JP2011018886A - 電子デバイス用誘電体層 - Google Patents
電子デバイス用誘電体層 Download PDFInfo
- Publication number
- JP2011018886A JP2011018886A JP2010120304A JP2010120304A JP2011018886A JP 2011018886 A JP2011018886 A JP 2011018886A JP 2010120304 A JP2010120304 A JP 2010120304A JP 2010120304 A JP2010120304 A JP 2010120304A JP 2011018886 A JP2011018886 A JP 2011018886A
- Authority
- JP
- Japan
- Prior art keywords
- compound
- dielectric layer
- molecular
- glass
- molecular glass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011521 glass Substances 0.000 claims abstract description 75
- 239000000203 mixture Substances 0.000 claims abstract description 20
- 150000001875 compounds Chemical class 0.000 claims abstract description 16
- 239000003431 cross linking reagent Substances 0.000 claims abstract description 15
- 239000007788 liquid Substances 0.000 claims abstract description 14
- 239000003054 catalyst Substances 0.000 claims abstract description 9
- 239000010409 thin film Substances 0.000 claims description 16
- 238000004132 cross linking Methods 0.000 claims description 8
- 239000000463 material Substances 0.000 abstract description 52
- -1 bisphenol A compound Chemical class 0.000 abstract description 37
- 229910000077 silane Inorganic materials 0.000 abstract description 19
- ORILYTVJVMAKLC-UHFFFAOYSA-N Adamantane Natural products C1C(C2)CC3CC1CC2C3 ORILYTVJVMAKLC-UHFFFAOYSA-N 0.000 abstract description 12
- 239000002105 nanoparticle Substances 0.000 abstract description 10
- UHOVQNZJYSORNB-UHFFFAOYSA-N monobenzene Natural products C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 abstract description 8
- IISBACLAFKSPIT-UHFFFAOYSA-N Bisphenol A Natural products C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 abstract description 7
- 150000003413 spiro compounds Chemical class 0.000 abstract description 7
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Natural products C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 abstract description 6
- 150000002148 esters Chemical class 0.000 abstract description 5
- 239000002253 acid Substances 0.000 abstract description 4
- 229910044991 metal oxide Inorganic materials 0.000 abstract description 4
- 150000004706 metal oxides Chemical class 0.000 abstract description 4
- BBEAQIROQSPTKN-UHFFFAOYSA-N antipyrene Natural products C1=CC=C2C=CC3=CC=CC4=CC=C1C2=C43 BBEAQIROQSPTKN-UHFFFAOYSA-N 0.000 abstract description 3
- 150000001923 cyclic compounds Chemical class 0.000 abstract description 3
- 239000002082 metal nanoparticle Substances 0.000 abstract description 3
- UFWIBTONFRDIAS-UHFFFAOYSA-N naphthalene-acid Natural products C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 abstract description 3
- YNPNZTXNASCQKK-UHFFFAOYSA-N Phenanthrene Natural products C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 abstract description 2
- GVEPBJHOBDJJJI-UHFFFAOYSA-N fluoranthrene Natural products C1=CC(C2=CC=CC=C22)=C3C2=CC=CC3=C1 GVEPBJHOBDJJJI-UHFFFAOYSA-N 0.000 abstract description 2
- 239000010954 inorganic particle Substances 0.000 abstract description 2
- 230000005494 condensation Effects 0.000 abstract 1
- 238000009833 condensation Methods 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 description 26
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 19
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 18
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 17
- 238000000034 method Methods 0.000 description 16
- 239000004971 Cross linker Substances 0.000 description 13
- 229910052739 hydrogen Inorganic materials 0.000 description 13
- 239000001257 hydrogen Substances 0.000 description 13
- 125000004464 hydroxyphenyl group Chemical group 0.000 description 13
- 230000008569 process Effects 0.000 description 13
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 12
- 125000000524 functional group Chemical group 0.000 description 12
- 239000000758 substrate Substances 0.000 description 12
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 11
- 239000004593 Epoxy Chemical group 0.000 description 10
- YXVFYQXJAXKLAK-UHFFFAOYSA-N biphenyl-4-ol Chemical group C1=CC(O)=CC=C1C1=CC=CC=C1 YXVFYQXJAXKLAK-UHFFFAOYSA-N 0.000 description 10
- 239000011159 matrix material Substances 0.000 description 9
- 229920000123 polythiophene Polymers 0.000 description 9
- 238000007639 printing Methods 0.000 description 9
- 239000000243 solution Substances 0.000 description 9
- 239000010408 film Substances 0.000 description 8
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 8
- 125000004122 cyclic group Chemical group 0.000 description 7
- LBLYYCQCTBFVLH-UHFFFAOYSA-N 2-Methylbenzenesulfonic acid Chemical compound CC1=CC=CC=C1S(O)(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-N 0.000 description 5
- 229920000877 Melamine resin Polymers 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 239000000306 component Substances 0.000 description 5
- 238000000151 deposition Methods 0.000 description 5
- 125000003700 epoxy group Chemical group 0.000 description 5
- 229920000642 polymer Polymers 0.000 description 5
- 239000002861 polymer material Substances 0.000 description 5
- KQMIWCAOEFUBQK-UHFFFAOYSA-N 1-methoxy-3-phenylbenzene Chemical group COC1=CC=CC(C=2C=CC=CC=2)=C1 KQMIWCAOEFUBQK-UHFFFAOYSA-N 0.000 description 4
