JP2010528468A - 埋込みコレクタを有するフォトトランジスタ - Google Patents
埋込みコレクタを有するフォトトランジスタ Download PDFInfo
- Publication number
- JP2010528468A JP2010528468A JP2010509267A JP2010509267A JP2010528468A JP 2010528468 A JP2010528468 A JP 2010528468A JP 2010509267 A JP2010509267 A JP 2010509267A JP 2010509267 A JP2010509267 A JP 2010509267A JP 2010528468 A JP2010528468 A JP 2010528468A
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- Prior art keywords
- phototransistor
- collector
- emitter
- base
- type
- Prior art date
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- 230000035945 sensitivity Effects 0.000 abstract description 3
- 230000004888 barrier function Effects 0.000 description 13
- 238000010586 diagram Methods 0.000 description 7
- 239000000758 substrate Substances 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 4
- 238000009825 accumulation Methods 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 229910044991 metal oxide Inorganic materials 0.000 description 3
- 150000004706 metal oxides Chemical class 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by at least one potential-jump barrier or surface barrier, e.g. phototransistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by at least one potential-jump barrier or surface barrier, e.g. phototransistors
- H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
- H01L31/11—Devices sensitive to infrared, visible or ultraviolet radiation characterised by two potential barriers or surface barriers, e.g. bipolar phototransistor
- H01L31/1105—Devices sensitive to infrared, visible or ultraviolet radiation characterised by two potential barriers or surface barriers, e.g. bipolar phototransistor the device being a bipolar phototransistor
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
- H01L27/06—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
- H01L27/0611—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region
- H01L27/0617—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region comprising components of the field-effect type
- H01L27/0623—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region comprising components of the field-effect type in combination with bipolar transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/1463—Pixel isolation structures
Abstract
Description
Claims (6)
- 埋込みコレクタを有するフォトトランジスタであって、
第1導電型のエミッタと、
第2導電型のベースと、
前記ベースに埋込まれた第1導電型のコレクタとを含むことを特徴とするフォトトランジスタ。 - 前記フォトトランジスタは、前記エミッタによって、隣接した他のフォトトランジスタと隔離されることを特徴とする請求項1に記載のフォトトランジスタ。
- 前記コレクタは、MOSによって電気的に接続されることを特徴とする請求項1に記載のフォトトランジスタ。
- 前記エミッタは、高濃度にドーピングされていることを特徴とする請求項1に記載のフォトトランジスタ。
- 前記ベースは、低濃度にドーピングされていることを特徴とする請求項1に記載のフォトトランジスタ。
- 前記コレクタは、低濃度にドーピングされていることを特徴とする請求項1に記載のフォトトランジスタ。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2007-0049701 | 2007-05-22 | ||
KR1020070049701A KR100879013B1 (ko) | 2007-05-22 | 2007-05-22 | 매립형 컬렉터를 구비하는 포토트랜지스터 |
PCT/KR2008/002548 WO2008143413A1 (en) | 2007-05-22 | 2008-05-07 | Phototransistor having a buried collector |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010528468A true JP2010528468A (ja) | 2010-08-19 |
JP5043184B2 JP5043184B2 (ja) | 2012-10-10 |
Family
ID=40032076
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010509267A Active JP5043184B2 (ja) | 2007-05-22 | 2008-05-07 | 埋込みコレクタを有するフォトトランジスタ |
Country Status (6)
Country | Link |
---|---|
US (1) | US8368164B2 (ja) |
EP (1) | EP2149158A1 (ja) |
JP (1) | JP5043184B2 (ja) |
KR (1) | KR100879013B1 (ja) |
CN (1) | CN101681954A (ja) |
WO (1) | WO2008143413A1 (ja) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9735304B1 (en) * | 2013-03-15 | 2017-08-15 | Actlight, S.A. | Photo detector systems and methods of operating same |
US11837669B2 (en) | 2013-03-15 | 2023-12-05 | ActLight SA | Photo detector systems and methods of operating same |
US10269855B2 (en) * | 2013-03-15 | 2019-04-23 | ActLight SA | Photo detector systems and methods of operating same |
US11114480B2 (en) | 2013-03-15 | 2021-09-07 | ActLight SA | Photodetector |
US10964837B2 (en) | 2013-03-15 | 2021-03-30 | ActLight SA | Photo detector systems and methods of operating same |
US10553633B2 (en) * | 2014-05-30 | 2020-02-04 | Klaus Y.J. Hsu | Phototransistor with body-strapped base |
FR3037205B1 (fr) * | 2015-06-04 | 2018-07-06 | New Imaging Technologies | Capteur optique |
KR102545170B1 (ko) | 2015-12-09 | 2023-06-19 | 삼성전자주식회사 | 이미지 센서 및 그 제조 방법 |
KR102490593B1 (ko) * | 2016-08-22 | 2023-01-20 | 세메스 주식회사 | 웨이퍼링 이송 장치 |
US10453984B2 (en) | 2017-03-23 | 2019-10-22 | Wavefront Holdings, Llc | Conductive isolation between phototransistors |
US10509113B2 (en) | 2017-04-07 | 2019-12-17 | ActLight SA | Techniques for performing time of flight measurements |
US10002979B1 (en) | 2017-05-30 | 2018-06-19 | Wavefront Holdings, Llc | Unipolar doping in photodiode and phototransistor |
US11251217B2 (en) | 2019-04-17 | 2022-02-15 | ActLight SA | Photodetector sensor arrays |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3838439A (en) * | 1970-03-18 | 1974-09-24 | Texas Instruments Inc | Phototransistor having a buried base |
JPS6012765A (ja) | 1983-07-02 | 1985-01-23 | Tadahiro Omi | 光電変換装置 |
JP3974322B2 (ja) * | 2000-12-07 | 2007-09-12 | 株式会社日立製作所 | 光半導体集積回路装置及び光記憶再生装置 |
JP3918442B2 (ja) * | 2001-02-19 | 2007-05-23 | ソニー株式会社 | 半導体装置及びその製造方法 |
EP1647059A2 (en) * | 2004-03-17 | 2006-04-19 | Matsushita Electric Works, Ltd. | Light detecting element and method for operating it |
-
2007
- 2007-05-22 KR KR1020070049701A patent/KR100879013B1/ko active IP Right Grant
-
2008
- 2008-05-07 EP EP08753345A patent/EP2149158A1/en not_active Withdrawn
- 2008-05-07 US US12/599,309 patent/US8368164B2/en active Active
- 2008-05-07 CN CN200880016260A patent/CN101681954A/zh active Pending
- 2008-05-07 JP JP2010509267A patent/JP5043184B2/ja active Active
- 2008-05-07 WO PCT/KR2008/002548 patent/WO2008143413A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
US8368164B2 (en) | 2013-02-05 |
CN101681954A (zh) | 2010-03-24 |
KR20080102793A (ko) | 2008-11-26 |
EP2149158A1 (en) | 2010-02-03 |
US20100237455A1 (en) | 2010-09-23 |
JP5043184B2 (ja) | 2012-10-10 |
KR100879013B1 (ko) | 2009-01-19 |
WO2008143413A1 (en) | 2008-11-27 |
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