JP2006210553A - Aligner, illuminance distribution correction filter, and process for fabricating semiconductor device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an aligner in which light transmittance distribution of a light illuminance distribution correction filter can be updated inexpensively and quickly. <P>SOLUTION: The aligner comprises a light source 1, a section 28 for holding a reticle being irradiated with light from the light source 1, a fly eye lens 22 having a plurality of lens elements 22a and arranged between the reticle holding section 28 and the light source 1, an illuminance distribution correction filter 30 having a plurality of liquid crystal cells arranged in matrix and interposed between the light source 1 and the fly eye lens 22 in order to correct illuminance distribution of light for the plurality of lens elements 22a, and a section 50 for controlling the plurality of liquid crystal cells respectively. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to an exposure apparatus, an illuminance distribution correction filter, and a method for manufacturing a semiconductor device. In particular, the present invention relates to an exposure apparatus, an illuminance distribution correction filter, and a method for manufacturing a semiconductor device that can update the light transmittance distribution of a light illuminance distribution correction filter at low cost and quickly.

  FIG. 9 is a schematic diagram for explaining an optical configuration of a conventional exposure apparatus. This exposure apparatus has an ultrahigh pressure mercury lamp 101, an elliptical mirror 102, a cold mirror 103, and a collimation lens 104 as a light source 100. Light from the ultrahigh pressure mercury lamp 101 is collected by the elliptical mirror 102, further reflected by the cold mirror 103, and then converted into a parallel light beam by the collimation lens 104. Thereafter, the parallel light beam enters the interference filter 111. The interference filter 111 transmits only light having a predetermined wavelength. Thereafter, after the illuminance distribution is corrected by the illuminance distribution correction filter 112, the parallel light flux passes through the fly-eye lens 113 having the plurality of lens elements 113 a, the reflecting mirror 114, and the condenser lens 115 to the reticle holding unit 116. Irradiates the held reticle.

  When the fly-eye lens 113 is not provided, the illuminance of light applied to the reticle is high at the center of the reticle and decreases as it goes to the periphery of the reticle. The fly-eye lens 113 is provided to increase the uniformity of the illuminance of light applied to the reticle and faithfully project and expose the circuit pattern of the reticle. In the exposure apparatus shown in FIG. 9, since the illuminance distribution correction filter 112 is disposed in front of the fly-eye lens 113, the uniformity of the illuminance of light irradiated on the reticle is further increased.

  FIG. 10A is a schematic plan view of the illuminance distribution correction filter 112. In the illuminance distribution correction filter 112, a plurality of correction elements 112a are provided at positions corresponding to the plurality of lens elements 113a of the fly-eye lens 113, respectively. The correction pattern of each of the plurality of correction elements 112a is formed by providing a chrome dot pattern on the quartz substrate of the illuminance distribution correction filter 112.

  FIG. 10B is a plan view of the correction element 112a included in the illuminance distribution correction filter 112, and FIG. 10C is a graph showing the light transmittance distribution in the section AA of the illuminance distribution correction filter 112. is there. The chrome dot pattern gradually becomes denser from the center of the correction element 112a toward the periphery. For this reason, the light transmittance distribution of the correction element 112a has a smooth gradient, is high in the central portion, and becomes lower toward the peripheral portion.

FIG. 11A is a graph showing the illuminance distribution of light incident on the lens element 113a in a state where the illuminance distribution correction filter 112 is not provided. FIG. 11B is a graph showing the illuminance distribution of light after passing through the correction element 112 a of the illuminance distribution correction filter 112. As shown in FIG. 11A, the illuminance distribution of the light incident on the lens element 113a has a smooth gradient, which is low at the center portion of the lens element 113a and increases toward the peripheral portion. On the other hand, as shown in FIG. 10C, the light transmittance of the correction element 112a is high in the central portion and decreases as it goes to the peripheral portion. For this reason, as shown in FIG. 11B, by providing the illuminance distribution correction filter 112, the uniformity of the illuminance of light incident on the lens element 113a is increased. As a result, the uniformity of the illuminance of the light applied to the reticle is increased (see, for example, Patent Document 1).
Japanese Patent Application Laid-Open No. 64-42821 (FIG. 1)

  Since the optical system of the exposure apparatus deteriorates with time, the illuminance distribution of light in the exposure apparatus changes with time. For this reason, the illuminance distribution correction filter needs to be updated periodically. However, the illuminance distribution correction filter is manufactured using a method similar to that of the reticle. Furthermore, since the illuminance distribution of the illuminance distribution correction filter is specific to the current situation of each exposure apparatus, it cannot be mass-produced. For this reason, it was expensive to update the illuminance distribution correction filter.