- RHDYQUZYHZWTCI-UHFFFAOYSA-N 1-methoxy-4-phenylbenzene Chemical group C1=CC(OC)=CC=C1C1=CC=CC=C1 RHDYQUZYHZWTCI-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- GLZPCOQZEFWAFX-UHFFFAOYSA-N Geraniol Chemical compound CC(C)=CCCC(C)=CCO GLZPCOQZEFWAFX-UHFFFAOYSA-N 0.000 description 4
- 239000003377 acid catalyst Substances 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- UBXYXCRCOKCZIT-UHFFFAOYSA-N biphenyl-3-ol Chemical group OC1=CC=CC(C=2C=CC=CC=2)=C1 UBXYXCRCOKCZIT-UHFFFAOYSA-N 0.000 description 4
- 150000001732 carboxylic acid derivatives Chemical group 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 230000009477 glass transition Effects 0.000 description 4
- 238000007641 inkjet printing Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 238000007650 screen-printing Methods 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 238000004528 spin coating Methods 0.000 description 4
- 125000001424 substituent group Chemical group 0.000 description 4
- 125000005259 triarylamine group Chemical group 0.000 description 4
- XGQJGMGAMHFMAO-UHFFFAOYSA-N 1,3,4,6-tetrakis(methoxymethyl)-3a,6a-dihydroimidazo[4,5-d]imidazole-2,5-dione Chemical compound COCN1C(=O)N(COC)C2C1N(COC)C(=O)N2COC XGQJGMGAMHFMAO-UHFFFAOYSA-N 0.000 description 3
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- 239000004642 Polyimide Substances 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 230000015556 catabolic process Effects 0.000 description 3
- VZWXIQHBIQLMPN-UHFFFAOYSA-N chromane Chemical compound C1=CC=C2CCCOC2=C1 VZWXIQHBIQLMPN-UHFFFAOYSA-N 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- 229920001940 conductive polymer Polymers 0.000 description 3
- 229940117389 dichlorobenzene Drugs 0.000 description 3
- 238000003618 dip coating Methods 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 125000005842 heteroatom Chemical group 0.000 description 3
- 239000012948 isocyanate Substances 0.000 description 3
- 150000002513 isocyanates Chemical class 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 150000003384 small molecules Chemical class 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- 125000005556 thienylene group Chemical group 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- QJHQKKNJSMEXIN-VCNJFBTNSA-N (2-methyl-2-adamantyl) 2-[[(2r,3r,4s,5r,6s)-3,4,5,6-tetrakis[2-[(2-methyl-2-adamantyl)oxy]-2-oxoethoxy]oxan-2-yl]methoxy]acetate Chemical compound C1C(C2)CC3CC1C(C)(OC(=O)COC[C@@H]1[C@H]([C@H](OCC(=O)OC4(C)C5CC6CC(C5)CC4C6)[C@@H](OCC(=O)OC4(C)C5CC6CC(C5)CC4C6)[C@@H](OCC(=O)OC4(C)C5CC6CC(C5)CC4C6)O1)OCC(=O)OC1(C)C4CC5CC(C4)CC1C5)C2C3 QJHQKKNJSMEXIN-VCNJFBTNSA-N 0.000 description 2
- POFMQEVZKZVAPQ-UHFFFAOYSA-N 1,1,1',1'-tetramethyl-3,3'-spirobi[2h-indene]-5,5',6,6'-tetrol Chemical compound C12=CC(O)=C(O)C=C2C(C)(C)CC11C2=CC(O)=C(O)C=C2C(C)(C)C1 POFMQEVZKZVAPQ-UHFFFAOYSA-N 0.000 description 2
- FYGHSUNMUKGBRK-UHFFFAOYSA-N 1,2,3-trimethylbenzene Chemical compound CC1=CC=CC(C)=C1C FYGHSUNMUKGBRK-UHFFFAOYSA-N 0.000 description 2
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 2
- FCEHBMOGCRZNNI-UHFFFAOYSA-N 1-benzothiophene Chemical group C1=CC=C2SC=CC2=C1 FCEHBMOGCRZNNI-UHFFFAOYSA-N 0.000 description 2
- BBMCTIGTTCKYKF-UHFFFAOYSA-N 1-heptanol Chemical compound CCCCCCCO BBMCTIGTTCKYKF-UHFFFAOYSA-N 0.000 description 2
- OHZAHWOAMVVGEL-UHFFFAOYSA-N 2,2'-bithiophene Chemical compound C1=CSC(C=2SC=CC=2)=C1 OHZAHWOAMVVGEL-UHFFFAOYSA-N 0.000 description 2
- JESXATFQYMPTNL-UHFFFAOYSA-N 2-ethenylphenol Chemical compound OC1=CC=CC=C1C=C JESXATFQYMPTNL-UHFFFAOYSA-N 0.000 description 2
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 2
- JTLIHDXDRMOPJZ-UHFFFAOYSA-N 2-tris(2-hydroxyphenyl)silylphenol Chemical compound OC1=CC=CC=C1[Si](C=1C(=CC=CC=1)O)(C=1C(=CC=CC=1)O)C1=CC=CC=C1O JTLIHDXDRMOPJZ-UHFFFAOYSA-N 0.000 description 2
- DRBMMEUJBPKBIS-UHFFFAOYSA-N 3-tris(3-hydroxyphenyl)silylphenol Chemical compound OC1=CC=CC([Si](C=2C=C(O)C=CC=2)(C=2C=C(O)C=CC=2)C=2C=C(O)C=CC=2)=C1 DRBMMEUJBPKBIS-UHFFFAOYSA-N 0.000 description 2
- AIHRQGUYNQTCBQ-UHFFFAOYSA-N 4-tris(4-hydroxyphenyl)silylphenol Chemical compound C1=CC(O)=CC=C1[Si](C=1C=CC(O)=CC=1)(C=1C=CC(O)=CC=1)C1=CC=C(O)C=C1 AIHRQGUYNQTCBQ-UHFFFAOYSA-N 0.000 description 2
- UJOBWOGCFQCDNV-UHFFFAOYSA-N 9H-carbazole Chemical group C1=CC=C2C3=CC=CC=C3NC2=C1 UJOBWOGCFQCDNV-UHFFFAOYSA-N 0.000 description 2
- GIXXQTYGFOHYPT-UHFFFAOYSA-N Bisphenol P Chemical compound C=1C=C(C(C)(C)C=2C=CC(O)=CC=2)C=CC=1C(C)(C)C1=CC=C(O)C=C1 GIXXQTYGFOHYPT-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- 229920001609 Poly(3,4-ethylenedioxythiophene) Polymers 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 125000000732 arylene group Chemical group 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 229940099352 cholate Drugs 0.000 description 2
- BHQCQFFYRZLCQQ-OELDTZBJSA-N cholic acid Chemical compound C([C@H]1C[C@H]2O)[C@H](O)CC[C@]1(C)[C@@H]1[C@@H]2[C@@H]2CC[C@H]([C@@H](CCC(O)=O)C)[C@@]2(C)[C@@H](O)C1 BHQCQFFYRZLCQQ-OELDTZBJSA-N 0.000 description 2
- QMVPMAAFGQKVCJ-UHFFFAOYSA-N citronellol Chemical compound OCCC(C)CCC=C(C)C QMVPMAAFGQKVCJ-UHFFFAOYSA-N 0.000 description 2
- MWKFXSUHUHTGQN-UHFFFAOYSA-N decan-1-ol Chemical compound CCCCCCCCCCO MWKFXSUHUHTGQN-UHFFFAOYSA-N 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- LQZZUXJYWNFBMV-UHFFFAOYSA-N dodecan-1-ol Chemical compound CCCCCCCCCCCCO LQZZUXJYWNFBMV-UHFFFAOYSA-N 0.000 description 2
