JP2010527135A - 電子カラム用磁場デフレクター - Google Patents
電子カラム用磁場デフレクター Download PDFInfo
- Publication number
- JP2010527135A JP2010527135A JP2010508306A JP2010508306A JP2010527135A JP 2010527135 A JP2010527135 A JP 2010527135A JP 2010508306 A JP2010508306 A JP 2010508306A JP 2010508306 A JP2010508306 A JP 2010508306A JP 2010527135 A JP2010527135 A JP 2010527135A
- Authority
- JP
- Japan
- Prior art keywords
- deflector
- core
- coil
- magnetic
- column
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010894 electron beam technology Methods 0.000 claims abstract description 39
- 239000004020 conductor Substances 0.000 claims abstract description 10
- 239000004065 semiconductor Substances 0.000 claims abstract description 7
- 201000009310 astigmatism Diseases 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 8
- 238000004377 microelectronic Methods 0.000 claims description 2
- 230000005684 electric field Effects 0.000 abstract description 25
- 230000004075 alteration Effects 0.000 abstract description 10
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 238000007689 inspection Methods 0.000 description 4
- 238000005192 partition Methods 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 239000011810 insulating material Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 230000005856 abnormality Effects 0.000 description 2
- 230000005672 electromagnetic field Effects 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 230000005641 tunneling Effects 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/10—Lenses
- H01J2237/12—Lenses electrostatic
- H01J2237/1205—Microlenses
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/15—Means for deflecting or directing discharge
- H01J2237/152—Magnetic means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/153—Correcting image defects, e.g. stigmators
- H01J2237/1532—Astigmatism
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020070047350A KR20080101098A (ko) | 2007-05-15 | 2007-05-15 | 초소형 전자 칼럼용 자기장 디플렉터 |
| PCT/KR2008/002713 WO2008140273A2 (en) | 2007-05-15 | 2008-05-15 | Magnetic deflector for an electron column |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2010527135A true JP2010527135A (ja) | 2010-08-05 |
| JP2010527135A5 JP2010527135A5 (https=) | 2011-06-30 |
Family
ID=40002757
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010508306A Pending JP2010527135A (ja) | 2007-05-15 | 2008-05-15 | 電子カラム用磁場デフレクター |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US8071955B2 (https=) |
| EP (1) | EP2149145A4 (https=) |
| JP (1) | JP2010527135A (https=) |
| KR (1) | KR20080101098A (https=) |
| CN (1) | CN101681783A (https=) |
| WO (1) | WO2008140273A2 (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2017107849A (ja) * | 2015-11-20 | 2017-06-15 | アイシーティー インテグレーテッド サーキット テスティング ゲゼルシャフト フィーア ハルプライタープリーフテヒニック エム ベー ハー | 静電多極デバイス、静電多極配置、および静電多極デバイスを製造する方法 |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013077715A1 (ru) * | 2011-11-22 | 2013-05-30 | Bimurzaev Seitkerim Bimurzaevich | Корректор аберраций электронных линз |
| KR101416559B1 (ko) * | 2013-10-25 | 2014-07-10 | (주)펨트론 | 전자빔얼라인먼트 조정장치 및 이를 이용한 전자빔얼라인먼트 조정방법 |
| JP6613466B2 (ja) * | 2014-10-28 | 2019-12-04 | 国立研究開発法人量子科学技術研究開発機構 | 荷電粒子ビーム照射装置 |
| CN110798959A (zh) * | 2019-10-31 | 2020-02-14 | 复旦大学 | 一种多方向带电粒子束流转向装置 |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10334845A (ja) * | 1997-06-02 | 1998-12-18 | Fujitsu Ltd | 電子ビーム装置及びその調整方法 |
| JP2003036808A (ja) * | 2001-07-19 | 2003-02-07 | National Institute Of Advanced Industrial & Technology | 荷電粒子ビーム装置 |
| JP2004241190A (ja) * | 2003-02-04 | 2004-08-26 | Jeol Ltd | 多極子レンズ用の多極子製造方法、多極子レンズ及び荷電粒子線装置 |
| JP2005056788A (ja) * | 2003-08-07 | 2005-03-03 | Nikon Corp | 偏向器及びその駆動方法、並びに荷電粒子線露光装置 |
| JP2005353429A (ja) * | 2004-06-11 | 2005-12-22 | Hitachi Ltd | 荷電粒子線色収差補正装置 |
| JP2006005161A (ja) * | 2004-06-17 | 2006-01-05 | Nikon Corp | 電磁コイル板の製造方法、電磁コイル板、トロイダル型コイル構造体および荷電粒子線露光装置 |