  In addition, since it takes time to manufacture the illuminance distribution correction filter, it takes time from measuring the illuminance distribution of light to updating the illuminance distribution correction filter. For this reason, the illuminance distribution of light further changes before the illuminance distribution correction filter is updated, and the illuminance distribution of light may not be completely corrected even by the correction distribution correction filter immediately after the update.

  The present invention has been made in view of the above circumstances, and an object thereof is an exposure apparatus and an illuminance distribution correction filter that can update the light transmittance distribution of the illuminance distribution correction filter of light at low cost and quickly. And a method of manufacturing a semiconductor device.

In order to solve the above problems, an exposure apparatus according to the present invention includes a light source,
A reticle holding unit for holding a reticle irradiated with light from the light source;
A fly-eye lens disposed between the reticle holding part and the light source and having a plurality of lens elements;
An illuminance distribution correction filter including a plurality of liquid crystal cells arranged between the light source and the fly-eye lens and arranged in a matrix,
A controller for displaying an illuminance distribution correction pattern on the illuminance distribution correction filter by inputting illuminance distribution correction data to the illuminance distribution correction filter;

Another exposure apparatus according to the present invention includes a light source,
A reticle holding unit for holding a reticle irradiated with light from the light source;
A fly-eye lens disposed between the reticle holding part and the light source and having a plurality of lens elements;
An illuminance distribution correction filter that is disposed between the fly-eye lens and the reticle holding unit and includes a plurality of liquid crystal cells arranged in a matrix.
A controller for displaying an illuminance distribution correction pattern on the illuminance distribution correction filter by inputting illuminance distribution correction data to the illuminance distribution correction filter;

  According to these exposure apparatuses, since the illuminance distribution is corrected by the illuminance distribution correction filter having a plurality of liquid crystal cells arranged in a matrix, the illuminance is updated by updating the data input to the illuminance distribution correction filter. The light transmittance distribution correction pattern of the distribution correction filter can be updated. Therefore, the light transmittance distribution of the illuminance distribution correction filter can be updated inexpensively and quickly.

  The latter exposure apparatus further includes a condensing lens disposed between the fly-eye lens and the illuminance distribution correction filter, and the illuminance distribution correction filter is disposed at or near the rear focal point of the condensing lens. It is preferable. The graph showing the light transmittance distribution of the illuminance distribution correction filter displaying the illuminance distribution correction pattern may have an acute angle portion. In this way, even if the illuminance distribution of the entire surface of the reticle without the illuminance distribution correction filter is partially steeply changed, it is possible to easily correct the decrease in the illuminance uniformity of the light irradiating the reticle. Can do.

The liquid crystal included in the liquid crystal cell preferably has a hysteresis characteristic in light transmittance with respect to an applied voltage.
The illuminance distribution correction filter includes a transparent substrate, a plurality of first transparent electrodes arranged substantially parallel to each other on the transparent substrate, and the first transparent electrode substantially above the first transparent electrode. A plurality of second transparent electrodes arranged at right angles and substantially parallel to each other; and a plurality of first transparent electrodes and a liquid crystal positioned between the plurality of second transparent electrodes, and adjacent to each other. The first transparent electrodes are arranged such that their edges overlap with each other via the first transparent insulating film, and the adjacent second transparent electrodes have the edges of the second transparent insulating film. It may be arranged so as to overlap each other.

  The illuminance distribution correction filter according to the present invention is used in an exposure apparatus, includes a plurality of liquid crystal cells arranged in a matrix, and corrects the illuminance distribution of light by displaying a correction illuminance distribution correction pattern. .

A method of manufacturing a semiconductor device according to the present invention includes a step of preparing an exposure apparatus including an illuminance distribution correction filter, in which a plurality of liquid crystal cells using liquid crystals having a hysteresis characteristic in light transmittance with respect to an applied voltage are arranged. ,
Inputting data indicating an illuminance distribution correction pattern to the illuminance distribution correction filter, and holding the illuminance distribution correction pattern in the illuminance distribution correction filter;
Forming a photosensitive film on a thin film formed on or above the semiconductor substrate; and
Exposing the photosensitive film using the exposure apparatus in which the illuminance distribution correction filter holds an illuminance distribution correction pattern; and
And developing a pattern by developing the exposed photosensitive film.

