JP2010527042A5 - - Google Patents

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Publication number
JP2010527042A5
JP2010527042A5 JP2010507998A JP2010507998A JP2010527042A5 JP 2010527042 A5 JP2010527042 A5 JP 2010527042A5 JP 2010507998 A JP2010507998 A JP 2010507998A JP 2010507998 A JP2010507998 A JP 2010507998A JP 2010527042 A5 JP2010527042 A5 JP 2010527042A5
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JP
Japan
Prior art keywords
aromatic
substituted
hydroxy
useful
moiety
Prior art date
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Pending
Application number
JP2010507998A
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English (en)
Japanese (ja)
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JP2010527042A (ja
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Publication date
Priority claimed from US11/747,936 external-priority patent/US20080286689A1/en
Application filed filed Critical
Publication of JP2010527042A publication Critical patent/JP2010527042A/ja
Publication of JP2010527042A5 publication Critical patent/JP2010527042A5/ja
Pending legal-status Critical Current

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JP2010507998A 2007-05-14 2008-05-09 反射防止コーティング組成物 Pending JP2010527042A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/747,936 US20080286689A1 (en) 2007-05-14 2007-05-14 Antireflective Coating Compositions
PCT/IB2008/001208 WO2008139320A2 (en) 2007-05-14 2008-05-09 Antireflective coating compositions

Publications (2)

Publication Number Publication Date
JP2010527042A JP2010527042A (ja) 2010-08-05
JP2010527042A5 true JP2010527042A5 (https=) 2011-05-19

Family

ID=40002704

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010507998A Pending JP2010527042A (ja) 2007-05-14 2008-05-09 反射防止コーティング組成物

Country Status (7)

Country Link
US (1) US20080286689A1 (https=)
EP (1) EP2152822A2 (https=)
JP (1) JP2010527042A (https=)
KR (1) KR20100021457A (https=)
CN (1) CN101959980A (https=)
TW (1) TW200916543A (https=)
WO (1) WO2008139320A2 (https=)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009104685A1 (ja) 2008-02-21 2009-08-27 日産化学工業株式会社 レジスト下層膜形成組成物及びそれを用いたレジストパターンの形成方法
KR100894218B1 (ko) * 2008-04-11 2009-04-22 금호석유화학 주식회사 흡광제 및 이를 포함하는 유기 반사 방지막 조성물
US8445181B2 (en) * 2010-06-03 2013-05-21 Az Electronic Materials Usa Corp. Antireflective coating composition and process thereof
US20130189533A1 (en) * 2010-10-14 2013-07-25 Nissan Chemical Industries, Ltd. Resist underlayer film forming composition for lithography containing polyether structure-containing resin
US8465902B2 (en) * 2011-02-08 2013-06-18 Az Electronic Materials Usa Corp. Underlayer coating composition and processes thereof
TWI685495B (zh) * 2013-11-25 2020-02-21 日商四國化成工業股份有限公司 含有縮水甘油基乙炔脲類的組成物
US9793268B2 (en) * 2014-01-24 2017-10-17 Taiwan Semiconductor Manufacturing Company, Ltd. Method and structure for gap filling improvement
TWI592760B (zh) * 2014-12-30 2017-07-21 羅門哈斯電子材料韓國有限公司 與經外塗佈之光致抗蝕劑一起使用之塗層組合物
KR101982103B1 (ko) * 2015-08-31 2019-05-27 롬 앤드 하스 일렉트로닉 머트어리얼즈 엘엘씨 오버코팅된 포토레지스트와 함께 사용하기 위한 코팅 조성물
TWI646397B (zh) * 2015-10-31 2019-01-01 南韓商羅門哈斯電子材料韓國公司 與外塗佈光致抗蝕劑一起使用的塗料組合物
CN109735280B (zh) * 2019-01-04 2020-06-09 中国科学技术大学 紫外光响应性聚合物粘合剂及其制备方法和用途
KR102675074B1 (ko) * 2020-11-20 2024-06-12 삼성에스디아이 주식회사 레지스트 하층막용 조성물 및 이를 이용한 패턴형성방법
CN112680052B (zh) * 2020-12-23 2022-06-28 上海飞凯材料科技股份有限公司 一种抗反射涂料组合物及其应用
CN113929900B (zh) * 2021-10-15 2023-07-04 厦门恒坤新材料科技股份有限公司 一种聚醚高聚物和抗反射涂层溶液及其制备方法
CN114853993B (zh) * 2022-05-27 2024-08-23 中国科学院长春应用化学研究所 一种增塑成核双功能聚乳酸改性剂及其制备方法、改性聚乳酸
CN115948095B (zh) * 2023-02-10 2023-09-12 厦门恒坤新材料科技股份有限公司 一种抗反射涂料组合物及其制备方法以及光刻胶图案的形成方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3694703B2 (ja) * 1996-04-25 2005-09-14 Ａｚエレクトロニックマテリアルズ株式会社 反射防止コーティング用組成物
US7361444B1 (en) * 1998-02-23 2008-04-22 International Business Machines Corporation Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof
TW591341B (en) * 2001-09-26 2004-06-11 Shipley Co Llc Coating compositions for use with an overcoated photoresist
KR100903153B1 (ko) * 2001-10-10 2009-06-17 닛산 가가쿠 고교 가부시키 가이샤 리소그래피용 반사방지막 형성 조성물
US20040067437A1 (en) * 2002-10-06 2004-04-08 Shipley Company, L.L.C. Coating compositions for use with an overcoated photoresist
EP1422565A3 (en) * 2002-11-20 2005-01-05 Shipley Company LLC Multilayer photoresist systems
KR20040044368A (ko) * 2002-11-20 2004-05-28 쉬플리 캄파니, 엘.엘.씨. 다층 포토레지스트 시스템
US7264913B2 (en) * 2002-11-21 2007-09-04 Az Electronic Materials Usa Corp. Antireflective compositions for photoresists
US7081511B2 (en) * 2004-04-05 2006-07-25 Az Electronic Materials Usa Corp. Process for making polyesters
CN100503756C (zh) * 2004-05-18 2009-06-24 罗姆及海斯电子材料有限公司 与上涂光致抗蚀剂一起使用的涂料组合物
US7691556B2 (en) * 2004-09-15 2010-04-06 Az Electronic Materials Usa Corp. Antireflective compositions for photoresists
EP1691238A3 (en) * 2005-02-05 2009-01-21 Rohm and Haas Electronic Materials, L.L.C. Coating compositions for use with an overcoated photoresist
TWI340296B (en) * 2005-03-20 2011-04-11 Rohm & Haas Elect Mat Coating compositions for use with an overcoated photoresist
US7638262B2 (en) * 2006-08-10 2009-12-29 Az Electronic Materials Usa Corp. Antireflective composition for photoresists

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