JP2010538272A5 - - Google Patents
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- Publication number
- JP2010538272A5 JP2010538272A5 JP2010523110A JP2010523110A JP2010538272A5 JP 2010538272 A5 JP2010538272 A5 JP 2010538272A5 JP 2010523110 A JP2010523110 A JP 2010523110A JP 2010523110 A JP2010523110 A JP 2010523110A JP 2010538272 A5 JP2010538272 A5 JP 2010538272A5
- Authority
- JP
- Japan
- Prior art keywords
- illumination
- light
- sample
- light source
- led
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005286 illumination Methods 0.000 claims 37
- 230000009977 dual effect Effects 0.000 claims 9
- 238000001514 detection method Methods 0.000 claims 6
- 230000003595 spectral effect Effects 0.000 claims 5
- 238000000034 method Methods 0.000 claims 4
- 239000011248 coating agent Substances 0.000 claims 3
- 238000000576 coating method Methods 0.000 claims 3
- 238000000926 separation method Methods 0.000 claims 3
- 230000007547 defect Effects 0.000 claims 1
- 230000002452 interceptive effect Effects 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/848,516 US7782452B2 (en) | 2007-08-31 | 2007-08-31 | Systems and method for simultaneously inspecting a specimen with two distinct channels |
| PCT/US2008/074435 WO2009032681A1 (en) | 2007-08-31 | 2008-08-27 | Systems and method for simultaneously inspecting a specimen with two distinct channels |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015093842A Division JP2015215349A (ja) | 2007-08-31 | 2015-05-01 | 試料を二つの別個のチャンネルで同時に検査するためのシステムおよび方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2010538272A JP2010538272A (ja) | 2010-12-09 |
| JP2010538272A5 true JP2010538272A5 (enExample) | 2011-09-22 |
Family
ID=40406925
Family Applications (4)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010523110A Pending JP2010538272A (ja) | 2007-08-31 | 2008-08-27 | 試料を二つの別個のチャンネルで同時に検査するためのシステムおよび方法 |
| JP2015093842A Pending JP2015215349A (ja) | 2007-08-31 | 2015-05-01 | 試料を二つの別個のチャンネルで同時に検査するためのシステムおよび方法 |
| JP2017083313A Active JP6430578B2 (ja) | 2007-08-31 | 2017-04-20 | 試料を二つの別個のチャンネルで同時に検査するためのシステム |
| JP2018204573A Active JP6580771B2 (ja) | 2007-08-31 | 2018-10-31 | 試料を二つの別個のチャンネルで同時に検査するためのシステム |
Family Applications After (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015093842A Pending JP2015215349A (ja) | 2007-08-31 | 2015-05-01 | 試料を二つの別個のチャンネルで同時に検査するためのシステムおよび方法 |
| JP2017083313A Active JP6430578B2 (ja) | 2007-08-31 | 2017-04-20 | 試料を二つの別個のチャンネルで同時に検査するためのシステム |
| JP2018204573A Active JP6580771B2 (ja) | 2007-08-31 | 2018-10-31 | 試料を二つの別個のチャンネルで同時に検査するためのシステム |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US7782452B2 (enExample) |
| JP (4) | JP2010538272A (enExample) |
| WO (1) | WO2009032681A1 (enExample) |
Families Citing this family (47)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5039495B2 (ja) * | 2007-10-04 | 2012-10-03 | ルネサスエレクトロニクス株式会社 | マスクブランク検査方法、反射型露光マスクの製造方法、反射型露光方法および半導体集積回路の製造方法 |
| DE112009000832T5 (de) * | 2008-04-04 | 2011-07-28 | Nanda Technologies GmbH, 85716 | System und Verfahren zur optischen Inspektion |
