JP2010539717A5 - - Google Patents

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Publication number
JP2010539717A5
JP2010539717A5 JP2010525251A JP2010525251A JP2010539717A5 JP 2010539717 A5 JP2010539717 A5 JP 2010539717A5 JP 2010525251 A JP2010525251 A JP 2010525251A JP 2010525251 A JP2010525251 A JP 2010525251A JP 2010539717 A5 JP2010539717 A5 JP 2010539717A5
Authority
JP
Japan
Prior art keywords
projection objective
tube
optical surface
beam envelope
useful light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2010525251A
Other languages
English (en)
Japanese (ja)
Other versions
JP5885098B2 (ja
JP2010539717A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/EP2008/007807 external-priority patent/WO2009036975A1/en
Publication of JP2010539717A publication Critical patent/JP2010539717A/ja
Publication of JP2010539717A5 publication Critical patent/JP2010539717A5/ja
Application granted granted Critical
Publication of JP5885098B2 publication Critical patent/JP5885098B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2010525251A 2007-09-21 2008-09-18 マイクロリソグラフィ用の掩蔽瞳を有する投影対物系 Expired - Fee Related JP5885098B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US97417107P 2007-09-21 2007-09-21
DE102007046398 2007-09-21
DE102007046398.9 2007-09-21
US60/974,171 2007-09-21
PCT/EP2008/007807 WO2009036975A1 (en) 2007-09-21 2008-09-18 Projection objective with obscurated pupil for microlithography

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2015009927A Division JP5995229B2 (ja) 2007-09-21 2015-01-22 マイクロリソグラフィ用の掩蔽瞳を有する投影対物系

Publications (3)

Publication Number Publication Date
JP2010539717A JP2010539717A (ja) 2010-12-16
JP2010539717A5 true JP2010539717A5 (enExample) 2011-11-04
JP5885098B2 JP5885098B2 (ja) 2016-03-15

Family

ID=40029050

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2010525251A Expired - Fee Related JP5885098B2 (ja) 2007-09-21 2008-09-18 マイクロリソグラフィ用の掩蔽瞳を有する投影対物系
JP2015009927A Expired - Fee Related JP5995229B2 (ja) 2007-09-21 2015-01-22 マイクロリソグラフィ用の掩蔽瞳を有する投影対物系

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2015009927A Expired - Fee Related JP5995229B2 (ja) 2007-09-21 2015-01-22 マイクロリソグラフィ用の掩蔽瞳を有する投影対物系

Country Status (7)

Country Link
US (2) US20100208225A1 (enExample)
EP (1) EP2191331B1 (enExample)
JP (2) JP5885098B2 (enExample)
KR (1) KR101433424B1 (enExample)
CN (1) CN101802717B (enExample)
TW (1) TWI447528B (enExample)
WO (1) WO2009036975A1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009046685A1 (de) * 2009-11-13 2011-05-26 Carl Zeiss Smt Gmbh Abbildende Optik
CN102402135B (zh) * 2011-12-07 2013-06-05 北京理工大学 一种极紫外光刻投影物镜设计方法
CN102436058B (zh) * 2011-12-14 2013-08-21 北京理工大学 一种用于深紫外波段的全球面折反式准直物镜
KR102330570B1 (ko) * 2012-02-06 2021-11-25 가부시키가이샤 니콘 반사 결상 광학계, 노광 장치, 및 디바이스 제조 방법
US8947775B2 (en) * 2012-06-08 2015-02-03 The Arizona Board Of Regents On Behalf Of The University Of Arizona Catadioptric optical system with total internal reflection for high numerical aperture imaging

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2726574A (en) * 1950-09-11 1955-12-13 Leitz Ernst Gmbh Reflecting mirror and lens objective of the cassegrain type
US3119892A (en) * 1960-07-01 1964-01-28 Farrand Optical Co Inc Catadioptric system
US3761158A (en) * 1972-06-16 1973-09-25 Optigon Res & Dev Corp Telescope having immersed mirror stabilizer
IL85908A (en) * 1988-03-29 1992-06-21 Israel State Dual field of view optical system
US6013598A (en) * 1996-02-02 2000-01-11 Exxon Research And Engineering Co. Selective hydrodesulfurization catalyst
US6031598A (en) * 1998-09-25 2000-02-29 Euv Llc Extreme ultraviolet lithography machine
JP2001185480A (ja) * 1999-10-15 2001-07-06 Nikon Corp 投影光学系及び該光学系を備える投影露光装置
EP1093021A3 (en) * 1999-10-15 2004-06-30 Nikon Corporation Projection optical system as well as equipment and methods making use of said system
JP2003045782A (ja) * 2001-07-31 2003-02-14 Canon Inc 反射型縮小投影光学系及びそれを用いた露光装置
JP2005057154A (ja) * 2003-08-07 2005-03-03 Canon Inc 露光装置
JP4218475B2 (ja) * 2003-09-11 2009-02-04 株式会社ニコン 極端紫外線光学系及び露光装置
US20050086148A1 (en) * 2003-10-20 2005-04-21 Woodruff Kevin G. Investment structures, methods and systems involving derivative securities
JP2006049815A (ja) * 2004-07-02 2006-02-16 Canon Inc 露光装置
DE102005042005A1 (de) 2004-12-23 2006-07-06 Carl Zeiss Smt Ag Hochaperturiges Objektiv mit obskurierter Pupille
WO2006069725A1 (de) * 2004-12-23 2006-07-06 Carl Zeiss Smt Ag Hochaperturiges objektiv mit obskurierter pupille
JP2006269942A (ja) * 2005-03-25 2006-10-05 Canon Inc 露光装置及びデバイス製造方法
US7471451B2 (en) * 2005-10-14 2008-12-30 Flir Systems, Inc. Multiple field of view optical system

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