JP2010267368A - 半導体記憶装置 - Google Patents
半導体記憶装置 Download PDFInfo
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- JP2010267368A JP2010267368A JP2010091039A JP2010091039A JP2010267368A JP 2010267368 A JP2010267368 A JP 2010267368A JP 2010091039 A JP2010091039 A JP 2010091039A JP 2010091039 A JP2010091039 A JP 2010091039A JP 2010267368 A JP2010267368 A JP 2010267368A
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Images
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C5/00—Details of stores covered by group G11C11/00
- G11C5/14—Power supply arrangements, e.g. power down, chip selection or deselection, layout of wirings or power grids, or multiple supply levels
- G11C5/145—Applications of charge pumps; Boosted voltage circuits; Clamp circuits therefor
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C17/00—Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards
- G11C17/14—Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards in which contents are determined by selectively establishing, breaking or modifying connecting links by permanently altering the state of coupling elements, e.g. PROM
- G11C17/18—Auxiliary circuits, e.g. for writing into memory
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/10—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration
- H01L27/101—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration including resistors or capacitors only
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/525—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body with adaptable interconnections
- H01L23/5252—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body with adaptable interconnections comprising anti-fuses, i.e. connections having their state changed from non-conductive to conductive
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
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- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Read Only Memory (AREA)
Abstract
【解決手段】アンチヒューズ型メモリ素子への書き込みが完了した直後、メモリ素子の抵抗が急激に低下するため、書き込み電圧を生成する昇圧回路の出力が急激に低下する。昇圧回路の出力電圧の変化を検出することで、書き込み命令を制御することにより、メモリ素子がショートした直後、直ちに書き込み動作を止める。これによって、ショートしたメモリ素子に書き込み動作を続けることによる無駄な消費電流を抑制する。
【選択図】図1
Description
本実施の形態においては、半導体記憶装置の構造の一態様に関し、図面を用いて説明する。
本実施の形態では、半導体記憶装置のより具体的な構成に関して、図面を用いて説明する。
本実施の形態では、本発明の一態様に係る半導体記憶装置のより具体的な構成に関して、図面を用いて説明する。
本実施の形態では、本発明の一態様に係る半導体記憶装置を搭載した半導体装置に関して、図面を用いて説明する。
本実施の形態では、本発明の一態様に係る半導体記憶装置を搭載した半導体装置の作製方法に関して、図面を用いて説明する。
本実施の形態では、本発明の一態様に係る半導体記憶装置を搭載することができる、可撓性を有する半導体装置の作製方法に関して、図面を用いて説明する。
本実施の形態では、本発明の一態様に係る半導体記憶装置を搭載した半導体装置の使用例に関して説明する。
P=1−[1/{exp(T/μ)}]
の指数分布に従う。
20μs×14.6(エラー率1ppmで書き込みできる時間)+20μs(昇圧に掛かる時間)=312μs
となる。
102 モニタ回路
103 メモリセル
104 トランジスタ
105 メモリ素子
106 コントロール回路
200 コンパレータ
201〜204 抵抗
205 NANDゲート
206〜209 トランジスタ
300 非接触情報処理装置
301 無線通信回路
302 クロック生成回路
303 ロジック回路
304 電源回路
305 復調回路
306 変調回路
307 分周回路
309 カウンタ回路
310 CPU
311 ROM
312 RAM
313 コントローラ
314 CPUインターフェース
315 RFインターフェース
316 メモリコントローラ
317 アンテナ
318 アンテナ部
319 基準クロック生成回路
Claims (7)
- 第1の電極、第2の電極、及び前記第1の電極と前記第2の電極との間に設けられた半導体層を有するメモリ素子と、
前記メモリ素子への書き込み電圧を生成する昇圧回路と、
前記昇圧回路の出力をモニタするモニタ回路と、を有し、
前記モニタ回路は、前記メモリ素子への書き込み動作において、前記昇圧回路の出力の変化を検出し、前記メモリ素子への書き込み動作を停止させるための信号を出力することを特徴とする半導体記憶装置。 - 第1の電極、第2の電極、及び前記第1の電極と前記第2の電極との間に設けられた半導体層を有するメモリ素子と、
前記メモリ素子への書き込み電圧を生成する昇圧回路と、
前記昇圧回路に信号を入力するコントロール回路と、
前記昇圧回路の出力をモニタし、且つ、前記コントロール回路を制御するモニタ回路と、を有することを特徴とする半導体記憶装置。 - 第1の電極、第2の電極、及び前記第1の電極と前記第2の電極との間に設けられた半導体層を有するメモリ素子と、
前記メモリ素子への書き込み電圧を生成する昇圧回路と、
前記昇圧回路の出力をモニタするモニタ回路と、を有し、
前記モニタ回路は、前記メモリ素子への書き込み動作において、前記昇圧回路の出力の変化を検出し、前記昇圧回路の昇圧動作を停止させるための信号を出力することを特徴とする半導体記憶装置。 - 請求項3において、
前記昇圧回路の昇圧動作を停止させるための信号により、前記昇圧回路へのクロック信号の供給が停止することを特徴とする半導体記憶装置。 - 請求項1乃至請求項4のいずれか一において、
前記メモリ素子は、前記第1の電極と前記第2の電極との間に書き込み電圧を印加することにより、前記第1の電極と前記第2の電極との間の抵抗値を変化させることで記憶を行うことを特徴とする半導体記憶装置。 - 請求項1乃至請求項5のいずれか一に記載の半導体記憶装置と、無線通信回路と、演算処理回路と、を有し、
無線通信によって、前記半導体記憶装置への情報の書き込み及び前記半導体記憶装置からの情報の読み出しを行うことを特徴とする非接触情報処理装置。 - 請求項1乃至請求項5のいずれか一に記載の半導体記憶装置を用いたことを特徴とする電子機器。
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