- 239000007772 electrode material Substances 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- RMBPEFMHABBEKP-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2C3=C[CH]C=CC3=CC2=C1 RMBPEFMHABBEKP-UHFFFAOYSA-N 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 238000007646 gravure printing Methods 0.000 description 2
- 125000005549 heteroarylene group Chemical group 0.000 description 2
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 2
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 2
- ZYTMANIQRDEHIO-KXUCPTDWSA-N isopulegol Chemical compound C[C@@H]1CC[C@@H](C(C)=C)[C@H](O)C1 ZYTMANIQRDEHIO-KXUCPTDWSA-N 0.000 description 2
- CDOSHBSSFJOMGT-UHFFFAOYSA-N linalool Chemical compound CC(C)=CCCC(C)(O)C=C CDOSHBSSFJOMGT-UHFFFAOYSA-N 0.000 description 2
- 238000000813 microcontact printing Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- ZWRUINPWMLAQRD-UHFFFAOYSA-N nonan-1-ol Chemical compound CCCCCCCCCO ZWRUINPWMLAQRD-UHFFFAOYSA-N 0.000 description 2
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N o-biphenylenemethane Natural products C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- 229920001568 phenolic resin Polymers 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 2
- 239000002985 plastic film Substances 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- HLZKNKRTKFSKGZ-UHFFFAOYSA-N tetradecan-1-ol Chemical compound CCCCCCCCCCCCCCO HLZKNKRTKFSKGZ-UHFFFAOYSA-N 0.000 description 2
- SOJOEVWHKUTJCM-UHFFFAOYSA-N tetrakis(3-methoxyphenyl)silane Chemical compound COC1=CC=CC([Si](C=2C=C(OC)C=CC=2)(C=2C=C(OC)C=CC=2)C=2C=C(OC)C=CC=2)=C1 SOJOEVWHKUTJCM-UHFFFAOYSA-N 0.000 description 2
- RODVFNLNVRRRRG-UHFFFAOYSA-N tetrakis(4-methoxyphenyl)silane Chemical compound C1=CC(OC)=CC=C1[Si](C=1C=CC(OC)=CC=1)(C=1C=CC(OC)=CC=1)C1=CC=C(OC)C=C1 RODVFNLNVRRRRG-UHFFFAOYSA-N 0.000 description 2
- VJYJJHQEVLEOFL-UHFFFAOYSA-N thieno[3,2-b]thiophene Chemical class S1C=CC2=C1C=CS2 VJYJJHQEVLEOFL-UHFFFAOYSA-N 0.000 description 2
- NOOLISFMXDJSKH-UTLUCORTSA-N (+)-Neomenthol Chemical compound CC(C)[C@@H]1CC[C@@H](C)C[C@@H]1O NOOLISFMXDJSKH-UTLUCORTSA-N 0.000 description 1
- AEPMMTRERWOSHG-HULFFUFUSA-N (1E,3E)-dodeca-1,3-dien-1-ol Chemical compound CCCCCCCC\C=C\C=C\O AEPMMTRERWOSHG-HULFFUFUSA-N 0.000 description 1
- 239000001871 (1R,2R,5S)-5-methyl-2-prop-1-en-2-ylcyclohexan-1-ol Substances 0.000 description 1
- ZAXKASRBECJCPQ-YTXTXJHMSA-N (1e,3e)-hepta-1,3-dien-1-ol Chemical compound CCC\C=C\C=C\O ZAXKASRBECJCPQ-YTXTXJHMSA-N 0.000 description 1
- CRDAMVZIKSXKFV-FBXUGWQNSA-N (2-cis,6-cis)-farnesol Chemical compound CC(C)=CCC\C(C)=C/CC\C(C)=C/CO CRDAMVZIKSXKFV-FBXUGWQNSA-N 0.000 description 1
- 239000000260 (2E,6E)-3,7,11-trimethyldodeca-2,6,10-trien-1-ol Substances 0.000 description 1
- UGJIFKYLLACUAK-YSVFQJGKSA-N (2r,3r,4s,5r,6r)-2,3,4,5-tetrakis(2-adamantyloxymethoxy)-6-(2-adamantyloxymethoxymethyl)oxane Chemical compound C1C(CC2C3)CC3CC1C2OCOC[C@@H]1[C@@H](OCOC2C3CC4CC(C3)CC2C4)[C@H](OCOC2C3CC4CC(C3)CC2C4)[C@@H](OCOC2C3CC4CC(C3)CC2C4)[C@@H](OCOC2C3CC4CC(C3)CC2C4)O1 UGJIFKYLLACUAK-YSVFQJGKSA-N 0.000 description 1
- NAWXUBYGYWOOIX-SFHVURJKSA-N (2s)-2-[[4-[2-(2,4-diaminoquinazolin-6-yl)ethyl]benzoyl]amino]-4-methylidenepentanedioic acid Chemical compound C1=CC2=NC(N)=NC(N)=C2C=C1CCC1=CC=C(C(=O)N[C@@H](CC(=C)C(O)=O)C(O)=O)C=C1 NAWXUBYGYWOOIX-SFHVURJKSA-N 0.000 description 1
- 239000001490 (3R)-3,7-dimethylocta-1,6-dien-3-ol Substances 0.000 description 1
- WHQDLCHSPLKATA-UHFFFAOYSA-M (4-iodophenyl)-diphenylsulfanium;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C1=CC(I)=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 WHQDLCHSPLKATA-UHFFFAOYSA-M 0.000 description 1
- ALSTYHKOOCGGFT-KTKRTIGZSA-N (9Z)-octadecen-1-ol Chemical compound CCCCCCCC\C=C/CCCCCCCCO ALSTYHKOOCGGFT-KTKRTIGZSA-N 0.000 description 1
- 239000001707 (E,7R,11R)-3,7,11,15-tetramethylhexadec-2-en-1-ol Substances 0.000 description 1
- QMVPMAAFGQKVCJ-SNVBAGLBSA-N (R)-(+)-citronellol Natural products OCC[C@H](C)CCC=C(C)C QMVPMAAFGQKVCJ-SNVBAGLBSA-N 0.000 description 1
- CDOSHBSSFJOMGT-JTQLQIEISA-N (R)-linalool Natural products CC(C)=CCC[C@@](C)(O)C=C CDOSHBSSFJOMGT-JTQLQIEISA-N 0.000 description 1
- CQKHFONAFZDDKV-VAWYXSNFSA-N (e)-dodec-1-en-1-ol Chemical compound CCCCCCCCCC\C=C\O CQKHFONAFZDDKV-VAWYXSNFSA-N 0.000 description 1
- HDQDUBPEBVXIBJ-VOTSOKGWSA-N (e)-hept-1-en-1-ol Chemical compound CCCCC\C=C\O HDQDUBPEBVXIBJ-VOTSOKGWSA-N 0.000 description 1
- GWSURTDMLUFMJH-FOCLMDBBSA-N (e)-hexadec-1-en-1-ol Chemical compound CCCCCCCCCCCCCC\C=C\O GWSURTDMLUFMJH-FOCLMDBBSA-N 0.000 description 1
- XKBCNTPVQJGJPY-CMDGGOBGSA-N (e)-non-1-en-1-ol Chemical compound CCCCCCC\C=C\O XKBCNTPVQJGJPY-CMDGGOBGSA-N 0.000 description 1
- MDVPRIBCAFEROC-BQYQJAHWSA-N (e)-oct-1-en-1-ol Chemical compound CCCCCC\C=C\O MDVPRIBCAFEROC-BQYQJAHWSA-N 0.000 description 1
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- SXWIAEOZZQADEY-UHFFFAOYSA-N 1,3,5-triphenylbenzene Chemical compound C1=CC=CC=C1C1=CC(C=2C=CC=CC=2)=CC(C=2C=CC=CC=2)=C1 SXWIAEOZZQADEY-UHFFFAOYSA-N 0.000 description 1
- 125000001140 1,4-phenylene group Chemical group [H]C1=C([H])C([*:2])=C([H])C([H])=C1[*:1] 0.000 description 1
- GIEMHYCMBGELGY-UHFFFAOYSA-N 10-undecen-1-ol Chemical compound OCCCCCCCCCC=C GIEMHYCMBGELGY-UHFFFAOYSA-N 0.000 description 1
- KXSFECAJUBPPFE-UHFFFAOYSA-N 2,2':5',2''-terthiophene Chemical compound C1=CSC(C=2SC(=CC=2)C=2SC=CC=2)=C1 KXSFECAJUBPPFE-UHFFFAOYSA-N 0.000 description 1
