JP2011029653A5 - - Google Patents

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Publication number
JP2011029653A5
JP2011029653A5 JP2010211817A JP2010211817A JP2011029653A5 JP 2011029653 A5 JP2011029653 A5 JP 2011029653A5 JP 2010211817 A JP2010211817 A JP 2010211817A JP 2010211817 A JP2010211817 A JP 2010211817A JP 2011029653 A5 JP2011029653 A5 JP 2011029653A5
Authority
JP
Japan
Prior art keywords
contaminant
trap
platelets
traps
central zone
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2010211817A
Other languages
English (en)
Japanese (ja)
Other versions
JP5249296B2 (ja
JP2011029653A (ja
Filing date
Publication date
Priority claimed from US10/944,422 external-priority patent/US7161653B2/en
Application filed filed Critical
Publication of JP2011029653A publication Critical patent/JP2011029653A/ja
Publication of JP2011029653A5 publication Critical patent/JP2011029653A5/ja
Application granted granted Critical
Publication of JP5249296B2 publication Critical patent/JP5249296B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2010211817A 2004-09-20 2010-09-22 汚染物トラップシステム及び汚染物トラップシステムを有するリソグラフィ装置 Expired - Fee Related JP5249296B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/944,422 2004-09-20
US10/944,422 US7161653B2 (en) 2004-09-20 2004-09-20 Lithographic apparatus having a contaminant trapping system, a contamination trapping system, a device manufacturing method, and a method for improving trapping of contaminants in a lithographic apparatus

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2007532268A Division JP5005544B2 (ja) 2004-09-20 2005-09-19 汚染物トラップシステムを有するリソグラフィ装置、汚染物トラップシステム及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2011029653A JP2011029653A (ja) 2011-02-10
JP2011029653A5 true JP2011029653A5 (enExample) 2012-09-06
JP5249296B2 JP5249296B2 (ja) 2013-07-31

Family

ID=35677316

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2007532268A Expired - Fee Related JP5005544B2 (ja) 2004-09-20 2005-09-19 汚染物トラップシステムを有するリソグラフィ装置、汚染物トラップシステム及びデバイス製造方法
JP2010211817A Expired - Fee Related JP5249296B2 (ja) 2004-09-20 2010-09-22 汚染物トラップシステム及び汚染物トラップシステムを有するリソグラフィ装置

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP2007532268A Expired - Fee Related JP5005544B2 (ja) 2004-09-20 2005-09-19 汚染物トラップシステムを有するリソグラフィ装置、汚染物トラップシステム及びデバイス製造方法

Country Status (4)

Country Link
US (1) US7161653B2 (enExample)
JP (2) JP5005544B2 (enExample)
TW (1) TWI327256B (enExample)
WO (1) WO2006049489A1 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7368733B2 (en) * 2006-03-30 2008-05-06 Asml Netherlands B.V. Contamination barrier and lithographic apparatus comprising same
US7889312B2 (en) * 2006-09-22 2011-02-15 Asml Netherlands B.V. Apparatus comprising a rotating contaminant trap
US8227771B2 (en) * 2007-07-23 2012-07-24 Asml Netherlands B.V. Debris prevention system and lithographic apparatus
US7700930B2 (en) * 2007-09-14 2010-04-20 Asml Netherlands B.V. Lithographic apparatus with rotation filter device
WO2010072429A1 (en) 2008-12-22 2010-07-01 Asml Netherlands B.V. A lithographic apparatus, a radiation system, a device manufacturing method and a debris mitigation method
JP5355115B2 (ja) * 2009-01-30 2013-11-27 株式会社東芝 極端紫外光光源装置及びその調整方法
US9753383B2 (en) * 2012-06-22 2017-09-05 Asml Netherlands B.V. Radiation source and lithographic apparatus
KR102813711B1 (ko) 2019-05-02 2025-05-29 삼성전자주식회사 반도체 소자의 제조 장치 및 그를 이용한 반도체 소자의 제조 방법

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL1008352C2 (nl) * 1998-02-19 1999-08-20 Stichting Tech Wetenschapp Inrichting, geschikt voor extreem ultraviolet lithografie, omvattende een stralingsbron en een verwerkingsorgaan voor het verwerken van de van de stralingsbron afkomstige straling, alsmede een filter voor het onderdrukken van ongewenste atomaire en microscopische deeltjes welke door een stralingsbron zijn uitgezonden.
EP1223468B1 (en) 2001-01-10 2008-07-02 ASML Netherlands B.V. Lithographic projection apparatus and device manufacturing method
JP2003022950A (ja) * 2001-07-05 2003-01-24 Canon Inc Ｘ線光源用デブリ除去装置及び、デブリ除去装置を用いた露光装置
DE10138284A1 (de) * 2001-08-10 2003-02-27 Zeiss Carl Beleuchtungssystem mit genesteten Kollektoren
KR20040052231A (ko) * 2001-10-12 2004-06-22 코닌클리즈케 필립스 일렉트로닉스 엔.브이. 리소그래피용 투영 장치, 소자 제조 방법 및 오염 물질집진부
KR100748447B1 (ko) * 2002-08-23 2007-08-10 에이에스엠엘 네델란즈 비.브이. 리소그래피 투영장치 및 상기 장치에 사용하기 위한파티클 배리어
TWI230847B (en) * 2002-12-23 2005-04-11 Asml Netherlands Bv Contamination barrier with expandable lamellas

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