JP2011048056A - Exposure apparatus, and exposure method and method for manufacturing display panel substrate using the same - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of enhancing the productivity by extending the lifetime of a light source including a plurality of lamps and reducing the times of maintenance, and to provide an exposure method and a method for manufacturing a display panel substrate using the apparatus. <P>SOLUTION: The exposure apparatus includes a light source including a plurality of lamps 131-1 and 131-2, a plurality of power supplies 141-1 and 141-2 respectively supplying electric power to the plurality of lamps, a power supply controlling device 140 controlling the plurality of power supplies, and a chuck 110 to mount a substrate 101 coated with a photosensitive resin material, wherein the power controlling device 140 controls the plurality of power supplies 141-1 and 141-2 in such a manner that the electric power supplied to the plurality of lamps 131-1 and 131-2 is equalized and constant. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

  The present invention relates to an exposure apparatus that exposes a substrate in the manufacture of a display panel substrate such as a liquid crystal display device, an exposure method using the same, and a method of manufacturing a display panel substrate.

  Manufacturing of TFT (Thin Film Transistor) substrates, color filter substrates, plasma display panel substrates, organic EL (Electroluminescence) display panel substrates, and the like of liquid crystal display devices used as display panels is performed using photolithography using an exposure apparatus. This is done by forming a pattern on the substrate using technology. The exposure apparatus transfers a mask pattern onto a substrate by irradiating the substrate coated with a photosensitive resin material (photoresist) with exposure light through the mask. For example, Patent Documents 1 and 2 disclose the exposure apparatus.

JP-A-11-260705 JP 2008-286971 A

  In recent years, as the size of the substrate increases with the increase in the screen size of the display panel, a light source with higher brightness has been required for the light source of the exposure apparatus. The higher the brightness of the light source, the higher the illuminance of the exposure light, the shorter the exposure time, the shorter the tact time, and the higher the throughput.

  In order to increase the luminance of the light source, it is necessary to increase the output of the lamp. However, when the output of the lamp is increased, the lamp becomes large and difficult to handle, and it takes time to install and replace the lamp, and the risk of breakage and the like increases.

  By using a light source (lamp set) including a plurality of lamps, it is possible to obtain a high output and brightness as a lamp set while keeping the output of each lamp small. However, in the case of using a plurality of lamps, if any one of the lamps burns out, all lamps have been replaced based on the judgment that the other lamps are nearing the end of their lives. That is, the lifetime of the lamp set (light source) of the exposure apparatus is the minimum lifetime among the plurality of lamps.

  SUMMARY OF THE INVENTION An object of the present invention is to provide an exposure apparatus capable of enhancing the productivity by extending the life of a lamp set (light source) and reducing the number of maintenance times, an exposure method using the same, and a method for manufacturing a display panel substrate Is to provide.

  As one mode for achieving the above object, a light source including a plurality of lamps, a plurality of power supplies for supplying power to the plurality of lamps, a power supply control device for controlling the plurality of power supplies, and a chuck on which a substrate is mounted The power supply control apparatus controls the plurality of power supplies so that the power supplied to the plurality of lamps is the same and constant.

  Further, in an exposure method using an exposure apparatus having a light source including a plurality of lamps, a step of inputting a target value of illuminance of exposure light generated from the light source including a plurality of lamps, and the target of illuminance of the exposure light Determining the target value of the illuminance of the light source including the plurality of lamps from the value and the target value of the illuminance of the light source including the plurality of lamps, the power supplied to the plurality of lamps is the same and constant A step of adjusting the amount of electric power, and then a step of exposing the substrate using exposure light generated from the light source adjusted so that the power supplied to the plurality of lamps is the same and constant The exposure method is characterized by comprising:

  A step of forming a thin film on the glass substrate; a step of applying a photosensitive resin on the thin film; a step of exposing the glass substrate coated with the photosensitive resin using the exposure method; Developing the developed glass substrate, etching the exposed portion of the thin film on the developed glass substrate, and peeling the photosensitive resin film on the glass substrate. A display panel substrate manufacturing method characterized by the above.