- DMTBJSZFNYDENF-UHFFFAOYSA-N 2,3,3-trimethylcyclohexen-1-ol Chemical compound CC1=C(O)CCCC1(C)C DMTBJSZFNYDENF-UHFFFAOYSA-N 0.000 description 1
- PPPFYBPQAPISCT-UHFFFAOYSA-N 2-hydroxypropyl acetate Chemical compound CC(O)COC(C)=O PPPFYBPQAPISCT-UHFFFAOYSA-N 0.000 description 1
- FPALFFYLFYUUHV-UHFFFAOYSA-N 2-methylcyclohexen-1-ol Chemical compound CC1=C(O)CCCC1 FPALFFYLFYUUHV-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- MQWCXKGKQLNYQG-UHFFFAOYSA-N 4-methylcyclohexan-1-ol Chemical compound CC1CCC(O)CC1 MQWCXKGKQLNYQG-UHFFFAOYSA-N 0.000 description 1
- ADLVDYMTBOSDFE-UHFFFAOYSA-N 5-chloro-6-nitroisoindole-1,3-dione Chemical compound C1=C(Cl)C([N+](=O)[O-])=CC2=C1C(=O)NC2=O ADLVDYMTBOSDFE-UHFFFAOYSA-N 0.000 description 1
- ZMCBPOWGXHULPT-UHFFFAOYSA-M 9,10-dimethoxyanthracene-2-sulfonate;diphenyliodanium Chemical compound C=1C=CC=CC=1[I+]C1=CC=CC=C1.[O-]S(=O)(=O)C1=CC=C2C(OC)=C(C=CC=C3)C3=C(OC)C2=C1 ZMCBPOWGXHULPT-UHFFFAOYSA-M 0.000 description 1
- 229920003026 Acene Polymers 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- XMWRBQBLMFGWIX-UHFFFAOYSA-N C60 fullerene Chemical class C12=C3C(C4=C56)=C7C8=C5C5=C9C%10=C6C6=C4C1=C1C4=C6C6=C%10C%10=C9C9=C%11C5=C8C5=C8C7=C3C3=C7C2=C1C1=C2C4=C6C4=C%10C6=C9C9=C%11C5=C5C8=C3C3=C7C1=C1C2=C4C6=C2C9=C5C3=C12 XMWRBQBLMFGWIX-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- NOOLISFMXDJSKH-UHFFFAOYSA-N DL-menthol Natural products CC(C)C1CCC(C)CC1O NOOLISFMXDJSKH-UHFFFAOYSA-N 0.000 description 1
- 102100025027 E3 ubiquitin-protein ligase TRIM69 Human genes 0.000 description 1
- GLZPCOQZEFWAFX-YFHOEESVSA-N Geraniol Natural products CC(C)=CCC\C(C)=C/CO GLZPCOQZEFWAFX-YFHOEESVSA-N 0.000 description 1
- 239000005792 Geraniol Substances 0.000 description 1
- WQZGKKKJIJFFOK-GASJEMHNSA-N Glucose Natural products OC[C@H]1OC(O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-GASJEMHNSA-N 0.000 description 1
- 229910004129 HfSiO Inorganic materials 0.000 description 1
- 101000830203 Homo sapiens E3 ubiquitin-protein ligase TRIM69 Proteins 0.000 description 1
- 229910021193 La 2 O 3 Inorganic materials 0.000 description 1
- YHBTXTFFTYXOFV-UHFFFAOYSA-N Liquid thiophthene Chemical group C1=CSC2=C1C=CS2 YHBTXTFFTYXOFV-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- GLZPCOQZEFWAFX-JXMROGBWSA-N Nerol Natural products CC(C)=CCC\C(C)=C\CO GLZPCOQZEFWAFX-JXMROGBWSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- BLUHKGOSFDHHGX-UHFFFAOYSA-N Phytol Natural products CC(C)CCCC(C)CCCC(C)CCCC(C)C=CO BLUHKGOSFDHHGX-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- XBDYBAVJXHJMNQ-UHFFFAOYSA-N Tetrahydroanthracene Natural products C1=CC=C2C=C(CCCC3)C3=CC2=C1 XBDYBAVJXHJMNQ-UHFFFAOYSA-N 0.000 description 1
- HNZBNQYXWOLKBA-UHFFFAOYSA-N Tetrahydrofarnesol Natural products CC(C)CCCC(C)CCCC(C)=CCO HNZBNQYXWOLKBA-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- GEIAQOFPUVMAGM-UHFFFAOYSA-N ZrO Inorganic materials [Zr]=O GEIAQOFPUVMAGM-UHFFFAOYSA-N 0.000 description 1
- 229910006501 ZrSiO Inorganic materials 0.000 description 1
- XOJBTAXWIQQSRS-UHFFFAOYSA-N [2-methoxy-3-[(2-methylpropan-2-yl)oxycarbonyl]phenyl]-diphenylsulfanium Chemical compound C1=CC=C(C(=O)OC(C)(C)C)C(OC)=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 XOJBTAXWIQQSRS-UHFFFAOYSA-N 0.000 description 1
- RCAQADNJXBGEKC-UHFFFAOYSA-N [O].[In].[Sb] Chemical compound [O].[In].[Sb] RCAQADNJXBGEKC-UHFFFAOYSA-N 0.000 description 1
- PDPFWXJLAATZEF-UHFFFAOYSA-N [SiH4].OC1=CC=C(C=C1)C1=CC=CC=C1.OC1=CC=C(C=C1)C1=CC=CC=C1.OC1=CC=C(C=C1)C1=CC=CC=C1.OC1=CC=C(C=C1)C1=CC=CC=C1 Chemical compound [SiH4].OC1=CC=C(C=C1)C1=CC=CC=C1.OC1=CC=C(C=C1)C1=CC=CC=C1.OC1=CC=C(C=C1)C1=CC=CC=C1.OC1=CC=C(C=C1)C1=CC=CC=C1 PDPFWXJLAATZEF-UHFFFAOYSA-N 0.000 description 1
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 1
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
- 150000001241 acetals Chemical class 0.000 description 1
- 150000001242 acetic acid derivatives Chemical class 0.000 description 1
- 125000003670 adamantan-2-yl group Chemical group [H]C1([H])C(C2([H])[H])([H])C([H])([H])C3([H])C([*])([H])C1([H])C([H])([H])C2([H])C3([H])[H] 0.000 description 1
- 125000004183 alkoxy alkyl group Chemical group 0.000 description 1
- BOTWFXYSPFMFNR-OALUTQOASA-N all-rac-phytol Natural products CC(C)CCC[C@H](C)CCC[C@H](C)CCCC(C)=CCO BOTWFXYSPFMFNR-OALUTQOASA-N 0.000 description 1
- WUOACPNHFRMFPN-UHFFFAOYSA-N alpha-terpineol Chemical compound CC1=CCC(C(C)(C)O)CC1 WUOACPNHFRMFPN-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- KCXMKQUNVWSEMD-UHFFFAOYSA-N benzyl chloride Chemical compound ClCC1=CC=CC=C1 KCXMKQUNVWSEMD-UHFFFAOYSA-N 0.000 description 1
- JGQFVRIQXUFPAH-UHFFFAOYSA-N beta-citronellol Natural products OCCC(C)CCCC(C)=C JGQFVRIQXUFPAH-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- DJBAOXYQCAKLPH-UHFFFAOYSA-M bis(4-tert-butylphenyl)iodanium;1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F.C1=CC(C(C)(C)C)=CC=C1[I+]C1=CC=C(C(C)(C)C)C=C1 DJBAOXYQCAKLPH-UHFFFAOYSA-M 0.000 description 1
- UEJFJTOGXLEPIV-UHFFFAOYSA-M bis(4-tert-butylphenyl)iodanium;4-methylbenzenesulfonate Chemical compound CC1=CC=C(S([O-])(=O)=O)C=C1.C1=CC(C(C)(C)C)=CC=C1[I+]C1=CC=C(C(C)(C)C)C=C1 UEJFJTOGXLEPIV-UHFFFAOYSA-M 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 125000002843 carboxylic acid group Chemical group 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 125000003716 cholic acid group Chemical group 0.000 description 1