  According to this method for manufacturing a semiconductor device, the light transmittance distribution of the illuminance distribution correction filter can be quickly updated. Therefore, in the step of exposing the photosensitive film, the uniformity of the light applied to the reticle can be increased, and the pattern of the reticle can be accurately projected onto the photosensitive film.

BEST MODE FOR CARRYING OUT THE INVENTION

  Hereinafter, embodiments of the present invention will be described with reference to the drawings. FIG. 1 is a schematic diagram for explaining an optical configuration of an exposure apparatus according to the first embodiment. This exposure apparatus is used in the manufacturing process of a semiconductor device.

  The light source 1 includes an ultrahigh pressure mercury lamp 11, an elliptical mirror 12, a cold mirror 13, and a collimation lens 14. The light beam generated by the ultra high pressure mercury lamp 11 is reflected and collected by the elliptical mirror 12 and then reflected by the cold mirror 13 in the direction of incidence on the collimation lens 14. Then, the light beam is converted into a parallel light beam by the collimation lens 14.

  The parallel light beam then enters the interference filter 21. The interference filter 21 transmits only a light beam having a predetermined wavelength range. Thereafter, the parallel luminous flux is incident on the fly-eye lens 22 after the illuminance distribution is corrected by the illuminance distribution correction filter 30.

The illuminance distribution correction filter 30 has a plurality of liquid crystal cells arranged in a matrix. The illuminance distribution correction filter 30 is input with illuminance distribution correction data stored in the storage unit 51 by the control unit 50. The illuminance distribution correction filter 30 corrects the illuminance distribution of the parallel light flux by displaying the illuminance distribution correction pattern indicated by the input data. For this reason, the illuminance distribution correction pattern of the illuminance distribution correction filter 30, that is, the light transmittance distribution pattern is updated easily and quickly by updating the illuminance distribution correction data held in the storage unit 51.
Note that the storage unit 51 may be a hard disk or a removable disk.

  The fly-eye lens 22 is an aggregate of a plurality of lens elements 22a. The light beam emitted from the fly-eye lens 22 is collected by the condenser lens 23. The light beams emitted from the lens elements 22a of the fly-eye lens 22 each have an illuminance distribution, but overlap each other before being irradiated onto the reticle. Compared to the case where the eye lens 22 is not provided, it is averaged to some extent.

  A field stop 24 is disposed at the rear focal position of the condenser lens 23. The light beam that has passed through the opening of the field stop 24 irradiates the reticle held by the reticle holding unit 28 via the first relay lens 25, the reflecting mirror 26, and the second relay lens 27. The light irradiated on the reticle forms an image having a predetermined circuit pattern. This image is transferred to the above-described photoresist film, thereby forming a resist pattern.

  FIG. 2A is an enlarged plan view of a main part of the illuminance distribution correction filter 30. FIG. 2B is a diagram illustrating a cross section taken along the line AA in FIG. As shown in FIG. 2B, the illuminance distribution correction filter 30 has the following structure. On the quartz substrate 31, a plurality of vertically transparent electrodes 32 made of ITO (Indium Tin Oxide) are arranged substantially in parallel and spaced apart from each other. An alignment film 33 is formed on the quartz substrate 31 and the plurality of vertically transparent electrodes 32. A liquid crystal 34 is disposed on the alignment film 33. As the liquid crystal 34, a liquid crystal whose light transmittance with respect to an applied voltage has a hysteresis characteristic is used. An example of such a liquid crystal is a chiral nematic liquid crystal. A chiral nematic liquid crystal is formed by introducing an optically active branched alkyl group or branched alkoxy group having an asymmetric carbon into a terminal group of a normal nematic liquid crystal compound.

  On the liquid crystal 34, an alignment film 35 and a plurality of horizontal transparent electrodes 36 made of ITO are laminated in this order. The plurality of horizontal transparent electrodes 36 are provided in a direction substantially parallel to each other and substantially perpendicular to the vertical transparent electrode 32. Each of the plurality of regions where the vertical transparent electrode 32 and the horizontal transparent electrode 36 overlap functions as the liquid crystal cell 30a. The controller 50 controls each of the plurality of liquid crystal cells 30a by controlling the voltage applied to each of the plurality of vertical transparent electrodes 32 and the plurality of horizontal transparent electrodes 36 and the timing thereof.