  Further, a black matrix process for forming a black matrix on a glass substrate, a colored pattern forming process for forming a colored pattern on the glass substrate on which the black matrix is formed, and then protection on the colored pattern A step of forming a film and a step of forming an electrode film on the protective film, wherein the exposure method is used in at least one of the black matrix forming step and the colored pattern forming step. It is set as the manufacturing method of the display panel board | substrate characterized.

  By extending the life of the lamp set (light source) and reducing the number of maintenance times, it is possible to provide an exposure apparatus capable of increasing productivity, an exposure method using the same, and a method for manufacturing a display panel substrate. .

It is a schematic block diagram of the exposure apparatus which concerns on a 1st Example. It is a flowchart for demonstrating the exposure method which concerns on a 1st Example. It is a flowchart which shows an example of the manufacturing process of the TFT substrate of the liquid crystal display device which concerns on a 2nd Example. It is a flowchart which shows an example of the manufacturing process of the color filter substrate of the liquid crystal display device which concerns on a 3rd Example.

  The inventors first examined the relationship between the power supply method to the lamp set (light source) and the life of the lamp, the influence of the illuminance of each lamp on the uniformity of the exposure light illuminance, and the like. As a result, if the illuminance of the lamps constituting the lamp set (light source) is the same and constant, there is a difference in the power supplied due to individual differences between the lamps (for example, in four lamp sets (light sources)) Therefore, it was found that the load on each lamp varied and the lamp life changed. It was also found that if a collimator lens is installed as the optical system, the illuminance distribution of the exposure light can be sufficiently uniform (for example, even if the illuminance variation of each lamp is approximately ± 25%, By passing the meter lens, the illuminance uniformity within the exposure surface is within ± 5%).

  The present invention was born based on the above knowledge, and by making the power supplied to the lamps constituting the lamp set (light source) the same and constant, the lamp having a short lifetime has been extended. The life of each lamp constituting the lamp set (light source) is made uniform, thereby extending the life of the lamp set (light source). Accordingly, it is possible to provide an exposure apparatus that can reduce the number of maintenance times and increase productivity, an exposure method using the same, and a method for manufacturing a display panel substrate.

  Examples will be described in detail below.

  A first embodiment will be described with reference to FIGS. FIG. 1 is a schematic block diagram of an exposure apparatus according to the present embodiment. In this embodiment, an example of a proximity exposure apparatus that transfers a mask pattern to a substrate by providing a minute gap (proximity gap) between the mask and the substrate is shown.

  The exposure apparatus includes a base 103, an X guide 104, an X stage 105, a Y guide 106, a Y stage 107, a θ stage 108, a Z-tilt mechanism 109, a chuck 110, a mask holder 120, an exposure light irradiation device 130, and a power supply control device 140. , Power sources 141-1, 141-2, light source control device 150, input device 151, and illuminance sensor 152. In addition to these, the exposure apparatus includes a carry-in unit for carrying in the substrate 101, a carry-out unit for carrying out the substrate 101, a temperature control unit for managing the temperature in the apparatus, and the like.

  In FIG. 1, the chuck 110 is at an exposure position where the substrate 101 is exposed. A mask 102 is held by a mask holder 120 above the exposure position. The substrate 101 is mounted on the chuck 110 by a carry-in unit (not shown) at a delivery position away from the exposure position, and is recovered from the chuck 110 by a carry-out unit (not shown).

  The chuck 110 is mounted on the θ stage 108 via the Z-tilt mechanism 109, and the Y stage 107 and the X stage 5 are provided below the θ stage 108. The X stage 105 moves in the X direction (the horizontal direction in the drawing) along the X guide 104 provided on the base 103. As the X stage 105 moves in the X direction, the chuck 110 moves between the delivery position and the exposure position. The Y stage 107 moves in the Y direction (the drawing depth direction) along the Y guide 106 provided on the X stage 105. The θ stage 108 rotates in the θ direction, and the Z-tilt mechanism 109 moves and tilts in the Z direction (vertical direction in the drawing).