- 235000000484 citronellol Nutrition 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000008358 core component Substances 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- INSRQEMEVAMETL-UHFFFAOYSA-N decane-1,1-diol Chemical compound CCCCCCCCCC(O)O INSRQEMEVAMETL-UHFFFAOYSA-N 0.000 description 1
- SQIFACVGCPWBQZ-UHFFFAOYSA-N delta-terpineol Natural products CC(C)(O)C1CCC(=C)CC1 SQIFACVGCPWBQZ-UHFFFAOYSA-N 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- AJNVQOSZGJRYEI-UHFFFAOYSA-N digallium;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Ga+3].[Ga+3] AJNVQOSZGJRYEI-UHFFFAOYSA-N 0.000 description 1
- 150000002009 diols Chemical class 0.000 description 1
- UMIKAXKFQJWKCV-UHFFFAOYSA-M diphenyliodanium;4-methylbenzenesulfonate Chemical compound CC1=CC=C(S([O-])(=O)=O)C=C1.C=1C=CC=CC=1[I+]C1=CC=CC=C1 UMIKAXKFQJWKCV-UHFFFAOYSA-M 0.000 description 1
- SBQIJPBUMNWUKN-UHFFFAOYSA-M diphenyliodanium;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C=1C=CC=CC=1[I+]C1=CC=CC=C1 SBQIJPBUMNWUKN-UHFFFAOYSA-M 0.000 description 1
- 229940052761 dopaminergic adamantane derivative Drugs 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 239000012777 electrically insulating material Substances 0.000 description 1
- 238000010893 electron trap Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- OJAGAAVUZKMVGX-UHFFFAOYSA-N ethyl acetate;pyridine Chemical compound CCOC(C)=O.C1=CC=NC=C1 OJAGAAVUZKMVGX-UHFFFAOYSA-N 0.000 description 1
- 229940043259 farnesol Drugs 0.000 description 1
- 229930002886 farnesol Natural products 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 229920002457 flexible plastic Polymers 0.000 description 1
- 229910003472 fullerene Inorganic materials 0.000 description 1
- 229910001195 gallium oxide Inorganic materials 0.000 description 1
- 229940113087 geraniol Drugs 0.000 description 1
- 238000007496 glass forming Methods 0.000 description 1
- 239000008103 glucose Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- RBTKNAXYKSUFRK-UHFFFAOYSA-N heliogen blue Chemical compound [Cu].[N-]1C2=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=NC([N-]1)=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=N2 RBTKNAXYKSUFRK-UHFFFAOYSA-N 0.000 description 1
- MHIBEGOZTWERHF-UHFFFAOYSA-N heptane-1,1-diol Chemical compound CCCCCCC(O)O MHIBEGOZTWERHF-UHFFFAOYSA-N 0.000 description 1
- BXWNKGSJHAJOGX-UHFFFAOYSA-N hexadecan-1-ol Chemical compound CCCCCCCCCCCCCCCCO BXWNKGSJHAJOGX-UHFFFAOYSA-N 0.000 description 1
- ACCCMOQWYVYDOT-UHFFFAOYSA-N hexane-1,1-diol Chemical compound CCCCCC(O)O ACCCMOQWYVYDOT-UHFFFAOYSA-N 0.000 description 1
- QBHWPVJPWQGYDS-UHFFFAOYSA-N hexaphenylbenzene Chemical compound C1=CC=CC=C1C(C(=C(C=1C=CC=CC=1)C(C=1C=CC=CC=1)=C1C=2C=CC=CC=2)C=2C=CC=CC=2)=C1C1=CC=CC=C1 QBHWPVJPWQGYDS-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 150000008624 imidazolidinones Chemical class 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- VVVPGLRKXQSQSZ-UHFFFAOYSA-N indolo[3,2-c]carbazole Chemical group C1=CC=CC2=NC3=C4C5=CC=CC=C5N=C4C=CC3=C21 VVVPGLRKXQSQSZ-UHFFFAOYSA-N 0.000 description 1
- 229960005544 indolocarbazole Drugs 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 1
- 229940095045 isopulegol Drugs 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000003446 ligand Substances 0.000 description 1
- 229930007744 linalool Natural products 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 229940041616 menthol Drugs 0.000 description 1
- AUHZEENZYGFFBQ-UHFFFAOYSA-N mesitylene Substances CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 description 1
- 125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- KYTZHLUVELPASH-UHFFFAOYSA-N naphthalene-1,2-dicarboxylic acid Chemical compound C1=CC=CC2=C(C(O)=O)C(C(=O)O)=CC=C21 KYTZHLUVELPASH-UHFFFAOYSA-N 0.000 description 1
- ZYTMANIQRDEHIO-UHFFFAOYSA-N neo-Isopulegol Natural products CC1CCC(C(C)=C)C(O)C1 ZYTMANIQRDEHIO-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- FVXBCDWMKCEPCL-UHFFFAOYSA-N nonane-1,1-diol Chemical class CCCCCCCCC(O)O FVXBCDWMKCEPCL-UHFFFAOYSA-N 0.000 description 1
- OEIJHBUUFURJLI-UHFFFAOYSA-N octane-1,8-diol Chemical compound OCCCCCCCCO OEIJHBUUFURJLI-UHFFFAOYSA-N 0.000 description 1
- 238000007645 offset printing Methods 0.000 description 1
- 229940055577 oleyl alcohol Drugs 0.000 description 1
- XMLQWXUVTXCDDL-UHFFFAOYSA-N oleyl alcohol Natural products CCCCCCC=CCCCCCCCCCCO XMLQWXUVTXCDDL-UHFFFAOYSA-N 0.000 description 1
- RPDJEKMSFIRVII-UHFFFAOYSA-N oxomethylidenehydrazine Chemical group NN=C=O RPDJEKMSFIRVII-UHFFFAOYSA-N 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- SLIUAWYAILUBJU-UHFFFAOYSA-N pentacene Chemical compound C1=CC=CC2=CC3=CC4=CC5=CC=CC=C5C=C4C=C3C=C21 SLIUAWYAILUBJU-UHFFFAOYSA-N 0.000 description 1
- 150000002964 pentacenes Chemical class 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- 125000002080 perylenyl group Chemical class C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Chemical class C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- VBOGDLCGFBSZKS-UHFFFAOYSA-N phenylsulfanylbenzene;trifluoromethanesulfonic acid Chemical compound [O-]S(=O)(=O)C(F)(F)F.C=1C=CC=CC=1[SH+]C1=CC=CC=C1 VBOGDLCGFBSZKS-UHFFFAOYSA-N 0.000 description 1
