JP2018502215A5 - - Google Patents

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Publication number
JP2018502215A5
JP2018502215A5 JP2017523838A JP2017523838A JP2018502215A5 JP 2018502215 A5 JP2018502215 A5 JP 2018502215A5 JP 2017523838 A JP2017523838 A JP 2017523838A JP 2017523838 A JP2017523838 A JP 2017523838A JP 2018502215 A5 JP2018502215 A5 JP 2018502215A5
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JP
Japan
Prior art keywords
thin film
metal oxide
film according
oxide thin
omega
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JP2017523838A
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English (en)
Japanese (ja)
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JP7091577B2 (ja
JP2018502215A (ja
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Priority claimed from EP14192219.5A external-priority patent/EP3018111A1/en
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Publication of JP2018502215A publication Critical patent/JP2018502215A/ja
Publication of JP2018502215A5 publication Critical patent/JP2018502215A5/ja
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Publication of JP7091577B2 publication Critical patent/JP7091577B2/ja
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JP2017523838A 2014-11-07 2015-11-05 金属酸化物薄膜、金属酸化物薄膜を堆積する方法及び金属酸化物薄膜を備える装置 Active JP7091577B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP14192219.5A EP3018111A1 (en) 2014-11-07 2014-11-07 Metal oxide thin film, method for depositing metal oxide thin film and device comprising metal oxide thin film
EP14192219.5 2014-11-07
PCT/EP2015/002229 WO2016071000A1 (en) 2014-11-07 2015-11-05 Metal oxide thin film, method for depositing metal oxide thin film and device comprising metal oxide thin film

Publications (3)

Publication Number Publication Date
JP2018502215A JP2018502215A (ja) 2018-01-25
JP2018502215A5 true JP2018502215A5 (enExample) 2018-03-15
JP7091577B2 JP7091577B2 (ja) 2022-06-28

Family

ID=51947135

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017523838A Active JP7091577B2 (ja) 2014-11-07 2015-11-05 金属酸化物薄膜、金属酸化物薄膜を堆積する方法及び金属酸化物薄膜を備える装置

Country Status (7)

Country Link
US (1) US10366803B2 (enExample)
EP (1) EP3018111A1 (enExample)
JP (1) JP7091577B2 (enExample)
KR (1) KR102266536B1 (enExample)
CN (1) CN107074662B (enExample)
TW (1) TWI702189B (enExample)
WO (1) WO2016071000A1 (enExample)

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JP6651714B2 (ja) * 2014-07-11 2020-02-19 株式会社リコー ｎ型酸化物半導体製造用塗布液、電界効果型トランジスタ、表示素子、画像表示装置、及びシステム
ES2975068T3 (es) * 2017-07-20 2024-07-03 Miru Smart Tech Corp Fotodeposición de óxidos metálicos para dispositivos electrocrómicos
TWI718353B (zh) * 2017-12-13 2021-02-11 財團法人工業技術研究院 鈣鈦礦太陽能電池與堆疊型太陽能電池
CN110224072B (zh) * 2018-03-02 2021-09-14 昆山工研院新型平板显示技术中心有限公司 发光器件及其制备方法、显示装置
CN110224070B (zh) * 2018-03-02 2022-12-20 昆山工研院新型平板显示技术中心有限公司 Qled器件、制备方法及显示装置
CN109879319B (zh) * 2019-01-23 2020-12-25 西安交通大学 一种具有光磁效应的锰掺杂氧化钼纳米材料的制备方法
TWI739419B (zh) * 2020-05-08 2021-09-11 崑山科技大學 電致變色材料的製作方法
CN111916251A (zh) * 2020-08-27 2020-11-10 江苏日久光电股份有限公司 低方阻透明导电膜
CN112266021B (zh) * 2020-11-25 2021-11-16 中南大学 一种同步制备物相纯α-MoO3和β-MoO3的方法
WO2022124460A1 (ko) * 2020-12-10 2022-06-16 엘티메탈 주식회사 몰리브덴 산화물을 주된 성분으로 하는 금속 산화물 소결체 및 이를 포함하는 스퍼터링 타겟{metal oxide sintered body containing molybdenum oxide as the main component and sputtering target comprising the same}
CN112479683A (zh) * 2020-12-17 2021-03-12 中山智隆新材料科技有限公司 一种掺杂的igzo材料的制备方法
TWI832093B (zh) * 2021-09-17 2024-02-11 崑山科技大學 電致變色離子儲存膜的製備方法
CN115985993A (zh) * 2022-12-16 2023-04-18 浙江师范大学 一种低成本非掺杂异质结晶体硅太阳能电池及其制备方法
PL247166B1 (pl) * 2023-01-02 2025-05-26 Instytut Masz Przeplywowych Im Roberta Szewalskiego Polskiej Akademii Nauk Sposób wytwarzania warstw krystalicznych trójtlenku molibdenu
CN117089821A (zh) * 2023-08-03 2023-11-21 中山大学 一种原位退火制备纯相MoO3薄膜的方法及其应用
CN117389047A (zh) * 2023-10-26 2024-01-12 业成光电（深圳）有限公司 扩增实境显示装置
CN118324426A (zh) * 2024-04-15 2024-07-12 辽宁大学 一种增强型NiO@MnO2复合膜的制备方法及其在高性能电致变色-能量存储器件中的应用

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AT300140B (de) * 1970-06-02 1972-07-10 Metallwerk Plansee Ag & Co Kom Drehanode für Röntgenröhren
DD137867A1 (de) * 1978-07-20 1979-09-26 Guenter Weise Substrat fuer keramische halbleiterwiderstaende und herstellungsverfahren
JPS6070421A (ja) * 1983-09-28 1985-04-22 Toshiba Corp エレクトロクロミック表示素子
US4753916A (en) 1986-09-17 1988-06-28 E. I. Du Pont De Nemours And Company Metal oxides of molybdenum or molybdenum and tungsten
JPH05147939A (ja) * 1991-12-03 1993-06-15 Ube Ind Ltd アモルフアス強誘電体酸化物材料及びその製造方法
EP0852266B1 (en) 1995-08-23 2004-10-13 Asahi Glass Ceramics Co., Ltd. Target, process for production thereof, and method of forming highly refractive film
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