  In the exposure apparatus, the substrate 101 is positioned by moving the X stage 105 in the X direction, moving the Y stage 107 in the Y direction, and rotating the θ stage 108 in the θ direction. Further, the gap alignment between the mask 102 and the substrate 101 is performed by the movement and tilt of the Z-tilt mechanism 109 in the Z direction.

  In this embodiment, the gap between the mask 102 and the substrate 101 is adjusted by the Z-tilt mechanism 109. However, by moving and tilting the mask holder 120 in the Z direction, the gap between the mask 102 and the substrate 101 is adjusted. You may combine.

  Above the mask holder 120, an exposure light irradiation device 130 is provided. The exposure light irradiation device 130 includes a plurality of lamps 131-1, 131-2, a plurality of condensing mirrors 132-1, 132-2, a first plane mirror 133, a lens 134, a shutter 135, a collimator lens 136, a second A plane mirror 137 and a shutter driving device 138 are included.

  In this embodiment, four lamps 131 are used as a light source for generating exposure light, and the four lamps 131 are arranged so as to form a quadrangle when viewed from above, but only two lamps are shown in FIG. It is shown. The number of lamps is not limited to this, and two, three, five or more lamps may be used. As the lamp 131, a lamp in which high-pressure gas is enclosed in a bulb, such as a mercury lamp, a halogen lamp, or a xenon lamp, is used.

  A condensing mirror 132 that condenses the light generated from each lamp 131 is provided around each lamp 131. In the present embodiment, a part of the condensing mirror 132 is notched so that the two adjacent lamps are arranged close to a distance smaller than the diameter of the condensing mirror. However, two adjacent lamps may be spaced apart by a distance larger than the diameter of the condenser mirror without cutting out a part of the condenser mirror 132.

  Each lamp 131 is turned on when power is supplied from each power source 141. The light generated from each lamp 131 is collected by each condenser mirror 132 and applied to the first plane mirror 133. The light reflected by the first plane mirror 133 is incident on a lens 134 made of a fly-eye lens or a lot lens, and is transmitted through the lens 134 so that the illuminance distribution is made uniform. The illuminance distribution at this time is about ± 5% on the exposed surface.

  When the shutter 135 is open, the light transmitted through the lens 134 is transmitted through the collimator lens 136 to become a parallel light beam, reflected by the second plane mirror 137, and irradiated onto the mask 102. The pattern of the mask 102 is transferred to the substrate 101 by the exposure light applied to the mask 102, and the substrate 101 is exposed.

  An illuminance sensor 152 is disposed in the vicinity of the back side of the second plane mirror 137. The second plane mirror 137 is provided with a small opening that allows a part of the exposure light to pass through. The illuminance sensor 152 receives the light that has passed through the opening of the second plane mirror 137 and detects the illuminance of the exposure light. The detection result of the illuminance sensor 152 is input to the light source control device 150.

  Hereinafter, operations of the power supply control device 140 and the light source control device 150 will be described. The light source control device 150 instructs the power supply control device 140 to set a target value of lamp set (light source) illuminance. The power supply control device 140 first controls each power supply 141 according to the target value of the illuminance of the lamp set (light source) instructed from the light source control device 150, while keeping the power supplied to each lamp 131 the same and constant. Adjust the amount of power. At this time, if the illuminance variation between the lamps is large, it is considered that there is a problem with the lamps. Therefore, an alarm for warning is output to prevent an accident such as a lamp burst. It should be noted that the power supplied to each lamp can be regarded as the same if it is within ± 3%.

  The light source control device 150 variously changes the target value of the illuminance of the lamp set instructed to the power supply control device 140 before performing the exposure process, and inputs the detection result of the illuminance sensor 152 from the power supply control device 140 for reference. Store as data.