- 229910000064 phosphane Inorganic materials 0.000 description 1
- 150000003002 phosphanes Chemical class 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- BOTWFXYSPFMFNR-PYDDKJGSSA-N phytol Chemical compound CC(C)CCC[C@@H](C)CCC[C@@H](C)CCC\C(C)=C\CO BOTWFXYSPFMFNR-PYDDKJGSSA-N 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 1
- 229920002848 poly(3-alkoxythiophenes) Polymers 0.000 description 1
- 229920001467 poly(styrenesulfonates) Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000417 polynaphthalene Polymers 0.000 description 1
- 229920000128 polypyrrole Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920000734 polysilsesquioxane polymer Polymers 0.000 description 1
- 239000011970 polystyrene sulfonate Substances 0.000 description 1
- 229960002796 polystyrene sulfonate Drugs 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 150000004040 pyrrolidinones Chemical class 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 239000010944 silver (metal) Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 125000003003 spiro group Chemical group 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 229940116411 terpineol Drugs 0.000 description 1
- IFLREYGFSNHWGE-UHFFFAOYSA-N tetracene Chemical compound C1=CC=CC2=CC3=CC4=CC=CC=C4C=C3C=C21 IFLREYGFSNHWGE-UHFFFAOYSA-N 0.000 description 1
- GXBLITCOLKGJDG-UHFFFAOYSA-N tetradec-13-en-1-ol Chemical compound OCCCCCCCCCCCCC=C GXBLITCOLKGJDG-UHFFFAOYSA-N 0.000 description 1
- CRUIOQJBPNKOJG-UHFFFAOYSA-N thieno[3,2-e][1]benzothiole Chemical group C1=C2SC=CC2=C2C=CSC2=C1 CRUIOQJBPNKOJG-UHFFFAOYSA-N 0.000 description 1
- 229930192474 thiophene Natural products 0.000 description 1
- CRDAMVZIKSXKFV-UHFFFAOYSA-N trans-Farnesol Natural products CC(C)=CCCC(C)=CCCC(C)=CCO CRDAMVZIKSXKFV-UHFFFAOYSA-N 0.000 description 1
- 125000005409 triarylsulfonium group Chemical group 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-M triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-M 0.000 description 1
- HHMQUQRJNPTPAJ-UHFFFAOYSA-M trifluoromethanesulfonate;tris(4-tert-butylphenyl)sulfanium Chemical compound [O-]S(=O)(=O)C(F)(F)F.C1=CC(C(C)(C)C)=CC=C1[S+](C=1C=CC(=CC=1)C(C)(C)C)C1=CC=C(C(C)(C)C)C=C1 HHMQUQRJNPTPAJ-UHFFFAOYSA-M 0.000 description 1
- OZWSFIJKAVDLEO-UHFFFAOYSA-N tris(2-methyl-2-adamantyl) adamantane-1,3,5-tricarboxylate Chemical compound C1C(C2)CC3CC1C(C)(OC(=O)C14CC5(CC(CC(C5)(C4)C(=O)OC4(C)C5CC6CC(C5)CC4C6)C1)C(=O)OC1(C)C4CC5CC(C4)CC1C5)C2C3 OZWSFIJKAVDLEO-UHFFFAOYSA-N 0.000 description 1
- KJIOQYGWTQBHNH-UHFFFAOYSA-N undecanol Chemical compound CCCCCCCCCCCO KJIOQYGWTQBHNH-UHFFFAOYSA-N 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
- H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
- H01B3/38—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes condensation products of aldehydes with amines or amides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02123—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/312—Organic layers, e.g. photoresist
- H01L21/3121—Layers comprising organo-silicon compounds
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/468—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics
- H10K10/471—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics the gate dielectric comprising only organic materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/466—Lateral bottom-gate IGFETs comprising only a single gate
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
- H10K85/113—Heteroaromatic compounds comprising sulfur or selene, e.g. polythiophene
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/151—Copolymers
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Thin Film Transistor (AREA)
- Formation Of Insulating Films (AREA)
- Laminated Bodies (AREA)
Abstract
【解決手段】分子性ガラスと、架橋剤と、触媒と、を含む、液体組成物を用い、誘電体層を形成する。分子性ガラスとしては、アモルファス分子性材料であり、‐OH、‐NH2の何れかを含む、エステル分子、スピロ、ビスフェノールA、四面体アリールシラン、アダマンタン、環系、縮合環、トリアリールアミン、ベンゼン、ヘキサフェニルベンゼン、トリフェニルベンゼン、ナフタレン、アントラセン、フェナントラセン、ピレンを用いる。又、光を照射することで酸を発生させる化合物、ナノ粒子等の無機粒子、金属ナノ粒子、酸化金属ナノ粒子、その他の無機ナノ粒子を含んでいてもよい。
【選択図】なし
Description
ここで、各置換基Rは、独立して、水素、ヒドロキシル、保護ヒドロキシル、アミノ、‐OC2H5、‐OCH3、‐OCOOC4H9、‐CNO、ヒドロキシフェニル、‐COOH、およびエポキシからなる群より選択される。
ここで、各Rは、独立して、水素、ヒドロキシル、保護ヒドロキシル、アミノ、‐OC2H5、‐OCH3、‐OCOOC4H9、‐CNO、ヒドロキシフェニル、‐COOH、およびエポキシからなる群より選択される。
ここで、各Rは、独立して、水素、ヒドロキシル、保護ヒドロキシル、アミノ、‐OC2H5、‐OCH3、‐OCOOC4H9、‐CNO、ヒドロキシフェニル、‐COOH、およびエポキシからなる群より選択される。R1は、酸素含有部分で置換されたフェニル基である。
ここで、各Rは、独立して、水素、ヒドロキシル、保護ヒドロキシル、アミノ、‐OC2H5、‐OCH3、‐OCOOC4H9、‐CNO、ヒドロキシフェニル、‐COOH、およびエポキシからなる群より選択される。
4,4’‐(1,4‐フェニレンジイソプロピリデン)ビスフェノール、テトラキス(4‐ヒドロキシフェニル)シラン、テトラキス(3‐ヒドロキシフェニル)シラン、テトラキス(2‐ヒドロキシフェニル)シラン;テトラキス(4‐ヒドロキシビフェニル)シラン、テトラキス(3‐[3‐ヒドロキシビフェニル])シラン、テトラキス(4‐[3‐ヒドロキシビフェニル])シラン、テトラキス(3‐[4‐ヒドロキシビフェニル])シラン、テトラキス(4‐[4‐ヒドロキシビフェニル])シラン、テトラキス(3‐メトキシフェニル)シラン、テトラキス(4‐メトキシフェニル)シラン、テトラキス(3‐[3‐メトキシビフェニル])シラン、テトラキス(4‐[3‐メトキシビフェニル])シラン、テトラキス(3‐[4‐メトキシビフェニル])シラン、テトラキス(4‐[4‐メトキシビフェニル])シラン、トリ(2‐アダマンチルオキシメチルコレート)‐3‐イル‐アダマンタン‐1,3,5‐トリカルボキシレート、トリ{[(2‐メチル‐2‐アダマンチル)オキシ]カルボニルメチルコレート}‐3‐イル‐アダマンタン‐1,3,5‐トリカルボキシレート、アダマンタン‐1,3,5‐トリイルトリス(オキシメチレン)トリコレート、アダマンタン‐1,3,5‐トリイルトリス(オキシメチレン)‐トリ‐3‐(2‐アダマンチルオキシメトキシ)コレート、トリ(2‐メチル‐2‐アダマンチル)‐アダマンタン‐1,3,5‐トリカルボキシレート、1,3,4‐トリス[(2‐アダマンチルオキシメチルコレート)‐3‐オキシメチルオキシ]アダマンタン、1,2,3,4,6‐ペンタ‐O‐(2‐アダマンチルオキシメチル)‐アルファ‐D‐グルコース、および1,2,3,4,6‐ペンタ‐O‐{[(2‐メチル‐2‐アダマンチル)オキシ]カルボニルメチル}‐アルファ‐D‐グルコース。
