JP5885098B2 - マイクロリソグラフィ用の掩蔽瞳を有する投影対物系 - Google Patents

マイクロリソグラフィ用の掩蔽瞳を有する投影対物系 Download PDF

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Publication number
JP5885098B2
JP5885098B2 JP2010525251A JP2010525251A JP5885098B2 JP 5885098 B2 JP5885098 B2 JP 5885098B2 JP 2010525251 A JP2010525251 A JP 2010525251A JP 2010525251 A JP2010525251 A JP 2010525251A JP 5885098 B2 JP5885098 B2 JP 5885098B2
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Japan
Prior art keywords
projection objective
tube
beam envelope
optical surface
useful light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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JP2010525251A
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English (en)
Japanese (ja)
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JP2010539717A5 (enExample
JP2010539717A (ja
Inventor
ダニエル クレーマー
ダニエル クレーマー
アウレリアン ドドック
アウレリアン ドドック
ハンス ユールゲン マン
ハンス ユールゲン マン
トラルフ グルナー
トラルフ グルナー
Original Assignee
カール・ツァイス・エスエムティー・ゲーエムベーハー
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Publication of JP2010539717A publication Critical patent/JP2010539717A/ja
Publication of JP2010539717A5 publication Critical patent/JP2010539717A5/ja
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/003—Light absorbing elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
    • G02B17/0657—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0018—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means for preventing ghost images
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/005—Diaphragms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
JP2010525251A 2007-09-21 2008-09-18 マイクロリソグラフィ用の掩蔽瞳を有する投影対物系 Expired - Fee Related JP5885098B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US97417107P 2007-09-21 2007-09-21
DE102007046398 2007-09-21
DE102007046398.9 2007-09-21
US60/974,171 2007-09-21
PCT/EP2008/007807 WO2009036975A1 (en) 2007-09-21 2008-09-18 Projection objective with obscurated pupil for microlithography

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2015009927A Division JP5995229B2 (ja) 2007-09-21 2015-01-22 マイクロリソグラフィ用の掩蔽瞳を有する投影対物系

Publications (3)

Publication Number Publication Date
JP2010539717A JP2010539717A (ja) 2010-12-16
JP2010539717A5 JP2010539717A5 (enExample) 2011-11-04
JP5885098B2 true JP5885098B2 (ja) 2016-03-15

Family

ID=40029050

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2010525251A Expired - Fee Related JP5885098B2 (ja) 2007-09-21 2008-09-18 マイクロリソグラフィ用の掩蔽瞳を有する投影対物系
JP2015009927A Expired - Fee Related JP5995229B2 (ja) 2007-09-21 2015-01-22 マイクロリソグラフィ用の掩蔽瞳を有する投影対物系

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2015009927A Expired - Fee Related JP5995229B2 (ja) 2007-09-21 2015-01-22 マイクロリソグラフィ用の掩蔽瞳を有する投影対物系

Country Status (7)

Country Link
US (2) US20100208225A1 (enExample)
EP (1) EP2191331B1 (enExample)
JP (2) JP5885098B2 (enExample)
KR (1) KR101433424B1 (enExample)
CN (1) CN101802717B (enExample)
TW (1) TWI447528B (enExample)
WO (1) WO2009036975A1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009046685A1 (de) * 2009-11-13 2011-05-26 Carl Zeiss Smt Gmbh Abbildende Optik
CN102402135B (zh) * 2011-12-07 2013-06-05 北京理工大学 一种极紫外光刻投影物镜设计方法
CN102436058B (zh) * 2011-12-14 2013-08-21 北京理工大学 一种用于深紫外波段的全球面折反式准直物镜
KR102330570B1 (ko) * 2012-02-06 2021-11-25 가부시키가이샤 니콘 반사 결상 광학계, 노광 장치, 및 디바이스 제조 방법
US8947775B2 (en) * 2012-06-08 2015-02-03 The Arizona Board Of Regents On Behalf Of The University Of Arizona Catadioptric optical system with total internal reflection for high numerical aperture imaging

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2726574A (en) * 1950-09-11 1955-12-13 Leitz Ernst Gmbh Reflecting mirror and lens objective of the cassegrain type
US3119892A (en) * 1960-07-01 1964-01-28 Farrand Optical Co Inc Catadioptric system
US3761158A (en) * 1972-06-16 1973-09-25 Optigon Res & Dev Corp Telescope having immersed mirror stabilizer
IL85908A (en) * 1988-03-29 1992-06-21 Israel State Dual field of view optical system
US6013598A (en) * 1996-02-02 2000-01-11 Exxon Research And Engineering Co. Selective hydrodesulfurization catalyst
US6031598A (en) * 1998-09-25 2000-02-29 Euv Llc Extreme ultraviolet lithography machine
JP2001185480A (ja) * 1999-10-15 2001-07-06 Nikon Corp 投影光学系及び該光学系を備える投影露光装置
EP1093021A3 (en) * 1999-10-15 2004-06-30 Nikon Corporation Projection optical system as well as equipment and methods making use of said system
JP2003045782A (ja) * 2001-07-31 2003-02-14 Canon Inc 反射型縮小投影光学系及びそれを用いた露光装置
JP2005057154A (ja) * 2003-08-07 2005-03-03 Canon Inc 露光装置
JP4218475B2 (ja) * 2003-09-11 2009-02-04 株式会社ニコン 極端紫外線光学系及び露光装置
US20050086148A1 (en) * 2003-10-20 2005-04-21 Woodruff Kevin G. Investment structures, methods and systems involving derivative securities
JP2006049815A (ja) * 2004-07-02 2006-02-16 Canon Inc 露光装置
DE102005042005A1 (de) 2004-12-23 2006-07-06 Carl Zeiss Smt Ag Hochaperturiges Objektiv mit obskurierter Pupille
WO2006069725A1 (de) * 2004-12-23 2006-07-06 Carl Zeiss Smt Ag Hochaperturiges objektiv mit obskurierter pupille
JP2006269942A (ja) * 2005-03-25 2006-10-05 Canon Inc 露光装置及びデバイス製造方法
US7471451B2 (en) * 2005-10-14 2008-12-30 Flir Systems, Inc. Multiple field of view optical system

Also Published As

Publication number Publication date
EP2191331A1 (en) 2010-06-02
US20100208225A1 (en) 2010-08-19
CN101802717A (zh) 2010-08-11
CN101802717B (zh) 2014-01-29
TWI447528B (zh) 2014-08-01
WO2009036975A1 (en) 2009-03-26
KR101433424B1 (ko) 2014-08-26
US20180164474A1 (en) 2018-06-14
JP2010539717A (ja) 2010-12-16
KR20100076966A (ko) 2010-07-06
TW200921293A (en) 2009-05-16
EP2191331B1 (en) 2017-05-31
JP2015084454A (ja) 2015-04-30
JP5995229B2 (ja) 2016-09-21

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