  Next, an exposure method will be described with reference to FIG. FIG. 2 is a flowchart for explaining the exposure method according to the present embodiment. First, the target value of the illuminance of the exposure light is input to the light source control device 150 from the input device 151 (S201). The light source control device 150 determines the target value of the illuminance of the lamp set from the target value of the illuminance of the exposure light (S202). At this time, the light source control device 150 finds, for example, from the reference data that the illuminance of the exposure light is before and after the target value, and refers to the slope of the change in the illuminance of the lamp set during that time to determine the illuminance of the lamp set. Determine the target value. By using the reference data, the target value of the illuminance of the lamp set in which the illuminance of the exposure light becomes the target value is determined with high accuracy.

  The light source control device 150 instructs the power supply control device 140 on the determined target value of the illuminance of the lamp set. The power supply control device 140 controls each power supply 141 according to the target value of the illuminance of the lamp set determined by the light source control device 150, and adjusts the amount of power while keeping the power supplied to each lamp 131 the same and constant. (S203).

  Subsequently, the light source control device 150 controls the shutter driving device 138 to open the shutter 135. At this time, the chuck 110 is in the delivery position, and the substrate 101 is not exposed. The illuminance sensor 152 detects the illuminance of the exposure light (S204). After the illuminance sensor 152 detects the illuminance of the exposure light, the light source control device 150 controls the shutter driving device 138 to close the shutter 135 again.

  The light source controller 150 receives the detection result of the illuminance sensor 152 and corrects the target value of the illuminance of the lamp set based on the detection result of the illuminance sensor 152 (S205). At this time, the light source control device 150 finds, for example, from the reference data that the illuminance of the exposure light is before and after the target value, and refers to the slope of the change in the illuminance of the lamp set during that time to determine the illuminance of the lamp set. Correct the target value. By using the reference data, the target value of the illuminance of the lamp set where the illuminance of the exposure light becomes the target value is corrected with high accuracy.

  The light source control device 150 instructs the power supply control device 140 on the corrected target value of the illuminance of the lamp set. The power supply control device 140 controls each power supply 141 according to the target value of the illuminance of the lamp set corrected by the light source control device 150, and adjusts the amount of power while keeping the power supplied to each lamp 131 the same and constant. (S206). Then, since the illuminance of the exposure light is detected and the target value of the illuminance of the lamp set is corrected based on the detection result, the illuminance of the exposure light combined with the light from the plurality of lamps 131 is accurately controlled to the target value.

  After performing the above processing, the substrate 101 is exposed (S207). In exposure of the substrate 101, the chuck 110 is moved to the exposure position, and after positioning the substrate 101 and aligning the gap between the mask 102 and the substrate 101, the light source control device 150 controls the shutter driving device 138 to move the shutter 135. Open and close. Thereafter, feedback control (S206) of each power supply 141 and exposure (S207) of the substrate 101 are repeated. Then, for each predetermined period, as shown by the broken line in FIG. 2, the process returns to step S204 to detect the illuminance of the exposure light (S204) and correct the target value of the illuminance of the lamp set (S205).

  In this embodiment, the illuminance of the exposure light is detected (S204) and the target value of the illuminance of the lamp set is corrected (S205) every predetermined period, but every time the substrate 101 is exposed. Also good.

  As a result of exposure by the above exposure method, it has been found that the lamp set can have a longer life than the conventional one.

  According to the embodiment described above, the illuminance of the exposure light is detected, and the target value of the illuminance of the plurality of lamps 131 is set as the target by correcting the illuminance target value of the lamp set based on the detection result. The value can be precisely controlled.

  Furthermore, the illuminance of the exposure light is detected by changing the target value of the illuminance of the lamp set in advance, and the target value of the illuminance of the lamp set is determined or corrected with reference to the detection result. By doing so, the target value of the illuminance of the lamp set in which the illuminance of the exposure light becomes the target value can be determined or corrected with high accuracy.