| SG164292A1 (en) * | 2009-01-13 | 2010-09-29 | Semiconductor Technologies & Instruments Pte | System and method for inspecting a wafer |
| SG163442A1 (en) * | 2009-01-13 | 2010-08-30 | Semiconductor Technologies & Instruments | System and method for inspecting a wafer |
| DE102009026555B4 (de) * | 2009-05-28 | 2016-03-24 | Leica Instruments (Singapore) Pte. Ltd. | Auflicht-Beleuchtungseinrichtung für ein Mikroskop |
| US20110204258A1 (en) * | 2009-12-11 | 2011-08-25 | Heller Daniel A | Spectral imaging of photoluminescent materials |
| JP5703609B2 (ja) | 2010-07-02 | 2015-04-22 | ソニー株式会社 | 顕微鏡及び領域判定方法 |
| WO2012114147A1 (en) * | 2011-02-23 | 2012-08-30 | Nano-Uv | Method for detecting defects in a microscopic scale on a surface of a sample, and device implementing this method |
| US9219885B2 (en) * | 2011-08-24 | 2015-12-22 | Delta Design, Inc. | Imaging system with defocused and aperture-cropped light sources for detecting surface characteristics |
| US9400246B2 (en) * | 2011-10-11 | 2016-07-26 | Kla-Tencor Corporation | Optical metrology tool equipped with modulated illumination sources |
| US9939386B2 (en) * | 2012-04-12 | 2018-04-10 | KLA—Tencor Corporation | Systems and methods for sample inspection and review |
| DE102013110497B4 (de) | 2013-04-03 | 2023-04-27 | Jörg Piper | Verfahren und Vorrichtung zur Erzeugung einer variablen und simultanen Phasenkontrastabbildung in Kombination mit einer der Abbildungen Dunkelfeldabbildung oder Hellfeldabbildung oder Polarisationsabbildung |
| US9941103B2 (en) * | 2013-10-19 | 2018-04-10 | Kla-Tencor Corporation | Bias-variant photomultiplier tube |
| US9772297B2 (en) | 2014-02-12 | 2017-09-26 | Kla-Tencor Corporation | Apparatus and methods for combined brightfield, darkfield, and photothermal inspection |
| US9885671B2 (en) | 2014-06-09 | 2018-02-06 | Kla-Tencor Corporation | Miniaturized imaging apparatus for wafer edge |
| US9645097B2 (en) | 2014-06-20 | 2017-05-09 | Kla-Tencor Corporation | In-line wafer edge inspection, wafer pre-alignment, and wafer cleaning |
| US9726615B2 (en) * | 2014-07-22 | 2017-08-08 | Kla-Tencor Corporation | System and method for simultaneous dark field and phase contrast inspection |
| ES2919139T3 (es) * | 2015-02-04 | 2022-07-22 | Syntegon Tech K K | Dispositivo de inspección y sistema de inspección |
| CN105259734B (zh) * | 2015-09-17 | 2019-11-22 | 上海华力微电子有限公司 | 一种光阻残留物检测结构单元、检测系统及方法 |
| US10563973B2 (en) | 2016-03-28 | 2020-02-18 | Kla-Tencor Corporation | All surface film metrology system |
| US10677739B2 (en) * | 2016-11-02 | 2020-06-09 | Corning Incorporated | Method and apparatus for inspecting defects on transparent substrate |
| WO2018085237A1 (en) | 2016-11-02 | 2018-05-11 | Corning Incorporated | Method and apparatus for inspecting defects on transparent substrate and method of emitting incident light |
| DE102016122529A1 (de) | 2016-11-22 | 2018-05-24 | Carl Zeiss Microscopy Gmbh | Mikroskop zur Abbildung eines Objekts |
| DE102016122528A1 (de) | 2016-11-22 | 2018-05-24 | Carl Zeiss Microscopy Gmbh | Verfahren zum Steuern oder Regeln einer Mikroskopbeleuchtung |
