| CN (1) | CN107074662B (enExample) |
| TW (1) | TWI702189B (enExample) |
| WO (1) | WO2016071000A1 (enExample) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6651714B2 (ja) * | 2014-07-11 | 2020-02-19 | 株式会社リコー | ｎ型酸化物半導体製造用塗布液、電界効果型トランジスタ、表示素子、画像表示装置、及びシステム |
| WO2019014776A1 (en) * | 2017-07-20 | 2019-01-24 | Curtis Berlinguette | PHOTODEPOSITION OF METAL OXIDES FOR ELECTROCHROMIC DEVICES |
| TWI718353B (zh) | 2017-12-13 | 2021-02-11 | 財團法人工業技術研究院 | 鈣鈦礦太陽能電池與堆疊型太陽能電池 |
| CN110224070B (zh) * | 2018-03-02 | 2022-12-20 | 昆山工研院新型平板显示技术中心有限公司 | Qled器件、制备方法及显示装置 |
| CN110224072B (zh) * | 2018-03-02 | 2021-09-14 | 昆山工研院新型平板显示技术中心有限公司 | 发光器件及其制备方法、显示装置 |
| CN109879319B (zh) * | 2019-01-23 | 2020-12-25 | 西安交通大学 | 一种具有光磁效应的锰掺杂氧化钼纳米材料的制备方法 |
| TWI739419B (zh) * | 2020-05-08 | 2021-09-11 | 崑山科技大學 | 電致變色材料的製作方法 |
| CN111916251A (zh) * | 2020-08-27 | 2020-11-10 | 江苏日久光电股份有限公司 | 低方阻透明导电膜 |
| CN112266021B (zh) * | 2020-11-25 | 2021-11-16 | 中南大学 | 一种同步制备物相纯α-MoO3和β-MoO3的方法 |
| CN114916228B (zh) * | 2020-12-10 | 2023-08-15 | Lt金属株式会社 | 以钼氧化物为主成分的金属氧化物烧结体及包含其的溅射靶材 |
| CN112479683A (zh) * | 2020-12-17 | 2021-03-12 | 中山智隆新材料科技有限公司 | 一种掺杂的igzo材料的制备方法 |
| TWI832093B (zh) * | 2021-09-17 | 2024-02-11 | 崑山科技大學 | 電致變色離子儲存膜的製備方法 |
| CN115985993B (zh) * | 2022-12-16 | 2026-04-24 | 浙江师范大学 | 一种低成本非掺杂异质结晶体硅太阳能电池及其制备方法 |
| PL247166B1 (pl) * | 2023-01-02 | 2025-05-26 | Instytut Masz Przeplywowych Im Roberta Szewalskiego Polskiej Akademii Nauk | Sposób wytwarzania warstw krystalicznych trójtlenku molibdenu |
| CN117089821A (zh) * | 2023-08-03 | 2023-11-21 | 中山大学 | 一种原位退火制备纯相MoO3薄膜的方法及其应用 |
| CN117389047A (zh) * | 2023-10-26 | 2024-01-12 | 业成光电（深圳）有限公司 | 扩增实境显示装置 |
| CN118324426A (zh) * | 2024-04-15 | 2024-07-12 | 辽宁大学 | 一种增强型NiO@MnO2复合膜的制备方法及其在高性能电致变色-能量存储器件中的应用 |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AT300140B (de) * | 1970-06-02 | 1972-07-10 | Metallwerk Plansee Ag & Co Kom | Drehanode für Röntgenröhren |
| DD137867A1 (de) * | 1978-07-20 | 1979-09-26 | Guenter Weise | Substrat fuer keramische halbleiterwiderstaende und herstellungsverfahren |
| JPS6070421A (ja) * | 1983-09-28 | 1985-04-22 | Toshiba Corp | エレクトロクロミック表示素子 |
| US4753916A (en) | 1986-09-17 | 1988-06-28 | E. I. Du Pont De Nemours And Company | Metal oxides of molybdenum or molybdenum and tungsten |
| JPH05147939A (ja) * | 1991-12-03 | 1993-06-15 | Ube Ind Ltd | アモルフアス強誘電体酸化物材料及びその製造方法 |
| EP1452622A3 (en) | 1995-08-23 | 2004-09-29 | Asahi Glass Ceramics Co., Ltd. | Target and process for its production, and method for forming a film having a high refractive index |
| DE19952335B4 (de) * | 1999-10-29 | 2007-03-29 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | In elektrochemischen Bauelementen verwendbare pastöse Masse, damit gebildete Schichten, Folien, Schichtverbünde und wiederaufladbare elektrochemische Zellen sowie Verfahren zur Herstellung der Schichten, Folien und Schichtverbünde |
| US6838198B2 (en) * | 2000-12-07 | 2005-01-04 | Industrial Research Limited | Organic/inorganic-oxide multilayer materials |
| US7205056B2 (en) * | 2001-06-13 | 2007-04-17 | Seiko Epson Corporation | Ceramic film and method of manufacturing the same, ferroelectric capacitor, semiconductor device, and other element |
| BRPI0412811A (pt) | 2003-07-22 | 2006-09-26 | Starck H C Inc | método de fabricação de pós de moo2, produtos feitos de pós de moo2, depósito de pelìculas finas de moo2 e métodos de uso de tais materiais |
| JP4243687B2 (ja) | 2003-12-19 | 2009-03-25 | 独立行政法人産業技術総合研究所 | 有機無機ハイブリッド薄膜及びその作製方法 |
| US8092660B2 (en) * | 2004-12-03 | 2012-01-10 | Cardinal Cg Company | Methods and equipment for depositing hydrophilic coatings, and deposition technologies for thin films |
| US20070071985A1 (en) | 2005-09-29 | 2007-03-29 | Prabhat Kumar | Sputtering target, low resistivity, transparent conductive film, method for producing such film and composition for use therein |
| US8183764B2 (en) | 2008-03-26 | 2012-05-22 | Toppan Printing Co., Ltd. | Organic electroluminescence element, manufacturing method for an organic electroluminescence element and display unit |
| JP5326665B2 (ja) | 2008-03-26 | 2013-10-30 | 凸版印刷株式会社 | 有機エレクトロルミネッセンス素子の製造方法 |
| US9664974B2 (en) * | 2009-03-31 | 2017-05-30 | View, Inc. | Fabrication of low defectivity electrochromic devices |
| AT11941U1 (de) * | 2010-02-12 | 2011-07-15 | Plansee Metall Gmbh | Berührungssensoranordnung |
| US20120160663A1 (en) * | 2010-12-14 | 2012-06-28 | Alliance For Sustainable Energy, Llc. | Sputter Deposition and Annealing of High Conductivity Transparent Oxides |
| CN104638141A (zh) * | 2013-11-14 | 2015-05-20 | 海洋王照明科技股份有限公司 | 有机电致发光器件及其制备方法 |
-
2014
- 2014-11-07 EP EP14192219.5A patent/EP3018111A1/en not_active Withdrawn
-
2015
- 2015-10-27 TW TW104135210A patent/TWI702189B/zh active
- 2015-11-05 CN CN201580060640.4A patent/CN107074662B/zh active Active
- 2015-11-05 JP JP2017523838A patent/JP7091577B2/ja active Active
- 2015-11-05 KR KR1020177010634A patent/KR102266536B1/ko active Active
- 2015-11-05 US US15/521,907 patent/US10366803B2/en active Active
- 2015-11-05 WO PCT/EP2015/002229 patent/WO2016071000A1/en not_active Ceased
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