  In this embodiment, the proximity exposure apparatus has been described as an example. However, the present invention is not limited to this, and the present invention can be applied to a projection exposure apparatus that projects a mask pattern onto a substrate using a lens or a mirror.

  By using the exposure apparatus or exposure method shown in this embodiment to transfer the mask pattern to the substrate, the pattern can be transferred uniformly, and the exposure time required for exposure can always be the same. As a result, a high-quality substrate can be manufactured with a constant tact time.

  According to the present embodiment, by making the power supplied to each lamp constituting the lamp set the same and constant, variations in each lamp load can be reduced, the life of the lamp set can be extended, and the number of times of maintenance is reduced. Thus, an exposure apparatus capable of increasing productivity and an exposure method using the same can be provided.

  A second embodiment will be described with reference to FIG. The matters described in the first embodiment and not described in the present embodiment are the same as those in the first embodiment.

  FIG. 3 is a flowchart showing an example of the manufacturing process of the TFT substrate of the liquid crystal display device according to this embodiment. First, in a thin film forming step (S301), a thin film such as a conductor film or an insulator film that becomes a transparent electrode for driving a liquid crystal is formed on a glass substrate by a sputtering method. A plasma chemical vapor deposition (CVD) method or the like may be used instead of the sputtering method.

  Next, in a resist coating step (S302), a photosensitive resin material (photoresist) is applied by a roll coating method or the like, and a photoresist film is formed on the thin film formed in the thin film forming step (S301).

  Next, in the exposure step (S303), the mask pattern is transferred to the photoresist film using the proximity exposure apparatus and the exposure method used in the first embodiment. A projection exposure apparatus can be used in place of the proximity exposure apparatus. Next, in the developing step (S304), a developer is supplied onto the photoresist film by a shower developing method or the like to remove unnecessary portions of the photoresist film.

  Next, in the etching step (S305), the portion of the thin film formed in the thin film formation step (S301) that is not masked by the photoresist film is removed by wet etching. Next, in the peeling step (S306), the photoresist film that has finished the role of the mask in the etching step (S305) is peeled off with a peeling solution. Before or after each of these steps, a substrate cleaning / drying step is performed as necessary. These steps are repeated several times to form a TFT array on the glass substrate.

  According to the present embodiment, the same effect as in the first embodiment can be obtained. In addition, the productivity of the TFT substrate of the liquid crystal display device can be improved.

  A third embodiment will be described with reference to FIG. The matters described in the first and second embodiments but not described in the present embodiment are the same as those described above.

  FIG. 4 is a flowchart showing an example of the manufacturing process of the color filter substrate of the liquid crystal display device according to this embodiment. First, in a black matrix forming step (S401), a black matrix is formed on a glass substrate by processing such as photoresist coating, exposure, development, etching, and peeling.

  Next, in a colored pattern forming step (S402), a colored pattern is formed on the glass substrate by a staining method. In place of the dyeing method, a pigment dispersion method, a printing method, an electrodeposition method, or the like can also be used. This process is repeated for R (red), G (green), and B (blue) coloring patterns. In pattern formation, the mask pattern is transferred to the photoresist film by the proximity exposure apparatus and the exposure method used in the first embodiment. A projection exposure apparatus can be used instead of the proximity exposure apparatus.

  Next, in a protective film forming step (S403), a protective film is formed on the colored pattern. Next, in the transparent electrode forming step (S404), a transparent electrode film is formed on the protective film. Before, during or after each of these steps, a substrate cleaning / drying step is performed as necessary.

  The proximity exposure apparatus and the exposure method used in Example 1 can be applied in at least one of the exposure processes of the black matrix forming process and the colored pattern forming process. A projection exposure apparatus can be used instead of the proximity exposure apparatus.

