JP2011049296A5 - - Google Patents

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Publication number
JP2011049296A5
JP2011049296A5 JP2009195538A JP2009195538A JP2011049296A5 JP 2011049296 A5 JP2011049296 A5 JP 2011049296A5 JP 2009195538 A JP2009195538 A JP 2009195538A JP 2009195538 A JP2009195538 A JP 2009195538A JP 2011049296 A5 JP2011049296 A5 JP 2011049296A5
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JP
Japan
Prior art keywords
exposure
maskless
exposure method
pattern
maskless exposure
Prior art date
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Pending
Application number
JP2009195538A
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English (en)
Japanese (ja)
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JP2011049296A (ja
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Priority to JP2009195538A priority Critical patent/JP2011049296A/ja
Priority claimed from JP2009195538A external-priority patent/JP2011049296A/ja
Publication of JP2011049296A publication Critical patent/JP2011049296A/ja
Publication of JP2011049296A5 publication Critical patent/JP2011049296A5/ja
Pending legal-status Critical Current

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JP2009195538A 2009-08-26 2009-08-26 マスクレス露光方法 Pending JP2011049296A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009195538A JP2011049296A (ja) 2009-08-26 2009-08-26 マスクレス露光方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009195538A JP2011049296A (ja) 2009-08-26 2009-08-26 マスクレス露光方法

Publications (2)

Publication Number Publication Date
JP2011049296A JP2011049296A (ja) 2011-03-10
JP2011049296A5 true JP2011049296A5 (https=) 2012-09-06

Family

ID=43835363

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009195538A Pending JP2011049296A (ja) 2009-08-26 2009-08-26 マスクレス露光方法

Country Status (1)

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JP (1) JP2011049296A (https=)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013069860A (ja) * 2011-09-22 2013-04-18 Orc Manufacturing Co Ltd Ｌｅｄ光源装置および露光装置
KR101970685B1 (ko) 2012-08-09 2019-04-19 삼성전자 주식회사 패터닝 방법, 그 패터닝 방법을 이용한 반도체 소자 제조방법, 및 반도체 소자 제조장치
JP6113990B2 (ja) * 2012-10-01 2017-04-12 株式会社クラレ 微細構造体の製造方法
JP6311720B2 (ja) 2013-10-25 2018-04-18 株式会社ニコン レーザ装置、該レーザ装置を備えた露光装置及び検査装置
KR20160049171A (ko) 2014-10-24 2016-05-09 삼성디스플레이 주식회사 마스크리스 노광 장치, 마스크리스 노광 방법 및 이에 의해 제조되는 표시 기판
CN109196416B (zh) 2016-05-26 2021-12-17 株式会社尼康 脉冲光生成装置、脉冲光生成方法、具备脉冲光生成装置的曝光装置及检查装置
CN109154727B (zh) 2016-05-26 2022-02-22 株式会社尼康 脉冲光生成装置、脉冲光生成方法、具备脉冲光生成装置的曝光装置及检查装置
JP7121509B2 (ja) * 2018-03-19 2022-08-18 キヤノン株式会社 露光装置、露光方法、および物品製造方法
KR102869821B1 (ko) * 2020-09-18 2025-10-14 어플라이드 머티어리얼스, 인코포레이티드 2번의 노출들을 이용하여 디지털 리소그래피를 위한 프로세스 윈도우 및 해상도를 개선하기 위한 방법들
EP3989002A1 (en) * 2020-10-20 2022-04-27 Mycronic Ab Device and method for setting relative laser intensities

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7755657B2 (en) * 2003-06-12 2010-07-13 Micronic Laser Systems Ab Method for high precision printing of patterns
US6831768B1 (en) * 2003-07-31 2004-12-14 Asml Holding N.V. Using time and/or power modulation to achieve dose gray-scaling in optical maskless lithography
JP2007522671A (ja) * 2004-02-25 2007-08-09 マイクロニック レーザー システムズ アクチボラゲット 光マスクレスリソグラフィにおいてパターンを露光し、マスクをエミュレートする方法
US7713667B2 (en) * 2004-11-30 2010-05-11 Asml Holding N.V. System and method for generating pattern data used to control a pattern generator
TW200816271A (en) * 2006-06-09 2008-04-01 Nikon Corp Pattern formation method, pattern formation device, exposure method, exposure device, and device manufacturing method

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