ここで、各置換基Rは、独立して、水素、‐OH、‐NH2、‐OC2H5、‐OCH3、‐OCOOC4H9、‐CNO、‐C6H4OH(ヒドロキシフェニル)、‐COOH、エポキシ等からなる群より選択される。さらなる態様では、これらの特定の化合物は、2個以上のヒドロキシル基または保護ヒドロキシル基(例えば、メトキシ基、メトキシシクロヘキシル基等で保護されたヒドロキシル基)を、それぞれのスピロ化合物の各環上に有する。式(1)の例示的な化合物は、5,5’,6,6’‐テトラヒドロキシ‐3,3,3’,3’‐テトラメチル‐1,1’‐スピロビスインダン(式中のRはヒドロキシル)である。式(2)の例示的な化合物は、6,6’,7,7’‐テトラヒドロキシ‐4,4,4’,4’‐テトラメチル‐2,2’‐スピロビス[クロマン](式中のRはヒドロキシル)である。これら2つの代表的な化合物は、式(1a)および(2a)として示される:
ここで、各Rは、独立して、水素、‐OH、‐NH2、‐OCH3、‐OC2H5、‐OCOOC4H9、‐CNO、‐C6H4OH(ヒドロキシフェニル)、‐COOH、エポキシ基等からなる群より選択される。さらなる態様では、R基は、‐OH、または保護された‐OH基であり、‐OCH3、‐OCOOC4H9、メトキシシクロヘキシル基等である。式(4)の例示的な化合物は、4,4’‐(1,4‐フェニレンジイソプロピリデン)ビスフェノールのヒドロキシフェニル誘導体である。その他の例示的なビスフェノールA系分子性ガラスとしては、構造(a)〜構造(e)が挙げられる。
ここで、各Rは、独立して、水素、‐OH、‐NH2、‐OCH3、‐OC2H5、‐OCOOC4H9、‐CNO、‐C6H4OH(ヒドロキシフェニル)、‐COOH、エポキシ基等からなる群より選択される。式(9)の例示的な態様としては、例えば、テトラキス(4‐ヒドロキシフェニル)シラン、テトラキス(3‐ヒドロキシフェニル)シラン、テトラキス(2‐ヒドロキシフェニル)シラン;テトラキス(4‐ヒドロキシビフェニル)シラン、テトラキス(3‐[3‐ヒドロキシビフェニル])シラン、テトラキス(4‐[3‐ヒドロキシビフェニル])シラン、テトラキス(3‐[4‐ヒドロキシビフェニル])シラン、テトラキス(4‐[4‐ヒドロキシビフェニル])シラン、テトラキス(3‐メトキシフェニル)シラン、テトラキス(4‐メトキシフェニル)シラン、テトラキス(3‐[3‐メトキシビフェニル])シラン、テトラキス(4‐[3‐メトキシビフェニル])シラン、テトラキス(3‐[4‐メトキシビフェニル])シラン、テトラキス(4‐[4‐メトキシビフェニル])シラン、およびこれらの混合物が挙げられる。
ここで、各Rは、独立して、水素、または酸素および窒素等のヘテロ原子を含む置換基である。他のさらなる態様では、Rは、アセタールおよび/またはエステル部分を含む基であり、例えばグルコースが挙げられる。他のある態様では、Rは、1以上のコール酸基を含む。代表的なR基としては、例えば、構造(f)〜構造(h)が挙げられる。
代表的なアダマンタン系分子性ガラスとしては、トリ(2‐アダマンチルオキシメチルコレート)‐3‐イル‐アダマンタン‐1,3,5‐トリカルボキシレート、トリ{[(2‐メチル‐2‐アダマンチル)オキシ]カルボニルメチルコレート}‐3‐イル‐アダマンタン‐1,3,5‐トリカルボキシレート、アダマンタン‐1,3,5‐トリイルトリス(オキシメチレン)トリコレート、アダマンタン‐1,3,5‐トリイルトリス(オキシメチレン)‐トリ‐3‐(2‐アダマンチルオキシメトキシ)コレート、トリ(2‐メチル‐2‐アダマンチル)‐アダマンタン‐1,3,5‐トリカルボキシレート、1,3,4‐トリ[(2‐アダマンチルオキシメチルコレート)‐3‐オキシメチルオキシ]アダマンタン、1,2,3,4,6‐ペンタ‐O‐(2‐アダマンチルオキシメチル)‐アルファ‐D‐グルコース、1,2,3,4,6‐ペンタ‐O‐{[(2‐メチル‐2‐アダマンチル)オキシ]カルボニルメチル}‐アルファ‐D‐グルコース等が挙げられる。
ここで、各Rは、独立して、水素、‐OH、‐NH2、‐OCH3、‐OC2H5、‐OCOOC4H9、‐CNO、‐C6H4OH(ヒドロキシフェニル)、‐COOH、エポキシ基等からなる群より選択される。R1は、酸素含有ラジカルで置換されたフェニル基であり、例えば、ヒドロキシフェニル、メトキシフェニル、ブトキシカルボニルオキシベンジル基等である。さらなる態様では、R基は、独立して、‐OH、または保護された‐OH基であり、OCH3、OCOOC4H9、メトキシシクロヘキシル基等である。
ここで、各Rは、独立して、水素、‐OH、‐NH2、‐OCH3、‐OC2H5、‐OCOOC4H9、‐CNO、‐C6H4OH(ヒドロキシフェニル)、‐COOH、メトキシフェニル、ブトキシカルボニルオキシベンジル、エポキシ基等からなる群より選択される。
ここで、RおよびR’は、独立して、水素、ハロゲン、アルキル、アルコキシアルキル、シロキシアルキル、およびパーフルオロアルキルから選択され、Mは、二価の結合であり、nは、繰り返し単位の数である。ある具体的な態様では、Mは、チエニレン、置換チエニレン、ビチオフェン、ターチオフェン、アリーレン、置換アリーレン、ヘテロアリーレン、または置換へテロアリーレンである。より具体的な態様では、Mは、フェニレン、チエノチオフェン、ベンゾチオフェン、カルバゾール、インドロカルバゾール、フルオレン、ベンゾジチオフェン、またはビチオフェンである。他の具体的な態様では、RおよびR’は、アルキルから選択される。より具体的な態様では、RおよびR’は、約4〜約18個の炭素原子、約6〜約16個の炭素原子、または約1〜約25個の炭素原子を有するアルキル、またはその異性体、混合物等である。
5,5’,6,6’‐テトラヒドロキシ‐3,3,3’,3’テトラメチル‐1,1’スピロビスインダン(Alfa Aesarより購入)を、12重量%の充填量(loading)にて、架橋剤としての6重量%のメラミン‐ホルムアルデヒド樹脂、および酸触媒としての少量のトルエンスルホン酸と共に酢酸プロピレングリコールメチルエーテルに溶解した。この溶液を0.2ミクロンのシリンジフィルターでろ過し、スライドガラス上に1000rpmにてスピンコーティングした。この膜(厚さ約200nm)を120℃にて30分間焼成した。得られた膜は、非常に均一で、強固であり、ジクロロベンゼンを含むほとんどの溶媒に対して耐性を示した。
本例では、4,4’‐(1,4‐フェニレンジイソプロピリデン)ビスフェノールを用いた。この分子性ガラスを、12重量%の充填量にて、架橋剤としての6重量%のメラミン‐ホルムアルデヒド樹脂、および酸触媒としての少量のトルエンスルホン酸と共に酢酸プロピレングリコールメチルエーテルに溶解した。この溶液を0.2ミクロンのシリンジフィルターでろ過し、スライドガラス上に1000rpmにてスピンコーティングした。この膜(厚さ約200nm)を120℃にて30分間焼成した。得られた膜は、非常に均一で、強固であり、ジクロロベンゼンを含むほとんどの溶媒に対して耐性を示した。
Claims (4)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/474,346 US8513650B2 (en) | 2009-05-29 | 2009-05-29 | Dielectric layer for an electronic device |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2011018886A true JP2011018886A (ja) | 2011-01-27 |
Family
ID=42712569
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010120304A Pending JP2011018886A (ja) | 2009-05-29 | 2010-05-26 | 電子デバイス用誘電体層 |
Country Status (4)
Country | Link |
---|---|
US (2) | US8513650B2 (ja) |
EP (1) | EP2256797B1 (ja) |
JP (1) | JP2011018886A (ja) |
CA (1) | CA2704720C (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102557930B (zh) * | 2012-01-05 | 2014-01-29 | 南京航空航天大学 | 联苯型分子玻璃及其制备方法 |
US8569443B1 (en) | 2012-12-18 | 2013-10-29 | Xerox Corporation | Copolythiophene semiconductors for electronic device applications |
DE102014104219B4 (de) * | 2014-03-26 | 2019-09-12 | Heraeus Nexensos Gmbh | Keramikträger sowie Sensorelement, Heizelement und Sensormodul jeweils mit einem Keramikträger und Verfahren zur Herstellung eines Keramikträgers |
WO2020008375A1 (en) * | 2018-07-05 | 2020-01-09 | Reliance Industries Limited | Spirobiindane derivatives and a process for preparation thereof |
KR102364856B1 (ko) * | 2020-01-17 | 2022-02-18 | 삼성전자주식회사 | 레지스트 화합물, 이를 사용한 패턴 형성 방법, 및 이를 사용한 반도체 소자 제조 방법 |
CN112142769B (zh) * | 2019-06-27 | 2022-02-01 | 中国科学院理化技术研究所 | 含硅多苯基单分子树脂及其光刻胶组合物 |
WO2021102711A1 (zh) * | 2019-11-27 | 2021-06-03 | 重庆康佳光电技术研究院有限公司 | 一种薄膜晶体管及其制备方法与薄膜晶体管阵列 |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002356551A (ja) * | 2001-05-31 | 2002-12-13 | Asahi Glass Co Ltd | 新規ポリアリーレンエーテル、その製造方法及びその用途 |
JP2005105115A (ja) * | 2003-09-30 | 2005-04-21 | Asahi Glass Co Ltd | 架橋性含フッ素芳香族プレポリマー及びその用途 |
JP2006058427A (ja) * | 2004-08-18 | 2006-03-02 | Mitsubishi Gas Chem Co Inc | レジスト組成物 |
WO2007094784A1 (en) * | 2006-02-16 | 2007-08-23 | Cornell Research Foundation, Inc. | Adamantane based molecular glass photoresists for sub-200 nm lithography |
JP2007241271A (ja) * | 2006-02-16 | 2007-09-20 | Cornell Research Foundation Inc | 分子性ガラスのフォトレジスト |
JP2007321152A (ja) * | 2006-06-02 | 2007-12-13 | Air Products & Chemicals Inc | ゲート誘電体層及びパッシベーション層としてポリ(アリーレンエーテル)ポリマーを有する薄膜トランジスタ |
JP2008081731A (ja) * | 2006-09-28 | 2008-04-10 | Gwangju Inst Of Science & Technology | フェニルエチルシラン化合物及びこれを重合した高分子 |