FIG. 3 is a graph showing a change in light transmittance with respect to an applied voltage of the liquid crystal 34. As shown in this graph, the light transmittance of the liquid crystal 34 exhibits hysteresis characteristics with respect to the applied voltage. That is, at the initial applied voltage V ₀ , the light transmittance of the liquid crystal 34 is close to 0%. As the applied voltage is gradually increased from V ₀ , the light transmittance gradually increases. When the applied voltage exceeds the first threshold value, the light transmittance increases rapidly and becomes a value close to 100%.

Thereafter, even if the applied voltage is gradually lowered to a value lower than the initial applied voltage V ₀ , the light transmittance of the liquid crystal 34 maintains a value close to 100%. Then, when the applied voltage is further lowered and falls below the second threshold value, the light transmittance of the liquid crystal 34 rapidly decreases to a value close to 0%. Thereafter, even if the applied voltage is increased to V ₀ , the light transmittance of the liquid crystal 34 remains close to 0%.

  For this reason, after applying a voltage equal to or higher than the first threshold value to a predetermined liquid crystal cell to make the light transmittance close to 100%, the first threshold value higher than the second threshold value is applied to the liquid crystal cell. By continuing to apply a voltage less than the value, the light transmittance of the liquid crystal cell can be maintained at a value close to 100%. Since the voltage to be applied is lower than the first threshold value, the light transmittance of other liquid crystal cells does not change. Thus, the illuminance distribution correction filter 30 can hold the illuminance distribution correction pattern indicated by the input data. Note that the illuminance distribution correction pattern is erased by lowering the applied voltage to be equal to or lower than the second threshold value.

  FIG. 4A is a schematic plan view of the illuminance distribution correction filter 30 displaying an example of the illuminance distribution correction pattern. The illuminance distribution correction pattern shown in this figure is an aggregate of a plurality of sub correction patterns 30b. Each of the plurality of sub correction patterns 30b corrects the illuminance distribution of light incident on each lens element 22a of the fly-eye lens 22.

  FIG. 4B is a schematic plan view of the sub correction pattern 30b, and FIG. 4C is a graph showing the light transmittance distribution in the AA section of each of the sub correction patterns 30b. In the sub correction pattern 30b, the density of the liquid crystal cell that blocks light gradually becomes denser from the center of the sub correction pattern 30b toward the peripheral portion. For this reason, the light transmittance distribution of the sub correction pattern 30b has a smooth gradient, is high in the central portion, and becomes lower toward the peripheral portion.

  On the other hand, the illuminance of light incident on each lens element 22a of the fly-eye lens 22 is low at the center of the lens element 22a before correction, and increases smoothly toward the periphery. Such a distribution is corrected by the illuminance distribution correction filter 30 displaying the sub correction pattern 30b shown in FIG. 4B. As a result, the illuminance of light applied to the reticle is highly uniform.

  Next, a method for manufacturing a semiconductor device using the exposure apparatus according to the present embodiment will be described. First, a thin film (for example, a polysilicon film, an interlayer insulating film, or an Al alloy film: none shown) is formed on a silicon substrate (not shown) or above the silicon substrate by a CVD method or a sputtering method. . Next, a photoresist film (not shown) is applied on the thin film. Next, the photoresist film is exposed using the exposure apparatus according to the present embodiment. Next, a resist pattern is formed by developing the photoresist film. Then, using the resist pattern as a mask, the above-described thin film is processed and patterned.

  FIG. 5 is a flowchart for explaining a process of exposing a photoresist film using an exposure apparatus. First, the illuminance distribution of light incident on each of the plurality of lens elements 22a is measured (S2). Next, the illuminance distribution correction data indicating the sub correction pattern 30b corresponding to each lens element 22a is generated by inverting each of the measured illuminance distributions of the light. Next, by integrating these data, illuminance distribution correction data to be input to the illuminance distribution correction filter 30 is generated (S4). Thereafter, the correction data is stored in the storage unit 51.

  Next, using the control unit 50, correction data is input to the illuminance distribution correction filter 30, and the illuminance distribution correction filter 30 holds the illuminance distribution correction pattern (S6). In this state, the photoresist film is exposed using an exposure apparatus (S8). When a certain time has elapsed, the above-described processing is repeated, and the illuminance distribution correction data held by the illuminance distribution correction filter 30 is updated. For this reason, since the light transmittance distribution of the illuminance distribution correction filter 30 can be quickly updated, variation in the illuminance of the light irradiating the reticle is reduced, and the circuit pattern of the reticle is accurately exposed to the photoresist film. .