| US10983325B2 (en) * | 2016-12-12 | 2021-04-20 | Molecular Devices, Llc | Trans-illumination imaging with an array of light sources |
| US10422984B2 (en) * | 2017-05-12 | 2019-09-24 | Applied Materials, Inc. | Flexible mode scanning optical microscopy and inspection system |
| JP6959831B2 (ja) * | 2017-08-31 | 2021-11-05 | 株式会社日立製作所 | 計算機、処理の制御パラメータの決定方法、代用試料、計測システム、及び計測方法 |
| US10599951B2 (en) | 2018-03-28 | 2020-03-24 | Kla-Tencor Corp. | Training a neural network for defect detection in low resolution images |
| US10295476B1 (en) * | 2018-08-14 | 2019-05-21 | Applied Materials Israel Ltd. | System and method for multiple mode inspection of a sample |
| KR102124034B1 (ko) * | 2018-10-02 | 2020-06-17 | 공주대학교 산학협력단 | 광학적 검사장치를 이용한 미세결함의 크기 및 속성 검사방법 |
| KR102194289B1 (ko) * | 2019-03-18 | 2020-12-22 | 주식회사 유니온커뮤니티 | 청색 또는 보라색 광을 차단하는 차단 성능을 검사하는 검사장치 및 그 검사방법 |
| US11087449B2 (en) | 2019-10-24 | 2021-08-10 | KLA Corp. | Deep learning networks for nuisance filtering |
| RU2727527C1 (ru) * | 2020-03-10 | 2020-07-22 | Вячеслав Михайлович Смелков | Телевизионная система для наблюдения за перемещением горячего проката |
| US11631169B2 (en) | 2020-08-02 | 2023-04-18 | KLA Corp. | Inspection of noisy patterned features |
| US11644756B2 (en) | 2020-08-07 | 2023-05-09 | KLA Corp. | 3D structure inspection or metrology using deep learning |
| KR20230056770A (ko) * | 2020-08-27 | 2023-04-27 | 노바 엘티디. | 높은 처리량 광학 계측 |
| US11526086B2 (en) * | 2021-03-08 | 2022-12-13 | Kla Corporation | Multi-field scanning overlay metrology |
| JP7738091B2 (ja) * | 2021-03-15 | 2025-09-11 | アプライド マテリアルズ インコーポレイテッド | 光学デバイスの効率を測定する方法 |
| US12322568B2 (en) | 2022-09-07 | 2025-06-03 | Kla Corporation | Auto-focus sensor implementation for multi-column microscopes |
| IL307265A (en) * | 2023-09-26 | 2025-04-01 | Applied Materials Israel Ltd | Optical systems and methods for coupling a mirror to an optical system |
| KR102738978B1 (ko) * | 2023-12-27 | 2024-12-05 | 율촌화학 주식회사 | Led와 레이저를 활용한 검사 장치 및 그 제어 방법 |
| CN119438221A (zh) * | 2024-12-12 | 2025-02-14 | 上海中科飞测半导体科技有限公司 | 一种半导体检测设备 |
| CN119985504A (zh) * | 2025-03-11 | 2025-05-13 | 复旦大学 | 一种基于双通道光学成像的晶圆缺陷检测系统 |
| CN119901683B (zh) * | 2025-03-31 | 2025-08-05 | 深圳中科飞测科技股份有限公司 | 一种晶圆明暗场缺陷检测装置 |
| CN119880900A (zh) * | 2025-03-31 | 2025-04-25 | 深圳中科飞测科技股份有限公司 | 一种半导体检测装置及其控制方法 |
| CN119901756A (zh) * | 2025-03-31 | 2025-04-29 | 深圳中科飞测科技股份有限公司 | 一种晶圆缺陷检测装置及控制方法 |
| CN119901684B (zh) * | 2025-04-01 | 2025-07-15 | 上海中科飞测半导体科技有限公司 | 一种明暗场检测装置及方法 |
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| JPS5767844A (en) * | 1980-10-15 | 1982-04-24 | Nippon Kogaku Kk <Nikon> | Surface inspecting device |
| JPS6129712A (ja) * | 1984-07-23 | 1986-02-10 | Hitachi Ltd | 微細パタ−ンの欠陥検出方法及びその装置 |
| JPS62153737A (ja) * | 1985-12-27 | 1987-07-08 | Toshiba Corp | 物品表面検査装置 |
| JPH04333847A (ja) * | 1991-05-09 | 1992-11-20 | Hitachi Electron Eng Co Ltd | レチクルマスクの異物検査装置 |
| JPH06222013A (ja) * | 1992-09-11 | 1994-08-12 | Hologenix Inc | 表面の光学的検査装置 |
| US5864394A (en) * | 1994-06-20 | 1999-01-26 | Kla-Tencor Corporation | Surface inspection system |