JP2009009131A (ja) * | 2007-06-27 | 2009-01-15 | Internatl Business Mach Corp <Ibm> | フォトリソグラフィ用途のための縮合芳香族構造体及び方法 |
WO2009045733A2 (en) * | 2007-10-05 | 2009-04-09 | 3M Innovative Properties Company | Organic chemical sensor comprising microporous polymer, and method of use |
JP2009081265A (ja) * | 2007-09-26 | 2009-04-16 | Idemitsu Kosan Co Ltd | 有機薄膜トランジスタ |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0814696B2 (ja) * | 1987-09-17 | 1996-02-14 | 富士写真フイルム株式会社 | 感光性樹脂組成物 |
DE3919756A1 (de) * | 1989-06-16 | 1990-12-20 | Hoechst Ag | Vorzugsweise plattenfoermiger formkoerper |
CN1114647C (zh) * | 1998-07-21 | 2003-07-16 | 范蒂科股份公司 | 松散的颗粒材料 |
US7875415B2 (en) * | 2005-12-30 | 2011-01-25 | Intel Corporation | Helical pixilated photoresist |
US7582691B2 (en) * | 2007-01-17 | 2009-09-01 | Sabic Innovative Plastics Ip B.V. | Poly(arylene ether) compositions and articles |
US7932006B2 (en) * | 2007-05-31 | 2011-04-26 | Xerox Corporation | Photoconductors |
WO2009143482A2 (en) * | 2008-05-22 | 2009-11-26 | Georgia Tech Research Corporation | Negative tone molecular glass resists and methods of making and using same |
US8425808B2 (en) * | 2010-04-27 | 2013-04-23 | Xerox Corporation | Semiconducting composition |
-
2009
- 2009-05-29 US US12/474,346 patent/US8513650B2/en active Active
-
2010
- 2010-05-19 EP EP10163203.2A patent/EP2256797B1/en active Active
- 2010-05-20 CA CA2704720A patent/CA2704720C/en active Active
- 2010-05-26 JP JP2010120304A patent/JP2011018886A/ja active Pending
-
2013
- 2013-08-16 US US13/968,568 patent/US8994016B2/en active Active
Patent Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002356551A (ja) * | 2001-05-31 | 2002-12-13 | Asahi Glass Co Ltd | 新規ポリアリーレンエーテル、その製造方法及びその用途 |
JP2005105115A (ja) * | 2003-09-30 | 2005-04-21 | Asahi Glass Co Ltd | 架橋性含フッ素芳香族プレポリマー及びその用途 |
JP2006058427A (ja) * | 2004-08-18 | 2006-03-02 | Mitsubishi Gas Chem Co Inc | レジスト組成物 |
WO2007094784A1 (en) * | 2006-02-16 | 2007-08-23 | Cornell Research Foundation, Inc. | Adamantane based molecular glass photoresists for sub-200 nm lithography |
JP2007241271A (ja) * | 2006-02-16 | 2007-09-20 | Cornell Research Foundation Inc | 分子性ガラスのフォトレジスト |
JP2009527019A (ja) * | 2006-02-16 | 2009-07-23 | コーネル・リサーチ・ファンデーション・インコーポレイテッド | 200nm未満リソグラフィー用アダマンタン系分子性ガラスフォトレジスト |
JP2007321152A (ja) * | 2006-06-02 | 2007-12-13 | Air Products & Chemicals Inc | ゲート誘電体層及びパッシベーション層としてポリ(アリーレンエーテル)ポリマーを有する薄膜トランジスタ |
JP2008081731A (ja) * | 2006-09-28 | 2008-04-10 | Gwangju Inst Of Science & Technology | フェニルエチルシラン化合物及びこれを重合した高分子 |
JP2009009131A (ja) * | 2007-06-27 | 2009-01-15 | Internatl Business Mach Corp <Ibm> | フォトリソグラフィ用途のための縮合芳香族構造体及び方法 |
JP2009081265A (ja) * | 2007-09-26 | 2009-04-16 | Idemitsu Kosan Co Ltd | 有機薄膜トランジスタ |
WO2009045733A2 (en) * | 2007-10-05 | 2009-04-09 | 3M Innovative Properties Company | Organic chemical sensor comprising microporous polymer, and method of use |
JP2010540966A (ja) * | 2007-10-05 | 2010-12-24 | スリーエム イノベイティブ プロパティズ カンパニー | ミクロ孔質ポリマーを含む有機化学センサー、及び使用方法 |
Non-Patent Citations (1)
Title |
---|
JPN7014002570; N.Felix: 'Supercritical CO2 for High Resolution Photoresist Development' SPIE Proceedings Vol.6153 61534B, 20060329, pp.1-8, SPIE * |
Also Published As
Publication number | Publication date |
---|---|
EP2256797B1 (en) | 2019-11-27 |
US8994016B2 (en) | 2015-03-31 |
CA2704720C (en) | 2017-01-17 |
US8513650B2 (en) | 2013-08-20 |
CA2704720A1 (en) | 2010-11-29 |
US20130331512A1 (en) | 2013-12-12 |
US20100301344A1 (en) | 2010-12-02 |
EP2256797A3 (en) | 2013-09-18 |
EP2256797A2 (en) | 2010-12-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US8994016B2 (en) | Dielectric layer for an electronic device | |
KR101956961B1 (ko) | 유기 전자 소자용 평탄화 층 | |
KR102082019B1 (ko) | 유기 전자 소자용 뱅크 구조체 | |
US9923035B2 (en) | Method for producing organic electronic devices with bank structures, bank structures and electronic devices produced therewith | |
JP5913107B2 (ja) | 有機半導体材料、有機半導体組成物、有機薄膜及び電界効果トランジスタ並びにその製造方法 | |
TW201503266A (zh) | 有機半導體薄膜的製作方法 | |
US20070275501A1 (en) | Fabricating tft having fluorocarbon-containing layer | |
US9076975B2 (en) | Dielectric composition for thin-film transistors | |
US9203038B2 (en) | Electronic device | |
KR20080090329A (ko) | 상 분리된 유전 구조물의 제조방법 | |
JP2011233886A (ja) | 半導体組成物 | |
US8821962B2 (en) | Method of forming dielectric layer with a dielectric composition | |
US9058981B2 (en) | Dielectric composition for thin-film transistors | |
US20170104080A1 (en) | Curable Polymeric Materials and Their Use for Fabricating Electronic Devices | |
US20100090201A1 (en) | Organic thin film transistors | |
US20120049171A1 (en) | Electronic device and method of manufacturing the same, and semiconductor device and method of manufacturing the same | |
US10727426B2 (en) | Thin film transistor, method of manufacturing the same, and electronic device including the same | |
US8106387B2 (en) | Organic thin film transistors | |
JP2009278087A (ja) | 有機薄膜トランジスター | |
KR101811617B1 (ko) | 열가교형 절연 고분자 및 이를 이용한 유기박막트랜지스터 | |
KR20120092053A (ko) | 반도전성 조성물 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20130514 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20140605 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20140617 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20140811 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20140902 |