| JP2006127879A (ja) * | 2004-10-28 | 2006-05-18 | Jeol Ltd | 多極子 |
| JP2008505470A (ja) * | 2004-07-05 | 2008-02-21 | シーイービーティー・カンパニー・リミティッド | マルチマイクロコラムにおける電子ビームの制御方法及びこの方法を利用したマルチマイクロコラム |
| JP2008519423A (ja) * | 2004-11-08 | 2008-06-05 | バイオメド・ソリューションズ・エルエルシー | 一体化されたサブナノメートルスケール電子ビームシステム |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3406273A (en) * | 1966-12-14 | 1968-10-15 | United Aircraft Corp | Magnetic vapor deflector for an electron beam |
| JPH09180987A (ja) * | 1995-12-26 | 1997-07-11 | Nikon Corp | 荷電粒子線転写装置 |
| DE60134922D1 (de) * | 2000-08-14 | 2008-09-04 | Elith Llc | Lithographischer Apparat |
| US20020148971A1 (en) * | 2001-03-05 | 2002-10-17 | Michael Sogard | Lens assembly for electron beam column |
| JP2003187730A (ja) | 2001-12-13 | 2003-07-04 | Jeol Ltd | ビームセパレータ及び反射電子顕微鏡 |
| US7112803B2 (en) * | 2004-07-23 | 2006-09-26 | Applied Materials, Israel, Ltd. | Beam directing system and method for use in a charged particle beam column |
| KR101384260B1 (ko) * | 2005-12-05 | 2014-04-11 | 전자빔기술센터 주식회사 | 전자칼럼의 전자빔 포커싱 방법 |
-
2007
- 2007-05-15 KR KR1020070047350A patent/KR20080101098A/ko not_active Ceased
-
2008
- 2008-05-15 US US12/600,266 patent/US8071955B2/en not_active Expired - Fee Related
- 2008-05-15 CN CN200880016052A patent/CN101681783A/zh active Pending
- 2008-05-15 EP EP08753509A patent/EP2149145A4/en not_active Withdrawn
- 2008-05-15 WO PCT/KR2008/002713 patent/WO2008140273A2/en not_active Ceased
- 2008-05-15 JP JP2010508306A patent/JP2010527135A/ja active Pending
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10334845A (ja) * | 1997-06-02 | 1998-12-18 | Fujitsu Ltd | 電子ビーム装置及びその調整方法 |
| JP2003036808A (ja) * | 2001-07-19 | 2003-02-07 | National Institute Of Advanced Industrial & Technology | 荷電粒子ビーム装置 |
| JP2004241190A (ja) * | 2003-02-04 | 2004-08-26 | Jeol Ltd | 多極子レンズ用の多極子製造方法、多極子レンズ及び荷電粒子線装置 |
| JP2005056788A (ja) * | 2003-08-07 | 2005-03-03 | Nikon Corp | 偏向器及びその駆動方法、並びに荷電粒子線露光装置 |
| JP2005353429A (ja) * | 2004-06-11 | 2005-12-22 | Hitachi Ltd | 荷電粒子線色収差補正装置 |
| JP2006005161A (ja) * | 2004-06-17 | 2006-01-05 | Nikon Corp | 電磁コイル板の製造方法、電磁コイル板、トロイダル型コイル構造体および荷電粒子線露光装置 |
| JP2008505470A (ja) * | 2004-07-05 | 2008-02-21 | シーイービーティー・カンパニー・リミティッド | マルチマイクロコラムにおける電子ビームの制御方法及びこの方法を利用したマルチマイクロコラム |
| JP2006127879A (ja) * | 2004-10-28 | 2006-05-18 | Jeol Ltd | 多極子 |
| JP2008519423A (ja) * | 2004-11-08 | 2008-06-05 | バイオメド・ソリューションズ・エルエルシー | 一体化されたサブナノメートルスケール電子ビームシステム |
Non-Patent Citations (2)
| Title |
|---|
| JPN6013006876; R. Rong et al.: 'A Novel Magnetic Microdeflector for Electron Beam Control in Electron Beam Microcolumn System' IEEE Transactions on magnetics Vol. 42, No. 10, October 2006, 2006, pages3237 -3239 * |
| JPN6013006877; R. Rong et al.: 'Simulation and characterization of a magnetic microdeflector for electron beam control in electron b' Journal of Vacuum. Science and Technology, B25(2), Mar/Apr 2007, 200704, pages373-379 * |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2017107849A (ja) * | 2015-11-20 | 2017-06-15 | アイシーティー インテグレーテッド サーキット テスティング ゲゼルシャフト フィーア ハルプライタープリーフテヒニック エム ベー ハー | 静電多極デバイス、静電多極配置、および静電多極デバイスを製造する方法 |
| JP7020775B2 (ja) | 2015-11-20 | 2022-02-16 | アイシーティー インテグレーテッド サーキット テスティング ゲゼルシャフト フィーア ハルプライタープリーフテヒニック エム ベー ハー | 静電多極デバイス、静電多極配置、および静電多極デバイスを製造する方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20080101098A (ko) | 2008-11-21 |
| EP2149145A4 (en) | 2011-12-21 |
| WO2008140273A3 (en) | 2009-01-29 |
| US20100148086A1 (en) | 2010-06-17 |
| EP2149145A2 (en) | 2010-02-03 |
| US8071955B2 (en) | 2011-12-06 |
| CN101681783A (zh) | 2010-03-24 |
| WO2008140273A2 (en) | 2008-11-20 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20110512 |
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| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20110512 |
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| A977 | Report on retrieval |
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