  According to the present embodiment, the same effect as in the first embodiment can be obtained. In addition, the productivity of the color filter substrate of the liquid crystal display device can be improved.

101 ... substrate,
102 ... mask,
103 ... Base,
104 ... X guide,
105 ... X stage,
106 ... Y guide,
107 ... Y stage,
108 ... θ stage,
109 ... Z-tilt mechanism,
110 ... Chuck,
120 ... mask holder,
130 ... exposure light irradiation device,
131, 131-1, 131-2 ... lamp,
132, 132-1 and 132-2 ... condensing mirrors,
133 ... 1st plane mirror,
134 ... Lens,
135 ... Shutter 136 ... Collimator lens,
137 ... the second plane mirror,
138 ... Shutter driving device,
140 ... power supply control device,
141, 141-1, 141-2 ... power supply,
150 ... Light source control device,
151: Input device.

Claims (11)

In an exposure apparatus comprising: a light source including a plurality of lamps; a plurality of power supplies that respectively supply power to the plurality of lamps; a power control device that controls the plurality of power supplies; and a chuck on which a substrate is placed.
The exposure apparatus according to claim 1, wherein the power supply control device controls the plurality of power supplies so that power supplied to the plurality of lamps is the same and constant. A light source including a plurality of lamps, a plurality of power supplies that respectively supply power to the plurality of lamps, a power control device that controls the plurality of power supplies, a light source control device that controls the power control device, and a substrate are mounted In an exposure apparatus having a chuck,
The power supply control device controls the plurality of power supplies based on a target value obtained from the light source control device so that power supplied to the plurality of lamps is the same and constant. apparatus. The exposure apparatus according to claim 2, wherein
The exposure apparatus characterized in that the target value is determined from a target value of illuminance of exposure light input to the light source control apparatus using an input device. In the exposure apparatus according to claim 2 or 3,
Furthermore, an illuminance sensor that detects the illuminance of exposure light generated from the light source is provided,
The light source controller corrects the target value based on the illuminance of exposure light detected by the illuminance sensor. The exposure apparatus according to any one of claims 1 to 4,
An exposure apparatus characterized in that the supply power to the plurality of lamps is the same includes fluctuations in power within ± 3%. The exposure apparatus according to any one of claims 1 to 5,
An exposure apparatus further comprising a collimator lens through which exposure light generated from the light source passes. In an exposure method using an exposure apparatus having a light source including a plurality of lamps,
Inputting a target value of illuminance of exposure light generated from a light source including a plurality of the lamps;
Determining a target value of illuminance of a light source including the plurality of lamps from the target value of illuminance of the exposure light;
Based on the target value of the illuminance of a light source including a plurality of lamps, adjusting the amount of power while ensuring that the power supplied to the plurality of lamps is the same and constant;
And a step of exposing the substrate using exposure light generated from the light source that is adjusted so that the power supplied to the plurality of lamps is the same and constant. Forming a thin film on a glass substrate;
Applying a photosensitive resin on the thin film;
Exposing the glass substrate coated with the photosensitive resin using the exposure method according to claim 7;
Developing the exposed glass substrate;
Etching the exposed portion of the thin film on the developed glass substrate;
And a step of peeling the photosensitive resin film on the glass substrate. In the manufacturing method of the display panel board | substrate of Claim 8,
The method for producing a display panel substrate, wherein the thin film is a conductive film that serves as an electrode for driving liquid crystal A black matrix process for forming a black matrix on a glass substrate;
A colored pattern forming step of forming a colored pattern on the glass substrate on which the black matrix is formed;
Then, forming a protective film on the colored pattern,
Forming an electrode film on the protective film,
8. A method for manufacturing a display panel substrate, wherein the exposure method according to claim 7 is used in at least one of the black matrix forming step and the colored pattern forming step. In the manufacturing method of the display panel board | substrate of Claim 10,
The method for manufacturing a display panel substrate, wherein the colored pattern is a red pattern, a green pattern, or a blue pattern.

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