| US6512631B2 (en) * | 1996-07-22 | 2003-01-28 | Kla-Tencor Corporation | Broad-band deep ultraviolet/vacuum ultraviolet catadioptric imaging system |
| US6288780B1 (en) * | 1995-06-06 | 2001-09-11 | Kla-Tencor Technologies Corp. | High throughput brightfield/darkfield wafer inspection system using advanced optical techniques |
| WO1996039619A1 (en) * | 1995-06-06 | 1996-12-12 | Kla Instruments Corporation | Optical inspection of a specimen using multi-channel responses from the specimen |
| JP2822937B2 (ja) * | 1995-07-17 | 1998-11-11 | 株式会社日立製作所 | 半導体装置の製造システム及び欠陥検査方法 |
| JP4001653B2 (ja) * | 1996-08-29 | 2007-10-31 | ケーエルエー・インストルメンツ・コーポレーション | 試料からの多重チャネル応答を用いた試料の光学的検査 |
| JP2000162137A (ja) * | 1998-11-26 | 2000-06-16 | Nikon Corp | 面検査装置 |
| DE19903486C2 (de) * | 1999-01-29 | 2003-03-06 | Leica Microsystems | Verfahren und Vorrichtung zur optischen Untersuchung von strukturierten Oberflächen von Objekten |
| US6404544B1 (en) * | 1999-06-01 | 2002-06-11 | Optical Perspectives Group, Llc | Wavelength multiplexed quantitative differential interference contrast microscopy |
| US6919957B2 (en) * | 2000-09-20 | 2005-07-19 | Kla-Tencor Technologies Corp. | Methods and systems for determining a critical dimension, a presence of defects, and a thin film characteristic of a specimen |
| US6673637B2 (en) * | 2000-09-20 | 2004-01-06 | Kla-Tencor Technologies | Methods and systems for determining a presence of macro defects and overlay of a specimen |
| US6694284B1 (en) * | 2000-09-20 | 2004-02-17 | Kla-Tencor Technologies Corp. | Methods and systems for determining at least four properties of a specimen |
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| JP4030815B2 (ja) * | 2001-07-10 | 2008-01-09 | ケーエルエー−テンカー テクノロジィース コーポレイション | 同時のまたは連続的な多重の斜視的な試料欠陥検査のためのシステムおよび方法 |
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| DE10332073A1 (de) * | 2003-07-11 | 2005-02-10 | Carl Zeiss Jena Gmbh | Anordnung zur optischen Erfassung von in einer Probe angeregter und / oder rückgestreuter Lichtstrahlung mit Doppelobjektivanordnung |
| JP4546741B2 (ja) * | 2004-01-08 | 2010-09-15 | オリンパス株式会社 | 蛍光顕微鏡 |
| US7184138B1 (en) * | 2004-03-11 | 2007-02-27 | Kla Tencor Technologies Corporation | Spatial filter for sample inspection system |
| WO2006006148A2 (en) * | 2004-07-12 | 2006-01-19 | Negevtech Ltd. | Multi mode inspection method and apparatus |
| JP4982385B2 (ja) * | 2005-02-01 | 2012-07-25 | アムニス コーポレイション | イメージングフローサイトメータを使用した血液及び細胞の分析 |
| US7528943B2 (en) * | 2005-12-27 | 2009-05-05 | Kla-Tencor Technologies Corporation | Method and apparatus for simultaneous high-speed acquisition of multiple images |
-
2007
- 2007-08-31 US US11/848,516 patent/US7782452B2/en active Active
-
2008
- 2008-08-27 WO PCT/US2008/074435 patent/WO2009032681A1/en not_active Ceased
- 2008-08-27 JP JP2010523110A patent/JP2010538272A/ja active Pending
-
2015
- 2015-05-01 JP JP2015093842A patent/JP2015215349A/ja active Pending
-
2017
- 2017-04-20 JP JP2017083313A patent/JP6430578B2/ja active Active
-
2018
- 2018-10-31 JP JP2018204573A patent/JP6580771B2/ja active Active
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