  As described above, according to the first embodiment, since a member in which a plurality of liquid crystal cells are arranged in a matrix is used as the illuminance distribution correction filter 30, illuminance distribution correction data input to the illuminance distribution correction filter 30 is updated. Thus, the illuminance distribution correction pattern of the illuminance distribution correction filter 30 can be updated. Accordingly, the illuminance distribution correction pattern can be updated inexpensively and quickly.

  Next, an exposure apparatus according to the second embodiment will be described. This exposure apparatus is the same as that of the first embodiment except for the configuration of the transparent electrode included in the illuminance distribution correction filter 30. Hereinafter, the configuration of the illuminance distribution correction filter 30 will be described in detail, and description of other configurations will be omitted.

  FIG. 6A is a plan view in which a main part of the illuminance distribution correction filter 30 is enlarged. In the plurality of vertically transparent electrodes 32, the edges of adjacent electrodes overlap each other while ensuring insulation. Similarly, in the plurality of horizontal transparent electrodes 36, the edges of adjacent electrodes overlap each other while ensuring insulation. For this reason, the plurality of liquid crystal cells 30a can be arranged without gaps.

  6B is a diagram showing a BB cross section of FIG. 6A, and FIG. 6C is a diagram showing a CC cross section of FIG. 6A. As shown in FIG. 6B, adjacent vertical electrodes 32 of the plurality of vertical transparent electrodes 32 are alternately arranged above and below a transparent insulating film 37 such as a silicon oxide film. Further, as shown in FIG. 6C, adjacent horizontal electrodes of the plurality of lateral transparent electrodes 36 are alternately arranged above and below a transparent insulating film 38 such as a silicon oxide film. In this way, in each of the plurality of vertical transparent electrodes 32 and the plurality of horizontal transparent electrodes 36, the adjacent electrodes are secured from each other.

  As described above, according to the second embodiment, the same effects as those of the first embodiment can be obtained. Further, in the illuminance distribution correction filter 30, the plurality of liquid crystal cells 30 a can be arranged without gaps, so that the presence or absence of light transmission can be controlled over the entire surface of the illuminance distribution correction filter 30. Therefore, the illuminance distribution can be corrected with high accuracy.

  FIG. 7 is a schematic diagram for explaining an optical configuration of an exposure apparatus according to the third embodiment. In the present embodiment, the illuminance distribution correction filter 30 is the first except for the point that the illuminance distribution correction filter 30 is arranged at the rear focal position of the condenser lens 23 and in front of the field stop 24, and the data input to the illuminance distribution correction filter 30. This is the same as the first embodiment. Hereinafter, the same components as those of the first embodiment are denoted by the same reference numerals, and description thereof is omitted.

  In the present embodiment, the illuminance distribution correction image data input and held in the illuminance distribution correction filter 30 is opposite to the illuminance distribution of light on the entire reticle surface before correction, that is, without the illuminance distribution correction filter 30. The light transmittance distribution is as follows.

  FIG. 8A is a graph showing an example of the illuminance distribution of light on the entire reticle surface before correction. In the example shown in the figure, the graph showing the illuminance of light has an acute-angled concave portion that is smoothly lowered from the peripheral portion toward the central portion, but is partially steeply lowered. Such an acute concave portion is generated, for example, when a light source or a lens is deteriorated.

  FIG. 8B is a schematic plan view of the illuminance distribution correction filter 30 in a state where image data for correction is held, and FIG. 8C is an illuminance distribution correction in the AA cross section of FIG. 4 is a graph showing a light transmittance distribution of the filter 30. The density of the liquid crystal cell 30a in which the liquid crystal is aligned in the direction of blocking light is adjusted according to the light illuminance on the reticle before correction. That is, the density of the liquid crystal cell 30a that blocks light is high in the region corresponding to the portion where the light illuminance of the reticle is high, and the density of the liquid crystal cell 30a that blocks light is low in the region corresponding to the portion where the light illuminance of the reticle is low. As a result, as shown in FIG. 8C, the transmittance distribution of the illuminance distribution correction filter 30 has a distribution opposite to the illuminance distribution of light on the entire reticle surface before correction. Specifically, the transmittance distribution of the illuminance distribution correction filter 30 increases smoothly from the peripheral part toward the central part, but has an acute-angle convex part that rises partially and steeply.

