JP2011187881A5 - - Google Patents

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Publication number
JP2011187881A5
JP2011187881A5 JP2010054408A JP2010054408A JP2011187881A5 JP 2011187881 A5 JP2011187881 A5 JP 2011187881A5 JP 2010054408 A JP2010054408 A JP 2010054408A JP 2010054408 A JP2010054408 A JP 2010054408A JP 2011187881 A5 JP2011187881 A5 JP 2011187881A5
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JP
Japan
Prior art keywords
electrode
plasma
leakage current
plasma processing
power source
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Pending
Application number
JP2010054408A
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English (en)
Japanese (ja)
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JP2011187881A (ja
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Priority to JP2010054408A priority Critical patent/JP2011187881A/ja
Priority claimed from JP2010054408A external-priority patent/JP2011187881A/ja
Publication of JP2011187881A publication Critical patent/JP2011187881A/ja
Publication of JP2011187881A5 publication Critical patent/JP2011187881A5/ja
Pending legal-status Critical Current

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JP2010054408A 2010-03-11 2010-03-11 プラズマ処理装置および方法 Pending JP2011187881A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2010054408A JP2011187881A (ja) 2010-03-11 2010-03-11 プラズマ処理装置および方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010054408A JP2011187881A (ja) 2010-03-11 2010-03-11 プラズマ処理装置および方法

Publications (2)

Publication Number Publication Date
JP2011187881A JP2011187881A (ja) 2011-09-22
JP2011187881A5 true JP2011187881A5 (enExample) 2013-03-21

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ID=44793762

Family Applications (1)

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JP2010054408A Pending JP2011187881A (ja) 2010-03-11 2010-03-11 プラズマ処理装置および方法

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JP (1) JP2011187881A (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7527194B2 (ja) * 2020-12-23 2024-08-02 東京エレクトロン株式会社 プラズマ処理装置およびプラズマ処理方法
CN115250648B (zh) 2021-02-25 2025-11-11 株式会社日立高新技术 等离子处理装置
CN114158173B (zh) * 2021-11-30 2023-09-01 西北核技术研究所 一种用于抑制预脉冲电流的丝阵负载结构

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3287996B2 (ja) * 1996-12-26 2002-06-04 京セラ株式会社 静電チャック装置
US5933314A (en) * 1997-06-27 1999-08-03 Lam Research Corp. Method and an apparatus for offsetting plasma bias voltage in bi-polar electro-static chucks
JP4468194B2 (ja) * 2005-01-28 2010-05-26 株式会社日立ハイテクノロジーズ プラズマ処理方法およびプラズマ処理装置

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