JP2011140716A - 繊維状物質の連続コーティングのための方法及び装置 - Google Patents
繊維状物質の連続コーティングのための方法及び装置 Download PDFInfo
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Abstract
【解決手段】繊維状物質の複数のストランド46を、ハウジング42により画定された包囲されたチャンバー44内のコーティングゾーンに通して連続的に移動させることにより、ストランドの一部分がチャンバーを通って移動するときに前記部分が反応物質ガスと接触し、ストランドと物理的に接触することなく、かつハウジングを直接に加熱することなく、ストランドの前記部分を直接加熱し、反応物質ガスがストランドの前記部分と接触し分解する結果としてストランド上にコーティング材料を付着させてコーティング材料のコーティングを形成することを含む化学蒸着法である。
【選択図】図3
Description
セラミックマトリックス複合材(CMC)材料は一般にセラミックマトリックス材料中に埋め込まれたセラミック繊維強化材を含んでいる。この強化材は、マトリックス材料中に分散した不連続の短繊維又はマトリックス材料内で配向された連続繊維若しくは繊維束(トウ)であり得、マトリックスに亀裂が入った場合にはCMCの負荷担持成分として働く。一方、セラミックマトリックスは強化材を保護し、その繊維の配向を維持し、強化材に対する負荷を分散するように機能する。個々の繊維(フィラメント)は、これらの繊維とセラミックマトリックス材料との限定され制御された滑りを許容する脆弱な界面又は剥離(de-bond)層を形成するように窒化ホウ素(BN)又は炭素のような剥離材で被覆されることが多い。CMC内に亀裂が発生したとき、その亀裂を横切る1以上の繊維が、その負荷をマトリックス材料の隣接する繊維及び領域に再分配して、その亀裂がさらに伝播するのを阻止するか又は少なくとも遅らせるように作用する。
12 薄層
14 トウ
16 繊維
18 マトリックス
20 反応器
22 ハウジング
24 チャンバー
26 繊維
28 加熱炉
30
40 反応器
42 ハウジング
44 チャンバー
46 ストランド
48a 電極
48b 電極
50 ポート
52 スプール
54 スプール
70 輻射加熱炉
72 ハウジング
73 ミラー
74 チャンバー
76 ストランド
77a 点
77b 点
78 光源
80 輻射加熱炉
82 ハウジング
83 反射器
84 チャンバー
86 ストランド
87a 点
87b 点
88a 光源
88b 光源
Claims (10)
- 繊維状物質の複数のストランド(46,76,86)を、ハウジング(42,72,82)により画定される包囲されたチャンバー(44,74,84)内のコーティングゾーンに通して連続的に移動させることによって、ストランド(46,76,86)の一部分がチャンバー(44,74,84)を通って移動するときに前記部分が反応物質ガスと接触し、反応物質ガスがストランド(46,76,86)の前記部分と接触し分解する結果としてコーティング材料をストランド(46,76,86)上に付着させてコーティング材料のコーティングを形成することを含む化学蒸着法であって、
ストランド(46,76,86)と物理的に接触せず、ハウジング(42,72,82)を直接加熱しない加熱手段(48a,48b,78,88a,88b)で、ストランド(46,76,86)の前記部分を直接加熱し、前記加熱手段(48a,48b,78,88a,88b)が容量性又は誘導結合手段(48a,48b)、マイクロ波放射発生手段(48a,48b)及び輻射加熱手段(78,88a,88b)からなる群から選択されることを特徴とする、前記化学蒸着法。 - ストランド(46,76,86)の前記部分がマイクロ波放射発生手段(48a,48b)及びそれにより発生したマイクロ波放射によって加熱されることを特徴とする、請求項1記載の化学蒸着法。
- さらに、ハウジング(42)の内面上の赤外−反射性コーティングにより特徴付けられ、赤外−反射性コーティングがストランド(46)から放出された熱をストランド(46)の方に向けて反射するように適合している、請求項2記載の化学蒸着法。
- ストランド(46,76,86)の前記部分が輻射加熱手段(78,88a,88b)及びそれにより発生した電磁放射線によって加熱されることを特徴とする、請求項1記載の化学蒸着法。
- さらに、ハウジング(72,82)及び輻射加熱手段(78,88a,88b)を含有する光反射器(73,83)により特徴付けられる、請求項4記載の化学蒸着法。
- 光反射器(73)が楕円形の断面を有し、輻射加熱手段(78)が楕円形の断面の第1の焦点(77a)に位置し、ハウジング(72)が楕円形の断面の第2の焦点(77b)に位置することを特徴とする、請求項5記載の化学蒸着法。
- 光反射器(83)が少なくとも2つの交差する楕円により画定される断面を有し、各々の楕円が個別に第1の焦点(87a)を有し、楕円が一致する第2の焦点(87b)を共有し、輻射加熱手段(88a,88b)が各々第1の焦点(87a)に位置し、ハウジング(82)が一致する第2の焦点(87b)に位置することを特徴とする、請求項5記載の化学蒸着法。
- コーティング材料が繊維状物質とセラミック材料との結合を阻止する剥離層であることを特徴とする、請求項1乃至請求項7のいずれか1項記載の化学蒸着法。
- さらに、前記付着工程により製造された被覆されたストランドをセラミックマトリックス複合材料中の強化材として使用することを特徴とする、請求項1乃至請求項8のいずれか1項記載の化学蒸着法。
- 請求項1乃至請求項9のいずれか1項記載の方法を実施するのに適した化学蒸着装置(50,70,80)。
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JP2019001706A (ja) * | 2017-06-15 | 2019-01-10 | ロールス−ロイス ハイ テンペラチャー コンポジッツ,インコーポレーテッド | 炭化ケイ素繊維上に湿度耐性コーティングを形成する方法 |
JP7126872B2 (ja) | 2017-06-15 | 2022-08-29 | ロールス-ロイス ハイ テンペラチャー コンポジッツ,インコーポレーテッド | 炭化ケイ素繊維上に湿度耐性コーティングを形成する方法 |
JP2023016748A (ja) * | 2021-07-21 | 2023-02-02 | ゼネラル・エレクトリック・カンパニイ | セラミックファイバをコーティングするためのシステムおよび方法 |
JP7416470B2 (ja) | 2021-07-21 | 2024-01-17 | ゼネラル・エレクトリック・カンパニイ | セラミックファイバをコーティングするためのシステムおよび方法 |
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US20110171399A1 (en) | 2011-07-14 |
EP2343398A1 (en) | 2011-07-13 |
CA2726386A1 (en) | 2011-07-08 |
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