  In FIG. 8D, the illuminance distribution correction filter 30 shown in FIGS. 8B and 8C is added to the exposure apparatus in which the illuminance distribution of light before correction has a distribution as shown in FIG. It is a graph which shows the illumination intensity distribution of the light in the reticle whole surface at the time of using. As shown in the figure, even when the illuminance of the light before correction is partially steeply changed, the illuminance distribution correction filter 30 is arranged behind the fly-eye lens 22 to cause a steep change in illuminance. This can be offset by a steep change in transmittance. As a result, the illuminance of light applied to the reticle is highly uniform.

  Since the illuminance distribution of light on the entire reticle surface before correction changes as the running time of the exposure apparatus increases, it is necessary to periodically update the light transmittance distribution of the illuminance distribution correction filter 30. According to the exposure apparatus of the present embodiment, the illuminance distribution correction pattern of the illuminance distribution correction filter 30, that is, the light transmittance distribution can be updated by updating the correction image data. The illuminance distribution correction pattern of the distribution correction filter 40 can be updated.

  As described above, according to the third embodiment, the illuminance distribution correction filter 30 is disposed behind the fly-eye lens 22 in the optical path. The light transmittance distribution of the illuminance distribution correction filter 30 has a distribution opposite to the illuminance distribution of light on the entire reticle surface before correction. For this reason, even when the illuminance distribution of the light before correction changes partially steeply, this change is canceled out by the illuminance distribution correction filter 30, and the uniformity of the illuminance of light at the reticle holding unit 28 is high. Become. Accordingly, the circuit pattern of the reticle is accurately exposed on the photoresist film.

  Furthermore, since the light transmittance distribution of the illuminance distribution correction filter 30 can be updated by updating the correction image data, the light source and the lens are deteriorated with time, and the light on the entire reticle surface before the correction is corrected. Even if the illuminance distribution changes, the light transmittance distribution of the illuminance distribution correction filter 40 can be updated quickly and inexpensively.

  Note that the present invention is not limited to the above-described embodiment, and various modifications can be made without departing from the spirit of the present invention. For example, the illuminance distribution correction filter 30 may be disposed in front of the fly-eye lens 22 and at the rear focal position of the condenser lens 23, respectively.

  Further, the light transmittance of the liquid crystal 34 included in the illuminance distribution correction filter 30 may not exhibit hysteresis characteristics with respect to the applied voltage. In this case, the photoresist film is exposed while inputting the data indicating the illuminance distribution correction pattern to the illuminance distribution correction filter 30 in the exposure process during the manufacturing process of the semiconductor device described above. Further, the exposure apparatus described above may be an apparatus that exposes a photosensitive polyimide film instead of a photoresist film.

1 is a schematic diagram for explaining an optical configuration of an exposure apparatus according to a first embodiment. (A) is the top view to which the principal part of the illumination intensity distribution correction filter 30 was expanded, (B) is a figure which shows the AA cross section of (A). The graph which shows the change of the light transmittance with respect to the applied voltage of the liquid crystal. (A) is a schematic plan view of the illuminance distribution correction filter 30 displaying an example of the illuminance distribution correction pattern, (B) is a schematic plan view of the sub correction pattern 30b, and (C) is a transmission of light in each of the sub correction patterns 30b. The graph which shows rate distribution. The flowchart for demonstrating the process of exposing a photoresist film. The top view which expanded the principal part of the illumination intensity distribution correction filter 30 which concerns on 2nd Embodiment, (B) is a figure which shows the BB cross section of (A), (C) is CC cross section of (A). FIG. Schematic for demonstrating the optical structure of the exposure apparatus which concerns on 3rd Embodiment. (A) is a graph showing an example of the illuminance distribution of light on the entire reticle surface before correction, (B) is a schematic plan view of the illuminance distribution correction filter 30, and (C) is the light transmittance in the AA cross section of (B). (D) is a graph showing the illuminance distribution of the light after correction. Schematic for demonstrating the structure of the conventional exposure apparatus. (A) is a schematic plan view of the illuminance distribution correction filter 112, (B) is a plan view of the correction element 112a, and (C) is a graph showing the light transmittance distribution of the illuminance distribution correction filter 112. (A) is a graph showing the illuminance distribution of light incident on the lens element 113a in a state where the illuminance distribution correction filter 112 is not provided, and (B) is the illuminance of light after passing through the correction element 112a of the illuminance distribution correction filter 112. A graph showing the distribution.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1,100 ... Light source 11, 101 ... Super high pressure mercury lamp, 12, 102 ... Elliptical mirror, 13, 103 ... Cold mirror, 14, 104 ... Collimation lens, 21, 111 ... Interference filter, 22, 113 ... Fly eye lens 22a, 113a ... lens element, 23 ... condensing lens, 24 ... field stop, 25 ... first relay lens, 26, 114 ... reflector, 27 ... second relay lens, 28, 116 ... reticle holder, 30, 112 ... Illuminance distribution correction filter, 30a ... liquid crystal cell, 30b ... sub correction pattern, 31 ... quartz substrate, 32 ... vertical transparent electrode, 33 ... alignment film, 34 ... liquid crystal, 35 ... alignment film, 36 ... horizontal transparent electrode, 37 , 38 ... Transparent insulating film, 40 ... Illuminance distribution correction filter, 50 ... Control unit, 51 ... Storage unit, 112a ... Correction element, 115 ... Condenser lens

Claims (8)

A light source;
A reticle holding unit for holding a reticle irradiated with light from the light source;
A fly-eye lens disposed between the reticle holding part and the light source and having a plurality of lens elements;
An illuminance distribution correction filter including a plurality of liquid crystal cells arranged between the light source and the fly-eye lens and arranged in a matrix,
A controller for displaying an illuminance distribution correction pattern on the illuminance distribution correction filter by inputting illuminance distribution correction data to the illuminance distribution correction filter;
An exposure apparatus comprising: A light source;
A reticle holding unit for holding a reticle irradiated with light from the light source;
A fly-eye lens disposed between the reticle holding part and the light source and having a plurality of lens elements;
An illuminance distribution correction filter including a plurality of liquid crystal cells arranged between the reticle holding unit and the fly-eye lens and arranged in a matrix,
A controller for displaying an illuminance distribution correction pattern on the illuminance distribution correction filter by inputting illuminance distribution correction data to the illuminance distribution correction filter;
An exposure apparatus comprising: Further comprising a condenser lens disposed between the fly-eye lens and the illuminance distribution correction filter;
The exposure apparatus according to claim 2, wherein the illuminance distribution correction filter is disposed at a rear focal point of the condenser lens or in the vicinity thereof.   The exposure apparatus according to claim 2, wherein the graph showing the light transmittance distribution of the illuminance distribution correction filter displaying the illuminance distribution correction pattern has an acute angle portion.   The exposure apparatus according to claim 1, wherein the liquid crystal included in the liquid crystal cell has a hysteresis characteristic in light transmittance with respect to an applied voltage. The illuminance distribution correction filter is
A transparent substrate;
A plurality of first transparent electrodes disposed substantially parallel to each other on the transparent substrate;
Above the first transparent electrode, a plurality of second transparent electrodes disposed substantially perpendicular to the first transparent electrode and substantially parallel to each other;
Liquid crystal positioned between the plurality of first transparent electrodes and the plurality of second transparent electrodes;
Comprising
The adjacent first transparent electrodes are arranged such that their edges overlap with each other via the first transparent insulating film,
The exposure apparatus according to any one of claims 1 to 5, wherein the adjacent second transparent electrodes are arranged such that their edges overlap with each other via a second transparent insulating film.   An illuminance distribution correction filter that is used in an exposure apparatus and includes a plurality of liquid crystal cells arranged in a matrix and corrects the illuminance distribution of light by displaying an illuminance distribution correction pattern for correction. A step of preparing an exposure apparatus including an illuminance distribution correction filter, in which a plurality of liquid crystal cells using liquid crystal having a hysteresis characteristic in light transmittance with respect to an applied voltage are arranged;
Inputting data indicating an illuminance distribution correction pattern to the illuminance distribution correction filter, and holding the illuminance distribution correction pattern in the illuminance distribution correction filter;
Forming a photosensitive film on a thin film formed on or above the semiconductor substrate; and
Exposing the photosensitive film using the exposure apparatus in which the illuminance distribution correction filter holds an illuminance distribution correction pattern; and
Forming a pattern by developing the exposed photosensitive film;
A method for manufacturing a semiconductor device comprising:

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